This page is updated frequently with new Plasma-related patent applications.
|Plasma arc torch nozzle with variably-curved orifice inlet profile|
A nozzle for a plasma arc torch has a longitudinal nozzle axis, a nozzle orifice with a generally cylindrical orifice sidewall centered on the nozzle axis, and an orifice inlet that is formed as a surface of rotation about the nozzle axis; a gas-directing surface may also be provided. The orifice inlet has a variably-curved surface generated by rotating a variably-curved element about the nozzle axis, where the variably-curved element can be a portion of an ellipse, parabola, or hyperbola, and can join to the orifice sidewall and to the gas-directing surface, if provided.
|Systems and methods for controlling euv energy generation using pulse intensity|
In a laser produced plasma (lpp) extreme ultraviolet (euv) system, a plasma created from droplets irradiated by a laser pulse can become destabilized. The instability of the plasma can reduce the amount of euv energy generated over time.
Asml Netherlands B.v.
|Systems and methods for stabilization of droplet-plasma interaction via laser energy modulation|
In a laser produced plasma (lpp) extreme ultraviolet (euv) system, a droplet is irradiated by a laser pulse to produce a plasma in a chamber. This generates forces that cause the plasma to destabilize and subsequent droplets to have their flight trajectory and speed altered as they approach the plasma.
Asml Netherlands B.v.
|Stabilizing euv light power in an extreme ultraviolet light source|
A method includes providing a target material that includes a component that emits extreme ultraviolet (euv) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits euv light; controlling a radiant exposure delivered to the target material from the first beam of radiation to within a predetermined range of radiant exposures; and stabilizing a power of the euv light emitted from the plasma by controlling the radiant exposure delivered to the target material from the first beam of radiation to within the predetermined range of radiant exposures.. .
Asml Netherlands B.v.
|Target expansion rate control in an extreme ultraviolet light source|
A method includes providing a target material that comprises a component that emits extreme ultraviolet (euv) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits euv light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.. .
Asml Netherlands B.v.
|Method of manufacturing display device|
A method of manufacturing a display device, the method including providing a first electrode on a base substrate; providing a fluorine-containing pixel defining layer on the base substrate and the first electrode such that the pixel defining layer exposes at least a portion of the first electrode; pretreating the first electrode; and providing an organic layer on the first electrode after pretreating the first electrode, wherein pretreating the first electrode includes performing a first treatment operation of treating an exposed surface of the first electrode using a first plasma gas; and performing a second treatment operation after performing the first treatment operation, the second treatment operation including treating the exposed surface of the first electrode using a second plasma gas, wherein the second plasma gas is different from the first plasma gas and includes hydrogen.. .
Samsung Display Co., Ltd.
|Method for manufacturing a resistive random access memory device|
A method for manufacturing a resistive memory device is disclosed and comprises following steps. Firstly, a bottom electrode is formed over a substrate.
Macronix International Co., Ltd.
|Semiconductor modification process and structures|
There is herein described a process for providing improved device performance and fabrication techniques for semiconductors. More particularly, the present invention relates to a process for forming features, such as pixels, on gan semiconductors using a p-gan modification and annealing process.
|Ultrananocrystalline diamond contacts for electronic devices|
A method of forming electrical contacts on a diamond substrate comprises producing a plasma ball using a microwave plasma source in the presence of a mixture of gases. The mixture of gases include a source of a p-type or an n-type dopant.
The Research Foundation For The State University Of New York
|Cover plate, plasma treatment system including the same and plasma treatment the plasma treatment system|
A cover plate, a plasma treatment system, and a plasma treatment method therewith are disclosed. The plasma treatment system may include a window, an antenna electrode disposed on the window, and a cover plate disposed between the antenna electrode and the window to cover top and side surfaces of the window..
Samsung Electronics Co., Ltd.
Shadow trim line edge roughness reduction
A method for etching an etch layer in a stack over a substrate wherein the etch layer is under a mask layer which is under a patterned organic mask is provided. The stack and substrate is placed on a support in the plasma chamber.
