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Plasma patents

      

This page is updated frequently with new Plasma-related patent applications.




new patent Multi-component electrode for a plasma cutting torch and torch including the same
Embodiments of the present invention are directed to a plasma arc cutting torch and an electrode assembly used in the torch. The electrode assembly includes a high thermionic emissive insert and a high thermally conductive wrap which covers at least a portion of the insert.
Lincoln Global, Inc.


new patent Oscillator generators and methods of using them
Certain embodiments described herein are directed to generators that can be used to sustain a plasma. In some embodiments, the generator comprises an oscillation circuit configured to electrically couple to an induction device and provide power to the induction device in an oscillation mode to sustain the inductively coupled plasma in a torch body, the circuit configured to provide harmonic emission control during sustaining of the inductively coupled plasma in the torch body in the oscillation mode of the generator..
Perkinelmer Health Sciences, Inc.


new patent Cooling plasma torch nozzles and related systems and methods
In some aspects, nozzles for a plasma arc torch can include a first body having a first end, a second end, and a longitudinal axis; and a second body disposed about a portion of the first body to complement the first body, the second body defining a set of channels formed on an internal surface shaped to form a set of liquid flow passages between the first body and the second body, the second body at least partially defining at least one inlet and at least one outlet to the set of liquid flow passages.. .
Hypertherm, Inc.


new patent Selective plating of copper on transparent conductive oxide, solar cell structure and manufacturing method
A solar cell includes a silicon substrate having a transparent conductive oxide (tco) film formed on a surface thereof, a dielectric mask having openings formed on a surface of the tco film, a seed layer formed in the openings of the dielectric mask, and a copper plating later formed on the seed layer. In a method of forming a solar cell, a tco film is applied to a surface of a silicon substrate, a dielectric mask is formed on a surface of the tco film, a metal seed layer is applied to openings in the dielectric mask by in-situ hydrogen plasma treatment, and copper metal is plated onto the metal seed layer via light induced plating or field induced plating to form a copper electrode.

new patent Driver circuit and semiconductor device
The silicon nitride layer 910 formed by plasma cvd using a gas containing a hydrogen compound such as silane (sih4) and ammonia (nh3) is provided on and in direct contact with the oxide semiconductor layer 905 used for the resistor 354, and the silicon nitride layer 910 is provided over the oxide semiconductor layer 906 used for the thin film transistor 355 with the silicon oxide layer 909 serving as a barrier layer interposed therebetween. Therefore, a higher concentration of hydrogen is introduced into the oxide semiconductor layer 905 than into the oxide semiconductor layer 906.
Semiconductor Energy Laboratory Co., Ltd.


new patent Mechanisms for forming semiconductor device structure with feature opening
A method for forming a semiconductor device structure is provided. The method includes forming a material layer over a semiconductor substrate and forming a hard mask layer over the material layer.
Taiwan Semiconductor Manufacturing Co., Ltd


new patent Method of using a barrier-seed tool for forming fine pitched metal interconnects
A barrier seed tool is configured to clean trenches in a first chamber, line the trenches with a diffusion barrier layer, and form a copper seed layer over the diffusion barrier layer in a second chamber. The clean chamber is configured to reduce overhangs in the copper seed layer by producing a plasma comprising positively and negatively charged ions including halogen ions, filtering the plasma to selectively exclude positively charged ions, and bombarding with the filtered plasma.
Taiwan Semiconductor Manufacturing Co., Ltd.


new patent Hybrid 200 mm/300 mm semiconductor processing apparatuses
In one aspect, several apparatuses are described that allow a processing chamber designed for plasma-enhanced chemical vapor deposition on 300 mm wafers to be performed on 200 mm wafers. More specifically, a modified pedestal, carrier plate, and showerhead are described that have been designed for 200 mm wafers and are compatible with 300 mm wafer processing chambers.
Lam Research Corporation


new patent Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films
The present disclosure generally relates to processing chamber seasoning layers having a graded composition. In one example, the seasoning layer is a boron-carbon-nitride (bcn) film.
Applied Materials, Inc.


new patent Plasma processing apparatus and method, and manufacturing electronic device
In an inductively coupled plasma torch unit, two coils, a first ceramic block, and a second ceramic block are arranged, and an annular chamber is provided. Plasma generated in the chamber is ejected toward a substrate through an opening in the chamber.
Panasonic Intellectual Property Management Co., Ltd.


new patent

Plasma-enhanced etching in an augmented plasma processing system

Methods for etching a substrate in a plasma processing chamber having at least a primary plasma generating region and a secondary plasma generating region separated from said primary plasma generating region by a semi-barrier structure. The method includes generating a primary plasma from a primary feed gas in the primary plasma generating region.
Lam Research Corporation

new patent

Method and device for texturing a silicon surface

A method for texturing at least one substrate surface of at least one crystalline silicon substrate includes etching the substrate surface with fluorine gas in a plasma generated in a plasma etching room. A device for texturing at least one substrate surface of at least one crystalline silicon substrate includes a plasma etching room, a gas inlet device coupled with a fluorine source and at least one plasma source.
Meyer Burger (germany) Ag

new patent

Atomic layer etching of gan and other iii-v materials

Provided herein are ale methods of removing iii-v materials such as gallium nitride (gan) and related apparatus. In some embodiments, the methods involve exposing the iii-v material to a chlorine-containing plasma without biasing the substrate to form a modified iii-v surface layer; and applying a bias voltage to the substrate while exposing the modified iii-v surface layer to a plasma to thereby remove the modified iii-v surface layer.
Lam Research Corporation

new patent

Process chamber

Embodiments described herein generally relate to a method and apparatus for plasma treating a process chamber. A substrate having a gate stack formed thereon may be placed in a process chamber, and hydrogen containing plasma may be used to treat the gate stack in order to cure the defects in the gate stack.
Applied Materials, Inc.

