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Plasma patents



      
           
This page is updated frequently with new Plasma-related patent applications. Subscribe to the Plasma RSS feed to automatically get the update: related Plasma RSS feeds. RSS updates for this page: Plasma RSS RSS


Module-level processing of silicon photovoltaic cells

Imec Vzw

Module-level processing of silicon photovoltaic cells

Module-level processing of silicon photovoltaic cells

Ultra-bright passivated aluminum nano-flake pigments

Date/App# patent app List of recent Plasma-related patents
04/23/15
20150112324
 Rf tissue modulation devices and methods of using the same patent thumbnailnew patent Rf tissue modulation devices and methods of using the same
Minimally invasive rf tissue modulation devices are provided. In some aspects, the devices include a hand-held control unit and an elongated member.
Trice Medical, Inc.
04/23/15
20150112300
 Method for enhanced trans-tissue delivery of therapeutic substances patent thumbnailnew patent Method for enhanced trans-tissue delivery of therapeutic substances
A method of enhanced trans-tissue delivery of therapeutic substances including; placing an electrode in proximity to human or animal tissue covered with material of sufficient concentration of such substances; applying a voltage signal to generate plasma, preferably dielectric barrier discharge in air, between the tissue and the electrode.. .
04/23/15
20150112058
 Macrocycles as factor xia inhibitors patent thumbnailnew patent Macrocycles as factor xia inhibitors
Or a stereoisomer, a tautomer, or a pharmaceutically acceptable salt thereof, wherein all the variables are as defined herein. These compounds are selective factor xia inhibitors or dual inhibitors of fxia and plasma kallikrein.
04/23/15
20150111974
 Method and device for generating hydrogen plasma field patent thumbnailnew patent Method and device for generating hydrogen plasma field
A method for generating a hydrogen plasma field include a step for preparing ionized hydrogen water in which hydrogenated hydrogen with ion binding properties or ortho hydrogen molecules have been dissolved. The method also includes a step for irradiating the resulting solution with vacuum ultraviolet light.
Taane Co.
04/23/15
20150111793
 Cu-ni-sn alloy overlay for bearing surfaces on oilfield equipment patent thumbnailnew patent Cu-ni-sn alloy overlay for bearing surfaces on oilfield equipment
A bearing surface of an oilfield component is treated by applying a surface treatment having a low coefficient of friction to the bearing surface of the oilfield component by weld fusing an overlay of a cu—ni—sn alloy material to the bearing surface. Weld fusing the overlay of the cu—ni—sn alloy material to the bearing surface can involve laser surface cladding the overlay of the cu—ni—sn alloy material to the bearing surface, gas tungsten arc welding the overlay of the cu—ni—sn alloy material to the bearing surface, or plasma tungsten arc welding the overlay of the cu—ni—sn alloy material to the bearing surface..
Weatherford Technology Holdings, Llc
04/23/15
20150111770
 Quantitative determination of biomarkers in the erythrocyte membrane patent thumbnailnew patent Quantitative determination of biomarkers in the erythrocyte membrane
This invention relates to determination of quantitative expression of plasma membrane proteins as biomarkers in the erythrocytes. The invention includes simple, quantitative assay platforms which can be made available in most diagnostic laboratories.
Advancell Diagnosztika Kft.
04/23/15
20150111394
 Mechanisms for forming uniform film on semiconductor substrate patent thumbnailnew patent Mechanisms for forming uniform film on semiconductor substrate
Embodiments of mechanisms for forming a film deposition tool are provided. The film deposition tool includes a plasma source and a substrate processing region connected to the plasma source.
Taiwan Semiconductor Manufacturing Co., Ltd.
04/23/15
20150111391
 Substrate treating apparatus and method patent thumbnailnew patent Substrate treating apparatus and method
Disclosed is an apparatus and method of processing substrate, which facilitates to improve deposition uniformity of a thin film deposited on a substrate, and to control quality of a thin film, wherein the apparatus includes a process chamber; a substrate supporter for supporting at least one of substrates, wherein the substrate supporter is provided in the bottom of the process chamber; a chamber lid confronting the substrate supporter, the chamber lid for covering an upper side of the process chamber; and a gas distributor for locally distributing activated source gas on the substrate, wherein the gas distributor locally confronting the substrate supporter is provided in the chamber lid, wherein the gas distributor forms plasma by the use of plasma formation gas, and activates the source gas by distributing the source gas to some of plasma area for formation of the plasma.. .
Jusung Engineering Co., Ltd.
04/23/15
20150111389
 Methods of surface interface engineering patent thumbnailnew patent Methods of surface interface engineering
Methods for surface interface engineering in semiconductor fabrication are provided herein. In some embodiments, a method of processing a substrate disposed atop a substrate support in a processing volume of a processing chamber includes: generating an ion species from an inductively coupled plasma formed within the processing volume of the processing chamber from a first process gas; exposing a first layer of the substrate to the ion species to form an ammonium fluoride (nh4f) film atop the first layer, wherein the first layer comprises silicon oxide; and heating the substrate to a second temperature at which the ammonium fluoride film reacts with the first layer to selectively etch the silicon oxide..
Applied Materials, Inc.
04/23/15
20150111371
 Passivation of group iii-nitride heterojunction devices patent thumbnailnew patent Passivation of group iii-nitride heterojunction devices
Passivation of group iii-nitride hetero junction devices is described herein. The passivation facilitates simultaneous realization of effective/high current collapse suppression and low leakage current without the use of a sophisticated multiple-field plate technique.
The Hong Kong University Of Science And Technology
04/23/15
20150111364
new patent

