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Plasma patents



      

This page is updated frequently with new Plasma-related patent applications.




Date/App# patent app List of recent Plasma-related patents
06/16/16
20160174354 
 Power supply device and  plasma generation patent thumbnailPower supply device and plasma generation
A power supply device includes: an oscillation unit for outputting a high frequency signal; a modulation unit for outputting a pulsed high frequency signal; a level adjustment unit for adjusting and outputting a level of the pulsed high frequency signal; a power amplifier for amplifying a power outputted from the level adjustment unit; an output power detection unit for detecting an output power value from the power amplifier; and a control unit. The control unit corrects and outputs a level control signal for controlling the level of the pulsed high frequency signal based on a corresponding correction factor at each of elapsed times in an on state of the pulsed high frequency signal, and compares comparison values in a current pulse and a previous pulse to update the correction factor such that comparison result between the set power value and the output power value becomes smaller at each reflection coefficient..
Hitachi Kokusai Electric Inc.


06/16/16
20160174353 
 Water injection and venting of a plasma arc torch patent thumbnailWater injection and venting of a plasma arc torch
A plasma arc torch system comprising a plasma arc torch is provided. The torch includes an electrode, a nozzle, a vent passage and a shield.
Hypertherm, Inc.


06/16/16
20160174352 
 Apparatus for and  source material delivery in a laser produced plasma euv light source patent thumbnailApparatus for and source material delivery in a laser produced plasma euv light source
A device and method are disclosed in which gas is caused to flow parallel to a flow of source material to form a gas shroud. The gas shroud may protect flow of source material from being disrupted by a cross flow of gas.
Asml Netherlands B.v.


06/16/16
20160174351 
 Variable radius mirror dichroic beam splitter module for extreme ultraviolet source patent thumbnailVariable radius mirror dichroic beam splitter module for extreme ultraviolet source
A laser produced plasma extreme ultraviolet laser source comprising at least one variable radius mirror. The at least one variable radius mirror to adjust a beam diameter of a main pulse at a specified distance from a pre-pulse focal plane, where the pre-pulse radiates droplets into target droplets and the main pulse radiates the target droplets into a plasma state to generate the extreme ultraviolet radiation..
Asml Netherlands B.v.


06/16/16
20160172411 
 Method for producing semiconductor light receiving device and semiconductor light receiving device patent thumbnailMethod for producing semiconductor light receiving device and semiconductor light receiving device
A method for producing a semiconductor light receiving device includes the steps of growing a stacked semiconductor layer on a principal surface of a substrate, the stacked semiconductor layer including a light-receiving layer having a super-lattice structure, the super-lattice structure including a first semiconductor layer and a second semiconductor layer that are stacked alternately; forming a mask on the stacked semiconductor layer; forming a mesa structure on the substrate by etching the stacked semiconductor layer using the mask so as to form a substrate product, the mesa structure having a side surface exposed in an atmosphere; forming a fluorinated amorphous layer on the side surface of the mesa structure by exposing the substrate product in fluorine plasma; and after the step of forming the fluorinated amorphous layer, forming a passivation film containing an oxide on the side surface of the mesa structure.. .
Sumitomo Electric Industries, Ltd.


06/16/16
20160172366 
 Three dimensional memory device with blocking dielectric having enhanced protection against fluorine attack patent thumbnailThree dimensional memory device with blocking dielectric having enhanced protection against fluorine attack
Blocking dielectric structures and/or thicker barrier metal films for preventing or reducing fluorine diffusion are provided. A blocking dielectric layer can be formed as an outer layer of a memory film in a memory stack structure extending through electrically insulating layers and sacrificial material layers.
Sandisk Technologies, Inc.


06/16/16
20160172315 
 Pecvd protective layers for semiconductor devices patent thumbnailPecvd protective layers for semiconductor devices
A semiconductor device includes a plasma-enhanced chemical vapor deposition (pecvd) protective layer configured to prevent failure of the semiconductor device throughout a temperature humidity with bias (thb) test exceeding about 1000 hours and/or a highly accelerated stress test (hast) exceeding about 96 hours. Including a pecvd protective layer capable of protecting the semiconductor device throughout a thb test exceeding about 1000 hours and/or a hast exceeding about 96 hours results in an extremely robust device, while providing the protective layer via pecvd results in convenience and cost savings..
Cree, Inc.


