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Plasma patents



      
           
This page is updated frequently with new Plasma-related patent applications. Subscribe to the Plasma RSS feed to automatically get the update: related Plasma RSS feeds. RSS updates for this page: Plasma RSS RSS


Tissue ablation systems and method

Tissue ablation systems and method

Date/App# patent app List of recent Plasma-related patents
11/13/14
20140336758
 Hydrophilizing plasma coating patent thumbnailHydrophilizing plasma coating
The invention relates to a method for hydrophilizing surfaces of polymer workpieces. The method has a step (a) of pretreating the workpiece surfaces in a high-frequency gas plasma which is produced on the basis of an inert gas in order to clean and activate the workpiece surfaces; a step (b) of precoating the pretreated workpiece surfaces with polyacrylic acid using a high-frequency gas plasma made of a gas mixture, said gas mixture being composed of an inert gas and a first gas made of biocompatible, polymerizable carboxy group-containing monomers; and a step (c) of subsequently coating the precoated workpiece surfaces using a second gas substantially containing acrylic acid monomers..
11/13/14
20140336632
 Tissue ablation systems and method patent thumbnailTissue ablation systems and method
Tissue is treated using a radiofrequency power supply connected to an applicator having a chamber filled with an electrically non-conductive gas surrounded by a thin dielectric wall. A radiofrequency voltage is applied at a level sufficient to ionize the gas into a plasma and to capacitively couple the ionized plasma with the tissue to deliver radiofrequency current to ablate or otherwise treat the tissue..
11/13/14
20140336443
 Method of repairing age and disease immune dysfunction and cellular senescence with lymphoid stem cells and then re-applying those for therapeutic use patent thumbnailMethod of repairing age and disease immune dysfunction and cellular senescence with lymphoid stem cells and then re-applying those for therapeutic use
This invention relates to methods for treatment of diseases of ageing including immunosenescence, immune dysfunction, inflammation and impairment of early lymphoid lineage differentiation. The invention more specifically relates to the use of granulocyte colony stimulating factors to assist in stem cell mobilization, optionally in combination with the application of a method of delivering precise magnetic field patterns which agree with the body's own natural magnetic field patterns, and further in combination with re-infusion of previously collected autologous cells and/or plasma, optionally including allogeneic (healthy donor) cells and blood plasma..
11/13/14
20140336266
 Method for administering an nmda receptor antagonist to a subject patent thumbnailMethod for administering an nmda receptor antagonist to a subject
Compositions and methods for administering memantine to a subject are provided. In particular, a solid pharmaceutical composition in a unit dosage form for once daily oral administration is provided.
11/13/14
20140336122
 Removal of serine proteases by treatment with finely divided silicon dioxide patent thumbnailRemoval of serine proteases by treatment with finely divided silicon dioxide
The present invention provides novel methods for reducing the serine protease and/or serine protease zymogen content of a plasma-derived protein composition. Also provided are methods for manufacturing plasma-derived protein compositions having reduced serine protease and\or serine protease zymogen content.
11/13/14
20140335700
 Carbon layers for high temperature processes patent thumbnailCarbon layers for high temperature processes
Carbon layers with reduced hydrogen content may be deposited by plasma-enhanced chemical vapor deposition by selecting processing parameters accordingly. Such carbon layers may be subjected to high temperature processing without showing excessive shrinking..
11/13/14
20140335698
 Component of a plasma processing apparatus having a protective in situ formed layer on a plasma exposed surface patent thumbnailComponent of a plasma processing apparatus having a protective in situ formed layer on a plasma exposed surface
A component of a plasma processing chamber having a protective liquid layer on a plasma exposed surface of the component. The protective liquid layer can be replenished by supplying a liquid to a liquid channel and delivering the liquid through liquid feed passages in the component.