Maskless hybrid laser scribing and plasma etching wafer dicing process


Maskless hybrid laser scribing and plasma etching wafer dicing processes are described. In an example, a method of dicing a semiconductor wafer having a front surface with a plurality of integrated circuits thereon and having a passivation layer disposed between and covering metal pillar/solder bump pairs of the integrated circuits involves laser scribing, without the use of a mask layer, the passivation layer to provide scribe lines exposing the semiconductor wafer.
04/23/15
20150111363
new patent

Maskless hybrid laser scribing and plasma etching wafer dicing process


Maskless hybrid laser scribing and plasma etching wafer dicing processes are described. In an example, a method of dicing a semiconductor wafer having a front surface with a plurality of integrated circuits thereon and having a passivation layer disposed between and covering metal pillar/solder bump pairs of the integrated circuits involves laser scribing, without the use of a mask layer, the passivation layer to provide scribe lines exposing the semiconductor wafer.
04/23/15
20150111338
new patent

Method for manufacturing thin-film transistor


The present invention provides a method for manufacturing a thin-film transistor. The thin-film transistor has a bottom gate coplanar structure.
Shenzhen China Star Optoelectronics Technology Co. Ltd.
04/23/15
20150111335
new patent

Module-level processing of silicon photovoltaic cells


A method for module-level processing of photovoltaic cells is provided. The method includes: bonding at least one crystalline silicon photovoltaic substrate to a carrier by means of an adhesive layer, thereby leaving part of the adhesive layer uncovered; after bonding, exposing the uncovered part of the adhesive layer and the at least one crystalline silicon photovoltaic substrate to a plasma; and removing a surface portion of the at least one crystalline photovoltaic substrate.
Imec Vzw
04/23/15
20150111235
new patent

Method for determining cause of the prolongation of blood coagulation time


The method of determining a cause of the prolongation of blood coagulation time in test plasma includes (1) measuring the blood coagulation time of samples including (a) the test plasma only, (b) normal plasma only, and (c) the test plasma and the normal plasma mixed at least at a mixing ratio, (2) drawing a polygonal line graph by plotting the measurement results of the samples (a), (b) and (c), with the vertical axis representing the blood coagulation time or the prolongation ratio of blood coagulation time and the horizontal axis representing the mixing ratio or mixing proportion of the test plasma or the normal plasma, and thereby determining the area a under the polygonal line and the area b under a line segment that connects the plotted measurement results of the samples (a) and (b), (3) calculating the ratio of the area (a−b) obtained by subtracting the area b from the area a, with respect to the area b, ((a−b)/(b)):area ratio x), (4) performing the steps of (1) and (2) for a coagulation factor inhibitor-positive plasma, and thereby determining in advance a standard area ratio y, and (5) comparing the area ratio x and the standard area ratio y, and determining the test plasma as a coagulation factor inhibitor type in the case where y≦x, or as a coagulation factor deficient type in the case where y>x.. .
04/23/15
20150111207
new patent