06/16/16
20160172258 
 Method of endpoint detection of plasma etching process using multivariate analysis patent thumbnailMethod of endpoint detection of plasma etching process using multivariate analysis
Described is a method for determining an endpoint of an etch process using optical emission spectroscopy (oes) data as an input. Optical emission spectroscopy (oes) data are acquired by a spectrometer attached to a plasma etch processing tool.
Tokyo Electron Limited


06/16/16
20160172217 
 Plasma processing apparatus patent thumbnailPlasma processing apparatus
A plasma processing apparatus includes: a processing container; a processing gas supply unit; a mounting table configured to mount a to-be-processed substrate thereon; an upper electrode provided above the mounting table; a plasma generation unit configured to supply a high frequency power to generate plasma of the processing gas; an exhaust flow path formed by a side wall of the processing container and a side surface of the mounting table; a conductive rectification plate configured to adjust a flow of the processing gas discharged to outside of the processing container; a conductor arranged in the exhaust flow path at a position higher than the rectification plate and lower than the to-be-processed substrate to face at least a part of the upper electrode. A distance of the conductor in the height direction in relation to the to-be-processed surface of the substrate is set to be within a predetermined range..
Tokyo Electron Limited


06/16/16
20160172212 
 Plasma processing method patent thumbnailPlasma processing method
A plasma processing method uses a plasma processing apparatus including a processing chamber, a mounting table provided in the processing chamber and configured to support a target object, and a ceiling member made of silicon and provided above the mounting table. The plasma processing method includes loading the target object into the processing chamber and generating a plasma of a processing gas containing chlorine gas and oxygen gas in the processing chamber..
Tokyo Electron Limited


06/16/16
20160172209 

Cmp-friendly coatings for planar recessing or removing of variable-height layers


An ic device manufacturing process effectuates a planar recessing of material that initially varies in height across a substrate. The method includes forming a polymer coating, cmp to form a planar surface, then plasma etching to effectuate a planar recessing of the polymer coating.
Taiwan Semiconductor Manufacturing Co., Ltd.


06/16/16
20160172206 

Fast-gas switching for etching


A method for etching a layer in a plasma chamber with an inner injection zone gas feed and an outer injection zone gas feed is provided. The layer is placed in the plasma chamber.
Lam Research Corporation


06/16/16
20160172205 

Plasma etching method


A plasma etching method can form a hole having a required opening diameter in a silicon nitride layer, while suppressing a tip end portion of the hole from being narrowed. The plasma etching method includes a first process of supplying a processing gas containing oxygen and fluorocarbon into a plasma processing apparatus; and a second process of etching a silicon nitride layer 106a of a processing target object with a first mask 106 by exciting the processing gas into plasma.
Tokyo Electron Limited


06/16/16
20160172189 

Method of selective gas phase film deposition on a substrate


According to one embodiment of the invention, a method is provided for selective surface deposition. In one example, the method includes providing a substrate containing a first material having a first surface and a second material having a second surface, forming a modified first surface and a modified second surface by exposing the first surface and the second surface to hydrogen gas excited by a plasma source, and selectively depositing a film on the modified second surface but not on the modified first surface..
Tokyo Electron Limited


06/16/16
20160172183 

Film forming method


Disclosed is a method of forming a nitride film on a substrate to be processed (“processing target substrate”) in a processing container. The method includes an adsorption step of supplying a precursor gas including a silicon-containing gas into the processing container, and adsorbing a molecule of the precursor gas onto a surface of the processing target substrate, and a reaction step of supplying a reaction gas including a nitrogen- and hydrogen-containing gas while supplying microwaves from an antenna to generate plasma of the reaction gas just above the processing target substrate, and performing a plasma processing, by the generated plasma, on a surface of the substrate to be processed on which the molecule of the precursor gas has been adsorbed..
Tokyo Electron Limited


06/16/16
20160172163 

Microwave plasma processing apparatus and microwave supplying method


Disclosed is a microwave plasma processing apparatus including: a processing container configured to define a processing space; a microwave generator configured to generate microwaves; a distributor configured to distribute the microwaves to a plurality of waveguides; an antenna installed in the processing container and to radiate the microwaves distributed to the plurality of waveguides to the processing space; a monitor unit configured to monitor a voltage of each of the plurality of waveguides; a storage unit configured to store a difference between a monitor value of the voltage monitored by the monitor unit and a predetermined reference value of the voltage and a control value of a distribution ratio of the distributor corresponding to the difference; and a control unit configured to acquire the control value of the distribution ratio of the distributor from the storage unit and to control the distribution ratio of the distributor.. .
Tokyo Electron Limited


06/16/16
20160172161 

Plasma processing apparatus


Provided is a plasma processing apparatus capable of obtaining desired etch profiles and preventing the degradation of yield rates due to the adhesion of particles, and equipped with a processing chamber in which a sample is plasma-treated; a radio-frequency power source for supplying radio-frequency power used to generate plasma; a sample stage which is provided with electrodes for electrostatically adsorbing the sample and on which the sample is mounted; and a dc power supply for applying dc voltages to the electrodes, the apparatus being further equipped with a control apparatus for controlling the dc power supply so as to apply such dc voltages as to decrease the absolute value of the potential of the sample in the absence of the plasma.. .
Hitachi High-technologies Corporation


