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Plasma

Plasma-related patent applications - as published by the U.S. Patent and Trademark Office (USPTO).


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Systems and methods for capturing generated electron spiral toroids
Electron Power Systems, Inc.
April 19, 2018 - N°20180110117

A spheromak is a plasma of ions and electrons formed into a toroidal shape. A spheromak plasma can include electrons and ions of nearly equal amounts such that it is essentially charge neutral. It contains large internal electrical currents and their associated internal magnetic fields arranged so that the forces within the spheromak are nearly balanced. The spheromak described herein ...
Hemts with an alxga1-xn barrier layer grown by plasma enhanced atomic layer deposition
National Taiwan University
April 19, 2018 - N°20180108753

In a method of manufacturing a high-electron mobility transistor (hemt), a first group iii-v semiconductor layer is formed on a substrate. The first group iii-v semiconductor layer is patterned to form a fin and a recessed surface. A second group iii-v semiconductor layer is formed to cover a top surface and all side surfaces of the fin and the recessed ...
Liner planarization-free process flow for fabricating metallic interconnect structures
International Business Machines Corporation
April 19, 2018 - N°20180108610

A method includes forming a dielectric layer on a substrate and patterning the dielectric layer to form an opening in the dielectric layer. A first layer of metallic material (e. G., non-nitride metal) is deposited to form a liner layer on an upper surface of the dielectric layer and on exposed surfaces within the opening. A second layer of metallic ...
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Systems and methods for workpiece processing
Mattson Technology, Inc.
April 19, 2018 - N°20180108548

Systems and methods for processing workpieces, such as semiconductor workpieces are provided. One example embodiment is directed to a processing system for processing a plurality of workpieces. The plasma processing system can include a loadlock chamber. The loadlock chamber can include a workpiece column configured to support a plurality of workpieces in a stacked arrangement. The system can further include ...
Method of forming titanium oxide film and method of forming hard mask
Tokyo Electron Limited
April 19, 2018 - N°20180108534

A method for forming a titanium oxide film on a substrate to be processed, which has a silicon portion on a surface thereof, the method including: forming a first titanium oxide film on the surface of the substrate to be processed, which includes the silicon portion, by means of thermal ald by alternately supplying a titanium-containing gas and a gas ...
Silicon oxide silicon nitride stack ion-assisted etch
Lam Research Corporation
April 19, 2018 - N°20180108532

A method for ion-assisted etching a stack of alternating silicon oxide and silicon nitride layers in an etch chamber is provided. An etch gas comprising a fluorine component, helium, and a fluorohydrocarbon or hydrocarbon is flowed into the etch chamber. The gas is formed into an in-situ plasma in the etch chamber. A bias of about 10 to about 100 volts is ...
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Film forming apparatus, cleaning method for film forming apparatus and recording medium
Tokyo Electron Limited
April 19, 2018 - N°20180108518

A film forming apparatus 1 includes a plasma generating mechanism 47 commonly used for plasmarizing a processing gas and a cleaning gas supplied into a processing vessel 11 in which a vacuum atmosphere is formed; an exhaust device 17 configured to evacuate an exhaust line 61 connected to a processing gas discharge unit 43 while the plasmarization of the cleaning gas is being performed by the ...
Coating architecture for plasma sprayed chamber components
Applied Materials, Inc.
April 19, 2018 - N°20180108517

A method of plasma spraying an article comprises inserting the article into a vacuum chamber for a low pressure plasma spraying system. A low pressure plasma spray process is then performed by the low pressure plasma spraying system to form a first plasma resistant layer having a thickness of 20-500 microns and a porosity of over 1%. A plasma spray thin ...
Plasma process apparatus
Tokyo Electron Limited
April 19, 2018 - N°20180108515

A plasma process apparatus that utilizes plasma so as to perform a predetermined process on a substrate, and includes a process chamber that houses a substrate subjected to the predetermined plasma process; a microwave generator; a dielectric window attached to the process chamber and provided with a concave portion provided at an outer surface of the dielectric window opposite to ...
Method of depositing niobium doped titania film on a substrate and the coated substrate made ...
Vitro S.a.b. De C.v.
April 19, 2018 - N°20180108457

A coated article includes an applied transparent electrically conductive oxide film of niobium doped titanium oxide. The article can be made by using a coating mixture having a niobium precursor and a titanium precursor. The coating mixture is directed toward a heated substrate to decompose the coating mixture and to deposit a transparent electrically conductive niobium doped titanium oxide film ...
Defect review sampling and normalization based on defect and design attributes
Kla-tencor Corporation
April 19, 2018 - N°20180107903

