|| List of recent Ultraviolet-related patents
| Carbon black, rubber composition and pneumatic tire|
The present invention provides carbon black, the standard deviation σ of aggregate size distribution of which is obtained by alight scattering method using an ultraviolet ray, the standard deviation σ satisfying the expression (1): σ<−48.7×(24m4dbp/dst)+161.8 (1). In the expression (1), 24m4dbp represents the dibutyl phthalate absorption number (cm3/100 g) of compressed sample, and dst (nm) is a stokes' equivalent diameter providing the mode in aggregate size distribution obtained by a centrifugal sedimentation method.
| Curing-type coating-agent composition|
A curing-type coating-agent composition according to the present invention contains: component (a) (e.g., an isocyanuric ring-containing urethane (meth)acrylate compound) in an amount of from 20 to 80 parts by mass; component (b) (e.g., an isocyanuricring-containing tri(meth)acrylate compound free from any urethane bond) in an amount of from 10 to 70 parts by mass; component (c-1) (e.g., a reaction compound between a colloidal silica and an alkoxysilane compound having a maleimide group) in amount of from 1 to 35 parts by mass, or component (c-2) (e.g., a specific organosilicon compound) in an amount of from 5 to 35 parts by mass; a radical-polymerization initiator serving as component (d) in an amount of from 0.1 to 10 parts by mass; an ultraviolet absorber serving as component (e) in an amount of from 1 to 12 parts by mass; and an organic solvent serving as component (f) in an amount of from 10 to 1,000 parts by mass; with respect to a sum of the component (a), the component (b), and the component (c-1) or the component (c-2) being taken as 100 parts by mass. The aforementioned composition demonstrates excellent wear resistance and weatherability as a coating agent for plastic substrate, or the like, which is employed outside..
| Polyetherimide polycarbonate blends|
The disclosure relates to compositions exhibiting a uv resistance of Δe ranging from more than 0 to less than or equal to 10 units after exposure to ultraviolet light for 300 hours, per astm d-4459 protocol. The compositions can include at least 15 wt % of a polyetherimide; at least 35 wt % of a polycarbonate; a polyetherimide siloxane; and optionally, at least one uv stabilizer.
| Inhibitor for corneal epithelial cell death, inhibitor characterized by combining hyaluronic acid and flavin adenine dinucleotide|
A combination of hyaluronic acid or a salt thereof and flavin adenine dinucleotide or a salt thereof can be an inhibitor for corneal epithelial cell death induced by ultraviolet irradiation and/or dryness because it significantly inhibits the decline of the number of living cells in corneal epithelial cells induced by ultraviolet irradiation or dryness.. .
| Methods and apparatus for building complex 3d scaffolds and biomimetic scaffolds built therefrom|
A novel method for building complex three-dimensional scaffolds for biomimetic applications such as in vitro organ growth, using a gelatin/sugar/water gel, ultraviolet radiation, and heat or enzyme is described. The method produces gelatin-sugar hydrogels demonstrating greater thermal stability, mechanical strength, and resistance to enzymatic degradation.
| Anti-reflective coating for photolithography and methods of preparation thereof|
Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one ph tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds.
| Film-forming material, group iv metal oxide film and vinylenediamide complex|
An object of the present invention is to provide a method for producing a group iv metal oxide film useful as a semiconductor element or an optical element at a low temperature. The present invention relates to a method for producing a group iv metal oxide film, comprising coating a surface of a substrate with a film-forming material dissolved in an organic solvent, and subjecting the substrate to a heat treatment, an ultraviolet irradiation treatment, or both of these treatments, wherein a film-forming material obtained by reacting a vinylenediamide complex having a specific structure with an oxidizing agent such as oxygen gas, air, ozone, water and hydrogen peroxide is used as the film-forming material..
| Quantum dot-fullerene junction based photodetectors|
A photodetector includes one or more photodiodes and a signal processing circuit. Each photodiode includes a transparent first electrode, a second electrode, and a heterojunction interposed between the first electrode and the second electrode.
