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Plasma patents



      
           
This page is updated frequently with new Plasma-related patent applications. Subscribe to the Plasma RSS feed to automatically get the update: related Plasma RSS feeds. RSS updates for this page: Plasma RSS RSS


Deposition apparatus

Canon Anelva

Deposition apparatus

Sterilization treatment method, formulation for sterilization use, solid ice for sterilization use, method and device…

Osaka University

Sterilization treatment method, formulation for sterilization use, solid ice for sterilization use, method and device…

Sterilization treatment method, formulation for sterilization use, solid ice for sterilization use, method and device…

Lam Research

Electronic knob for tuning radial etch non-uniformity at vhf frequencies

Date/App# patent app List of recent Plasma-related patents
03/26/15
20150088234
 Device for the plasma treatment of human, animal or plant surfaces, in particular of skin or mucous membrane areas patent thumbnailnew patent Device for the plasma treatment of human, animal or plant surfaces, in particular of skin or mucous membrane areas
The invention relates to a device for the treatment of free-form areas and zones of human or animal skin areas or plant surfaces by means of cold atmospheric-pressure plasma. The core of the device is a specific, preferably gas-permeable, electrode arrangement for generating a dielectrically impeded surface discharge where the earthed electrode is composed of electrically conductive textile material and the high-voltage electrode consists of a thin wire or electrically conductive thread which is sheathed with an insulting layer which has to meet specific requirements.
Inp Greifswald, Leibniz-institut Fuer Plasmaforschung Und Technologie E.v.
03/26/15
20150087656
 Formulation solution adapted to prolong plasma times of drugs in mammals including humans patent thumbnailnew patent Formulation solution adapted to prolong plasma times of drugs in mammals including humans
Prolongation compositions for prolonging the presence of drugs in blood.. .
03/26/15
20150087525
 Plasma micrornas for the detection of early colorectal cancer patent thumbnailnew patent Plasma micrornas for the detection of early colorectal cancer
The present invention relates in general to the field of colorectal cancer detection, and more particularly, to plasma micrornas for the detection of early colorectal cancer. Specifically, the present invention includes methods, kits and biomarkers for diagnosing or detecting colorectal neoplasia in a human subject comprising the steps of: a method for diagnosing or detecting colorectal neoplasia in a human subject comprising the steps of: obtaining one or more biological samples from the subject suspected of suffering from colorectal neoplasia; measuring an overall expression pattern or level of one or more micrornas obtained from the one or more biological samples of the subject; and comparing the overall expression pattern of the one or more micrornas from the biological sample of the subject suspected of suffering from colorectal neoplasia with the overall expression pattern of the one or more micrornas from a biological sample of a normal subject, wherein the normal subject is a healthy subject not suffering from colorectal neoplasia, wherein overexpression of a combination of mir19a and mir19b, or mir19a and mir19b and mir15b is indicative of colorectal cancer..
Hospital Clinic De Barcelona
03/26/15
20150087162
 Plasma processing apparatus and plasma processing method patent thumbnailnew patent Plasma processing apparatus and plasma processing method
A plasma processing apparatus includes: a processing container which defines a processing space; a microwave generator; a dielectric having an opposing surface which faces the processing space; a slot plate formed with a plurality of slots; and a heating member provided within the slot plate. The slot plate is provided on a surface of the dielectric at an opposite side to the opposing surface to radiate microwaves for plasma excitation to the processing space through the dielectric based on the microwaves generated by the microwave generator..
Tokyo Electron Limited
03/26/15
20150087160
 Substrate processing apparatus,  manufacturing semiconductor device, and recording medium patent thumbnailnew patent Substrate processing apparatus, manufacturing semiconductor device, and recording medium
A substrate processing apparatus includes: a processing gas supply pipe configured to supply a processing gas into a processing chamber; a substrate mounting table that is installed in the processing chamber and on which a substrate to be processed is mounted; a driving unit configured to drive the substrate mounting table to move the substrate mounted on the substrate mounting table; a first plasma generating unit configured to generate plasma of the processing gas supplied into the processing chamber with a first density; and a second plasma generating unit that is installed adjacent to the first plasma generating unit in a traveling direction of the substrate and configured to generate plasma of the processing gas supplied into the processing chamber with a second density lower than the first density.. .
Hitachi Kokusai Electric Inc.
03/26/15
20150087157
 Electromagnetic dipole for plasma density tuning in a substrate processing chamber patent thumbnailnew patent Electromagnetic dipole for plasma density tuning in a substrate processing chamber
Methods and apparatus for plasma-enhanced substrate processing are provided herein. In some embodiments, an apparatus for processing a substrate includes: a process chamber having an internal processing volume disposed beneath a dielectric lid of the process chamber; a substrate support disposed in the process chamber; two or more concentric inductive coils disposed above the dielectric lid to inductively couple rf energy into the processing volume above the substrate support; and an electromagnetic dipole disposed proximate a top surface of the dielectric lid between two adjacent concentric inductive coils of the two or more concentric inductive coils..
Applied Materials, Inc.
03/26/15
20150087152
 Method of manufacturing howllow-structure metal grating patent thumbnailnew patent Method of manufacturing howllow-structure metal grating
A method for making a hollow-structure metal grating is provided. The method includes the following steps.
Tsinghua University
03/26/15
20150087140
 Film forming method, film forming device, and film forming system patent thumbnailnew patent Film forming method, film forming device, and film forming system
A film forming method according to an embodiment includes: (a) a step of supplying a first precursor gas of a semiconductor material into a processing vessel in which a processing target substrate is disposed, the first precursor gas being adsorbed onto the processing target substrate during the step; (b) a step of supplying a second precursor gas of a dopant material into the processing vessel, the second precursor gas being adsorbed onto the processing target substrate during the step; and (c) a step of generating the plasma of a reaction gas in the processing vessel, a plasma treatment being performed during the step so as to modify a layer adsorbed onto the processing target substrate.. .
Tokyo Electron Limited
03/26/15
20150087139
 Organoaminosilane precursors and methods for depositing films comprising same patent thumbnailnew patent Organoaminosilane precursors and methods for depositing films comprising same
In one particular embodiment, the organoaminosilane precursors are effective for a low temperature (e.g., 350° c. Or less), atomic layer deposition (ald) or plasma enhanced atomic layer deposition (peald) of a silicon-containing film.
03/26/15
20150087138
 Method for manufacturing graphene quantum dot using thermal plasma patent thumbnailnew patent Method for manufacturing graphene quantum dot using thermal plasma
The present application provides a method for producing a graphene quantum dot using thermal plasma, comprising injecting a carbon source into a thermal plasma jet to pyrolyze the carbon source so as to form a carbon atomic beam and allowing the carbon atomic beam to flow in a tube connected to an anode to produce a graphene quantum dot.. .
Snu R&db Foundation
03/26/15
20150087108
new patent