Detection of mycoplasma in cell cultures and cell culture derived biologicals


Sequences having specificity for mycoplasma and related mollicutes genus strains and uses thereof. Methods of use include detection of samples contaminated with mycoplasma.
Akron Biotech
04/23/15
20150111170
new patent

Tooth and bone restoration via plasma deposition


Aspects described herein pertain to restoring damaged portions of tooth or bone using plasma mediated deposition. In an embodiment, a biocompatible carrier gas is ionized to form a biocompatible atmospheric plasma stream.
04/23/15
20150111127
new patent

Fuel cell with enhanced mass transfer characteristics


Disclosed is a fuel cell with enhanced mass transfer characteristics in which a highly hydrophobic porous medium, which is prepared by forming a micro-nano dual structure in which nanometer-scale protrusions with a high aspect ratio are formed on the surface of a porous medium with a micrometer-scale roughness by plasma etching and then by depositing a hydrophobic thin film thereon, is used as a gas diffusion layer, thereby increasing hydrophobicity due to the micro-nano dual structure and the hydrophobic thin film. When this highly hydrophobic porous medium is used as a gas diffusion layer for a fuel cell, it is possible to reduce water flooding by efficiently discharging water produced by an electrochemical reaction of the fuel cell and to improve the performance of the fuel cell by facilitating the supply of reactant gases such as hydrogen and air (oxygen) to a membrane-electrode assembly (mea)..
Korea Institute Of Science And Technology
04/23/15
20150111040
new patent

Surface treatment glass substrate and glass substrate


A method capable of forming a sufficiently thick low alkali concentration region without heating glass to a high temperature and even in an atmosphere which is not an atmosphere of plasma formation gas such as helium and argon, is provided. A glass substrate having a pair of main surfaces and being made of glass containing an alkali oxide in its composition, is disposed between a first electrode and a second electrode so that one main surface is separated from the first electrode and the other main surface is brought into contact with the second electrode, and a corona discharge is generated by applying a direct-current voltage to the first electrode as a positive electrode and the second electrode as a negative electrode, in a positive-electrode-side surface layer portion of the glass substrate, at least one positive ion including an alkali ion migrate toward the negative-electrode-side..
Asahi Glass Company, Limited
04/23/15
20150111027
new patent

Ultra-bright passivated aluminum nano-flake pigments


An organic release agent is vacuum deposited over a substrate and surface treated with a plasma or ion-beam source in a gas rich in oxygen-based functional groups to harden a very thin layer of the surface of the deposited layer in passivating environment. Aluminum is subsequently vacuum deposited onto the hardened release layer to form a very flat and specular thin film.
04/23/15
20150111013
new patent

Aramid-resin film laminate and producing the same


Provided is an a aramid-resin film laminate comprising an aramid paper comprising an aramid fibrid and an aramid short fiber, and a resin film laminated on each other. The aramid-resin film laminate is obtained by conducting a plasma treatment on a surface of the aramid paper, the surface having a skin layer portion whose heat of fusion measured with a differential scanning calorimeter (dsc) is 25 cal/g or less, and bonding the aramid paper and the resin film to each other by heating, pressing, or heating under pressure, with the plasma treated surface of the aramid paper and a plasma treated surface of the resin film facing each other.
Kawamura Sangyo Co., Ltd.
04/23/15
20150110974
new patent

Plasma processing apparatus and plasma processing method


A plasma processing apparatus including: a chamber configured to provide a space for processing a substrate; a substrate stage configured to support the substrate within the chamber and including a first electrode, the first electrode configured to receive a first radio frequency signal; a second electrode disposed on an upper portion of the chamber to face the first electrode, the second electrode configured to receive a second radio frequency signal; a gas supply unit configured to supply a process gas onto the substrate within the chamber; and a thermal control unit configured to circulate a heat transfer medium through a first fluid passage provided in the first electrode and a second fluid passage provided in the second electrode to maintain the first and second electrodes at the same temperature.. .
Samsung Display Co., Ltd.
04/23/15
20150110973
new patent