11/13/14
20140335696
 Plasma processing apparatus and plasma processing method patent thumbnailPlasma processing apparatus and plasma processing method
The plasma processing apparatus is provided with a chamber 11, a plasma source 13 which generates plasma inside the chamber 11, a stage 16 which is provided inside the chamber 11 and places a carrier 5 thereon, a cover 31 which is arranged above the stage 16 to cover a holding sheet 6 and a frame 7 and has a window 33 which is formed on a central part thereof to penetrate the cover 31 in the thickness direction, and a drive mechanism 38 which changes the position of the cover 31 relative to the stage 16 between a first position which is away from the stage 16 and allows the carrier 5 to be placed on and removed from the stage 16 and a second position which allows the cover 31 to cover the holding sheet 6 and the frame 7 of the carrier 5 placed on the stage 16 and a substrate 2 held on the holding sheet 6 to be exposed through the window 33. The window 33 of the cover 31 allows an area of the substrate 2, the area being located on the inner side with respect to an outer edge area of the substrate 2, to be exposed therefrom..
11/13/14
20140335680
 Multi-layer amorphous silicon structure with improved poly-silicon quality after excimer laser anneal patent thumbnailMulti-layer amorphous silicon structure with improved poly-silicon quality after excimer laser anneal
The embodiments described herein generally relate to methods for forming a multi-layer amorphous silicon structure that may be used in thin film transistor devices. In one embodiment, a method includes positioning a substrate comprising a buffer layer in a process chamber, the process chamber comprising a processing region, forming a plurality of amorphous silicon layers and annealing the amorphous silicon layers to form a polycrystalline silicon layer.
11/13/14
20140335675
 Regulating interface layer growth with n2o for two-terminal memory patent thumbnailRegulating interface layer growth with n2o for two-terminal memory
Provision of fabrication, construction, and/or assembly of a two-terminal memory device is described herein. The two-terminal memory device can include an active region with a silicon bearing layer, an interface layer, and an active metal layer.
11/13/14
20140335609
Protein expression from multiple nucleic acids
The current invention reports a method for the recombinant production of a secreted heterologous immunoglobulin in a cho cell comprising the following steps: i) providing a cho cell, which is adapted to growth in suspension culture, adapted to growth in serum-free medium, mycoplasma free, and virus free, ii) providing a vector comprising a prokaryotic origin of replication, a first nucleic acid conferring resistance to a prokaryotic selection agent, a second nucleic acid encoding the heavy chain of said heterologous immunoglobulin, a third nucleic acid encoding the light chain of said heterologous immunoglobulin, a fourth nucleic acid conferring resistance to a eukaryotic selection agent, iii) transfecting said cho cell, wherein said transfecting comprises a) transfecting said cho cell with said vector comprising a fourth nucleic acid conferring resistance to a first eukaryotic selection agent, b) selecting a cho cell by growth in cultivation medium containing said first eukaryotic selection agent, c) transfecting said selected cho cell with said vector comprising a fourth nucleic acid conferring resistance to a second eukaryotic selection agent different to said first eukaryotic selection agent, d) selecting a cho cell by selected growth in cultivation medium containing said first and said second eukaryotic selection agent, iv) cultivating said transfected cho cell in a medium in the presence of said first and second eukaryotic selection agent, under conditions suitable for the expression of said second, and third nucleic acid, and v) recovering said secreted heterologous immunoglobulin from the cultivation medium.. .
11/13/14
20140335547
Marker panels for idiopathic pulmonary fibrosis diagnosis and evaluation
The present invention relates to the discovery that of a panel of serum or plasma markers may be used to diagnose idiopathic pulmonary fibrosis (“ipf”) and distinguish this condition from other lung ailments. It further relates to the identification of markers associated with ipf disease progression..