06/16/16
20160172160 

Plasma processing apparatus and plasma processing method


A plasma processing apparatus includes: an evacuable processing chamber including a dielectric window; a substrate supporting unit, provided in the processing chamber, for mounting thereon a target substrate; a processing gas supply unit for supplying a desired processing gas to the processing chamber to perform a plasma process on the target substrate; a first rf antenna, provided on the dielectric window, for generating a plasma by an inductive coupling in the processing chamber; and a first rf power supply unit for supplying an rf power to the first rf antenna. The first rf antenna includes a primary coil provided on or above the dielectric window and electrically connected to the first rf power supply unit; and a secondary coil provided such that the coils are coupled with each other by an electromagnetic induction therebetween while being arranged closer to a bottom surface of the dielectric window than the primary coil..
Tokyo Electron Limited


06/16/16
20160172065 

Creation of isotopes using laser beams


A method for creating isotopes using laser beams, including the steps: 1) placing a target under plasma conditions, 2) bombarding the target under plasma conditions with particles generated using a bundle of laser beams, the bundle of laser beams being synchronised with the development of the plasma conditions, the fuel and the particles being selected in such a way that the interaction between the target under plasma conditions and the particles generates nuclear reactions, and 3) recovering the isotopes generated by the nuclear reactions.. .
Ecole Polytechnique


06/16/16
20160171183 

Simulation of endogenous and exogenous glucose/insulin/glucagon interplay in type 1 diabetic patients


A simulator for in-silico testing of type 1 diabetes patients uses a model that puts in relation plasma concentrations, i.e., glucose g and insulin /, with glucose fluxes, i.e. Endogenous glucose production (egp), glucose rate of appearance (ra), glucose utilization by the tissues (u), renal extraction (e), and insulin fluxes, i.e., rate of insulin appearance from the subcutaneous tissues (sc) and insulin degradation (d).
University Of Virginia Patent Foundation


06/16/16
20160170115 

Wire grid polarizer and manufacturing the same


A method of manufacturing a wire grid polarizer is provided. The method includes: forming an electrical conductive layer on a substrate; forming a guide pattern layer on the electrical conductive layer, wherein the guide pattern layer includes two or more linear structures separated from one another; forming a fluorocarbon surface modification layer on each of the linear structures using a fluorine-based gas plasma treatment; and forming a neutral layer on the electrical conductive layer, wherein the neutral layer has a nonselective affinity with repeating units of a block copolymer..
Samsung Display Co. Ltd.


06/16/16
20160169915 

Biomarkers of autism spectrum disorder


Methods for identifying metabolic signatures in blood plasma which are unique to autism are described herein. Samples are analyzed using multiple chromatographic-mass spectrometry-based techniques to orthogonally measure a broad range of small molecular weight metabolites differentially produced in autistic patient samples versus non-autistic control samples.
Stemina Biomarker Discovery, Inc.


06/16/16
20160169882 

Test st2 cardiac biomarker


The technology described in this document can be embodied in a test strip for use in measuring a level of an st2 cardiac biomarker in a blood plasma sample. The test strip includes a base, and a plurality of conjugates, wherein each conjugate includes a reporter group bound to a first antibody that binds to st2.
Critical Care Diagnostics, Inc.


06/16/16
20160169879 

Test st2 cardiac biomarker


The technology described in this document can be embodied in a test strip for use in measuring a level of an st2 cardiac biomarker in a whole blood sample. The test strip includes a base, and a plurality of conjugates, wherein each conjugate includes a reporter group bound to a first antibody that binds to st2.
Critical Care Diagnostics, Inc.


06/16/16
20160169814 

Plasma light source and inspection apparatus including the same


Provided are a plasma light source capable of solving a problem occurring when an arc discharge lamp is used and an inspection apparatus capable of providing uniform and high-brightness plasma light. The plasma light source includes a pulse laser generator configured to generate a pulse laser beam, a continuous wave (cw) laser generator configured to generate an infrared ray (ir) cw laser beam, a first dichroic mirror configured to transmit or reflect the pulse laser beam and reflect or transmit the ir cw laser beam, a chamber configured to receive the pulse laser beam to ignite plasma and the ir cw laser beam to maintain the plasma in an ignited state, and discharge plasma light generated by the plasma, and a second dichroic mirror configured to transmit the pulse laser beam and the ir cw laser beam and reflect the plasma light..

06/16/16
20160169805 

Combined raman spectroscopy and laser-induced breakdown spectroscopy


An apparatus includes a single laser source configurable to produce laser pulses directable towards a target substance, a focusing lens optically positionable between the single laser source and the target substance, the focusing lens focusing a first laser pulse to ablate at least a portion of the target substance when in a first focusing lens position to generate a plasma plume, the plume emitting atomic emission lines characteristic of elements including the target substance, the focusing lens focusing a second laser pulse in the target substance when in a second focusing lens position, resulting in raman scattering, a collection optics assembly to detect signals representing the atomic emission lines characteristic of the target substance and the raman scattering, and a spectrometer to detect signals received from the collection optics assembly.. .
Thermo Scientific Portable Analytical Instruments Inc.