A decision tree and normalized reclassification are used to classify defects. Defect review sampling and normalization can be used for accurate pareto ranking and defect source analysis. A defect review system, such as a broadband plasma tool, and a controller can be used to bin defects using the decision tree based on defect attributes and design attributes. Class codes are ...
Biological fluids concentration assembly
Alliance Partners Llc
April 19, 2018 - N°20180106706

A biological fluids concentration device, including a tube-in-tube assembly, is disclosed. The tube-in-tube assembly receives biologic fluids and may then be placed in the bucket of a centrifuge and spun to separate out the components of the biological fluid by their various densities. For example, whole blood may be centrifuged in the tube-in-tube assembly for separating into plasma, red blood ...
Edge seal for lower electrode assembly
Lam Research Corporation
April 19, 2018 - N°20180106371

An edge seal for sealing an outer surface of a lower electrode assembly configured to support a semiconductor substrate in a plasma processing chamber, the lower electrode assembly including an annular groove defined between a lower member and an upper member of the lower electrode assembly. The edge seal includes an elastomeric band configured to be arranged within the groove, ...
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Ion beam sputtering with ion assisted deposition for coatings on chamber components
Applied Materials, Inc.
April 19, 2018 - N°20180105922

An article comprises a body and a conformal protective layer on at least one surface of the body. The conformal protective layer is a plasma resistant rare earth oxide film having a thickness of less than 1000 μm, wherein the plasma resistant rare earth oxide film consists essentially of 40 mol % to less than 100 mol % of y2o3, over 0 mol % ...
Non-invasive determination of methylome of fetus or tumor from plasma
The Chinese University Of Hong Kong
April 19, 2018 - N°20180105884

Systems, methods, and apparatuses can determine and use methylation profiles of various tissues and samples. Examples are provided. A methylation profile can be deduced for fetal/tumor tissue based on a comparison of plasma methylation (or other sample with cell-free dna) to a methylation profile of the mother/patient. A methylation profile can be determined for fetal/tumor tissue using ...
Gestational age assessment by methylation and size profiling of maternal plasma dna
The Chinese University Of Hong Kong
April 19, 2018 - N°20180105807

Temporal variations in one or more characteristics measured from a cell-free dna sample are used to estimate a gestational age of a fetus. Example characteristics include the methylation level measured from the cell-free dna sample, size of dna fragments measured from the cell-free dna sample (e. G., proportion of fetal-derived dna fragments longer than a specified size), and ending patterns ...
Chemical conversion of yttria into yttrium fluoride and yttrium oxyfluoride to develop pre-seasoned corossion resistive ...
Applied Materials, Inc.
April 19, 2018 - N°20180105701

Embodiments of the disclosure provide a chamber component for use in a plasma processing chamber apparatus. The chamber component may include a coating layer that provides a fluorine-rich surface. In one embodiment, a chamber component, for use in a plasma processing apparatus, includes a body having an outer layer comprising yttria having a coating layer formed thereon, wherein the coating ...
Antibodies that potently neutralize rabies virus and other lyssaviruses and uses thereof
Institut Pasteur
April 19, 2018 - N°20180105579

The invention relates to antibodies, and antigen binding fragments thereof that potently neutralize infection of both rabv and non-rabv lyssaviruses. The invention also relates to antigenic sites to which the antibodies and antigen binding fragments bind, as well as to nucleic acids that encode and immortalized b cells and cultured plasma cells that produce such antibodies and antibody fragments. In ...
Albumin variants
Albumedix A/s
April 19, 2018 - N°20180105578

The present invention relates to variants of a parent albumin having altered plasma half-life compared with the parent albumin. The present invention also relates to fusion polypeptides and conjugates comprising said variant albumin.
Albumin variants
Albumedix A/s
April 19, 2018 - N°20180105577

The present invention relates to variants of a parent albumin having altered plasma half-life compared with the parent albumin. The present invention also relates to fusion polypeptides and conjugates comprising said variant albumin.
Albumin variants
Albumedix A/s
April 19, 2018 - N°20180105576

The present invention relates to variants of a parent albumin having altered plasma half-life compared with the parent albumin. The present invention also relates to fusion polypeptides and conjugates comprising said variant albumin.
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