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Plasma patents



      
           
This page is updated frequently with new Plasma-related patent applications. Subscribe to the Plasma RSS feed to automatically get the update: related Plasma RSS feeds. RSS updates for this page: Plasma RSS RSS


Method and device for generating hydrogen plasma

Taane

Method and device for generating hydrogen plasma

Strap for plasma processing apparatus and plasma processing apparatus having the same

Samsung Display

Strap for plasma processing apparatus and plasma processing apparatus having the same

Strap for plasma processing apparatus and plasma processing apparatus having the same

Lam Research

Methods for selectively modifying rf current paths in a plasma processing system

Date/App# patent app List of recent Plasma-related patents
02/26/15
20150057479
 Multi-stage system for processing hydrocarbon fuels patent thumbnailnew patent Multi-stage system for processing hydrocarbon fuels
A multi-stage system converts a hydrocarbon material to an intermediate product in a first stage and a final product in a final stage. The first stage includes a first reaction chamber configured to receive hydrocarbon and process gas.
H Quest Partners, Lp
02/26/15
20150057376
 Method and device for generating hydrogen plasma patent thumbnailnew patent Method and device for generating hydrogen plasma
A method for generating hydrogen plasma includes a step for preparing a solution in which hydrogenated hydrogen with ion binding properties or ortho hydrogen molecules have been dissolved. The method also includes exposing the solution to ultrasonic waves or microwaves.
Taane Co.
02/26/15
20150057287
 Method of therapeutic administration of dhe to enable rapid relief of migraine while minimizing side effect profile patent thumbnailnew patent Method of therapeutic administration of dhe to enable rapid relief of migraine while minimizing side effect profile
Pharmaceutical compositions containing dihydroergotamine (dhe) and methods in which dhe is administered to patients for treatment of migraine without side effects or adverse effects are disclosed. Methods for rapid treatment of migraine with dhe are disclosed comprising: dampening the peak plasma concentration (cmax) and slightly delaying the peak such as to avoid activating the dopaminergic and adrenergic receptors, while achieving sufficient active binding to the serotonin receptors to provide relief from migraine symptoms within a timeframe that permits rapid resolution of migraine symptoms.
Map Pharmaceuticals, Inc.
02/26/15
20150057262
 Cyclic p1 linkers as factor xia inhibitors patent thumbnailnew patent Cyclic p1 linkers as factor xia inhibitors
Or stereoisomers, tautomers, or pharmaceutically acceptable salts thereof, wherein all the variables are as defined herein. These compounds are selective factor xia inhibitors or dual inhibitors of fxia and plasma kallikrein.
02/26/15
20150057193
 Endothelial-monocyte activating polypeptide ii (emap-ii), a biomarker for use in diagnosis and treatment of brain injury patent thumbnailnew patent Endothelial-monocyte activating polypeptide ii (emap-ii), a biomarker for use in diagnosis and treatment of brain injury
A diagnostic tool and method of diagnosing brain injury and brain injury type (traumatic vs. Ischemic) by detecting the level of expression of endothelial monocyte-activating polypeptide ii (emap ii) and comparing to a control.
02/26/15
20150056816
 Semiconductor device manufacturing method and computer-readable storage medium patent thumbnailnew patent Semiconductor device manufacturing method and computer-readable storage medium
A semiconductor device manufacturing method for etching a substrate having a multilayer film formed by alternately stacking a first film and a second film, and a photoresist layer to form a step-shaped structure is provided. The step-shaped structure is formed by repeatedly performing a first step of plasma-etching the first film by using the photoresist layer as a mask, a second step of exposing the photoresist layer formed on the substrate to a plasma generated from a processing gas containing argon gas and hydrogen gas by applying a high frequency power to a lower electrode while applying a negative dc voltage to an upper electrode, a third step of trimming the photoresist layer, and a fourth step of plasma-etching the second film..
Tokyo Electron Limited
02/26/15
20150056808
 Method of etching silicon oxide film patent thumbnailnew patent Method of etching silicon oxide film
Provided is a method of etching a silicon oxide film. The method includes exposing a workpiece including the silicon oxide film and a mask formed on the silicon oxide film to plasma of a processing gas to etch the silicon oxide film.
Tokyo Electron Limited
02/26/15
20150056766
 Method of making high electron mobility transistor structure patent thumbnailnew patent Method of making high electron mobility transistor structure
A method includes epitaxially growing a gallium nitride (gan) layer over a silicon substrate. The method further includes epitaxially growing a donor-supply layer over the gan layer.
Taiwan Semiconductor Manufacturing Company, Ltd.
02/26/15
20150056753
 Semiconductor die having fine pitch electrical interconnects patent thumbnailnew patent Semiconductor die having fine pitch electrical interconnects
A die has interconnect pads on an interconnect side near an interconnect edge and has at least a portion of the interconnect side covered by a conformal dielectric coating, in which an interconnect trace over the dielectric coating forms a high interface angle with the surface of the dielectric coating. Because the traces have a high interface angle, a tendency for the interconnect materials to “bleed” laterally is mitigated and contact or overlap of adjacent traces is avoided.
Invensas Corporation
02/26/15
20150056750
 Manufacturing  semiconductor device patent thumbnailnew patent Manufacturing semiconductor device
A first insulating film in contact with an oxide semiconductor film and a second insulating film are stacked in this order over an electrode film of a transistor including the oxide semiconductor film, an etching mask is formed over the second insulating film, an opening portion exposing the electrode film is formed by etching a portion of the first insulating film and a portion of the second insulating film, the opening portion exposing the electrode film is exposed to argon plasma, the etching mask is removed, and a conductive film is formed in the opening portion exposing the electrode film. The first insulating film is an insulating film whose oxygen is partly released by heating.
Semiconductor Energy Laboratory Co., Ltd.
02/26/15
20150056602
new patent