06/16/16
20160169214 

Plasma actuating propulsion system for aerial vehicles


A plasma propulsion nozzle incorporates a cylinder having an inlet and an outlet. A plurality of substantially cylindrical planarly disbanded electrodes with sandwiched dielectric spacers is cascaded in an array to be concentrically expanding from the inlet through an interior chamber to the outlet for a nozzle.
The Boeing Company


06/16/16
20160169008 

System and blade with protective layer


A ceramic matrix composite blade may include an airfoil and a root. A protective metallic layer may be coupled to the root.
United Technologies Corporation


06/16/16
20160168705 

Inlet for effective mixing and purging


The present inventors have conceived of a showerhead inlet with an annular plenum and radial flow paths into a central passage. A process gas, that may include a precursor and a carrier gas, may be flowed into the annular plenum.
Lam Research Corporation


06/16/16
20160168701 

Multi-station plasma reactor with rf balancing


Methods and apparatus for multi-station semiconductor deposition operations with rf power frequency tuning are disclosed. The rf power frequency may be tuned according to a measured impedance of a plasma during the semiconductor deposition operation.
Lam Research Corporation


06/16/16
20160168699 

Method for depositing metal-containing film using particle-reduction step


A method for forming a metal oxide or nitride film on a substrate by plasma-enhanced atomic layer deposition (peald), includes: introducing an amino-based metal precursor in a pulse to a reaction space where a substrate is placed, using a carrier gas; and continuously introducing a reactant gas to the reaction space; applying rf power in a pulse to the reaction space wherein the pulse of the precursor and the pulse of rf power do not overlap, wherein conducted is at least either step (a) comprising passing the carrier gas through a purifier for reducing impurities before mixing the carrier gas with the precursor, or step (b) introducing the reactant gas at a flow rate such that a partial pressure of the reactant gas relative to the total gas flow provided in the reaction space is 15% or less.. .
Asm Ip Holding B.v.


06/16/16
20160168685 

Process for manufacturing a microstructured coating, and wall having such a coating


This relates to a process for manufacturing a microstructured coating on a substrate, which comprises a step of spraying molten particles having a diameter comprised between 0.05 μm and 5 μm onto the substrate, the spraying being carried out by at least one plasma torch, which is moved relative to the substrate, the movement parameters and/or the flowrate of particles sprayed by the plasma torches being variable as a function of the position of the plasma torches, ensuring a variable thickness for the coating formed by the particles, at various points of the substrate. The embodiment also relates to a wall having a coating obtained by this process..
Airbus Operations S.a.s.


06/16/16
20160168619 

Colorimetric assay for l-glutamine and related assay kit


The present invention is comprised of a novel assay and related kit for analyzing the l-glutamine content in samples such as cell cultures and blood serum, plasma, urine, cell, tissue samples. This enzymatic reaction is highly specific to l-glutamine and the enzyme converts l-glutamine to the blue compound indigoidine which is visible and can be accurately measured using a spectrophotometer at 600 nm.

06/16/16
20160168246 

Method for treating tumors that possess the cck-c receptor with the 3b9.1 monoclonal antibody


Human pancreatic cancer cells possess a distinct plasma membrane cck receptor variant that can be differentiated from the classic cck-b receptor with selective monoclonal antibodies. Use of this receptor may be helpful in early detection or treatment of patients with pancreatic cancer..

06/16/16
20160168123 

Inhibitors of plasma kallikrein


The present invention provides compounds of formula (i), compositions comprising such compounds; the use of such compounds in therapy (for example in the treatment or prevention of a disease or condition in which plasma kallikrein activity is implicated); and methods of treating patients with such compounds; wherein r5, r6, r7, r12, r13, a, l, b, n, w, x, y and z are as defined herein.. .
Kalvista Pharmaceuticals Limited


06/16/16
20160167402 

Printing apparatus and printed material manufacturing method


A printing apparatus includes a plasma treatment unit that performs plasma treatment on a surface of a treatment object to acidify at least the surface of the treatment object; and a recording unit that performs inkjet recording on the surface of the plasma treatment subjected to the plasma treatment by the plasma treatment unit.. .
Ricoh Company, Ltd.