| Continuous-flow solar ultraviolet disinfection system for drinking water|
Potable drinking water is a scarce resource in many parts of developing countries, especially rural areas. Due to limited financial means of these countries, low cost point-of-use systems are thought to be appropriate technology to treat water.
| Metrology and methods for detection of liquid|
One embodiment relates to an apparatus comprising a light source adapted to transmit light through a liquid, and a detector adapted to detect an intensity of the light after it passes through the liquid. The apparatus may also include a device to process data relating to the intensity of the infrared light and compare the processed data to predetermined control data.
| Ballast water tank recirculation treatment system|
Apparatus is provided having a signal processor or signal processing module configured to receive signaling containing information about the quality of water in a ballast water tank recirculation treatment system, e.g., in a vessel, boat or ship; and determine information about a variable fluorescence treatment to the water in the ballast water tank recirculation treatment system, based at least partly on the signaling received, as well as provide corresponding signaling containing information about the variable fluorescence treatment. The apparatus may include a variable fluorescence device configured to receive the corresponding signaling and provide the variable fluorescence treatment, including providing ultraviolet (uv) light to the water in the ballast water tank recirculation treatment system..
| Attraction device, insect-capturing apparatus and insect-capturing method|
By plates (31, 32) having different colors, an edge is formed in the vertical direction along the boundary between the plates (31, 32). Further, as materials of the plates (31, 32), a material which primarily transmits ultraviolet light having a wavelength of about 370 nm and a material which primarily transmits green light having a wavelength of about 520 nm are used.
|Method of using medical implants|
Disclosed herein is a method of using a medical implant in a subject. The method comprises treating a medical implant with ultraviolet light (uv) in a closed environment, causing the temperature of the medical implant to be between room temperature (rt) and about 37° c., and immediately, and placing the implant of a temperature from about the room temperature to about 37° c.
|Method for processing sample and sample processing apparatus|
Long-period roughness in patterned resist is reduced in a manufacturing process of a sample such as a semiconductor device. A method for processing a sample to be processed, with patterned resist, in a sample processing apparatus includes: disposing the sample to be processed, with the patterned resist on the stage in the processing chamber; supplying silicon tetrachloride (sicl4) or hydrobromide (hbr) into the processing chamber as processing gas; holding the pressure of the processing chamber in the range of 1 pa to 10 kpa; exciting the processing gas by irradiating the vacuum ultraviolet light having a wavelength of 200 nm or less to the processing gas; reacting an element contained in the excited processing gas with the pattern resist of the sample, and curing the resist..
|Method for producing pressure-sensitive adhesive sheet having ultraviolet-ray curing-type acrylic pressure-sensitive adhesive layer|
Provided is a method for producing a pressure-sensitive adhesive sheet having an ultraviolet-ray curing-type acrylic pressure-sensitive adhesive layer that has a high conversion per unit amount of light, is excellent in productivity, and is also excellent in balance between pressure-sensitive adhesive performances. The method includes: a pressure-sensitive adhesive layer forming step in which the composition is irradiated with and cured by ultraviolet rays to form a pressure-sensitive adhesive layer; wherein an ultraviolet lamp that radiates the ultraviolet rays in the pressure-sensitive adhesive layer forming step is an led lamp; the ultraviolet rays are radiated intermittently; and the time of bright periods when the ultraviolet rays are radiated is from 1 second to 30 seconds, and the time of dark periods when the rays are not radiated is from 0.1 timed to 20 times the time of the bright periods..
|An ozone generator|
An ozone generator comprising an ultraviolet light source and a housing defining a space around the ultraviolet light source. The housing is configured to direct a gas comprising oxygen through an ozone generation zone in which the gas containing oxygen is exposed to ultraviolet light.