11/13/14
20140335288
Plasma processing device and plasma processing method
There is provided a plasma processing apparatus which can improve density uniformity of plasma excited by a high frequency wave as in the vhf frequency band and reduce production costs by downsizing for a substrate having a large size. The plasma processing apparatus includes a waveguide member defining a waveguide, first and second electrodes disposed so as to face a plasma formation space, defining the waveguide in cooperation with the waveguide member, and electrically connected to the waveguide member; a coaxial tube supplying electromagnetic energy into the waveguide; a dielectric plate disposed in the waveguide and extending in a longitudinal direction; and first and second conductors disposed, in the waveguide, on at least one side of the waveguide in a width direction with respect to the dielectric plate, extending along the dielectric plate, and electrically connected to the first and second electrodes..
11/13/14
20140335285
System of surface treatment and the method thereof
The present disclosure is directed to a system for a surface treatment via plasma generated by a slim and/or flexible electrode and the method thereof. By using the plasma, the surface treatment for an outer wall or an inner wall of a tube can be performed..
11/13/14
20140335282
Method for coating a substrate
A method of coating a substrate is proposed, in which a starting material in the form of a process beam is sprayed onto a surface of the substrate by means of thermal spraying, wherein the surface of the substrate is initially pretreated with a plasma flame of a plasma spray device without material deposition and the process beam including the starting material is subsequently applied onto the surface.. .
11/13/14
20140335281
Film-forming treatment jig, plasma cvd apparatus, metal plate and osmium film forming method
In a film-forming treatment jig for forming a thin film on a plate having a through hole of a micro diameter by a single plasma film-forming treatment, the film-forming treatment jig includes: a holding member 39 for holding the aperture plate in a state of exposing the through hole and the front and back surfaces of the aperture plate by clamping an aperture plate 107 having a through hole; and an electrode member having the holding member attached thereon, wherein the electrode member is electrically connected to an electrode to which the plasma electric power of a plasma cvd apparatus is applied.. .
11/13/14
20140335275
Modified hybrid sol-gel solutions and compositions formed from such solutions
Provided are modified hybrid sol-gel precursor solutions and coatings formed from such solutions. A modified hybrid sol-gel precursor solution includes an inorganic precursor, cross-linkable inorganic-organic precursor, cross-linkable organic precursor, protic solvent, and aprotic solvent.
11/13/14
20140335023
Plasma kallikrein binding proteins
Plasma kallikrein binding proteins and methods of using such proteins are described.. .
11/13/14
20140334982
Apparatus for treating a gas stream
An apparatus for treating a gas stream includes a plasma abatement device that has a reaction chamber and a plasma torch for generating a plasma stream for injection into the chamber for treating the gas stream. A first inlet conveys a gas stream into the plasma abatement device for treatment, and a second inlet, in a normal condition of the apparatus, is in flow communication with a source of reagent for conveying a reagent into the plasma device for improving the efficiency of the treatment.
11/13/14
20140333915
Radiation source
A radiation source (so) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle (128) configured to direct a stream of fuel droplets along a trajectory (140) towards a plasma formation location (212).
11/13/14
20140333485
Plasma aviation antenna
An aircraft communications system may include a rf-transparent enclosure, a plasma antenna element and a controller. The rf-transparent enclosure may be disposed substantially conformal with a portion of the aircraft.
11/13/14
20140333203
Red emitting phosphor for plasma display panels and gas discharge lamps
The invention provides a lighting unit (100) comprising (1) a vacuum ultraviolet (vuv) radiation based source of radiation (10) configured to generate vuv radiation (11), and (2) a luminescent material (20) configured to convert at least part of the vuv radiation into visible luminescent material light (21), wherein the luminescent material comprises a trivalent praseodymium containing material selected from the group consisting of (zr1-x-yhfxpry)(si1-ypy)04, (zr1-x-yhfxpry)3((p1-3/4ys3/4y)04)4, and (zr1-x-yhxpry)3((b1-3/4yx3/4y))o3)4, with x in the range of 0.0-1.0 and y being larger than 0 and being equal to or smaller than 0.15.. .
11/13/14
20140332964
Interconnect structures containing nitrided metallic residues
A metal cap is formed on an exposed upper surface of a conductive structure that is embedded within an interconnect dielectric material. During the formation of the metal cap, metallic residues simultaneously form on an exposed upper surface of the interconnect dielectric material.