Plasma processing apparatus and plasma processing method


A plasma processing apparatus of the present disclosure includes a processing container configured to accommodate a wafer; a placing unit provided on a bottom surface of the processing container to place the wafer thereon; a first processing gas supply pipe provided in a central portion of a ceiling of the processing container to supply a first processing gas into the processing container; a second processing gas supply pipe provided in a side wall of the processing container to supply a second processing gas into the processing container; a rectifying gas supply pipe provided in the side wall of the processing container above the second processing gas supply pipe to supply a rectifying gas downward into the processing container; and a radial line slot antenna configured to radiate microwave into the processing container.. .
Tokyo Electron Limited
04/23/15
20150110968
new patent

Tandem source activation for cyclical deposition of films


A method includes flowing reactant gases into a process chamber. plasma having a first power level is supplied using a plasma source.
Lam Research Corporation
04/23/15
20150110932
new patent

Methods and systems for inactivation of bacteria in liquid using liquid-phase electrical discharge plasmas


An electrical discharge plasma reactor system for inactivating one or more pathogens in a liquid. The reactor system includes a reactor chamber configured to hold the liquid, a silver discharge electrode and a non-discharge electrode disposed within the reactor chamber such that the two electrodes are in spaced, conductive communication when the liquid is inside the reactor chamber, and a power supply connected to at least one of the discharge and non-discharge electrodes and configured to induce the discharge electrode to generate plasma to at least partially inactivate one or more pathogens in the liquid..
Clarkson University
04/23/15
20150110769
new patent

Method for retarding unhealthy manifestations brought by ageing of human beings


The present invention provides a method for retarding unhealthy manifestations brought by ageing of human beings (in particular, but not limited to the reduction of sexual activity and fertility, climax, changes in glucose tolerance, reduction of cognitive and mnestic functions, reduction of stress resistance, development of organ and tissue sclerosis). According to the invention this task is solved by administration into the blood circulation of an agent which inactivates extracellular blood plasma dna e.g.
Cls Therapeutics Limited
04/23/15
20150110706
new patent

Hydrogen surface-treated graphene, formation method thereof and electronic device comprising the same


The present invention relates to hydrogen surface-treated graphene, a formation method thereof, and an electronic device including the same. The graphene according to one exemplary embodiment of the present invention can be useful in preparing hydrogen surface-treated graphene having a band gap using simple methods through indirect hydrogen plasma treatment.
University-industry Foundation, Yonsei University
04/23/15
20150110703
new patent

Reactor with induction heater


A method for producing usable product in a reactor including introducing a viscous mixture including usable product and unconverted reactant into a chamber of a housing through an inlet, wherein the mixture has a temperature greater than ambient temperature when introduced into the chamber; heating the viscous mixture in the chamber using at least one of an induction heater, an exothermic reaction, a microwave heater, a radio frequency heater, an electrical resistance heater, a laser heater, a plasma heater, and a heated fluid; converting at least a portion of the unconverted reactant to usable product, wherein at least a portion of the usable product is produced in the viscous mixture; and transferring the viscous mixture including usable product from the housing through an outlet.. .
Lp Amina Llc
04/23/15
20150110672
new patent

Method for inducing apoptosis of disease cells and disease-causing microorganisms using plasma for bio-medical use


The present invention relates to a method for inducing apoptosis of disease cells and disease-causing micro-organisms using plasma for bio-medical use, the method comprising the steps of: generating plasma by means of a high-pressure plasma jet produced using a micro-electro-mechanical system (mems) technique; plasma-processing by applying a solution with the plasma; exposing cells to the plasma-processed solution; and inactivating disease cells and disease-causing micro-organisms from among the exposed cells. According to the present invention, after applying plasma to a solution such as a buffer solution or water, targets to be processed such as micro-organisms or animal or plant cells are exposed thereto, and thus the present invention can be used in both bio and medical fields, and has the benefit of effectively inducing apoptosis of disease cells and disease-causing micro-organisms with low power due to indirect processing..
Ajou University Industry-academic Cooperation Foundation
04/23/15
20150109779
new patent

Dual plasma luminaire for indoor horticulture


An illumination apparatus comprises a compound reflector panel for directing light energy from at least two solid state, point source light emitter into a combined emission pattern having substantially uniform spatial and spectral illumination at a predetermined target area. The first and second light emitters, mounted in respective first and second defined portions of the compound reflector panel, effectively provide point sources, each having a defined spectral characteristic.
04/23/15
20150109716
new patent