Apheresis platelets with fixed residual plasma volume


Methods and systems for obtaining platelets are disclosed. Platelets are collected in a pre-determined volume of plasma and a determined amount of a combined storage medium including the pre-determined amount of plasma and a volume of a synthetic additive solution..
Fenwal, Inc.
02/26/15
20150056555
new patent

Photoresist and formation and use


A system and method for depositing a photoresist and utilizing the photoresist are provided. In an embodiment a deposition chamber is utilized along with a first precursor material comprising carbon-carbon double bonds and a second precursor material comprising repeating units to deposit the photoresist onto a substrate.
Taiwan Semiconductor Manufacturing Company, Ltd.
02/26/15
20150056387
new patent

Methods for making coated porous separators and coated electrodes for lithium batteries


In an example of a method for coating a lithium battery component, the lithium battery component is provided. The lithium battery component is selected from the group consisting of an uncoated or untreated porous polymer membrane or an uncoated or untreated electrode including a lithium and manganese based active material.
Gm Global Technology Operations Llc
02/26/15
20150056381
new patent

Method for forming conductive film


A method for forming a conductive film on a substrate includes forming a precursor-containing film on the substrate; and irradiating plasma of a treatment gas to the precursor-containing film by an atmospheric pressure plasma treatment device, removing the organic substances and forming a conductive film from the metallic fine particles or the metallic compounds, the atmospheric pressure plasma treatment device including: a microwave generator, a hollow waveguide, a gas supply device, and an antenna portion configured to discharge to the outside, whereby the treatment gas being converted to plasma by the microwaves, the plasma thus generated being irradiated to the precursor-containing film on the substrate, and a hydrogen radical density of the plasma at a position spaced apart 7 mm from the slot holes being equal to or higher than 2×1014/cm3.. .
Tokyo Electron Limited
02/26/15
20150056380
new patent

Ion source of an ion implanter


An ion source uses at least one induction coil to generate ac magnetic field to couple rf/vhf power into a plasma within a vessel, where the excitation coil may be a single set of turns each turn having lobes or multiple separate sets of windings. The excitation coil is positioned outside and proximate that side of the vessel that is opposite to the extraction slit, and elongated parallel to the length dimension of the extraction slit.
Advanced Ion Beam Technology , Inc.
02/26/15
20150056363
new patent

Method for producing low-ash poultry plasma protein powder by utilizing poultry blood


The present invention relates to a method for producing low-ash poultry plasma protein powder by utilizing poultry blood. Specifically, the method of the present invention comprises the steps of: mixing the poultry blood with an anticoagulant to obtain anticoagulated whole blood; centrifugally separating the anticoagulated whole blood to obtain plasma liquid; de-calcifying the plasma liquid via a precipitation reaction, ultra-filtrating the plasma liquid via a ultra-filtration membrane, emulsifying, and nano-filtrating to obtain the concentrated plasma liquid; and drying the concentrated plasma liquid to obtain the poultry plasma protein powder.
Shanghai Genon Biological Products Co., Ltd
02/26/15
20150056182
new patent