11/13/14
20140332962
Device and method for reducing contact resistance of a metal
A structure for an integrated circuit with reduced contact resistance is disclosed. The structure includes a substrate, a cap layer deposited on the substrate, a dielectric layer deposited on the cap layer, and a trench embedded in the dielectric layer.
11/13/14
20140332960
Interconnect structures containing nitrided metallic residues
A metal cap is formed on an exposed upper surface of a conductive structure that is embedded within an interconnect dielectric material. During the formation of the metal cap, metallic residues simultaneously form on an exposed upper surface of the interconnect dielectric material.
11/13/14
20140332932
Shallow trench and fabrication method
Various embodiments provide shallow trenches and fabrication methods. In an exemplary method, a semiconductor substrate can be provided.
11/13/14
20140332875
Vertical memory devices and method of manufacturing the same
A method of manufacturing a vertical memory device is disclosed. In the method, a plurality of insulation layers and a plurality of first sacrificial layers are alternately stacked on a substrate.
11/13/14
20140332760
Organic semiconductor transistor with epoxy-based organic resin planarization layer
A method is provided for forming an epoxy-based planarization layer overlying an organic semiconductor (osc) film. Generally, the method forms a fluoropolymer passivation layer overlying the osc layer.
11/13/14
20140332697
Method of detecting thalassemia by optical analysis of blood components
The method of detecting thalassemia by optical analysis of blood components is a spectral detection method that is based on the fluorescence spectra of a set of biomolecules, including tyrosine, tryptophan, nicotinamide adenine dinucleotide, and flavin adenine dinucleotide, which are all found in blood plasma, and porphyrin, which is found in red blood cells (rbcs). Measured ratios of intensity maxima between tryptophan and nicotinamide adenine dinucleotide, flavin adenine dinucleotide and nicotinamide adenine dinucleotide, tyrosine and tryptophan, and the normal form of porphyrin and the basic form of porphyrin may each be used, alone or in combination, to diagnose a patient as suffering from thalassemia..
11/13/14
20140332605
Plasma processing equipment and gas distribution apparatus thereof
A gas distribution apparatus for a plasma processing equipment is provided. The gas distribution apparatus includes a support plate (3) and a showerhead electrode (5) that are secured together parallelly to define a chamber for gas distribution.
11/13/14
20140332583
Wire bonding apparatus
Provided is a wire bonding apparatus including: a base (11); a bonding head (13) configured to move a capillary (15) in x, y, and z directions with respect to the base (11); and a wire-cleaning plasma unit (30). The wire-cleaning plasma unit (30) includes: hollow casings (31a), (31b) in which an inert gas is introduced so that an internal pressure is higher than an atmospheric pressure; holes (33a), (33b) respectively provided in the casings (31a), (31b) so that the wire (21) is inserted therebetween; and electrodes for plasma respectively disposed within the casings (31a), (31b) around circumferences of the holes (33a), (33b).
11/13/14
20140332506
Capacitively coupled devices and oscillators
Certain embodiments described herein are directed to devices that can be used to sustain a capacitively coupled plasma. In some examples, a capacitive device can be used to sustain a capacitively coupled plasma in a torch in the absence of any substantial inductive coupling.
11/13/14
20140332505
Method of manufacturing track shoe
A method of manufacturing an undercarriage track shoe is provided. The method includes positioning a track shoe longbar at a workstation.
11/13/14
20140332497
Plasma processing apparatus and plasma processing method
The plasma processing apparatus is provided with a plasma source 13 which generates plasma inside a chamber 11, a stage 16 which is provided inside the chamber 11 and places a carrier 5 thereon, a cover 31 which is arranged above the stage 16 to cover a holding sheet 6 and a frame 7 and has a window 33 which is formed to penetrate the cover 31 in the thickness direction, and a drive mechanism 38 which changes the position of the cover 31 relative to the stage 16 between a first position and a second position. The second position does not allow the cover 31 to make contact with the holding sheet 6, the frame 7 and a substrate 2.