Plasma processing apparatus, power supply unit and mounting table system


A plasma processing apparatus includes a mounting table including a lower electrode and an electrostatic chuck, a high frequency power supply electrically connected to the lower electrode, a heater provided in the electrostatic chuck, a heater power supply for supplying a power to the heater, a filter unit including a filter connected to the heater power supply, a rod-shaped power feeder connecting the heater power supply and the heater via the filter, an insulating tubular portion having an inner hole through which the power feeder extends, and a conductive choke portion serving to suppress a microwave propagating through the tubular portion. The choke portion includes a first portion extending from the power feeder in a direction intersecting with a longitudinal direction of the power feeder and a cylindrical second portion extending, between the tubular portion and the power feeder, from a peripheral portion of the first portion..
Tokyo Electron Limited
04/23/15
20150109587
new patent

Optical element, lighting device, and image display device


Provided are an optical element, a lighting device, and an image display device, with which the absorption efficiency and the luminance of the excitation light can be improved. This optical element (40) is equipped with: a light-emitting layer (103) that generates excitation light; a plasmon excitation layer (105) stacked on the light-emitting layer (103) and having a higher plasma frequency than the light-emitting frequency of the light-emitting layer (103); an emission layer (207) that emits light by converting the surface plasmons or the light generated at the upper surface of the plasmon excitation layer (105) to light having a predetermined emission angle; and a metal layer (102) stacked on the underside of the light-emitting layer (103)..
Nec Corporation
04/23/15
20150108995
new patent

Instrument test arrangement


An instrument test arrangement is specified, which is preferably equipped for medical instruments for argon plasma coagulation. The instrument test arrangement comprises an electrode arrangement, comprising at least one test electrode.
Erbe Elektromedizin Gmbh
04/23/15
20150108994
new patent

Instrument test arrangement comprising test equipment


To provide the user of an rf-surgical instrument with a non-hazardous short test operation, for example so as to test the ignitability of an argon plasma probe, provision is made for an instrument test arrangement, which is installed into a feeding medical device or into a neutral conductor connecting cable or which is provided as plug adapter, which is to be plugged between the device and the neutral conductor connecting cable. The instrument test arrangement comprises at least one or, better yet, two ignition test electrodes, which are connected to conductors of the device or of the neutral conductor cable, preferably via impedance components.
Erbe Elektromedizin Gmbh
04/23/15
20150108914
new patent

High-frequency discharge ignition apparatus


A high-frequency discharge ignition apparatus is obtained that can stably make a high-frequency current flow into a spark discharge path and efficiently forms large discharge plasma. The high-frequency discharge ignition apparatus is configured with an ignition plug, a spark discharge path generation device that generates a high voltage and supplies the generated high voltage to the ignition plug so as to form a spark discharge path in the gap of the ignition plug, a voltage boosting device that boosts the voltage of an ac current, and a high-frequency current supply apparatus that supplies an ac current to the spark discharge path formed in the gap by way of the voltage boosting device..
Mitsubishi Electric Corporation
04/23/15
20150108898
new patent

Hybrid generators and methods of using them


Certain embodiments described herein are directed to generators that can be used to sustain a plasma in a driven mode and in an oscillation mode and optionally in a hybrid mode. In some embodiments, the generator is configured to switch between the two modes during operation.
Perkinelmer Health Sciences, Inc.
04/23/15
20150108897
new patent

Microwave plasma processing apparatus and microwave supply method


Disclosed is a microwave plasma processing apparatus including: a processing container configured to define a processing space a microwave generator configured to generate microwaves for generating plasma of a processing gas introduced into the processing space, a distributor configured to distribute the microwaves to a plurality of waveguides using a variable distribution ratio, an antenna installed in the processing container to seal the processing space and configured to radiate the microwaves distributed to each of the plurality of waveguides by the distributor to the processing space, a monitor unit configured to monitor a power of the microwaves distributed to each of the plurality of waveguides by the distributor, and a distribution ratio control unit configured to correct the distribution ratio used for distribution of the microwaves by the distributor based on a difference between a ratio of the power of the microwaves monitored by the monitor unit and a previously designated distribution ratio.. .
Tokyo Electron Limited
04/23/15
20150108894
new patent