Drug containing carrier into cell for forming immune complex


The present inventors discovered that by forming a large immune complex comprising antigens containing two or more antigenic binding units (epitopes) and two or more antigen-binding molecules (for example, antibodies), elimination from the plasma of the antigens containing two or more antigenic binding units can be accelerated. Moreover, they found that by using this characteristic and by further using antigen-binding molecules having an ion-dependent antigen-binding activity, elimination of the antigens can further be accelerated and the above problem can be solved..
Chugai Seiyaku Kabushiki Kaisha
02/26/15
20150056108
new patent

Exhaust flow spreading baffle-riser to optimize remote plasma window clean


Porogen accumulation in a uv-cure chamber may be reduced by removing outgassed porogen by flowing a purge gas across a window through which a wafer is exposed to uv light. Porogens in the purge gas stream may, as they flow through the chamber and into an exhaust baffle, deposit on surfaces within the chamber, including on the exhaust baffle.
Lam Research Corporation
02/26/15
20150056107
new patent

Microwave plasma sterilisation system and applicators therefor


A sterilization system having a controllable non-ionizing microwave radiation source for providing microwave energy for combining with a gas to produce atmospheric low temperature plasma for sterilizing biological tissue surfaces or the like. A plasma generating region may be contained in a hand held plasma applicator.
Creo Medical Limited
02/26/15
20150056095
new patent

Low energy electron sterilization


Low energy electron sterilizers and method of sterilization using low energy electrons are disclosed herein. An example method of sterilizing an instrument using low energy electrons can include generating one or more low energy electrons, maintaining the instrument in a vacuum and irradiating the instrument with the low energy electrons.
Electronworks Holdings Llc
02/26/15
20150055739
new patent

Plasma confinement use


A plasma confinement system is provided that includes a confinement chamber that includes one or more enclosures of respective helicity injectors. The one or more enclosures are coupled to ports at an outer radius of the confinement chamber.
University Of Washington Through Its Center Or Commercialization
02/26/15
20150054521
new patent

Discharge ionization current detector and aging treatment of the same


An aging treatment is performed by using cleaning gas obtained by mixing inert gas, as an impurity, to plasma gas. Plasma generation by dielectric-barrier discharge is performed until a predetermined period of time has elapsed by applying high ac voltage to an electrode while supplying the cleaning gas to a dielectric tube from a gas inlet..
Shimadzu Corporation
02/26/15
20150054405
new patent

Plasma generating device


The invention relates to a plasma generation device comprising a plurality of plasma modules for generating a plasma. Each plasma module has a module housing with at least one gas inlet for supplying a process gas.
Reinhausen Plasma Gmbh
02/26/15
20150053908
new patent

Memristive device and manufacture


A device with programmable resistance comprising memristive material between conductive electrodes on a substrate or in a film stack on a substrate is provided. During fabrication of a memristive device, a memristive layer may be hydrated after deposition of the memristive layer.
Privatran
02/26/15
20150053794
new patent

Heated showerhead assembly


The present disclosure generally comprises a heated showerhead assembly that may be used to supply processing gases into a processing chamber. The processing chamber may be an etching chamber.
Applied Materials, Inc.
02/26/15
20150053656
new patent

Laser-supported plasma processing


Methods, devices and systems for laser-supported plasma cutting or plasma welding of a workpiece. In one aspect, a method includes producing a plasma beam which extends in an expansion direction between an electrode and a processing location on the workpiece, the plasma beam having, with respect to a center axis of the plasma beam that extends in the expansion direction, an inner central region and an outer edge region, and supplying laser radiation to the outer edge region of the plasma beam.
Trumpf Werkzeugmaschinen Gmbh + Co. Kg
02/26/15
20150053645
new patent

Plasma processing apparatus and plasma processing method


The plasma processing apparatus includes a dielectric member for defining a chamber, a gas introducing part for introducing a gas into the chamber, a discharge coil disposed on one side of the dielectric member and supplied with ac power to generate a plasma in the chamber into which the gas has been introduced, a conductor member disposed on the other side of the dielectric member and facing the discharge coil with the chamber of the dielectric member interposed therebetween, an ac power source for supplying ac voltage to the discharge coil, an opening communicating with the chamber and serving for applying the plasma to a substrate to be processed, and a moving mechanism for moving the substrate relative to the chamber so that the substrate passes across a front of the opening. The discharge coil is grounded or connected to the conductor member via a voltage generating capacitor or a voltage generating coil..
Panasonic Corporation
02/26/15
20150053644
new patent