Process, film, and top cell for a pv device


This disclosure describes systems and methods for making at least a portion of a photovoltaic device. This may include a method of manufacturing, an optimization procedure and an apparatus for the pecvd (plasma enhanced chemical vapor deposition) of thin films over large area substrates.
Tel Solar Ag
03/26/15
20150086987
new patent

Real-time pcr for the detection of pathogens


Disclosed herein are methods for detecting presence of one or more of acinetobacter baumannii, pseudomonas aeruginosa, klebsiella pneumoniae, toxoplasma gondii, moraxella catarrhalis, escherichia coli, shigella, staphylococcus aureus, pneumocystis jirovecii, chlamydia trachomatis, ureaplasma urealyticum, ureaplasma parvum, ureaplasma spp., bartonella spp., streptococcus agalactiae, and neisseria meningitidis nucleic acids in a sample, such as a biological sample obtained from a subject, or an environmental sample. This disclosure also provides probes, primers, and kits for detecting one or more of acinetobacter baumannii, pseudomonas aeruginosa, klebsiella pneumoniae, toxoplasma gondii, moraxella catarrhalis, escherichia coli, shigella, staphylococcus aureus, pneumocystis jirovecii, chlamydia trachomatis, ureaplasma urealyticum, ureaplasma parvum, ureaplasma spp., bartonella spp., streptococcus agalactiae, and neisseria meningitidis in a sample..
The Government Of The Usa As Represented By The Secretary Of The Dept Of Health And Human Services
03/26/15
20150086970
new patent