Lam Research Corporation
Magnetron plasma apparatus
A magnetron plasma apparatus boosted by hollow cathode plasma includes at least one electrically connected pair of a first hollow cathode plate and a second hollow cathode plate placed opposite to each other at a separation distance of at least 0.1 mm and having an opening following an outer edge of a sputter erosion zone on a magnetron target so that a magnetron magnetic field forms a perpendicular magnetic component inside a hollow cathode slit between plates and, wherein the plates and are connected to a first electric power generator together with the magnetron target to generate a magnetically enhanced hollow cathode plasma in at least one of a first working gas distributed in the hollow cathode slit and a second working gas admitted outside the slit in contact with a magnetron plasma generated in at least one of the first working gas and the second working gas.. .
Bb Plasma Design Ab
Method and device for plasma treatment of substrates
A device for bombarding at least one substrate with a plasma with a first electrode fiend a second electrode that can be arranged opposite thereto, which electrodes are formed together producing the plasma between the electrodes wherein at least one of the electrodes is formed from at least two electrode units. In addition, this invention relates to a corresponding method..
Ev Group E. Thallner Gmbh
Magnetized edge ring for extreme edge control
An apparatus, for treating a substrate in a plasma processing chamber with an electromagnet power source with leads. An edge ring body surrounds the substrate.
Lam Research Corporation
The present invention concerns a method for at least partially preventing discolouration of a substrate by a plasma coating process, by diffusing a plasma prior to and/or during depositing of said plasma on said substrate to form a coating. The present invention also concerns a plasma coating apparatus comprising a plasma diffuser for homogenizing a plasma density nearby a substrate to be coated..
Plasma processing apparatus
A plasma processing apparatus includes a chamber defining a process space, an upper electrode mounted in the chamber, the upper electrode including a first gas spray port located in a central region of the upper electrode and a second gas spray port located in a peripheral region of the upper electrode, a lower electrode located opposite the upper electrode across the process space, a first gas supply unit configured to supply a first process gas into the process space via the first gas spray port and the second gas spray port, a second gas supply unit configured to supply a second process gas into the process space via the second gas spray port, a sensor configured to sense a state of plasma in an edge portion of the process space, and a controller configured to control the second gas supply unit in response to an output signal of the sensor.. .
Samsung Electronics Co., Ltd.
Method and means for the non-invasive diagnosis of type ii diabetes mellitus
The invention relates to a method and means for the non-invasive diagnosis of type ii diabetes mellitus. The glycation state is determined in at least one glycation position of selected plasma proteins..
A device for sustaining a plasma in a torch is provided. In certain examples, the device comprises a first electrode configured to couple to a power source and constructed and arranged to provide a loop current along a radial plane of the torch.
Perkinelmer Health Sciences, Inc.
Laser induced breakdown spectroscopy (libs) analyzing biological samples
This invention discloses a laser induced breakdown spectroscopy (libs) apparatus based on high repetition rate pulsed laser. The laser produces a train of laser pulses at a high repetition rate in the khz (or even higher) range.
Bwt Property, Inc.
Method and detection of contaminants in air by laser-induced filamentation
A method using a laser to propagate a laser beam through an optically-transparent medium, wherein the laser has a power level beyond a critical value pcr, and wherein the laser beam interacts with the optically transparent medium to generate a laser-induced plasma filament (lipf); and adjusting the power level to qualitatively detect chemical components within the optically-transparent medium.. .
The United States Of America As Represented By The Secretary Of The Navy
Glow discharge spectroscopy measuring in situ the etch depth of a sample
A glow discharge spectrometry system includes a glow discharge lamp suitable for receiving a solid sample (10) and forming a glow discharge etching plasma (19). The system (100) for measuring in situ the depth of the erosion crater generated by etching of the sample (10) includes an optical separator (3), optical elements (4) suitable for directing a first incident beam (21) toward a first zone (11) of the sample, the first zone being exposed to the etching plasma, and a second incident beam (22) toward a second zone (12) of the same side of the sample, the second zone being protected from the etching plasma, respectively, and an optical recombining device (3) suitable for forming an interferometric beam (30) so as to determine the depth (d) of the erosion crater..
Horiba Jobin Yvon Sas
Method for locally repairing thermal barriers
The invention relates to a method for repairing a thermal barrier of a component comprising a substrate coated with such a thermal barrier, said substrate being made of a high-performance alloy, said thermal barrier being adhered to the alloy and having lower thermal conductivity than the alloy, the thermal barrier including at least one ceramic, one region of the thermal barrier being a region to be repaired, wherein said method includes the following steps: a) defining the region to be repaired, using a mask which protects the other regions of the thermal barrier; b) injecting a carrier gas loaded with droplets of ceramic precursor into a plasma discharge inside a plasma chamber of a plasma reactor containing the component to be repaired, while making the concentration of ceramic precursor in the carrier gas dependent on at least one parameter of the reactor selected from among: the pressure of the plasma chamber, the power of the plasma generator and the diameter of the precursor droplets, in order to control the state—liquid, gel or solid—of the ceramic precursor having an effect on the region to be repaired; c) injecting a gas not loaded with ceramic precursor into a plasma discharge within the plasma chamber, steps b) and c) being repeated.. .