06/16/16
20160167130 

Metallic copper dispersion, manufacturing same, and usage for same


The purpose of the present invention is to provide a metallic copper dispersion: capable of maintaining dispersion stability of metallic copper particles for a long period of time; suitable for inkjet printing, spray coating, or the like; and capable of allowing a metallic copper-containing film having an excellent electrical conductivity and metallic color tone to be manufactured in a simple manner by performing low-temperature heating or plasma irradiation after application. The metallic copper dispersion is a dispersion containing at least an organic solvent, a polymer dispersant, and metallic copper particles having gelatin on the particle surface, wherein the metallic copper particles in the dispersion have a cumulative 50% particle size (d50) of 1-130 nm and a cumulative 90% particle size (d90) of 10-300 nm, and the polymer dispersant has an amine number of 10-150 mgkoh/g.
Ishihara Sangyo Kaisha, Ltd.


06/16/16
20160167063 

Corrosion protection for plasma gun nozzles and protecting gun nozzles


Nozzle for thermal spray gun, thermal spray gun and method for forming nozzle. Nozzle includes a nozzle body having a central bore and an exterior surface structured for insertion into a thermal spray gun and a water coolable surface coating applied onto at least a portion of the exterior surface.
Oerlikon Metco (us) Inc.


06/16/16
20160166991 

Membrane selective for alcohols


Polymeric membranes with greatly enhanced selectivities, permeation rates, and separation factors were formed by exposure of glassy polymers having high fractional free volume to an oxidizing gas plasma. Thusly treated membranes showed selectivities for low molecular weight alcohols (methanol, ethanol) versus water that were greater than 1.0, being as high as 10 to 15 during pervaporation.
Vector Separations, Llc


06/16/16
20160166868 

Plasma abatement using water vapor in conjunction with hydrogen or hydrogen containing gases


A plasma abatement process for abating effluent containing a pfc gas from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as an etch chamber, and reacts with the effluent within a plasma chamber placed in the foreline path.
Applied Materials, Inc.


06/16/16
20160166702 

Extended release aqueous suspension of methylphenidate or salts thereof


An extended release aqueous suspension composition of methylphenidate or salts thereof is provided. The extended release aqueous suspension of methylphenidate or salts has ph of more than 5.0 and exhibits excellent storage stability when tested for impurity and potency of methylphenidate.
Gavis Pharmaceuticals


06/16/16
20160166662 

Use of attenuated strains of parasites for the prevention or treatment of pathologies associates with an apicomplexan


Strains of sarcocystidae selected from toxoplasma spp or neospora spp isolated from their natural environment and having an immunostimulant effect, for the use thereof in the prevention or the treatment, in a mammal, of a pathology associated with an apicomplexan of the family cryptosporidiidae.. .
Universite Francois Rabelais De Tours


06/16/16
20160166596 

Phosphoramidate derivatives of 5 - fluoro - 2` - deoxyuridine for use in the treatment of cancer


Phosphoramidate derivatives of 5-fluoro-2′-deoxyuridine are disclosed for use in the treatment of cancer, especially in the treatment of cancer where the patient shows resistance, for example, in a patient with cells with a lowered level of nucleoside transporter proteins and/or with nucleoside kinase-deficient cells and/or with mycoplasma-infected cells and/or with cells with a raised level of thymidylate synthase.. .
Nucana Biomed Limited


06/16/16
20160166516 

Novel curcuminoid formulations and related methods of treatment


The invention provides novel curcuminoid formulations which have improved aqueous solubility and bioavailability when compared to known curcuminoid dosage forms. Formulations of the invention exhibit an enhanced intestinal absorption of curcuminoids, a slower curcuminoid metabolism and a reduced rate of systemic curcuminoid elimination.
Designs For Health, Inc.


06/16/16
20160165878 

Seminal plasma complex quality control material, preparation method and kit thereof


The present invention provides a seminal plasma complex quality control serum, which is freeze-dried powders prepared by mixing a quality control serum preservation solution and a seminal plasma stock solution; wherein the quality control serum preservation solution is an aqueous solution containing 0.47% to 0.67% saccharides, 0.07% to 0.17% salts and 0.63% to 0.83% enzyme stabilizers; the seminal plasma stock solution is the seminal plasma obtained after the direct centrifugation of completely liquefied fresh human semen; and a mixing ratio by volume of the quality control serum preservation solution to the seminal plasma stock solution is 1:100 to 100:1. According to the present invention, a specific quality control serum preservation solution is used, then mixed with the seminal plasma at a suitable ratio by volume and finally subjected to freeze-drying treatment..
Bred Life Science Technology Inc


06/09/16
20160165713 

High-frequency power supply device, and plasma ignition method


A high-frequency power supply device is provided with a plasma ignition step that supplies pulse power to ignite plasma, and drive power supply step to supply drive power for maintaining the plasma being generated. In the plasma ignition step, an ignition pulse being applied in an ignition pulse output operation is configured as including a main pulse that induces ignition, and a prepulse with lower power than the power of the main pulse and being applied at a stage prior to the main pulse.
Kyosan Electric Mfg. Co., Ltd.


06/09/16
20160165712 

Cost effective cartridge for a plasma arc torch


A crown for a plasma arc torch is provided. The crown includes a body defining a proximal and a distal end.
Hypertherm, Inc.