Wide metal-free plasma flood gun


In one embodiment an apparatus to provide electrons to a substrate includes a plurality of helicon plasma sources arranged in a helicon source array, wherein each helicon plasma source comprises a helical antenna configured to generate a wave vector parallel to a first axis; and a magnet configured to generate a magnetic field vector parallel to the first axis, wherein each helicon plasma source is further configured to generate a respective magnetic field vector that is opposite that of a magnetic field vector of an adjacent helicon plasma source.. .
Varian Semiconductor Equipment Associates, Inc.
04/23/15
20150108654
new patent

Reliable passivation layers for semiconductor devices


Device and method for forming a device are disclosed. A substrate which is prepared with a dielectric layer having a top metal level of the device is provided.
Globalfoundries Singapore Pte. Ltd.
04/23/15
20150108373
new patent

Photon source, metrology apparatus, lithographic system and device manufacturing method


A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., xe).
Asml Netherlands B.v.
04/23/15
20150108365
new patent

Arrangement and cooling a plasma-based radiation source


An arrangements and methods for cooling a plasma-based radiation source having a revolving element which is to be cooled, particularly for application in euv radiation sources, is disclosed. The revolving element is immersed in the metal coolant in a first vessel of a primary cooling circuit, and a secondary cooling circuit with a cooling liquid evaporating at the desired operating temperature of the metal coolant has a control unit for controlling at least one atomizing arrangement in a differentiated manner and for selectively controlling a heater in case the determined temperature falls below a minimum operating temperature of the metal coolant.
Ushio Denki Kabushiki Kaisha
04/23/15
20150107988
new patent

Method for forming oxide semiconductor film


A method for forming an oxide semiconductor film using a sputtering apparatus including a target containing a crystalline in—ga—zn oxide, a substrate, and a magnet includes the following steps: generating plasma between the target and the substrate; and separating a flat-plate-like in—ga—zn oxide in which a first layer including a gallium atom, a zinc atom, and an oxygen atom, a second layer including an indium atom and an oxygen atom, and a third layer including a gallium atom, a zinc atom, and an oxygen atom are stacked in this order. The flat-plate-like in—ga—zn oxide passes through the plasma and thus is negatively charged.
Semiconductor Energy Laboratory Co., Ltd.
04/23/15
20150107987
new patent

Plasma generation apparatus, deposition apparatus, and plasma generation method


Provided is a plasma generation apparatus capable of generating uniform plasma over a wide range. The plasma generation apparatus includes two oppositely arranged plasma guns each injecting a discharge gas to be ionized, and having a cathode for emitting electrons, and a converging coil for forming a magnetic flux to guide the emitted electrons, and polarities of the converging coils with respect to the cathodes in the two plasma guns are opposite to each other..
Chugai Ro Co., Ltd.
04/23/15
20150107773
new patent

Plasma processing apparatus


A plasma processing apparatus for exciting a processing gas by a microwave, includes a focus ring extending in an annular shape, a first tubular member being wrapped around a central axis to extend along an outer periphery of the lower electrode below the focus ring, an annular member made of a dielectric material provided between the focus ring and the first tubular member a second tubular member extending along an outer periphery of the first tubular member and a choke portion suppressing a microwave propagating through the first tubular member via the focus ring and the annular member. And the choke portion protrudes outward in a diametrical direction of the first tubular from the outer periphery of the first tubular member and extends in an annular shape along the periphery of the first tubular member, the choke portion is covered by the second tubular member..
Tokyo Electron Limited
04/23/15
20150107768
new patent

Polycrystalline caf2 member, member for plasma treatment device, plasma treatment device, and producing focusing ring


A polycrystalline caf2 member includes a combined assembly of a plurality of polycrystalline bodies made from caf2 that are pressure bonded together.. .
Nikon Corporation
04/23/15
20150107618
new patent

Oxygen containing plasma cleaning to remove contamination from electronic device components


A gas comprising oxygen is supplied to a plasma source. A plasma jet comprising oxygen plasma particles is generated from the gas.
Applied Materials, Inc.
04/23/15
20150107517
new patent