Methods for selectively modifying rf current paths in a plasma processing system


Methods and apparatus for modifying rf current path lengths are disclosed. Apparatus includes a plasma processing system having an rf power supply and a lower electrode having a conductive portion.
Lam Research Corporation
02/26/15
20150053591
new patent

System for processing hydrocarbon fuels using surfaguide


A system for processing hydrocarbon materials includes a waveguide having a lateral portion comprising housing having a first end portion configured to be connected to an energy generator, a closed opposite end portion, a primary axis extending from the first end portion to the second end portion, and a central portion having a circular opening. A reaction tube structure comprising an outer wall made of a dielectric material is positioned in or connected to the opening of the waveguide.
H Quest Partners, Lp
02/26/15
20150053553
new patent

Plasma processing apparatus


The antenna has a structure that the high frequency electrode is received in a dielectric case. The high frequency electrode has a go-and-return conductor structure that two electrode conductors are disposed close to and in parallel to each other with a gap therebetween to form a rectangular plate shape as a whole, and the two electrode conductors are connected by a conductor at an end in the longitudinal direction.
The Japan Steel Works, Ltd.
02/26/15
20150053348
new patent

Plasma processing apparatus


A plasma processing apparatus includes a mounting stage on which a substrate is mounted, a focus ring arranged around a periphery of the mounting stage, a plurality of magnetic members arranged at a surface of the focus ring and a surface of the mounting stage facing opposite each other, and a temperature adjustment unit configured to adjust a temperature of the focus ring by introducing a heat transfer gas between the surface of the focus ring and the surface of the mounting stage facing opposite each other.. .
Tokyo Electron Limited
02/26/15
20150053347
new patent

Controlling cd and cd uniformity with trim time and temperature on a wafer by wafer basis


Exemplary embodiments are directed to controlling cd uniformity of a wafer by controlling trim time on temperature in a plasma processing system. The plasma processing system has a wafer support assembly including a plurality of independently controllable temperature control zones across a chuck and a controller that controls each temperature control zone.
Lam Research Corporation
02/26/15
20150053346
new patent

Plasma processing apparatus and plasma processing method


A plasma processing apparatus includes a flow splitter for dividing a common gas into two common gas streams of common gas branch lines. A central introduction portion connected to one of the common gas branch lines supplies a common gas to a central portion of a substrate to be processed.
Tokyo Electron Limited
02/26/15
20150053343
new patent

Plasma-sealant wobble paddle


An apparatus is configured to process a work piece and includes a robotic arm, a sealant discharger, and a plasma discharger. The robotic arm includes a distal end that is rotatable with respect to an axis of the robotic arm.
Honda Motor Co., Ltd.
02/26/15
20150053135
new patent

Strap for plasma processing apparatus and plasma processing apparatus having the same


A strap for a plasma processing apparatus includes a main body, and a protrusion pattern defined in the main body. The main body may include a binding part defined at opposing ends thereof.
Samsung Display Co., Ltd.
02/19/15
20150051839

Method for characterising plasma cell associated diseases


The invention provides a method for characterising a plasma cell associated disease in a patient comprising: (i) providing at least one sample from the patient; (ii) determining in the sample(s) two or more of; (a) the κ:λ free light chain (flc) ratio; (b) the ratio of κ light chains bound to a class of heavy chain:λ light chain bound to the same class of heavy chain (hlcκ:hlc λ ratio); (c) the total amount of flc in the samples and (d) the total amount of κ light chains bound to the heavy chain class plus λ light chains bound to the same heavy chain class (total hlc); (iii) comparing each ratio or amount from (a) (b), (c) and/or (d) to predetermined values and assigning a score to each amount or ratio; and (iv) using the scores to characterise the plasma cell associated disease. Apparatus configured to carry out the method of the invention are also provided.
The Binding Site Group Limited
02/19/15
20150051145