Whole blood analytic device and method therefor


Devices and methods are presented in which a plasma separation device with a first and second portion separates a blood containing fluid. Most preferably, the first portion produces a cell fraction and a plasma fraction, and the second portion captures the plasma fraction.
Qualigen, Inc.
03/26/15
20150086788
new patent

Spectrally selective coatings and associated methods for minimizing the effects of lightning strikes


A coating composition for reducing structural damage to a substrate resulting from interaction between the substrate and lightening plasma is disclosed. The coating composition includes a binder having a plurality of pigment particles that have a size distribution of a first portion of pigment particles that are relatively large compared to ultraviolet (uv) wavelengths from lightning plasma thereby backscattering uv energy, and a second portion of pigment particles that are relatively small compared to infrared (ir) wavelengths thereby forward scattering ir energy..
The Boeing Company
03/26/15
20150086729
new patent

Method for producing a substrate with stacked deposition layers


A stacked substrate is produced using an apparatus including an injector head device. Production includes the steps of providing an injector head device comprising a gas bearing pressure arrangement and injecting bearing gas against opposite substrate surfaces, to balance the substrate without support in a conveying plane in the injector head device.
Solaytec B.v.
03/26/15
20150086423
new patent

Sterilization treatment method, formulation for sterilization use, solid ice for sterilization use, for producing the solid ice, and producing liquid for sterilization use


A sterilization treatment method includes producing a plasma-treated solution in which biocidal activity is held by diffusing, in a liquid, superoxide anion radicals (o2−.) or a precursor of the superoxide anion radicals (o2−.) by plasma generated in a vicinity of or in a manner to make contact with the liquid; freezing the plasma-treated solution to produce solid ice and store the solid ice in a frozen state; thawing the solid ice to the plasma-treated solution in which biocidal activity by the superoxide anion radicals (o2−.) or the precursor of the superoxide anion radicals (o2−.) is held; and applying a sterilization treatment by any one of the following: allowing the plasma-treated solution to have a ph value of 4.8 or lower to apply the resultant plasma-treated solution to an object, and applying the plasma-treated solution to an object of which a ph value is 4.8 or lower.. .
Osaka University
03/26/15
20150086419
new patent

Chitosan-based hemostatic textile


A microfibrillar high molecular weight chitosan-based textile can be used as a hemostat. The chitosan has been treated in a nitrogen field by applying energy to ionize nitrogen in and around the chitosan textile.
North Carolina State University
03/26/15
20150085892
new patent

All optical high energy radiation source


A method for producing electromagnetic radiation comprising: firing a first laser pulse and generating a plasma region, the first laser pulse penetrating at least partially into the plasma region to create a plasma density wake in the plasma region; providing a group of charged particles in the plasma region arranged so as to be accelerated in the plasma density wake of the first laser pulse; reflecting the first laser pulse after the first laser pulse has penetrated into the plasma region, to give a reflected laser pulse; and arranging the reflected laser pulse to interact with the group of charged particles to generate an electromagnetic radiation.. .
Centre National De La Recherche Scientifique- Cnrs
03/26/15
20150085517
new patent

Laser-operated light source


A laser-operated light source encompasses a chamber for accommodating an ionizable gas and an ignition source for ionizing the gas in the chamber for generating a plasma. The light source encompasses a laser for inputting laser energy into the plasma such that, under the impact of the laser radiation, the plasma emits useful light, which forms the output signal of the light source, wherein provision is made for means for coupling the useful light into a transferring optical fiber.
Qioptiq Photonics Gmbh & Co. Kg
03/26/15
20150085516
new patent

Laser-operated light source


A laser-operated light source encompasses a chamber for accommodating an ionizable gas and an ignition source for ionizing the gas in the chamber for generating a plasma. The light source furthermore encompasses a laser for inputting laser energy into the plasma such that, under the impact of the laser radiation, the plasma emits useful light, which forms the output signal of the light source, wherein provision is made for means for coupling the useful light into a transferring optical fiber.
Qioptiq Photonics Gmbh & Co. Kg
03/26/15
20150085281
new patent