Methods for treating reinforcing fiber and treated reinforcing fibers
Surface treated fibers and methods of treating individual fiber surfaces. One exemplary method includes subjecting a precursor gas to a plasma-generating discharge within an atmospheric plasma generator to generate a reactive species flow including reactive oxygen species, and exposing a reinforcing fiber to the reactive species flow for a treatment time sufficient to functionalize the reinforcing fiber with oxygen such that at least one of a composite matrix interfacial adhesion of the reinforcing fiber or a composite matrix interfacial strength of the reinforcing fiber, increases.
3m Innovative Properties Company
Co3w3c fishbone-like hard phase-reinforced fe-based wear-resistant coating and preparation thereof
A co3w3c fishbone-like hard phase-reinforced fe-based wear-resistant coating and the preparation thereof, which belongs to the field of a wear-resistant coating on the surface of a material and a preparation method thereof. The wear-resistant coating comprises: 1.89-3.77% of c, 5.4-11.7% of cr, 3.3-7.15% of ni, 28.81-57.83% of w, 4.2-8.4% of co, 0.03-0.065% of si and the balance of fe.
China University Of Mining And Technology
Metal capping process and processing platform thereof
Before depositing a metal capping layer on a metal interconnect in a damascene structure, a remote plasma is used to reduce native oxide formed on the metal interconnect. Accordingly, a remote plasma reducing chamber is integrated in a processing platform for depositing a metal capping layer..
Taiwan Semiconductor Manufacturing Co., Ltd.
Deposition apparatus and deposition system having the same
A deposition apparatus includes: a substrate support having a main surface on which a substrate is placed; a body disposed on the main surface and including a hollow portion having an exposed upper portion; a plasma electrode unit provided at a inner circumferential surface of the body to separate the hollow portion into an upper space and a lower space; and a gas supply unit supplying process gas to the plasma electrode unit, wherein a gas exhaust channel extending from the lower space to an exhaust outlet provided at a top of the body is formed in the body.. .
Asm Ip Holding B.v.
Mechanical chuck and plasma machining device
Embodiments of the invention provide a mechanical chuck and a plasma processing apparatus. According to at least one embodiment, the mechanical chuck includes a base and a fixing assembly including a locking ring, an insulation ring and an spacer ring, wherein the locking ring is configured to press an edge region of the workpiece to be processed so as to fix the same onto the base; an orthogonal projection of the spacer ring on an upper surface of the locking ring overlaps with the upper surface of the locking ring; and the insulation ring electrically insulates the spacer ring from the locking ring, an inner circumferential wall of the insulation ring, a portion of the upper surface of the locking ring inside the inner circumferential wall and a portion of a lower surface of the spacer ring inside the inner circumferential wall form a first groove, and an outer circumferential wall of the insulation ring, a portion of the upper surface of the locking ring outside the outer circumferential wall and a portion of the lower surface of the spacer ring outside the outer circumferential wall form a second groove..
Beijing Nmc Co., Ltd.
A composite material comprising: a composite substrate comprising a polymeric matrix with fibre reinforcement; and a conductive layer comprising one or more conductive filaments embedded in a polymeric matrix. The conductive filaments provide a conductive surface layer onto which a further coating can be directly deposited.
Crompton Technology Group Limited
Single-molecule sequencing of plasma dna
Embodiments may include a method of determining a nucleic acid sequence. The method may include receiving a plurality of dna fragments.
The Chinese University Of Hong Kong
Biochemistry reactive material and device for eliminating electronegative low-density lipoprotein (ldl) and treating blood or plasma ex vivo to eliminate electronegative low-density lipoprotein therein
The present disclosure provides a biochemistry reactive material, including a substrate and an enzyme composition immobilized on the substrate. The enzyme composition is selected from a group consisting of a first enzyme, a second enzyme, and a combination thereof.