Use of 1,3-diphenylprop-2-en-1-one derivatives for treating liver disorders


The invention provides 1,3-diphenylprop-2-en-1-one derivatives and pharmaceutical compositions comprising the same for treating liver disorders, in particular those requiring the reduction of plasma level of biochemical markers such as aminotransferases. The 1,3-diphenylprop-2-en-1-one derivatives of general formula (i) have hepatoprotective properties and can be used in methods for treating liver disorders involving the pathological disruption, inflammation, degeneration, and/or proliferation of liver cells, such as liver fibrosis or fatty liver disease..
Genfit
02/19/15
20150051085

Rapid aneuploidy detection


Massively parallel sequencing of cell-free, maternal plasma dna was recently demonstrated to be a safe and effective screening method for fetal chromosomal aneuploidies. Here, we report an improved sequencing method achieving significantly increased throughput and decreased cost by replacing laborious sequencing library preparation steps with pcr employing a single primer pair.
The Johns Hopkins University
02/19/15
20150050812

Wafer-less auto clean of processing chamber


A method for cleaning a processing chamber, for example, a strip chamber, configured for processing a wafer is provided which includes the steps of introducing an oxygen-containing gas into the processing chamber, generating an oxygen plasma from the oxygen-containing gas in the processing chamber, establishing a pressure of the oxygen plasma in the processing chamber of at least 1 torr and maintaining the pressure of at least 1 torr for at least 40 seconds. A system is also provided including a strip chamber for receiving and stripping the wafer and including a gas inlet and plasma generator means, as well as a controller configured for performing, when no wafer is present in the strip chamber, controlling inflow of an oxygen-containing gas into the processing chamber through the gas inlet and controlling the plasma generator means to generate an oxygen plasma..
Globalfoundries Inc.
02/19/15
20150050807

Tungsten deposition with tungsten hexafluoride (wf6) etchback


Implementations described herein generally relate to methods for forming tungsten materials on substrates using vapor deposition processes. The method comprises positioning a substrate having a feature formed therein in a substrate processing chamber, depositing a first film of a bulk tungsten layer by introducing a continuous flow of a hydrogen containing gas and a tungsten halide compound to the processing chamber to deposit the first tungsten film over the feature, etching the first film of the bulk tungsten layer using a plasma treatment to remove a portion of the first film by exposing the first film to a continuous flow of the tungsten halide compound and an activated treatment gas and depositing a second film of the bulk tungsten layer by introducing a continuous flow of the hydrogen containing gas and the tungsten halide compound to the processing chamber to deposit the second tungsten film over the first tungsten film..
Applied Materials, Inc.
02/19/15
20150050750

Plasma processing method and plasma processing apparatus


A plasma processing method of etching a multilayered material having a structure where a first magnetic layer 105 and a second magnetic layer 103 are stacked with an insulating layer 104 therebetween is performed by a plasma processing apparatus 10 including a processing chamber 12 where a processing space s is formed; and a gas supply unit 44 of supplying a processing gas into the processing space, and includes a first etching process where the first magnetic layer is etched by supplying a first processing and generating plasma, and the first etching process is stopped on a surface of the insulating layer; and a second etching process where a residue z is removed by supplying a second processing gas and generating plasma. The first magnetic layer and the second magnetic layer contain cofeb, the first processing gas contains cl2, and the second processing gas contains h2..
Tokyo Electron Limited
02/19/15
20150050671

Method for species-independent measurement of complement activation in animals


A method for species-independent measurement of complement (c) activation in animals. The method comprises taking samples in the range of 3-100 microliter of anticoagulated blood, plasma or serum of an animal (specimen), mixing the specimen with a specificity converting protein matrix (scm), mixing to the specimen/scm mixture an activator of the c system (act), incubating the specimen/scm/act mixture at a temperature between 36° c.
Tecomedical Ag
02/19/15
20150050614

Plasma generator, surface treatment method using the same and surface treatment method using the same for bio-tissue


A plasma generator, a surface treatment method using the same, and a surface treatment method using the same for bio-tissue are provided. The plasma generator comprises a plasma tube, a reaction source tube, a first electrode and a second electrode.
Industrial Technology Research Institute
02/19/15
20150050331

Method for making a topical composition comprising growth factors derived from human umbilical cord blood platelets


The present invention is directed to a method of making a stable composition comprising growth factors, which may include platelet derived growth factors and transforming growth factors. The method comprises providing human umbilical cord blood plasma containing platelets, but substantially free of whole blood cells, and lysing the platelets to extrude growth factors into the plasma.
Novo Solutions Md, Llc
02/19/15
20150050274