|Methods and arrangements for frequency shift communications|
Embodiments relate to communicating data by varying a frequency of an amplitude modulated light source. Embodiments may comprise logic such as hardware and/or code to vary a frequency of an amplitude-modulated electromagnetic radiator such as a visible light source, an infrared light source, or an ultraviolet light source.
|Uniform illumination light diffusing fiber|
Light diffusing optical fibers for use in ultraviolet illumination applications and which have a uniform intensity that is angularly independent are disclosed herein along with methods for making such fibers. The light diffusing fibers are composed of a silica-based glass core that is coated with a number of layers including a scattering layer.
|System, method and reticle for improved pattern quality in extreme ultraviolet (euv) lithography and method for forming the reticle|
A reticle for use in an extreme ultraviolet (euv) lithography tool includes a trench formed in the opaque border formed around the image field of the reticle. The trench is coated with an absorber material.
|Extreme ultraviolet lithography process|
A process of an extreme ultraviolet lithography is disclosed. The process includes receiving an extreme ultraviolet (euv) mask, an euv radiation source and an illuminator.
|Support structure for barrier layer of semiconductor device|
Among other things, one or more support structures and techniques for forming such support structures within semiconductor devices are provided. The support structure comprises an oxide infused silicon layer that is formed within a trench of a dielectric layer on a substrate of a semiconductor device.
|Novel semiconducting alloy polymers formed from orthocarborane and 1,4-diaminobenzene|
Novel semiconducting polymers have been formed via the electron-induced cross-linking of orthocarborane b10c2h2 and 1,4-diaminobenzene. The films were formed by co-condensation of the molecular precursors and 200 ev electron-induced cross-linking under ultra-high vacuum (uhv) conditions.
|Chamber and extreme ultraviolet light generation apparatus|
A chamber used in an extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target material with a laser beam may include a chamber receptacle, a heat shield that is disposed within the chamber receptacle between a predetermined region where the target material turns into plasma and the chamber receptacle and that is configured to absorb heat produced at the predetermined region when the target material turns into plasma, and a support portion configured to attach the heat shield to the chamber receptacle, and further, the support portion may include an absorbing portion configured to absorb stress produced in the heat shield deforming due to the heat, by expanding/contracting in response to the thermal deformation of the heat shield.. .
|Split drive assembly and guide sleeves for uv disinfection modules|
The present invention is generally directed to a split drive assembly for an ultraviolet (uv) disinfection module comprising one or more uv lamps extending between one or more headers and a cleaning plate having openings therein arranged to substantially coincide with the uv lamps to permit movement of the cleaning plate along the uv lamps, the split drive assembly operatively connected to a moving device, the split drive assembly including a split drive nut having an internal bore for attachment to the moving device, the drive nut comprising at least two portions attached together around the moving device. Other aspects of the invention may include a sleeve guide including an attachment plate to attach the sleeve guide to a surface of the cleaning plate; a sleeve extended from the attachment plate; and an alignment device in contact with a uv lamp, the alignment device attached to the sleeve..
|Spectral purity filter and light monitor for an euv actinic reticle inspection system|
An extreme ultraviolet (eum) mask inspection system, comprising a light source to project euv light along an optical axis, an illumination system to receive the euv light from the source, the illumination system comprising a spectral purity filter (spf), the spf transmits a first portion of the euv light along the optical axis toward a mask and the spf comprising a plurality of at least partially reflective elements, said elements reflects a second portion of the euv light off the optical axis, a projection system adapted to receive the first portion of the euv light after it has illuminated the mask, a first detector array adapted to receive the image, and a second detector array to receive the second portion of the euv light. The spf may comprise one or more multilayer interference-type filters.
|Systems and methods for a nanoparticle photocatalyzed through-flow degradation reactor|
A reactor system including a main reactor having a reaction vessel in operative communication with a solar concentrator for focusing sunlight onto the reaction vessel for providing waste management and removal is disclosed. The sunlight focused on the reactor vessel provides ultraviolet radiation that degrades organic pollutants within the reaction vessel and infrared radiation boils off the liquid within the reaction vessel, thereby allowing a steady state condition to be achieved in the reactor vessel.