Analyzer and analysis method


The objective of the present invention is to reduce the dispersion of a powdered substance, which is the target substance, during the analysis period in an analyzing device that analyzes the target substance by analyzing the light originated from the substance which is in the plasma state. The present invention relates to an analyzing device including a plasma generation means which generates plasma in the space and maintains plasma using the energy of em radiation emitted from a radiation antenna; and an optical analysis means which analyzes a target substance by analyzing the plasma light generated from target substance of plasma state in the plasma area during the plasma maintenance period where the plasma is maintained by the plasma generation means using the energy of em radiation.
Imagineering, Inc.
03/26/15
20150085280
new patent

Induction device


A device for sustaining a plasma in a torch is provided. In certain examples, the device comprises a first electrode configured to couple to a power source and constructed and arranged to provide a loop current along a radial plane of the torch.
Perkinelmer Health Sciences, Inc.
03/26/15
20150084844
new patent

Capacitive-load driving circuit and plasma display apparatus using the same


A plasma display apparatus including a capacitive load and a driving circuit is provided. The plasma display apparatus includes a driving power source supplying a drive voltage to the capacitive load and a reference potential terminal supplying a reference potential to the capacitive load.
Hitachi Maxell, Ltd.
03/26/15
20150084727
new patent

Rare-earth permanent magnet, manufacturing rare-earth permanent magnet and system for manufacturing rare-earth permanent magnet


There are provided a rare-earth permanent magnet, and a method for manufacturing a rare-earth permanent magnet and a system for manufacturing a rare-earth permanent magnet, capable of achieving improved shape uniformity. Magnet material is milled into magnet powder, and the milled magnet powder is formed into a formed body 40.
Nitto Denko Corporation
03/26/15
20150084509
new patent

High-frequency power supply device and reflected wave power control method


In an rf power supply for supplying rf power to a plasma load, reflected wave power control is performed in which the reflected wave power of an rf generator is detected and the rf generator is controlled. For a short-time variation in reflected wave power, control is performed based on a peak value variation in the detection value of reflected wave power.
Kyosan Electric Mfg. Co., Ltd.
03/26/15
20150084049
new patent

Method for manufacturing semiconductor device


An object is to provide a method for manufacturing a semiconductor device including an oxide semiconductor and having improved electric characteristics. The semiconductor device includes an oxide semiconductor film, a gate electrode overlapping the oxide semiconductor film, and a source electrode and a drain electrode electrically connected to the oxide semiconductor film.
Semiconductor Energy Laboratory Co., Ltd.
03/26/15
20150083939
new patent

Extreme ultraviolet light generation device and extreme ultraviolet light generation system


An extreme ultraviolet light generation device may be configured to generate extreme ultraviolet light by irradiating a target with a laser beam to turn the target into plasma. The extreme ultraviolet light generation device may comprise: a chamber provided with at least one through-hole; an optical system configured to introduce the laser beam into a predetermined region in the chamber through the at least one through-hole; and a target supply device configured to supply a powder target as the target to the predetermined region..
Gigaphoton Inc.
03/26/15
20150083938
new patent

Cooler for plasma generation chamber of euv radiation source


The disclosure provides a cooler for use in a plasma generation chamber of a radiation source for an extreme ultraviolet wavelength range. The cooler has a heat sink which is at least partially manufactured of a substrate material having a thermal conductivity of greater than 50 w/mk.
Carl Zeiss Laser Optics Gmbh
03/26/15
20150083937
new patent

Laser-operated light source


A laser-operated light source encompasses a chamber for accommodating a gaseous medium for generating a plasma, which emits radiation in response to the operation of the light source under the impact of the laser radiation. The light source encompasses a housing for accommodating the chamber.
Qioptiq Photonics Gmbh & Co.kg
03/26/15
20150083936
new patent

System and creating and utilizing dual laser curtains from a single laser in an lpp euv light source


A method and apparatus for creating and utilizing dual laser curtains from a single laser source in a laser produced plasma (lpp) extreme ultraviolet (euv) light system is disclosed. A polarizing beam splitter creates two beams of orthogonal polarization from a single laser, and the beams are used to generate two laser curtains.
Cymer, Llc
03/26/15
20150083906
new patent