Plasma processing apparatus


A plasma processing apparatus includes a plasma generation chamber in which plasma active species are generated, a process chamber configured to accommodate processing target objects stacked in a vertical direction, the plasma active species generated in the plasma generation chamber being supplied into the process chamber, a plasma source gas supply pipe disposed inside the plasma generation chamber and extending in the vertical direction, a plasma source gas being introduced from one end of the plasma source gas supply pipe and discharged through gas discharge holes formed in the plasma source gas supply pipe in the vertical direction, and a pair of plasma electrodes, arranged to face each other, configured to apply an electric field to the plasma source gas discharged into the plasma generation chamber. A size of a discharge area interposed between the pair of plasma electrodes is varied in the vertical direction..
Tokyo Electron Limited
04/23/15
20150107516
new patent

Plasma treatment apparatus and substrate treatment system


In a substrate treatment system including multiple treatment chambers around a substrate transfer chamber, an increase in apparatus floor area due to installation of additional treatment chambers is reduced. A plasma treatment apparatus according to one embodiment of the present invention includes: a treatment chamber; a substrate holder for holding the substrate; plasma generation unit for forming plasma; multiple gate valves for installation and removal of the substrate; a shield for surrounding the plasma formed by the plasma generation unit; and substrate transfer unit for transferring the substrate through the gate valves.
Canon Anelva Corporation
04/23/15
20150107513
new patent

Systems for modulating step coverage during conformal film deposition


A system for processing a substrate include a processing chamber including a pedestal to support a substrate and a controller configured to a) supply precursor to the processing chamber; b) purge the processing chamber; c) perform radio frequency (rf) plasma activation; d) purge the processing chamber; and e) prior to purging the processing chamber in at least one of (b) or (d), set a vacuum pressure of the processing chamber to a first predetermined pressure that is less than a vacuum pressure during at least one of (a) or (c) for a first predetermined period.. .
Novellus Systems, Inc.
04/23/15
20150107448
new patent

Cylinder bore and forming the same


In one or more embodiments, a method of forming a coated cylinder bore includes honing a cylinder bore to produce a honed cylinder bore, masking partially the honed cylinder bore to form a partially masked cylinder bore, and contacting the partially marked cylinder bore with an electrolytic bath to form the coated cylinder bore. The method may further include applying a pulsed direct current at a voltage of 400 to 500 volts to the electrolytic bath.
Ford Global Technologies, Llc
04/16/15
20150105763

Method for patterned plasma-mediated modification of the crystalline lens


A system for treating a cataractous lens of a patient's eye includes a laser source for generating a light beam, a scanning system for deflecting the light beam to form a treatment pattern of the light beam, and a controller operably coupled to the laser source and scanning system and configured to operate the scanner to form the treatment pattern. The treatment pattern is a plurality of cuts in the form two or more different incision patterns for segmenting the lens tissue into a plurality of patterned pieces.
Optimedica Corporation
04/16/15
20150105762

Method for patterned plasma-mediated modification of the crystalline lens


A method of treating a cataractous lens of a patient's eye includes generating a light beam, deflecting the light beam using a scanner to form a treatment pattern, delivering the treatment pattern to the lens of the patient's eye to create a plurality of cuts in the form two or more different incisions patterns within the lens to segment the lens tissue into a plurality of patterned pieces, and mechanically breaking the lens into a plurality of pieces along the cuts. A first incision pattern includes two or more crossing cut incision planes.
Optimedica Corporation
04/16/15
20150105716

Physical means and methods for inducing regenerative effects on living tissues and fluids


A system for the administration of modified plasma to a subject, including: (a) a non thermal plasma (ntp) emitting source for emitting a plasma beam; (b) a plasma coupling mechanism (pcm) with a plasma beam dish having at least one opening for the passage of the plasma beam; the plasma beam dish having a first surface and a second opposite surface. The first surface of the plasma beam dish includes: at least one coupling element selected from the group consisting of: (1) at least one ferroelectric element for providing the field; (2) at least one ferromagnetic element for providing the field; (3) at least one piezoelectric element for providing the field; and (4) at least one piezomagnetic element for providing the field.
Orteron (t.o) Ltd.
04/16/15
20150105293

Clinical diagnosis of hepatic fibrosis using a novel panel of low abundant human plasma protein biomarkers