11/13/14
20140332437
Food container having improved oxygen barrier properties and manufacturing methed thereof
There are provided a food container having improved oxygen barrier properties and a manufacturing method thereof. The food container includes a container made of a plastic material, a buffer thin layer formed on a surface of the container and having a thickness of 5 to 30 nm, and an oxygen barrier thin layer formed on the buffer thin layer.
11/13/14
20140332410
Analytical micro-devices for mental health treatment monitoring
A lab on a chip device includes a whole blood inlet port and microchannels to transport a whole blood sample or plasma skimmed from the whole blood sample into a detection chamber that includes at least one 3-electrode set of a counter electrode, a working electrode and a reference electrode. The counter electrode, the working electrode and the reference electrode may present bare, unmodified surfaces that are disposed so that clozapine present in the whole blood sample is detected via a reduction-oxidation reaction.
11/13/14
20140332406
Purification methods and systems for contaminated liquids and mineral slurries
The present disclosure describes methods and systems comprising hydrodynamic cavitation, microwave irradiation, and at least one of oxidative sonoelectrolysis and reductive sonoelectrolysis, providing feedstock purification of at least one of water, fluid and mineral. Contaminants, broken down and chemically degraded into smaller and more volatile substances by hydrodynamic cavitation are ultimately destroyed in the course of one or more sonoelectrolysis steps.
11/13/14
20140332375
Assembly for feeding in hf current for tubular cathodes
An arrangement is provided for feeding in hf current for rotatable tubular cathodes in a vacuum chamber of a plasma coating system as well as a high frequency current source. Located inside the tubular cathode is a magnet arrangement that extends along said tubular cathode for generating a magnetic field.
11/13/14
20140332372
Plasma etching method
An isotropic etching process can be performed with high uniformity. A plasma etching method of etching an etching target layer containing silicon includes preparing a processing target object having the etching target layer in a processing chamber; removing an oxide film on a surface of the etching target layer by generating plasma of a first processing gas that contains a fluorocarbon gas or a fluorohydrocarbon gas but does not contain oxygen; removing a carbon-based reaction product generated when the removing of the oxide film by generating plasma of a second processing gas that does not contain oxygen; and etching the etching target layer without applying a high frequency bias power to a lower electrode serving as a mounting table configured to mount the processing target object thereon by generating plasma of a third processing gas containing a fluorocarbon gas or a fluorohydrocarbon gas with a microwave..
11/13/14
20140332369
Multidirectional racetrack rotary cathode for pvd array applications
A cathode assembly for a sputter deposition apparatus and a method for coating a substrate is provided. The cathode assembly has a coating side for coating on a substrate.
11/13/14
20140332177
Closed loop cooling of a plasma gun to improve hardware life
Water cooling system (1) for a plasma gun (2), method for cooling a plasma gun (2) and method for increasing a service life of a plasma gun (2). The system (1) includes a water cooler structured and arranged to remove heat from cooling water to be supplied to the plasma gun (2), a controller (7) structured and arranged to monitor a gun voltage of the plasma gun (2), and at least one flow valve (8) coupled to and under control of the controller (7) to adjust a flow of the cooling water.
11/13/14
20140331861
Mass spectrometer vacuum interface method and apparatus
A method of preparing or operating a mass spectrometer vacuum interface comprising a skimmer apparatus having a skimmer aperture and an internal surface of the skimmer apparatus, comprising disposing an adsorbent or getter material on the internal surface. The internal surface has a deposition region where matter from plasma flows may be deposited and the material is disposed on part or all of the deposition region.
11/06/14
20140329964
Enhanced thermoset resins containing pre-treated natural origin cellolosic fillers
A process of formulating a curable thermoset resin formulation is provided that includes reacting a natural cellulosic filler with at least one of: a silsesquioxane, a isocyanate, a base, or an organic acid to form a reduced hydrophilicity filler. By intermixing the resulting reduced hydrophilicity filler with a thermoset cross linkable polymeric resin, a curable thermoset resin formulation is formed that has superior properties to conventional formulations in terms of density and environmental impact.
