Images List Premium Download Classic

Plasma

Plasma-related patent applications - as published by the U.S. Patent and Trademark Office (USPTO).


loading
Plasma liquid generating device
Amsalp Biomedical Co., Ltd
December 07, 2017 - N°20170354024

A plasma liquid generating device includes a plasma generating module, a driving circuit, an adjust-controlling module and a mixing structure. The driving circuit is coupled with the plasma generating module and configured to drive the plasma generating module to generate first type plasma particles and second type plasma particles. The adjust-controlling module is coupled with the driving circuit and configured ...
Inline plasma-based system and method for thermal treatment of continuous products
Illinois Tool Works Inc.
December 07, 2017 - N°20170353999

An inline thermal treatment system for thermally treating a continuous product includes a gas supply system configured to supply a first gas flow and a power source configured to supply power. The system includes a plasma torch configured to receive the first gas flow from the gas supply system and power from the power source to form a plasma arc, ...
Complementary metal oxide semiconductor (cmos) devices employing plasma-doped source/drain structures and related methods
Qualcomm Incorporated
December 07, 2017 - N°20170352662

Complementary metal oxide semiconductor (cmos) devices employing plasma-doped source/drain structures and related methods are disclosed. In certain aspects, a source and drain of a cmos device are formed at end portions of a channel structure by plasma doping end portions of the channel structure above solid state solubility of the channel structure, and annealing the end portions for liquid ...
Plasma Patent Pack
Download 2061+ patent application PDFs
Plasma Patent Applications
Download 2061+ Plasma-related PDFs
For professional research & prior art discovery
inventor
  • 2061+ full patent PDF documents of Plasma-related inventions.
  • Exact USPTO filing data with full-text, images, drawings & claims.
  • Index pages: Table View and Image-Grid View layouts. All images in each PDF.
High power electrostatic chuck with aperture-reducing plug in a gas hole
Globalfoundries Inc.
December 07, 2017 - N°20170352568

An electrostatic chuck is described to carry a workpiece for processing such as high power plasma processing. In embodiments, the chuck includes a top plate to carry the workpiece, the top plate having an electrode to grip the workpiece, a cooling plate under the top plate to cool the top plate, a gas hole through the cooling plate and the ...
High power electrostatic chuck design with radio frequency coupling
Applied Materials, Inc.
December 07, 2017 - N°20170352567

An electrostatic chuck is described that has radio frequency coupling suitable for use in high power plasma environments. In some examples, the chuck includes a base plate, a top plate, a first electrode in the top plate proximate the top surface of the top plate to electrostatically grip a workpiece, and a second electrode in the top plate spaced apart ...
Rotary plasma electrical feedthrough
Applied Materials, Inc.
December 07, 2017 - N°20170352558

The present disclosure generally relates to methods and apparatus for facilitating electrical feedthrough in plasma processing chambers. The apparatus includes an electrically insulating housing positioned on a backside of the substrate support to contain a secondary plasma therein. The secondary plasma facilitates an electrical connection between the substrate support and electrical power or ground located outside the processing chamber. The ...
Plasma Patent Pack
Download 2061+ patent application PDFs
Plasma Patent Applications
Download 2061+ Plasma-related PDFs
For professional research & prior art discovery
inventor
  • 2061+ full patent PDF documents of Plasma-related inventions.
  • Exact USPTO filing data with full-text, images, drawings & claims.
  • Index pages: Table View and Image-Grid View layouts. All images in each PDF.
Method of etching semiconductor structures with etch gas
American Air Liquide, Inc.
December 07, 2017 - N°20170352546

Disclosed are sulfur-containing compounds for plasma etching channel holes, gate trenches, staircase contacts, capacitor holes, contact holes, etc., in si-containing layers on a substrate and plasma etching methods of using the same. The plasma etching compounds may provide improved selectivity between the si-containing layers and mask material, less damage to channel region, a straight vertical profile, and reduced bowing in ...
Ion sources and methods for generating ion beams with controllable ion current density distributions over ...
Veeco Instruments Inc.
December 07, 2017 - N°20170352521

The presently disclosed ion sources include one or more electromagnets for changing the distribution of plasma within a discharge space of an ion source. At least one of the electromagnets is oriented about an outer periphery of a tubular sidewall of the ion source and changes a distribution of the plasma in a peripheral region of the discharge space.
Ultra-thin plasma panel radiation detector
Integrated Sensors, Llc
December 07, 2017 - N°20170350991

An ultra-thin radiation detector includes a radiation detector gas chamber having at least one ultra-thin chamber window and an ultra-thin first substrate contained within the gas chamber. The detector further includes a second substrate generally parallel to and coupled to the first substrate and defining a gas gap between the first substrate and the second substrate. The detector further includes ...
Liquid level detection device, method of detecting liquid level, high temperature plasma raw material supply ...
Ushio Denki Kabushiki Kaisha
December 07, 2017 - N°20170350745

Disclosed herein a liquid level detection device capable of appropriately detecting a liquid level of a high temperature plasma raw material in a reservoir for storing the high temperature plasma raw material. The liquid level detection device includes: an upper limit level sensor configured to detect that the liquid level of the tin is elevated from downward to reach an ...
Substrate distance monitoring
Applied Materials, Inc.
December 07, 2017 - N°20170350688