Biomarkers for monitoring intervention therapies for diabetes


The use of n-linked glycosylation pattern of serum proteins as a biomarker for evaluating the efficacy of intervention therapies for diabetes is disclosed. As disclosed herein, changes in the n-linked glycosylation of total plasma proteins precedes and predicts the decrease in glycated hemoglobin (hba1c) associated with successful treatment of diabetes.
Merck Sharp & Dohme Corp.
03/26/15
20150083898
new patent

System and controlling droplet timing in an lpp euv light source


A method and apparatus for improved control of the trajectory and timing of droplets of target material in a laser produced plasma (lpp) extreme ultraviolet (euv) light system is disclosed. A droplet illumination module generates two laser curtains for detecting the droplets.
Cymer, Inc.
03/26/15
20150083696
new patent

Consumable selection aid for a plasma cutting system


A plasma cutting or welding system includes a power input. The power input is configured to be coupled to a plurality of multipronged input plugs.
Illinois Tool Works Inc.
03/26/15
20150083695
new patent

Cooling pipes, electrode holders and electrode for an arc plasma torch


An electrode holder for an arc plasma torch includes an elongate holder body. The holder body includes a holder end for receiving an electrode and a hollow interior.
Kjellberg Finsterwalde Plasma Und Maschinen Gmbh
03/26/15
20150083690
new patent

Electronic knob for tuning radial etch non-uniformity at vhf frequencies


System and methods for plasma processing of a wafer include a chamber with an electrode having a support surface and an outer edge region defined thereon. A radio frequency power is communicated to the electrode via a conductive delivery connection and returned through a conductive return connection.
Lam Research Corporation
03/26/15
20150083598
new patent

Plasma-chemical production of black oxide-ceramic layers and correspondingly coated object


plasma-chemical method for production of black oxide ceramic layers on aluminium, magnesium, titanium or alloys thereof and special materials containing these substances according to the process of anodic oxidation in aqueous electrolytes, wherein an electrolyte is used which contains iron and vanadium.. .
Ahc Oberflächentechnik Gmbh
03/26/15
20150083586
new patent

Deposition apparatus


A deposition apparatus comprises a source unit having a function of generating a plasma by an arc discharge; and a filter unit configured to transport the plasma generated by the source unit toward a material to be deposited, wherein the filter unit includes a duct configured to transport the plasma, a magnetic field formation unit configured to form, in the duct, a magnetic field for transporting the plasma, and a magnetic field bending unit configured to generate a magnetic force for bending the magnetic field formed by the magnetic field formation unit.. .
Canon Anelva Corporation
03/26/15
20150083582
new patent

Ion to neutral control for wafer processing with dual plasma source reactor


The disclosed techniques relate to methods and apparatus for etching a substrate. A plate assembly divides a reaction chamber into a lower and upper sub-chamber.
Lam Research Corporation
03/26/15
20150083580
new patent

Plasma processing method


A method includes: etching a target layer of a target object in a processing chamber by generating a plasma of a first gas containing at least one of sf6, clf3 and f2 supplied into the processing chamber to; and forming a protective film on the target layer by generating a plasma of a second gas containing at least one of hydrocarbon, fluorocarbon, and fluorohydrocarbon supplied into the processing chamber. In the etching, a pressure in the processing chamber is set to a first pressure and a first bias power is applied to a lower electrode.
Tokyo Electron Limited
03/26/15
20150083333
new patent

Plasma processor and plasma processing method


An etching chamber 1 incorporates a focus ring 9 so as to surround a semiconductor wafer w provided on a lower electrode 4. The plasma processor is provided with an electric potential control dc power supply 33 to control the electric potential of this focus ring 9, and so constituted that the lower electrode 4 is supplied with a dc voltage of, e.g., −400 to −600 v to control the electric potential of the focus ring 9.
Tokyo Electron Limited
03/26/15
20150083332
new patent

Plasma processor and plasma processing method


An etching chamber 1 incorporates a focus ring 9 so as to surround a semiconductor wafer w provided on a lower electrode 4. The plasma processor is provided with an electric potential control dc power supply 33 to control the electric potential of this focus ring 9, and so constituted that the lower electrode 4 is supplied with a dc voltage of e.g., −400 to −600 v to control the electric potential of the focus ring 9.
Tokyo Electron Limited
03/26/15
20150083329
new patent