11/06/14
20140329691
Noninvasive diagnosis of fetal aneuploidy by sequencing
Disclosed is a method to achieve digital quantification of dna (i.e., counting differences between identical sequences) using direct shotgun sequencing followed by mapping to the chromosome of origin and enumeration of fragments per chromosome. The preferred method uses massively parallel sequencing, which can produce tens of millions of short sequence tags in a single run and enabling a sampling that can be statistically evaluated.
11/06/14
20140329391
Continuous plasma etch process
A method for etching features with a continuous plasma is provided. A first plasma process is provided, comprising providing a flow of a first process gas into a process chamber, maintaining the continuous plasma, and stopping the flow of the first process gas into the process chamber.
11/06/14
20140329390
Plasma treatment method and plasma treatment device
A plasma treatment device includes a dielectric window containing sio2. The insulating film to be etched comprises silicon carbonitride.
11/06/14
20140329353
Manufacturing method of semiconductor device, semiconductor device and electronic apparatus
A manufacturing method of a semiconductor device includes exposing a wiring layer which is formed of an alloy including two or more types of metals having different standard electrode potentials, on one surface side of a semiconductor substrate and performing a plasma process of allowing plasma generated by a mixture gas of a gas including nitrogen and an inert gas or plasma generated by a gas including nitrogen to irradiate a range which includes an exposed surface of the wiring layer.. .
11/06/14
20140329345
Manufacturing method of organic light emitting diode display
A manufacturing method of an organic light emitting diode (oled) display includes manufacturing a mother substrate including a plurality of panels formed with a plurality of anodes for each pixel and a test pad connected to each anode of the panel. The method further includes loading the mother substrate into a plasma chamber and applying a plasma voltage to the test pad of the mother substrate to perform a plasma surface treatment process.
11/06/14
20140329322
Method of differentiating glioblastoma cells
A method of increasing differentiation of a cell line of glioblastoma cells is disclosed. A platelet-rich plasma (prp) composition is prepared.
11/06/14
20140329305
Devices, methods, and systems for nucleic acid amplification
A microfluidic device comprising a first surface portion and a first sample retaining element, which have differing affinities to a fluid, and a method comprising supplying a sample to such a device. In some embodiments, the differing affinity is a result of plasma, ion embedding, surface charging, chemical, optical, electronic and/or electromagnetic treatment.
11/06/14
20140329272
Metal-based covalent viability reagent for single cell analysis
The present invention provides a robust viability stain for methods utilizing elemental analysis. A population of cells is contacted with an effective dose of a non-chelated biomacromolecule-reactive metal derivative, which selectively crosses the plasma membrane of non-viable cells, and which covalently modifies a biological macromolecule within the cell, for a period of time sufficient to permit entry into non-viable cells.
11/06/14
20140329268
Arrangement for detection of hemolysis
The following invention relates to a device for visual detection of hemolysis in a whole blood sample from a pierceable container, said device comprising at least one visible detection compartment and a transfer passage connected to said visible detection compartment, said device further comprising means for passing through the container to the interior of said container for accessing the whole blood and permitting transfer of a volume of plasma from said sample to said detection compartment via said transfer passage, wherein said device further is arranged with a separation device for separating plasma from blood cells within said whole blood sample before said plasma reaches the detection compartment, said device further being arranged with means providing a capillary action for generating a capillary force urging said volume of plasma to be transferred through the separation device to said detection compartment.. .
11/06/14
20140329179
Methods of forming semiconductor device structures, and related semiconductor device structures
A method of forming a semiconductor device structure comprises forming a template material over a substrate, the template material exhibiting preferential wetting to a polymer block of a block copolymer. A positive tone photoresist material is formed over the template material.