|Method for fabricating gold/titanium dioxide core-shell structured photocatalyst and application thereof to photocatalytic decomposition of organic compounds|
This invention discloses a method for fabricating a gold/titanium dioxide core-shell structured photocatalyst and the application thereof to photocatalytic decomposition of organic compounds under ultraviolet irradiation. The method comprises steps: fabricating a solution of gold ions; fabricating gold/titanium dioxide core-shell structured nanoparticles; and crystallizing the gold/titanium dioxide core-shell structured nanoparticles, wherein gold and titanium dioxide are mixed by a weight ratio of 0.005 to 0.03.
|Thiol-ene cured oil-resistant polyacrylate sealants for in-place gasketing applications|
The present invention relates to thiol-ene curing compositions, which cure upon exposure to ultraviolet (uv) light and/or heat. The compositions include components having alkenyl (or “ene”) functionality and components having thiol functionality, which undergo thiol-ene curing.
|Gas lock device and extreme ultraviolet light generation apparatus|
A gas lock device may include a chamber having a passage section and a connection hole that connects a surface to the passage section, an optical element that is attached to the chamber and seals the passage section, a gas supply apparatus, and a pipe that is attached at one end to the gas supply apparatus and attached at the other end to the chamber, and may define a flow channel communicating with the connection hole.. .
|Multi-colored decorative laminate|
A decorative laminate includes a core layer, a decorative layer and an optional overlay layer. The core layer includes one or more resin impregnated paper sheets.
|Method for detecting fluid injection in a patient|
A method for detecting fluid injection in a patient, the method including the steps of providing a fluid storage tank; providing fluid for use in machinery and adding said fluid to the fluid storage tank; and providing a fluorescent dye and adding the fluorescent dye to the fluid such that the fluid fluoresces in the presence of ultraviolet light.. .
|New triazine derivative and ultraviolet absorber|
In the general formula (1), x1a and x1b represent a hydrogen atom or a substituent, y1 represents a substituent having a dissociative proton, z1a and z1b each independently represent heteroatom or a carbon atom, q1 represents an atomic group which is required to form an aromatic heterocycle together with z1a and z1b.. .
|New triazine derivative and ultraviolet absorber|
In the general formula (1), l1 represents a divalent to decavalent aromatic ring residue or a divalent to decavalent heterocycle residue, n1 represents an integer of 2 to 10, x1 represents a hydrogen atom or a substituent, r1a, r1b, r1c and r1d each independently represent a hydrogen atom or a substituent and may be bonded to each other to form a ring.. .
|Pattern-forming method, electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition, resist film, manufacturing method of electronic device using them and electronic device|
A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (a) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (a) in a developer containing an organic solvent by an action of an acid, (b) a compound capable of generating an acid upon irradiation with an electron beam or extreme ultraviolet radiation, (c) a resin having one or more groups selected from the specific group as defined in the specification and (d) a solvent; step (2) of exposing the film with an electron beam or extreme ultraviolet radiation; and step (4) of developing the film with a developer containing an organic solvent after the exposing to form a negative pattern.. .
|Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device|
There is provided a pattern forming method comprising (1) a step of forming a film by using an electron beam-sensitive or extreme ultraviolet-sensitive resin composition, (2) a step of exposing the film by using an electron beam or an extreme ultraviolet ray, and (3) a step of developing the exposed film by using an organic solvent-containing developer, wherein the electron beam-sensitive or extreme ultraviolet-sensitive resin composition contains (a) a resin containing (r) a repeating unit having a structural moiety capable of decomposing upon irradiation with an electron beam or an extreme ultraviolet ray to generate an acid, and (b) a solvent.. .