06/09/16
20160165711 

Cost effective cartridge for a plasma arc torch


A consumable cartridge for a plasma arc torch is provided. The consumable cartridge includes an outer component defining a substantially hollow body, an inner component disposed substantially within the hollow body of the outer component, and a hollow region between the rear portion of the inner component and the outer component.
Hypertherm, Inc.


06/09/16
20160165709 

System and isolating gain elements in a laser system


A method and apparatus for protecting the seed laser a laser produced plasma (lpp) extreme ultraviolet (euv) light system are disclosed. An isolation stage positioned on an optical path diverts light reflected from further components in the lpp euv light system from reaching the seed laser.
Asml Netherlands B.v.


06/09/16
20160163972 

Plasma assisted atomic layer deposition titanium oxide for conformal encapsulation and gapfill applications


The embodiments herein relate to methods and apparatus for depositing an encapsulation layer over memory stacks in mram and pcram applications. The encapsulation layer is a titanium dioxide (tio2) layer deposited through an atomic layer deposition reaction.
Lam Research Corporation


06/09/16
20160163838 

Method of fabricating thin-film semiconductor substrate


A method of fabricating a thin-film transistor substrate including a thin-film semiconductor includes: forming a metal film mainly comprising cu above a substrate; forming a source electrode and a drain electrode by processing the metal film in a predetermined shape; irradiating the source electrode and the drain electrode with nitrogen plasma; exposing surfaces of a top and an end portion of the source electrode and the drain electrode with silane (sih4) gas; and forming an insulating layer comprising an oxide on the source electrode and the drain electrode.. .
Joled Inc.


06/09/16
20160163782 

High precision capacitor dielectric


A process of forming an integrated circuit forms a high precision capacitor bottom plate with a metallic surface and performs a plasma treatment of the metallic surface. A high precision capacitor dielectric is formed by depositing a first layer of the capacitor dielectric on the high precision capacitor bottom plate wherein the first layer is silicon nitride, depositing a second layer of the capacitor dielectric on the first layer wherein the second portion is silicon dioxide, and depositing a third layer of the capacitor dielectric on the second portion wherein the third layer is silicon nitride.
Texas Instruments Incorporated


06/09/16
20160163590 

Methods of manufacturing semiconductor devices


Disclosed is a method of manufacturing a semiconductor device. A preliminary wafer-carrier assembly is formed in such a way that a wafer structure having a plurality of via structures is adhered to a light-penetrating carrier by a photodegradable adhesive.
Samsung Electronics Co., Ltd.


06/09/16
20160163569 

Faraday shield having plasma density decoupling structure between tcp coil zones


A faraday shield and a plasma processing chamber incorporating the faraday shield is are provided. The plasma chamber includes an electrostatic chuck for receiving a substrate, a dielectric window connected to a top portion of the chamber, the dielectric window disposed over the electrostatic chuck, and a faraday shield.
Lam Research Corporation


06/09/16
20160163563 

Etching method


There is provided an etching method for etching an object to be processed by using a substrate processing apparatus including a process chamber including a first electrode and a second electrode disposed opposite to the first electrode to receive the object to be processed thereon. The etching method includes a process of removing at least one of a first polymer and a second polymer by etching the object to be processed on which a pattern of the first polymer and the second polymer is formed by phase separation of a block copolymer containing the first polymer and the second polymer at a temperature lower than or equal to 10 degrees c.
Tokyo Electron Limited


06/09/16
20160163561 

Technique to deposit sidewall passivation for high aspect ratio cylinder etch


Various embodiments herein relate to methods, apparatus and systems for forming a recessed feature in dielectric material on a semiconductor substrate. Separate etching and deposition operations are employed in a cyclic manner.
Lam Research Corporation


06/09/16
20160163557 

Technique to deposit sidewall passivation for high aspect ratio cylinder etch


Various embodiments herein relate to methods, apparatus and systems for forming a recessed feature in dielectric material on a substrate. Separate etching and deposition operations are employed in a cyclic manner.
Lam Research Corporation


06/09/16
20160163556 

Technique to deposit sidewall passivation for high aspect ratio cylinder etch


Various embodiments herein relate to methods, apparatus and systems for forming a recessed feature in dielectric material on a semiconductor substrate. Separate etching and deposition operations are employed in a cyclic manner.
Lam Research Corporation


06/09/16
20160163554 

Plasma etching method


A plasma etching method is provided to perform a desired etching by switching a process condition while maintaining plasma by supplying high frequency power. A first plasma etching process is performed based on a first process condition.
Tokyo Electron Limited


06/09/16
20160163519 

Method and plasma ignition in high vacuum chambers


A new method and apparatus is described for igniting a plasma from high vacuum. The ignition method uses a small, short term and quick rise in gas flow into plasma chamber while being excited by rf power to ignite the plasma and then drops the gas flow to fixed input flow rate to maintain the plasma.
Xei Scientic, Inc.