11/06/14
20140329095
Method and apparatus for producing a reflection-reducing layer on a substrate
The invention relates to an apparatus (1) for producing a reflection-reducing layer on a surface (21) of a plastics substrate (20). The apparatus comprises a first sputtering device (3) for applying a base layer (22) to the surface (21) of the plastics substrate (20), a plasma source (4) for plasma-etching the coated substrate surface (21), and a second sputtering device (5) for applying a protective layer (24) to the substrate surface (21).
11/06/14
20140329072
Optical product and method for manufacturing same
An optical product according to the present invention includes a transparent base material, and a multilayer film including a dielectric film and an ito film. The multilayer film is formed on one face or two faces of the transparent base material.
11/06/14
20140329061
Durable hydrophilic dry adhesives with hierarchical structure and method of making
Provided is a method of making durable hydrophilic and hierarchical structures containing nano and micro features used as dry adhesives. The method includes introduction of hydrophilic, nanostructured features on the micro-scale tips of fibrillar arrays through uv/ozone (uvo) and oxygen plasma treatment; the method also includes further coating of the hierarchical structure with a polyelectrolyte via electrostatically-driven self-assembly to improve the hydrophilic stability of the treated fibril tip surfaces..
11/06/14
20140329030
Plasma generation for thin film deposition on flexible substrates
A system for depositing a thin film on a flexible substrate comprises a plurality of processing zones spaced apart by an isolation zone, a plasma generator for generating a plasma region proximal to a pathway along which the substrate travels, and a substrate transport mechanism for guiding the substrate back and forth between the processing zones so that the substrate is transported past and exposed to the plasma region when the system is in use.. .
11/06/14
20140329021
Method and apparatus for depositing stable crystalline phase coatings of high temperature ceramics
Producing high temperature coatings on ceramics using a high enthalpy air plasma spray torch and supplying in at least 3 passes to deposit the coating is advantageous for spraying high temperature ceramics while avoiding formation of undesirable phases, if the stand off distance is chosen such that a width of a bead produced from a single spray pass on the substrate at ˜800° c. Is less than 70% of a diameter of a plume of the torch at the stand off, and neither assisted heating, nor forced cooling, nor subsequent heat treatment is used.
11/06/14
20140328869
Methods for improving the design, bioavailability, and efficacy of random sequence polymer compositions via serum protein-based detection of random sequence polymer compositions
There exist in the art methods of detecting simple peptides. However, methods to determine the effective plasma concentration of mixtures of peptides as a group, rather than for individual peptides with a defined amino acid sequence, are complicated by the heterogeneity of the peptides to be detected.
11/06/14
20140328728
Plasma generation device
There is provided a plasma generation device capable of suppressing arc discharge in which discharge is localized to cause a high temperature, and allowing atmospheric discharge plasma to be stably generated with a high generation efficiency in a low temperature at about a room temperature without being spatially biased. The plasma generation device arranged with a plurality of electrodes facing each other includes a discharge position control unit, which is arranged between each of the plurality of electrodes, and is formed by containing an inverse characteristic material composed of a fluid having polarizability and a property that dielectric constant decreases with an increase in temperature, in a container formed of a dielectric material, wherein the inverse characteristic material is spaced apart from each of the plurality of electrodes..
11/06/14
20140328725
Steam plasma arc hydrolysis of ozone depleting substances
A two step process for the destruction of a precursor material using a steam plasma in a three zone reactor wherein the precursor material is hydrolyzed as a first step in the high temperature zone of the reactor, followed by a second step of medium temperature oxidation of the reactant stream in the combustion zone of the reactor where combustion oxygen or air is injected and immediate quenching of the resulting gas stream to avoid the formation of unwanted by-products. A related apparatus includes a non transferred direct current steam plasma torch, an externally cooled three zone steam plasma reactor means for introducing the precursor material into the plasma plume of the plasma torch, means for introducing the combustion air or oxygen into the combustion zone, means for exiting the reactant mixture from the reactor and means for quenching the reactant mixture located at the exit end of the reactor..


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