Methods and biomarkers for detection and treatment of mature t-cell leukemia


The present invention relates to methods and biomarkers for detection and characterization of mature t-cell neoplasias/leukemias (e.g., t-cell prolymphocytic leukemia, sezary syndrome) in biological samples (e.g., tissue samples, blood samples, plasma samples, cell samples, serum samples).. .
The Regents Of The University Of Michigan
02/19/15
20150050269

Antigen-binding molecule promoting disappearance of antigens having plurality of biological activities


The present inventors newly discovered that even if an antigen-binding molecule inhibits in vitro some of the physiological activities of an antigen having two or more physiological activities without inhibiting the remaining physiological activities, the molecule can promote elimination of the antigen from blood (from serum or plasma) and as a result reduce the physiological activities in vivo, when the antigen-binding molecule is conferred with the properties: (i) of binding to human fcrn under an acidic ph range condition; (ii) of binding under a neutral ph range condition to human fc receptor stronger than native human igg, and (iii) that its antigen-binding activity alters according to the ion concentration.. .
Chugai Seiyaku Kabushiki Kaisha
02/19/15
20150050191

Plasma driven catalyst system for disinfection and purification of gases


The present invention relates to a novel plasma driven catalyst apparatus for disinfecting and purifying air. The apparatus has a synergistically favorable effect from plasma and catalyst on high disinfecting and purifying efficiency and efficacy, low by-product formation, and low energy consumption.
Nano And Advanced Materials Institute Limited
02/19/15
20150049778

System and separation of pump light and collected light in a laser pumped light source


A system for separating plasma pumping light and collected broadband light includes a pump source configured to generate pumping illumination including at least a first wavelength, a gas containment element for containing a volume of gas, a collector configured to focus the pumping illumination from the pumping source into the volume of gas to generate a plasma within the volume of gas, wherein the plasma emits broadband radiation including at least a second wavelength and an illumination separation prism element positioned between a reflective surface of the collector and the pump source and arranged to spatially separate the pumping illumination including the first wavelength and the emitted broadband radiation including at least a second wavelength emitted from the plasma.. .
Kla-tencor Corporation
02/19/15
20150049159

Electronic television comprising mobile phone apparatus


A lcd television, led television, plasma television or other television system comprising a mobile phone having one or plurality of simsocket containing a plurality of pins, wherein input/output pin, clock pin, reset pin, vcc pin, ground pin are several respective pins of the said simsocket, and the said pins of one or plurality of simsocket are connected in parallel and the said plurality of simsockets for accepting plurality of simcards in order to operate the simcards selectively and/or simultaneously. The said plurality of simsocket are connected to the cpu (central processing unit) (14) in parallel and the said cpu (14) has a switching circuit and the said cpu (14) is connected to the one or plurality of simsocket through the switching circuit and the function of one or plurality of simsocket is operated by the cpu (14), switching circuit, and transreceivers (15).
02/19/15
20150048741

System and imaging a sample with a laser sustained plasma illumination output


The inspection of a sample with vuv light from a laser sustained plasma includes generating pumping illumination including a first selected wavelength, or range of wavelength, containing a volume of gas suitable for plasma generation, generating broadband radiation including a second selected wavelength, or range of wavelengths, by forming a plasma within the volume of gas by focusing the pumping illumination into the volume of gas, illuminating a surface of a sample with the broadband radiation emitted from the plasma via an illumination pathway, collecting illumination from a surface of the sample, focusing the collected illumination onto a detector via a collection pathway to form an image of at least a portion of the surface of the sample and purging the illumination pathway and/or the collection pathway with a selected purge gas.. .
Kla-tencor Corporation
02/19/15
20150048739

Elongated capacitively coupled plasma source for high temperature low pressure environments


A modular plasma source assembly for use with a processing chamber is described. The assembly includes an rf hot electrode with an end dielectric and a sliding ground connection positioned adjacent the sides of the electrode.
02/19/15
20150048487

Plasma polymerized thin film having high hardness and low dielectric constant and manufacturing method thereof


The present invention relates to a plasma polymerized thin film having high hardness and a low dielectric constant and a manufacturing method thereof, and in particular, relates to a plasma polymerized thin film having high hardness and a low dielectric constant for use in semiconductor devices, which has improved mechanical strength properties such as hardness and elastic modulus while having a low dielectric constant, and a manufacturing method thereof.. .
Research & Business Foundation Sungkyunkwan University
02/19/15
20150048061