Plasma processing apparatus and plasma processing method


In a plasma processing apparatus including a processing room disposed in a vacuum vessel, a sample stage located in the processing room, a dielectric film disposed on the top surface of the sample stage and serving as the sample mounting surface of the sample stage, and a plurality of electrodes embedded in the dielectric film for chucking the sample to the dielectric film when supplied with electric power, a part of the sample is chucked by supplying electric power to at least one of the electrodes while the sample is mounted on the sample stage; the sample is heated up to a predetermined temperature; a larger part of the sample is chucked by supplying electric power to the other of the electrodes; and the processing of the sample using the plasma is initiated.. .
Hitachi High-technologies Corporation
03/26/15
20150083328
new patent

Analysis method and semiconductor etching apparatus


There is provided a method of analyzing data obtained from an etching apparatus for micromachining a wafer using plasma. This method includes the following steps: acquiring the plasma light-emission data indicating light-emission intensities at a plurality of different wavelengths and times, the plasma light-emission data being measured under a plurality of different etching processing conditions, and being obtained at the time of the etching processing, evaluating the relationship between changes in the etching processing conditions and changes in the light-emission intensities at the plurality of different wavelengths and times with respect to the wavelengths and times of the plasma light-emission data, and identifying the wavelength and the time of the plasma light-emission data based on the evaluation result, the wavelength and the time being to be used for the adjustment of the etching processing condition..
Hitachi High-technologies Corporation
03/26/15
20150083277
new patent

Method for producing oxide layers which protect against wear and/or corrosion


Method for producing oxide layers which protect against wear and/or corrosion on barrier layer-forming metals, preferably aluminium, magnesium and titanium, alloys and mixtures thereof by means of laser treatment, characterised in that on the surface a continuous near-surface oxygen-plasma is produced to form the oxide layer.. .
Ahc Oberflächentechnik Gmbh
03/19/15
20150080436

Methods of using sustained release aminopyridine compositions


A pharmaceutical composition which comprises a therapeutically effective amount of a aminopyridine dispersed in a release matrix, including, for example, a composition that can be formulated into a stable, sustained-release oral dosage formulation, such as a tablet which provides, upon administration to a patient, a therapeutically effective plasma level of the aminopyridine for a period of at about 12 hours and the use of the composition to treat various neurological diseases, including multiple sclerosis. A method of selecting individuals based on responsiveness to a treatment, including, for example, identifying individuals who responded to treatment with a sustained release fampridine composition..
Acorda Therapeutics, Inc.
03/19/15
20150080372

Compounds and methods for kinase modulation, and indications therefor


Compounds and salts thereof, formulations thereof, conjugates thereof, derivatives thereof, forms thereof and uses thereof are described. In certain aspects and embodiments, the described compounds or salts thereof, formulations thereof, conjugates thereof, derivatives thereof, forms thereof are active on each of b-raf, b-raf v600e and c-raf-1 protein kinase.
Plexxikon Inc.
03/19/15
20150080300

Growth factor concentrate and the use thereof


Provided herein are growth factor concentrates, cosmetic compositions and methods for cosmetic treatment. The growth factor concentrates comprise decapsulated growth factors derived from platelet rich plasma..
Bestop Group Holdings Limited
03/19/15
20150080229

Plasma microribonucleic acids as biomarkers for endometriosis and endometriosis-associated ovarian cancer


The present invention relates to methods and compositions for differentiating between absence of disease, endometriosis, and eaoc or serous ovarian cancer in a subject. It is based, at least in part, on the discovery that certain micrornas are associated with each of these conditions..
University Of Pittsburgh - Of The Commonwealth System Of Higher Education
03/19/15
20150079799

Method for stabilizing an interface post etch to minimize queue time issues before next processing step