Embodiments disclosed herein include a faceplate having a sensor assembly, a processing chamber having the same, and a method for monitoring a substrate in a processing chamber. In one embodiment, a faceplate is configured to introduce processing gases into a plasma processing chamber. The faceplate has one or more holes. A sensor assembly is disposed in the one or more ...
Method of removing materials by their disintegration by action of electric plasma
Ga Drilling, A.s.
December 07, 2017 - N°20170350206

A method of removing materials by their disintegration, especially metal tubes and non-metal materials, particularly in an area of a borehole, by thermal disintegration of materials by action of plasma created in a plasma generator, by hydrodynamic and/or gravitational removing of disintegrated materials from the area of the borehole, characterized in that a directed flow of water vapour-based plasma ...
Vacuum platform with process chambers for removing carbon contaminants and surface oxide from semiconductor substrates
Applied Materials, Inc.
December 07, 2017 - N°20170350038

Implementations of the present disclosure generally relate to an improved vacuum processing system. In one implementation, the vacuum processing system includes a first transfer chamber coupling to at least one epitaxy process chamber, a second transfer chamber, a transition station disposed between the first transfer chamber and the second transfer chamber, a first plasma-cleaning chamber coupled to the second transfer ...
Plasma Patent Pack
Download 2061+ patent application PDFs
Plasma Patent Applications
Download 2061+ Plasma-related PDFs
For professional research & prior art discovery
inventor
  • 2061+ full patent PDF documents of Plasma-related inventions.
  • Exact USPTO filing data with full-text, images, drawings & claims.
  • Index pages: Table View and Image-Grid View layouts. All images in each PDF.
Symmetrical inductively coupled plasma source with symmetrical flow chamber
Applied Materials, Inc.
December 07, 2017 - N°20170350017

A plasma reactor has an overhead multiple coil inductive plasma source with symmetric rf feeds and a symmetrical chamber exhaust with plural struts through the exhaust region providing access to a confined workpiece support. A grid may be included for masking spatial effects of the struts from the processing region.
Plasma processing apparatus and plasma processing method
Tokyo Electron Limited
December 07, 2017 - N°20170350014

This plasma processing apparatus includes a processing container that defines a plasma processing space, a holder that holds a substrate to be processed, a gas supply unit that supplies gas into the plasma processing space, an antenna that radiates microwaves to the plasma processing space, a coaxial waveguide that supplies the microwaves to the antenna, a plurality of stubs that ...
Method for preparing transparent sheet materials
Fujifilm Manufacturing Europe B.v.
December 07, 2017 - N°20170350006

A method for preparing a transparent sheet material comprising an organic, polymeric substrate and inorganic layers on each side of the substrate, the method comprising the steps of: a) providing an apparatus for generating a glow discharge plasma, said apparatus comprising at least two opposing electrodes, a power supply for the electrodes and a treatment space between the electrodes; b) ...
Wire guides for plasma transferred wire arc processes
Comau Llc
December 07, 2017 - N°20170349993

A thermal metal spraying apparatus for applying a metal coating to a target surface. The apparatus provides a cathode, a wire feed stock having a free end, and a wire guide that directs the free end of the wire feedstock to a position for establishing and maintaining a plasma transferred wire arc between the cathode and the free end of ...
Processing component having improved plasma etching resistance, and treatment method for reinforcing plasma etching resistance ...
Femvix Corp
December 07, 2017 - N°20170349992

Provided is a processing component of equipment for manufacturing a semiconductor or a display. A ceramic coated film is formed on a surface of a body of the processing component, in a state in which some or the entirety of valleys and peaks are removed, such that a surface roughness rz, which is expressed as an absolute value (p1+p2+...
Installation and method for the metallic coating of a workpiece
Sturm Maschinen- & Anlagenbau Gmbh
December 07, 2017 - N°20170349991

The invention relates to an installation and a method for the metallic coating of a workpiece using a coating device, said coating device comprising a displaceable coating lance, by which a metal plasma jet can be generated to create a coating of metal particles. According to the invention, it is provided that the coating device with the coating lance and ...
Titanium casting product for hot rolling and method for producing the same
Nippon Steel & Sumitomo Metal Corporation
December 07, 2017 - N°20170349973

Provided is a titanium casting product made of titanium alloy, the titanium casting product being produced by electron-beam remelting or plasma arc remelting, comprising: a melted and resolidified layer in a range of 1 mm or more in depth at a surface serving as a surface to be rolled, the melted and resolidified layer being obtained by adding one or more ...
Detecting hematological disorders using cell-free dna in blood
The Chinese University Of Hong Kong
December 07, 2017 - N°20170349948

Techniques are provided for detecting hematological disorders using cell-free dna in a blood sample, e. G., using plasma or serum. For example, an assay can target one or more differentially-methylated regions specific to a particular hematological cell lineage (e. G., erythroblasts). A methylation level can be quantified from the assay to determine an amount of methylated or unmethylated dna fragments ...
Loading