06/09/16
20160163516 

Open plasma lamp for forming a light-sustained plasma


An open plasma lamp includes a cavity section. A gas input and gas output of the cavity section are arranged to flow gas through the cavity section.
Kla-tencor Corporation


06/09/16
20160163515 

Plasma processing apparatus and plasma processing method


A plasma processing apparatus includes a dielectric member having communication holes through which an internal space communicates with a processing space; a first electrode and a second electrode; a first gas supply device which supplies a first processing gas; a first high frequency power supply which supplies a first high frequency power to at least one of the electrodes to generate a first plasma of the first processing gas; a depressurizing device which introduces the first processing gas and radicals in the first plasma; a second high frequency power supply which supplies a second high frequency power to generate a second plasma of the first processing gas and to attract ions; and a control unit which adjusts, by controlling a total amount of the first high frequency powers, the radical amount in the second plasma and adjusts, by controlling a ratio therebetween, the ion amount therein.. .
Tokyo Electron Limited


06/09/16
20160163513 

Plasma processing system with direct outlet toroidal plasma source


A plasma processing system includes a process chamber and a plasma source that generates a plasma in a plasma cavity. The plasma cavity is substantially symmetric about a toroidal axis.
Applied Materials, Inc.


06/09/16
20160163512 

Direct outlet toroidal plasma source


An apparatus for supplying plasma products includes a plasma generation block that defines a toroidal plasma cavity therein. The plasma cavity is substantially symmetric about a toroidal axis, and the toroidal axis defines a first and second axial side of the plasma generation block.
Applied Materials, Inc.


06/09/16
20160163511 

Tunable magnetic field to improve uniformity


Implementations described herein provide a magnetic ring which enables both lateral and azimuthal tuning of the plasma in a processing chamber. In one embodiment, the magnetic ring has a body.
Applied Materials, Inc.


06/09/16
20160163495 

High reliability, long lifetime, negative ion source


A negative ion source includes a plasma chamber, a microwave source, a negative ion converter, a magnetic filter and a beam formation mechanism. The plasma chamber contains gas to be ionized.
Phoenix Nuclear Labs Llc


06/09/16
20160162696 

Camouflaged communication device


A transmission system is used in a method of transmitting a camouflaged transmission of signals by generating an underlying transmission comprising a plasma transmission discharge constituting background noise having a first amplitude and generating an embedded transmission of signals within the underlying transmission.. .
The Board Of Regents Of Nevada System Of Higher Education On Behalf Of The University Of Nevada,


06/09/16
20160161416 

Method of accurate thickness measurement of boron carbide coating on copper foil


A method is disclosed of measuring the thickness of a thin coating on a substrate comprising dissolving the coating and substrate in a reagent and using the post-dissolution concentration of the coating in the reagent to calculate an effective thickness of the coating. The preferred method includes measuring non-conducting films on flexible and rough substrates, but other kinds of thin films can be measure by matching a reliable film-substrate dissolution technique.
Proportional Technologies, Inc.


06/09/16
20160161415 

Metal-antibody tagging and plasma-based detection


A target within a sample can be characterized using an energy source configured to transform a metal in the sample into a plasma and an optical spectroscopic detector configured to detect electromagnetic radiation emitted by the plasma to provide an optical-spectrum signal. A processor can determine presence of the metal in the sample using the optical-spectrum signal.
Purdue Research Foundation


06/09/16
20160160833 

Radiation devices


A radiation device and related method are presented. The radiation device includes a body.
Freescale Semiconductor, Inc.


06/09/16
20160160570 

Methods for forming earth-boring tools having cutting elements mounted in cutting element pockets and tools formed by such methods


Methods of forming earth-boring tools include using a plasma spray device to gouge at least one recess through a hardfacing material and into a body. At least a portion of the recess may define a cutting element pocket in which a cutting element may be received and bonded.
Baker Hughes Incorporated


06/09/16
20160160350 

Method to deposit cvd ruthenium


Methods for depositing ruthenium by a pecvd process are described herein. Methods for depositing ruthenium can include positioning a substrate in a processing chamber, the substrate having a barrier layer formed thereon, heating and maintaining the substrate at a first temperature, flowing a first deposition gas into a processing chamber, the first deposition gas comprising a ruthenium containing precursor, generating a plasma from the first deposition gas to deposit a first ruthenium layer over the barrier layer, flowing a second deposition gas into the processing chamber to deposit a second ruthenium layer over the first ruthenium layer, the second deposition gas comprising a ruthenium containing precursor, depositing a copper seed layer over the second ruthenium layer and annealing the substrate at a second temperature..
Applied Materials, Inc.