Methods for etching a dielectric barrier layer disposed on the substrate using a low temperature etching process along with a subsequent interface protection layer deposition process are provided. In one embodiment, a method for etching a dielectric barrier layer disposed on a substrate includes transferring a substrate having a dielectric barrier layer disposed thereon into an etching processing chamber, performing a treatment process on the dielectric barrier layer, remotely generating a plasma in an etching gas mixture supplied into the etching processing chamber to etch the treated dielectric barrier layer disposed on the substrate, plasma annealing the dielectric barrier layer to remove the dielectric barrier layer from the substrate, and forming an interface protection layer after the dielectric barrier is removed from the substrate..
Applied Materials, Inc.
03/19/15
20150079797

Selective etch of silicon nitride


A method of etching silicon nitride on patterned heterogeneous structures is described and includes a remote plasma etch formed from a fluorine-containing precursor and a nitrogen-and-oxygen-containing precursor. Plasma effluents from two remote plasmas are flowed into a substrate processing region where the plasma effluents react with the silicon nitride.
Applied Materials, Inc.
03/19/15
20150079790

Semiconductor device manufacturing method


This semiconductor device manufacturing method is provided with: a film-forming step wherein a silicon nitride layer or a silicon oxide layer is formed such that a side wall portion of a silicon-containing layer, which is formed on a substrate and patterned, is covered with the silicon nitride layer or the silicon oxide layer; and a plasma etching step wherein the silicon-containing layer is selectively removed, and the silicon nitride layer or the silicon oxide layer formed on the side wall portion is left. In the plasma etching step, an etching gas containing sf6 gas is used..
Tokyo Electron Limited
03/19/15
20150079775

Chemical dielectric formation for semiconductor device fabrication


Systems and methods are provided for fabricating semiconductor devices. For example, a substrate is provided.
Taiwan Semiconductor Manufacturing Company Limited
03/19/15
20150079761

Wafer dicing from wafer backside and front side


Approaches for backside laser scribe plus front side laser scribe and plasma etch dicing of a wafer or substrate are described. For example, a method of dicing a semiconductor wafer having a plurality of integrated circuits on a front side thereof and metallization on a backside thereof involves patterning the metallization on the backside with a first laser scribing process to provide a first plurality of laser scribe lines on the backside.
03/19/15
20150079760

Alternating masking and laser scribing approach for wafer dicing using laser scribing and plasma etch


Alternating masking and laser scribing approaches for wafer dicing using laser scribing and plasma etch are described. In an example, a method of dicing a semiconductor wafer having a plurality of integrated circuits includes forming a first mask above the semiconductor wafer.
03/19/15
20150079731

Semiconductor device and manufacturing the same


An object is to provide a semiconductor device with stable electric characteristics in which an oxide semiconductor is used. An impurity such as hydrogen or moisture (e.g., a hydrogen atom or a compound containing a hydrogen atom such as h2o) is eliminated from an oxide semiconductor layer with use of a halogen element typified by fluorine or chlorine, so that the impurity concentration in the oxide semiconductor layer is reduced.
Semiconductor Energy Laboratory Co., Ltd.
03/19/15
20150079727

Amorphous igzo devices and methods for forming the same


Embodiments described herein provide improvements to indium-gallium-zinc oxide devices, such as amorphous igzo thin film transistors, and methods for forming such devices. A relatively thin a-igzo channel may be utilized.
Intermolecular, Inc.
03/19/15
20150079706

On-chip plasma charging sensor


A device for monitoring charging effects includes a semiconductor substrate having a surface region. The device also includes first, second, and third doped regions spaced apart in the semiconductor substrate and a dielectric layer overlying the surface region.
Semiconductor Manufacturing International (shanghai) Corporation
03/19/15
20150079612

Assays, antibodies, immunogens and compositions related to 5-fu


The present invention relates to conjugates of 5-fluorouracil, 5-fluorouracil immunogens, antibodies that bind 5-fu and/or 5-fu conjugated to another molecule, and assays for detecting, quantitating, and monitoring amounts of 5-fluorouracil in a sample such as in blood plasma.. .
Wellstat Diagnostics, Llc
03/19/15
20150079599

Method for screening a modulator of a tmem16 family member


A candidate which increases distribution of phosphatidylcholine or galactosylceramide in the inner leaflet of plasma membrane compared to control is selected as a modulator enhancing a function of the tmem16 family member, and a candidate which decreases distribution of phosphatidylcholine or galactosylceramide in the inner leaflet of plasma membrane compared to control is selected as a modulator suppressing a function of the tmem16 family member.. .
03/19/15
20150079481