Industrial Technology Research Institute
Hybridoma cell lines (my-c-cc0c2-259-1 a4) and use thereof for producing a monoclonal antibody against human cardiac myosin binding protein c (c-protein, mybpc3, cmybp-c or my-c)
Monoclonal antibodies, which can be produced in vitro, against cardiac epitopes of the human my-c are produced by generating myeloma cell clones that produce such specific antibodies having epitope specificity. These monoclonal antibodies allow, among other things, the creation of an enzyme-linked immunosorbent assay (elisa) for the specific, cross-reactivity-free quantitative determination of my-c in serum, plasma, whole blood or other body fluid.
Martin- Luther-universitaet Halle-wittenberg
Ink composition for detecting plasma treatment and indicator for detecting plasma treatment
An object of the present invention is to provide: a plasma treatment detection indicator comprising a color-changing layer that exhibits improved heat resistance so that the layer does not change color even when overheated at up to about 170° c. As a result of a plasma-generating gas not being supplied or being insufficient due to a defect in a plasma treatment device; and an ink composition for detecting plasma treatment, the composition being for forming the color-changing layer.
Sakura Color Products Corporation
Self-cleansing super-hydrophobic polymeric materials for anti-soiling
Disclosed are optically transparent super-hydrophobic materials, and methods for making and using the same, that can include an optically transparent polymeric layer having a first surface and an opposing second surface. At least a portion of the first surface has been plasma-treated with oxygen and a fluorine containing compound.
Sabic Global Technologies B.v.
Methods for the purification of proteins using caprylic acid
A protein purification process with virus inactivation or removal uses caprylic acid (octanoic acid) at acidic ph. The method comprises caprylic acid treatment as part of the chromatographic step so as to perform viral inactivation without a discontinuous process and without the requirement of attention by personnel, particularly when the ph adjustment of the eluate is performed automatically by eluting into buffer.
Novo Nordisk A/s
Factor xia inhibitors
The present invention provides a compound of formula (i) and pharmaceutical compositions comprising one or more said compounds, and methods for using said compounds for treating or preventing thromboses, embolisms, hypercoagulability or fibrotic changes. The compounds are selective factor xia inhibitors or dual inhibitors of factor xia and plasma kallikrein..
Merck Sharp & Dohme Corp.
Synergistic sterilizing and preserving fresh meat with high voltage electric field plasma and nano photocatalysis
Disclosed is a synergistic sterilizing and preserving method for fresh meat with high voltage electric field plasma and nano photocatalysis, which belongs to the technical field of cold sterilization of food package. The method comprises the steps: uniformly mixing a photocatalyst, a coupling agent and coating liquid at a high speed, performing the coupling to obtain modified coating liquid, smearing the coating liquid onto fee surface of a plastic packaging film to obtain a packaging material with a photocatalytic bacteriostatic function, packaging fresh meat in an map (modified atmosphere packing) manner by adopting the bacteriostatic packaging material, wherein a coating containing fee photocatalytic material is disposed at the inner side of a package, placing the packed fresh meat between two electrodes of a plasma generating device, and performing the plasma sterilization under the condition of a high voltage electric field..
Nanjing Agricultural University
Titanium carbide overlay and making
Compositions and methods for applying to a surface an overlay comprising titanium carbide are provided. The compositions include rounded titanium carbide particles and optionally include angular titanium carbide particles.
Oerlikon Metco (us) Inc.
Method for producing platinum group alloy
Provided is a method for producing a platinum group-based alloy capable of producing a sound molten ingot of a platinum group-based alloy in a large amount. The method for producing a platinum group-based alloy includes a molten ingot production step of a continuous casting system using a plasma arc melting furnace configured to form a plasma arc column between an electrode torch which is arranged in an upper part of a vacuum chamber and a water cooled copper crucible which is arranged in a lower part of the chamber and has a cavity having a sectional area s1, the molten ingot production step including: inserting and melting an end part of a raw material bar including a platinum group-based alloy in the plasma arc column to cause the raw material bar to fall in drops on a base material in the water cooled copper crucible, to thereby form a molten pool; and solidifying a bottom part of the molten pool while maintaining a constant liquid level height of the molten pool by pulling down the base material, the molten ingot having a horizontal sectional area s (mm2) and a length l (mm) satisfying the following relationship: s1≧s>500, l>4√(s/π), an internal pressure of the chamber during melting being 0.8 atm or more, a pulling down speed of the base material being 10 mm/min or less..