|Apparatus, system, and method for evaluating and adjusting the effectiveness of ultraviolet light disinfection of areas|
Provided is an apparatus, system, and method for evaluating and adjusting the effectiveness of ultraviolet light disinfection of areas such as hospital rooms or other areas. Provided in certain example embodiments are uv dosimeters adapted to visually indicate when they have been exposed to light in the uv c band range at a predetermined fluence level, the uv dosimeters being removably adhesable to surfaces in the room or area.
|Add on filter and air filtration system and method|
The present invention relates to an add on filter and air filtration system and method incorporating an add on filter for applying ultraviolet light to an environment to create oxidizing agents for killing microbes, such as bacteria, mold, and viruses, and for destroying odors. The add on filter may be coupled to existing air filtration systems to provide further filtration of the air.
|Multi-color light emitting diode device|
A multi-color light emitting diode device includes a plurality of light sources and a control module. The light sources are a ultraviolet a light source, a ultraviolet b light source, and a ultraviolet c light source, a red light source, a green light source, and a blue light source, an infrared light source, and a yva light source.
|Method of post-mold crosslinking thermoplastic polyurethane golf ball cover compositions|
A multi-piece golf ball is manufactured by molding a cover layer and a core layer to form a golf ball preform in a mold. The cover layer has a thermoplastic polyurethane composition which may be crosslinked by ultraviolet radiation.
Humidifying apparatus includes a chamber, and a water tank for supplying water to the chamber. A baffle located within the chamber divides the chamber into an inlet section and an outlet section, and guides water received from the water tank along the inlet section to the outlet section.
|Optoelectronic devices incorporating single crystalline aluminum nitride substrate|
The invention provides an optoelectronic device adapted to emit ultraviolet light, including an aluminum nitride single crystalline substrate, wherein the dislocation density of the substrate is less than about 105 cm−2 and the full width half maximum (fwhm) of the double axis rocking curve for the (002) and (102) crystallographic planes is less than about 200 arcsec; and an ultraviolet light-emitting diode structure overlying the aluminum nitride single crystalline substrate, the diode structure including a first electrode electrically connected to an n-type semiconductor layer and a second electrode electrically connected to a p-type semiconductor layer. In certain embodiments, the optoelectronic devices of the invention exhibit a reverse leakage current less than about 10−5 a/cm2 at −10v and/or an l80 of at least about 5000 hours at an injection current density of 28 a/cm2..
|Silicone material having a photochromic additive|
A silicone-based material that incorporates a photochromic molecule, and methods of making the same. The material changes color when exposed to ultraviolet radiation, thereby providing a convenient indicator of exposure.
|Hybrid multi-spectrum photosensitive pixel group, photosensitive device, and photosensitive system|
The present invention relates to a mixed multi-spectrum light-sensing pixel group, a light-sensing device, and a light-sensing system. The mixed multi-spectrum light-sensing pixel group includes at least one chemical coating light-sensing pixel and at least one semiconductor light-sensing pixel.
|Method of manufacturing image display device|
An image display device is manufactured by: applying a liquid photo-curable resin composition having a total value of cure shrinkage ratios based on pre-curing and complete curing of 3% or more to a surface of the light-transmitting cover member or a surface of the image display member with a thickness greater than that of the light-shielding layer to cancel the step between the light-shielding layer and the light-shielding layer forming surface of the light-transmitting cover member; pre-curing the photo-curable resin composition with the irradiation of ultraviolet rays to form a pre-cured resin layer; bonding the light-transmitting cover member to the image display member such that the pre-cured resin layer is placed inside; and subjecting the pre-cured resin layer to the irradiation of ultraviolet rays to achieve the complete curing thereof. The pre-curing is conducted to obtain a cure shrinkage ratio less than 3% in the complete curing thereof..
|Environment dependent - temperature independent color changing label|
A timing device comprises a sensing material and/or a component which is sensitive to the presence of an environmental attribute. The environmental attribute drives and speeds up or slows the timing device as the concentration of the attribute increases or decreases, respectively.