Solid state electrolyte and barrier on lithium metal and its methods


A method of fabricating an electrochemical device comprising a lithium metal electrode, may comprise: providing a substrate with a lithium metal electrode on the surface thereof; depositing a first layer of dielectric material on the lithium metal electrode, the depositing the first layer being sputtering li3po4 in an argon ambient; after the depositing the first layer, inducing and maintaining a nitrogen plasma over the first layer of dielectric material to provide ion bombardment of the first layer for incorporation of nitrogen therein; and after the depositing, the inducing and the maintaining, depositing a second layer of dielectric material on the ion bombarded first layer of dielectric material, the depositing the second layer being sputtering li3po4 in a nitrogen-containing ambient. Electrochemical devices may comprise a barrier layer between the lithium metal electrode and the lipon electrolyte.
Applied Materials, Inc.
03/19/15
20150079370

Coating architecture for plasma sprayed chamber components


A method of plasma spraying an article comprises inserting the article into a vacuum chamber for a low pressure plasma spraying system. A low pressure plasma spray process is then performed by the low pressure plasma spraying system to form a first plasma resistant layer having a thickness of 20-500 microns and a porosity of over 1%.
Applied Materials, Inc.
03/19/15
20150079342

Method and system for graphene formation


A method of forming graphene includes placing a substrate in a processing chamber and introducing a cleaning gas including hydrogen and nitrogen into the processing chamber. The method also includes introducing a carbon source into the processing chamber and initiating a microwave plasma in the processing chamber.
California Institute Of Technology
03/19/15
20150079311

Method for forming oxide film by plasma-assisted processing


A method for forming an oxide film by plasma-assisted processing includes: (i) supplying a precursor reactive to none of oxygen, cxoy, and nxoy (x and y are integers) without a plasma to a reaction space wherein a substrate is placed; (ii) exposing the precursor to a plasma of cxoy and/or nxoy in the reaction space; and (iii) forming an oxide film on the substrate using the precursor and the plasma.. .
Asm Ip Holding B.v.
03/19/15
20150079309

Coating of containers using plasma nozzles


A device used for plasma-enhanced coating of a container, e.g. A plastic bottle, and/or a container blank, e.g.
Krones Ag
03/19/15
20150079300

Plasma treatment and plasma enhanced chemical vapor deposition onto temperature sensitive biological materials


A method and apparatus for depositing a film on a biological substrate are provided. A plasma generation device includes a dielectric conduit and a high voltage electrode.
The Texas A&m University System
03/19/15
20150079226

Vegetable oil composition containing palm mid-fraction fat and reducing plasma cholesterol


A method and composition for reducing the cholesterolemic effect in mammals of ingesting a blended nutritional fat composition containing a palm mid-fraction (pmf) hardstock fat combined with an unsaturated vegetable oil. The composition is solid or semi-solid at 20° c.
Brandeis University
03/19/15
20150079153

Cell suspension and use thereof


The present invention provides for methods and devices suitable for producing a transplantable cellular suspension of living tissue suitable for promoting tissue regeneration in an epithelium-related procedure, as well as compositions produced therefrom. The cellular suspension can include viable and functioning cells at various stages of differentiation, including undifferentiated/progenitor cells and differentiated cells, as well as those in between.
Avita Medical Ltd.
03/19/15
20150079150

Morphine controlled release system


A composition for controlled release of an opioid from a pharmaceutical composition, the method comprises controlling the release of at least one opioid into an aqueous medium by erosion of at least one surface of a pharmaceutical composition comprising i) a matrix composition comprising a) polymer or a mixture of polymers, b) an opioid and, optionally, c) one or more pharmaceutically acceptable excipients, and (i) a coating. The matrix composition has a conus-like shape so the surface area exposed to the aqueous medium increases at least during initial erosion of the matrix composition, and the dissolution of the opioid-when tested in a dissolution test as described herein with or without application of sinkers-results in a zero order release of at least 80% of the opioid contained in the composition.
Egalet Ltd.


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