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Sensitizer

Sensitizer-related patent applications - as published by the U.S. Patent and Trademark Office (USPTO).


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Combination of an oxidant, a photosensitizer and a wound healing agent for oral disinfection and ...
Klox Technologies Inc.
June 08, 2017 - N°20170157254

The present document describes methods of use of photo activated compositions for oral disinfection and/or treatments which comprise at least one oxidant, at least one photoactivator capable of activating the oxidant, and at least one healing factor chosen from hyaluronic acid, glucosamine and allantoin, in association with a pharmacologically acceptable carrier.
F10 inhibits growth of pc3 xenografts and enhances the effects of radiation therapy
Wake Forest University
June 01, 2017 - N°20170151240

Chemotherapy remains of limited use for the treatment of prostate cancer with only one drug, docetaxel, demonstrating a modest survival advantage for treatment of late-stage disease. Data from the nci 60 cell line screen indicated that the castration-resistant prostate cancer cell lines pc3 and du145 were more sensitive than average to the novel polymeric fluoropyrimidine (fp), f10, despite displaying less than ...
Combination of an oxidant and a photoactivator for the healing of wounds
Wake Forest University
May 25, 2017 - N°20170143989

There is provided a wound healing composition which comprises at least one oxidant, at least one photoactivator capable of activating the oxidant and at least one healing factor chosen from hyaluronic acid, glucosamine and allantoin in association with a pharmaceutically acceptable carrier. In addition, a method of topically treating wounds using at least one oxidant and at least one photoactivator ...
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Chemically amplified resist material and resist pattern-forming method
Jsr Corporation
May 11, 2017 - N°20170131633

A chemically amplified resist material comprises a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The radiation-sensitive acid-and-sensitizer generating agent or the radiation-sensitive acid generating agent included in the ...
Methods for detecting and categorizing skin sensitizers
University Of Mississippi
May 11, 2017 - N°20170131207

Methods for detecting skin sensitization chemical compounds using nuclear magnetic resonance (nmr) spectroscopy and/or a microplate spectrophotometric assay or other spectroscopic methods. The presently disclosed subject matter relates to a method of detecting skin sensitization potential of a test chemical compound using nuclear magnetic resonance (nmr) spectroscopy, microplate spectrophotometry or other spectroscopic methods as stand-alone or in combination.
A method for continuously producing emulsion explosive by emulsification and sensitization in a static state ...
Shijiazhuang Success Machinery Electrical Co., Ltd .
May 11, 2017 - N°20170129824

A method continuously produces emulsion explosive by emulsification and sensitization in a static state without a loading pump. After the water phase and oil phase enters a static emulsifier for emulsification, the emulsion enters a static sensitization device; the sensitizer enters the static sensitization device through the sensitizer charging inlet and mixes with the emulsion in the static sensitization device. ...
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Resist patterning method, latent resist image forming device, and resist material
Osaka University
April 06, 2017 - N°20170097570

A resist patterning method according to the present invention includes a resist layer forming step, a patterned exposure step, a flood exposure step, and a developing step. In the resist layer forming step, a resist layer containing a base resin, a sensitizer precursor, an acid generator, and a base generator is formed on a substrate. In the patterned exposure step, ...
Methods and compounds for phototherapy with chalcogenorhodamine photosensitizers
The Research Foundation For The State University Of New York
April 06, 2017 - N°20170096636

A method of selectively depleting pathogenic t lymphocytes from a blood cell composition is carried out by (a) combining the cell composition ex vivo with an active compound in an effective amount, and then (b) irradiating the cells with light ex vivo for a time and at an intensity sufficient to selectively kill pathogenic t lymphocytes in said cell composition. ...
Dvdms sensitizer for cancer sonodynamic therapy
The Research Foundation For The State University Of New York
April 06, 2017 - N°20170095557

A method for treatment of hyperproliferative tissue by injection of and subsequently exposing the hyperproliferative tissue to a frequency of ultrasound. The invention further includes purified bis [1-[6,7-bis [2-(sodium carbonate ethyl]-1,3,5,8,-tetramethyl-2-vinyl-porphin-4-yl]ethyl]ether (dvdms) for use in sonodynamic treatment of hyperproliferative tissue including cancer and further includes a kit including a dosage controllable injection ...
Photosensitizer and photoelectric conversion device
Chemicrea Inc.
March 30, 2017 - N°20170092436

A photosensitizer is a dye represented by the following formula (i) or its salt. In the following chemical formula, m represents an integer of 0 through 4, and n represents an integer of 0 or 1, and p represents an integer of 0 to 2. R1, r2 and r3 represent a hydrogen atom, an alkyl group, an aryl group or the like. R4, r4′, r4&#...
Photodynamic diagnosis, formulations usable as photosensitizers for this purpose, method for the production and use ...
Sanochemia Pharmazeutika Ag
March 30, 2017 - N°20170087256