Ishifuku Metal Industry Co., Ltd.
Centrifugation system with red blood cell barrier
Centrifugation systems and methods are provided for separating blood into its constituent parts. Inner and outer walls of a centrifuge each include a projection which extends toward the other wall.
A pharmaceutical composition comprising a suspension of total cells obtained from hair follicle and plasma derived growth factors for promoting hair follicle regeneration
The present invention refers to a method of obtaining a composition comprising a cell suspension comprising hair progenitor cells (hpcs) from a human subject and plasma derived growth factors, which comprises the following steps: a. Incubating an isolated tissue sample comprising at least one complete hair follicle from the subject, preferably from the occipital region of the head of the subject, in a suspension of plasma derived growth factors, preferably obtained from the subject; for a period of time between 15 minutes and 1 hour at a temperature of approximately 37° c.; and b.
Gorrochategui Barrueta, Alberto
Tablettable chewing gums
The invention relates to certain nicotine chewing gums that provide for a high rate of buccal absorption and high plasma concentrations, in particular over the first 10 minutes after administration, in a subject willing to quit smoking.. .
Liposome composition and producing same
Provided are a liposome composition which has a practically required long-term preservation stability, and which has a release rate of a drug on the order of several tens of hours due to releasability of a drug being able to be suitably controlled by rendering an inner water phase hyper-osmotic; and a method for producing the same. According to the present invention, it is possible to provide a liposome composition, including liposomes each of which has an inner water phase and an aqueous solution which constitutes an outer water phase and in which the liposomes are dispersed, in which each of the liposomes encapsulates a drug in a dissolved state, an osmotic pressure of the inner water phase is 2-fold to 8-fold relative to the osmotic pressure of the outer water phase, and a release rate of the drug from each of the liposomes is 10%/24 hr to 70%/24 hr in blood plasma at 37° c.; and a method for producing the same..
Plasma arc cutting systems, consumables and operational methods
The invention features methods and apparatuses for regulating a shielding liquid in a plasma torch. A liquid-injection shield for a plasma torch includes a body having an exterior surface and an interior surface and a liquid injection regulation component circumferentially disposed within and in direct contact with the interior surface of the body.
Electrode for a contact start plasma arc torch and contact start plasma arc torch employing such electrodes
A swirl ring component of a contact start plasma arc torch is provided. The swirl ring component includes a hollow body formed of a front portion and a rear portion along a longitudinal axis and defining an exterior surface and an interior surface.
Cartridge for a liquid-cooled plasma arc torch
A liquid-cooled consumable cartridge for a plasma arc torch is provided. The cartridge includes (i) an electrode, (ii) a swirl ring with a first outer retaining feature and a second outer retaining feature on an exterior surface, where the electrode is secured to the swirl ring, and (iii) a nozzle with an inner retaining feature on an interior surface, where the inner retaining feature of the nozzle is mated with the first outer retaining feature of the swirl ring.
Cartridge for a liquid-cooled plasma arc torch
A consumable cartridge frame for a liquid-cooled plasma arc torch is provided. The consumable cartridge frame includes an insulator body configured to be disposed between a torch head and a cartridge tip.
Cartridge for a liquid-cooled plasma arc torch
A consumable cartridge for a liquid-cooled plasma arc torch is provided. The consumable cartridge comprises a cartridge frame including a proximal end having an end surface, a distal end and a body having a central longitudinal axis extending therethrough.
Cartridge for a liquid-cooled plasma arc torch
A torch head for a liquid-cooled plasma arc torch is provided. The torch head includes a torch body and a torch insulator, coupled to the torch body, having a substantially non-conductive insulator body.
Apparatus and techniques to treat substrates using directional plasma and reactive gas
An apparatus to treat a substrate. The apparatus may include a reactive gas source having a reactive gas outlet disposed in a process chamber, the reactive gas outlet to direct a first reactive gas to the substrate; a plasma chamber coupled to the process chamber and including an extraction plate having an extraction aperture extending along a first direction, disposed within the process chamber and movable along a second direction perpendicular to the first direction between a first position facing the reactive gas source and a second position facing the extraction aperture; and a gas flow restrictor disposed between the reactive gas outlet and the extraction aperture, the gas flow restrictor defining a differential pumping channel between at least the plasma chamber and substrate stage..
Varian Semiconductor Equipment Associates, Inc.