Oxidation resistant induction devices


Certain embodiments described herein are directed to induction devices comprising an oxidation resistant material. In certain examples, the induction device comprises a coil of wire that is produced from the oxidation resistant material.
Perkinelmer Health Sciences, Inc.
02/19/15
20150048052

Plasma processing apparatus


The present invention relates to an apparatus (10) for plasma processing an article (12), the apparatus comprising: a chamber (14) for receiving an article to be processed; electrode means (16) for generating an electric field in said chamber for establishing a plasma in said chamber so that said article can be processed; generation means (24) for generating alternating electrical energy for transmission to said electrode means (18); connection means for connecting said generation means to said electrode means (20); and control means for varying the location of nodes and anti-nodes of standing waves generated in said chamber during processing, so that a plurality of standing waves are generated over time which are not coincident with one another.. .
P2i Ltd
02/19/15
20150048049

Method and forming a periodic pattern using a self-assembled block copolymer


A method for causing a first polymer and a second polymer of a block copolymer to be self-assembled on an underlayer film and forming a periodic pattern in a guide layer is provided. The method includes a first etching process of etching the second polymer by plasma generated from a first gas, a first film deposition process of depositing a first protective film on surfaces of the first polymer and the guide layer except for an etched portion of the second polymer by plasma generated from a second gas after the first etching process, and a second etching process of further etching the second polymer by the plasma generated from the first gas after the first film deposition process..
Tokyo Electron Limited
02/19/15
20150047974

Plasma processing apparatus and high frequency generator


A plasma processing apparatus (11) is provided with: a processing container (12), in which processing is performed using plasma; a plasma generating mechanism (19), which has a high frequency oscillator that oscillates high frequency, includes a high frequency generator that generates high frequency by being disposed outside of the processing container (12), and which generates plasma in the processing container (12) using the high frequency generated by means of the high frequency generator; a determining mechanism, which determines the state of the high frequency oscillator; and a notifying mechanism, which performs notification of determination results obtained from the determining mechanism.. .
Tokyo Electron Limited
02/19/15
20150047785

Plasma processing devices having multi-port valve assemblies


A plasma processing device may include a plasma processing chamber, a plasma electrode assembly, a wafer stage, a plasma producing gas inlet, a plurality of vacuum ports, at least one vacuum pump, and a multi-port valve assembly. The multi-port valve assembly may comprise a movable seal plate positioned in the plasma processing chamber.
Lam Research Corporation
02/12/15
20150045641

Method and analyte measurement, display, and annotation


Systems for rapid and accurate analyte measurement are described. For example, periodic glucose measurements can be achieved with high accuracy in a critical care environment by drawing blood into a device more than once per hour, analyzing blood (for example using infrared radiation through plasma).
Optiscan Biomedical Corporation
02/12/15
20150045538

Manufacture of inter-alpha-inhibitor (iaip) from plasma


The present invention provides compositions and pharmaceutical formulations of iaip derived from plasma. Also provided are methods for the manufacture of the iaip compositions and formulations, as well as method for the treatment of diseases associated with iaip dysfunction..
Baxter Healthcare Sa
02/12/15
20150045515

Non-fouling, anti-microbial, anti-thrombogenic graft-from compositions


A method for preparing and resulting articles of manufacture comprising a substrate having a surface, a bulk beneath the surface, and a grafted polymer layer on the substrate surface, the substrate surface and the grafted polymer layer, in combination, constituting a modified surface having a fibrinogen adsorption of less than about 125 ng/cm2 in a fibrinogen binding assay in which the modified surface is incubated for 60 minutes at 37° c. In 70 μg/ml fibrinogen derived from human plasma containing 1.4 μg/ml i-125 radiolabeled fibrinogen..
02/12/15
20150045401

Prodrugs of riluzole and their use


Pharmaceutical compositions of the invention include substituted riluzole prodrugs useful for the treatment of cancers including melanoma, breast cancer, brain cancer, and prostate cancer through the release of riluzole. Prodrugs of riluzole have enhanced stability to hepatic metabolism and are delivered into systemic circulation by oral administration, and then cleaved to release riluzole in the plasma via either an enzymatic or general biophysical release process..
Rutgers, The State University Of New Jersey


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