06/09/16
20160159860 

Therapeutic agents for reducing parathyroid hormone levels


Compounds having activity for lowering parathyroid hormone levels are described. In one embodiment, the compounds are comprised of a contiguous sequence of subunits, x1-x2-x3-x4-x5-x6-x7, wherein the x1 subunit comprises a thiol-containing moiety and the distribution of charge on the x2-x7 subunits provides the desired activity.
Kai Pharmaceuticals, Inc.


06/09/16
20160159842 

Compounds, systems, and methods for monitoring and treating a surface of a subject


Compounds, systems, and methods are provided for the design and assembly of a non-invasive, analyte sensing dressing. The dressing can be therapeutic.

06/09/16
20160159650 

Method for producing a colloidal solution of nanoscale carbon


The technical result of the present method is simplicity, low cost and the possibility of producing nanoparticles of different types. This result is achieved in that the method for producing a colloidal solution of nanoscale carbon is carried out as follows: an organic fluid is fed into a chamber that contains electrodes, an inert gas is injected into the inter-electrode space, a high temperature plasma channel is formed in gas bubbles, thus atomizing ethanol molecules, followed by rapid cooling..
Obschestvo S Ogranichennoy Otvetstvennostyu "plazma-sk"


06/09/16
20160159108 

Printing system, printing apparatus, and printed-matter production method


According to an aspect of the present invention, a printing apparatus includes a plasma treatment unit configured to acidify at least a surface of a print medium by applying plasma treatment to the surface of the print medium, a first primer applying unit configured to apply primer treatment by applying treatment liquid to the surface of the print medium having undergone the plasma treatment, and a first recording unit configured to perform recording by inkjet recording on the print medium having undergone the primer treatment.. .

06/09/16
20160158891 

Laser processing apparatus suitable for formation of laser processed hole


A laser processing method for forming a laser processed hole in a workpiece having a first member including a first material and a second member including a second material, the laser processed hole extending from the first member to the second member, the laser processing method including: applying a pulsed laser beam to the workpiece; using a plasma detecting means to detect the wavelength of plasma light generated by applying the pulsed laser beam to the workpiece; controlling, via a controller, a laser beam applying means according to a detection signal from the plasma detecting means; and stopping the application of the pulsed laser beam when both: (i) the light intensity detected by a first photodetector is decreased, and (ii) the light intensity detected by a second photodetector is increased to a peak value and next decreased to a given value that is slightly less than the peak value.. .
Disco Corporation


06/09/16
20160158870 

Inductive devices and low flow plasmas using them


Certain embodiments described herein are directed to devices that can be used to sustain a low flow plasma. In certain examples, the low flow plasma can be sustained in a torch comprising an outer tube and an auxiliary tube within the outer tube.
Perkinelmer Health Sciences, Inc.


06/09/16
20160158840 

Use of spark plasma sintering for manufacturing superalloy compound components


A method of manufacturing a superalloy compound component is provided. The component includes a first component portion primarily consisting of a first superalloy and a second component portion primarily consisting of a second superalloy or of a refractory metal.

06/09/16
20160158726 

Combustion synthesis system, reaction product, article, combustion synthesis method, electric power generation system, plasma generation device, and power generation device


A combustion synthesis system includes: a supplying unit that produces a composite by mixing particle powder containing si, particle powder containing sio2, and an n2 gas; a reaction unit having heat resistance and pressure resistance in which combustion synthesis that uses the composite supplied from the supplying unit as a source material proceeds; an ignition unit that ignites the composite supplied to the reaction unit; and a heat collection unit that takes reaction heat from a combustion synthesis reaction in the reaction unit out of the reaction unit.. .
Advanced Resources Institute Holdings Llc.


06/09/16
20160158323 

Fibrinogen preparations enriched in fibrinogen with an extended alpha chain


The present invention relates to fibrinogen preparations enriched in α-extended fibrinogen. Compositions comprising such preparations show improved clotting properties compared to preparations based on hmw fib which typically contain no or only low amounts of α-extended fibrinogen.
Profibrix Bv


06/09/16
20160158286 

Cell preparations for extemporaneous use, useful for healing and rejuvenation in vivo


The present invention relates to new plasma or new platelet-rich plasma preparations, new cell dissociation methods, new cell associations or compositions, a method of preparation thereof, a use thereof, devices for the preparation thereof and preparations containing such a platelet-rich plasma preparation and cell associations or compositions. Specifically, the invention provides plasma or platelet-rich plasma alone or in cell combinasons preparations for use in tissue regeneration and bone regeneration and pain reduction..

06/09/16
20160158212 

Extended release aqueous suspension of methylphenidate or salts thereof


An extended release aqueous suspension composition of methylphenidate or salts thereof, is provided. The extended release aqueous suspension of methylphenidate or salts has ph below 3.5 and exhibit excellent storage stability when tested for impurity and potency of methylphenidate.
Gavis Pharmaceuticals






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