In the early detection of cancer, in particular bladder cancer, a photodynamic diagnosis uses, as a photosensitizer, a formulation that contains sodium hypericinate that is bonded to polyvinylpyrrolidone or complexed with polyvinylpyrrolidone.
Silver formation using stannous alkoxide complexes
Eastman Kodak Company
March 23, 2017 - N°20170081765

A method for forming an article, comprises providing a stannous alkoxide-containing pattern on a substrate. This stannous alkoxide-containing pattern is obtained from a non-aqueous stannous alkoxide composition that comprises component (a) comprising a water-insoluble stannous alkoxide complex comprising stannous ions, in an amount of at least 1 weight %, and a photocurable component (b), non-photocurable water-insoluble polymer component (c) having a molecular ...
Non-aqueous compositions and articles using stannous alkoxides
Eastman Kodak Company
March 23, 2017 - N°20170081530

A non-aqueous stannous alkoxide composition comprises: component (a) comprising a water-insoluble stannous alkoxide complex comprising stannous ions in an amount of at least 1 weight %, and a photocurable component (b), non-photocurable water-insoluble polymer component (c) having a molecular weight of at least 10,000, or both the photocurable component (b) and the non-photocurable water-insoluble polymer component (c). When photocurable component (b) is present, ...
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Chemically amplified resist material and resist pattern-forming method
Jsr Corporation
March 16, 2017 - N°20170075221

A chemically amplified resist material comprises: a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid; and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The polymer component comprises: a first polymer comprising a first structural unit that comprises ...
Novel photoresist having sensitizer bonded to acid generator
Taiwan Semiconductor Manufacturing Company, Ltd.
March 16, 2017 - N°20170075216

The present disclosure is directed to a photoresist and a method of performing a lithography process using the photoresist. The photoresist contains a polymer and a photo-acid generator. The photo-acid generator contains a sensitizer component, an acid generator component, and a bonding component that bonds the sensitizer component to the acid generator component. The bonding component may be either a ...
Silver nanoparticle-enhanced photosensitizers
University Of Cincinnati
March 16, 2017 - N°20170071210

The present invention relates generally to compositions and methods of killing bacteria using a surface plasmon coupled to a photosensitizer. A nanostructure (10) may include a silver nanoparticle core (12), a mesoporous silica shell (14), and a photosensitizer (16). A method of killing bacteria may include contacting bacteria with a nanostructure (10) including a silver nanoparticle core (12), a mesoporous silica shell (14), and a photosensitizer (16) to ...
Multifunctional nanoparticle systems and methods for cancer diagnosis and combination therapy
Board Of Regents, The University Of Texas System
March 09, 2017 - N°20170065523

In one aspect, compositions comprising a population of core-shell nanoparticles are described herein. In some cases, the population of core-shell nanoparticles comprises a core component and a shell component encapsulating or surrounding the core component. Additionally, one or more radiosensitizers are disposed in or dispersed throughout the core component, or an interior region of the core component. Similarly, one or ...
Resist pattern-forming method and chemically amplified radiation-sensitive resin composition
Jsr Corporation
March 02, 2017 - N°20170059992

A resist pattern-forming method comprises applying a chemically amplified radiation-sensitive resin composition on a substrate to form a resist film. The chemically amplified radiation-sensitive resin composition comprises a first component solubility in a developer solution of which is capable of being altered by an action of an acid, a second component that is capable of generating an acid by an ...
Actinic ray-curable offset ink composition and printed item obtained therewith
Toyo Ink Co., Ltd.
March 02, 2017 - N°20170058134

Shown is an actinic ray-curable offset ink composition for foodstuff and pharmaceutical packaging which maintains superior curability without using a photosensitizer, which despite contributing to better curability (high productivity) tends to suffer from significant outward migration. The ink composition also suppresses outward migration of the monomers and photopolymerization initiators, and exhibits favorable adhesion to substrates.
Pattern-forming method
Tokyo Electron Limited
February 23, 2017 - N°20170052450

A pattern-forming method comprises applying a chemically amplified resist material on an antireflective film formed on a substrate to form a resist material film. The resist material film is patternwise exposed to ionizing radiation or nonionizing radiation having a wavelength of no greater than 400 nm. The resist material film patternwise exposed is floodwise exposed to nonionizing radiation having a wavelength ...
Chemically amplified resist material, pattern-forming method, compound, and production method of compound
Tokyo Electron Limited
February 23, 2017 - N°20170052449

A pattern-forming method comprises patternwise exposing a predetermined region of a resist material film made from a photosensitive resin composition comprising a chemically amplified resist material to a first radioactive ray that is ionizing radiation or nonionizing radiation having a wavelength of no greater than 400 nm. The resist material film patternwise exposed is floodwise exposed to a second radioactive ray ...
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