The inventors have proposed a novel panel of human plasma protein biomarkers for diagnosing hepatic fibrosis and cirrhosis. Presently there is no reliable non-invasive way of assessing liver fibrosis.
The Chancellor, Masters And Scholars Of The University Of Oxford
04/16/15
20150105281

Method for the selection of serum biomarkers of epigenetic alterations, particularly of global hypomethylation and their uses


The present invention provides a novel method for the selection of serum biomarkers of epigenetic alterations, particularly of global hypomethylation, and the use of said biomarkers in a method for screening, diagnosing and following a pathology associated to epigenetic alterations of cell in an individual, such as placental-related pathology or cancer. The present invention also relates to a method of detecting a predisposition to placental-related pathology or cancer based on the presence or the level of said biomarker in a serum or plasma sample of said patient.
Institut Gustave Roussy
04/16/15
20150104957

Resist mask processing method


A method for processing a resist mask includes: (a) a step of preparing, in a processing chamber, a target object to be processed having a patterned resist mask provided thereon; and (b) a step of generating a plasma of the hydrogen-containing gas by supplying a hydrogen-containing gas and supplying a microwave into the processing chamber. The hydrogen-containing gas may be, e.g., h2 gas..
Tokyo Electron Limited
04/16/15
20150104951

Method for etching copper layer


Provided is a method of etching a copper layer. The method includes generating plasma of a processing gas within a processing container which accommodates an object to be processed that includes the copper layer and a metal mask formed on the copper layer.
Tokyo Electron Limited
04/16/15
20150104950

Plasma processing method


A plasma processing method for processing a silicon containing film formed on a substrate including a step of removing a reaction product with a first plasma formed from a first gas containing halogen, hydrogen, and carbon in a case where the reaction product is formed when performing an etching process on the silicon containing film by using an etching mask having an etching pattern.. .
Tokyo Electron Limited
04/16/15
20150104942

Method of manufacturing semiconductor device


A method of manufacturing a semiconductor device includes processing a semiconductor substrate using a plasma etching apparatus provided with a processing chamber. The semiconductor substrate has an uneasily-etched material formed thereabove and at least an upper layer film formed above the uneasily-etched material.
Kabushiki Kaisha Toshiba
04/16/15
20150104938

Method for forming damascene opening and applications thereof


A method for forming a damascene opening, wherein the method comprises steps as follows: firstly, a semiconductor structure comprising an inter-metal dielectric (imd), a first hard mask layer and a second hard mask layer stacked in sequence is provided, wherein the semiconductor structure has at least one trench extending downwards from the second hard mask layer to the imd. A plasma treatment is then performed to modify a portion of the first hard mask layer exposed from the trench.
United Microelectronics Corporation
04/16/15
20150104928

Wafer processing method


After performing a dividing step to divide a wafer into individual chips, an irradiation step is performed to apply ultraviolet radiation or plasma to the mount side of each chip, thereby generating ozone and active oxygen, which functions to remove organic matter sticking to the mount side of each chip. Accordingly, it is possible to remove from the mount side of each chip not only foreign matter sticking to the wafer during handling the wafer, but also foreign matter generated in dividing the wafer, so that faulty mounting of each chip can be reduced..
Disco Corporation
04/16/15
20150104896

Hollow cathode system, device and the plasma-assisted treatment of substrates


A hollow cathode system, a device and a method for the plasma-assisted treatment of substrates includes at least one hollow cathode, which can be connected to a power supply. The hollow cathode includes an electrically conducting main body with an opening which is bounded by ribs, follows a spiral or meandering path and allows a gas to pass through in a direction perpendicular to a surface of the main body.
Von Ardenne Gmbh
04/16/15
20150104648

Method and apparatus of growing metal-free and low stress thick film of diamond-like carbon


The presently claimed invention provides a metal-free and low stress thick film of diamond-like carbon (dlc). The diamond-like carbon layer of the present invention has a wide range of applications such as automotive coating, hydrophobic-hydrophilic tuning, solar photovoltaic, decorative coating, protective coating and bio-compatible coating.
Nano And Advanced Materials Institute Limited
04/16/15
20150104584

Method of increasing strength of a panel edge


A method of increasing strength of a panel edge includes providing a panel having a lateral surface treated by plasma. An elastic material is provided, photoinitiator is added therein, and the elastic material is then liquefied by heating.
Henghao Technology Co. Ltd


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