new patent

System and plasma treatment using directional dielectric barrier discharge energy system

A system including a directional dielectric barrier discharge (dbd) energy system, including a first electrode assembly configured to generate energy, including a first housing having a first fluid disposed in a first chamber, a first magnet, wherein the first magnet is configured to help guide or contain the energy generated by the first electrode assembly, and a first dielectric barrier.. .
Plasmology4, Inc.

new patent

Laser induced plasma micromachining (lipmm)

A system for laser-induced plasma micromachining of a work-piece includes a dielectric fluid, a dielectric fluid supply device, a laser, a processor, and a memory. The dielectric fluid supply device is arranged to hold a work-piece in the dielectric fluid or to direct the dielectric fluid onto the work-piece.
Northwestern University

new patent

Plasma processing apparatus

Disclosed is a plasma processing apparatus that includes a processing container configured to accommodate a wafer, and a dielectric window provided to hermetically seal an opening formed in a top portion of the processing container, and configured to transmit microwaves into the processing container. The dielectric window has a thickness of 3λ/8 or less (here, λ is a wavelength of the microwaves) at least at a predetermined position where a microwave power is concentrated, and a protrusion is formed at the predetermined position on a bottom surface of the dielectric window to protrude downward from the bottom surface..
Tokyo Electron Limited

new patent

Microwave plasma source and plasma processing apparatus

A microwave plasma source for forming a surface wave plasma by radiating a microwave into a chamber of a plasma processing apparatus, includes: a microwave output part; a microwave transmission part configured to transmit microwave outputted from the microwave output part; and a microwave radiation member configured to radiate the microwave into the chamber, wherein the microwave transmission part includes a microwave introduction mechanism configured to introduce the microwave into the microwave radiation member. The microwave radiation member includes: a metal main body; a dielectric slow-wave member installed in a portion of the main body; a plurality of slots configured to radiate the microwave introduced through the dielectric slow-wave member therethrough; and a dielectric microwave transmission member installed in a portion facing the chamber in the main body to cover a region where the slots are formed; and a plurality of dielectric layers installed to be separated from each other..
Tokyo Electron Limited

new patent

Plasma processing apparatus

Disclosed is a plasma processing apparatus including: a processing container that includes a bottom portion and a sidewall and defines a processing space; a microwave generator that generates microwaves; and a dielectric window attached to the sidewall of the processing container. The dielectric window is supported by a support surface formed in an upper end portion of the sidewall or a support surface formed in a conductor member disposed in the upper end portion of the sidewall, and includes a non-facing portion that does not face the processing space.
Tokyo Electron Limited

new patent

Large dynamic range rf voltage sensor and voltage mode rf bias application of plasma processing systems

A voltage sensor of a substrate processing system including a multi-divider circuit, a clamping circuit and first and second outputs. The multi-divider circuit receives a rf signal indicative of a rf voltage at a substrate.
Lam Research Corporation

new patent

Systems, methods and choked flow element extraction

A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber, multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites and multiple plasma chamber outlets coupling the plasma chamber to a process chamber. Each one of the plasma chamber outlets having a respective plasma restriction.
Lam Research Corporation

new patent

Plasma processing apparatus and method

An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first rf power supply configured to apply a first rf power having a relatively higher frequency is connected to the upper electrode.
Tokyo Electron Limited

new patent

Plasma generation device

A plasma generation device includes: a pair of electrodes that cause plasma to be generated in atmospheric pressure by a voltage being applied between the pair of electrodes; and a power source that includes a step-up transformer that has a coupling coefficient of 0.9 or greater and 0.9999 or less and generates the voltage.. .
Panasonic Intellectual Property Management Co., Ltd.

new patent

Arc discharge apparatus and plasma processing system including the same

An arc discharge apparatus includes a body unit including a housing and a transmissive member fixed to the housing, the housing having a coolant inlet and a coolant outlet, and an electrode unit on the housing, the electrode unit including an anode and a cathode facing each other, wherein the anode includes a main body portion connected to the housing, an anode tip coupled to the main body portion, and a cooling line in the anode and in contact with an inner wall of the anode tip, the cooling line being connected to the coolant inlet and to the coolant outlet.. .

new patent

Plasma etching device with plasma etch resistant coating

An apparatus for processing a substrate is provided. A chamber wall forms a processing chamber cavity.
Lam Research Corporation

new patent

Plasma processing apparatus and coil used therein

A plasma etching apparatus includes a chamber having a processing space and a plasma generating space 4 defined therein and a coil 20 wound around the processing chamber, the coil 20 has at least three inward projecting portions 21 formed thereon which project inward in a radial direction with respect to a pitch circle p defined outside a portion of the processing chamber 2 corresponding to the plasma generating space 4, and the at least three inward projecting portions 21 are arranged at equal intervals along a circumferential direction of the pitch circle p.. .
Spp Technologies Co., Ltd.

new patent

Sic matrix fuel cladding tube with spark plasma sintered end plugs

A method of providing an end-capped tubular ceramic composite for containing nuclear fuel (34) in a nuclear reactor involves the steps of providing a tubular ceramic composite (40), providing at least one end plug (14, 46, 48), applying (42) the at least one end plug material to the ends of the tubular ceramic composite, applying electrodes to the end plug and tubular ceramic composite and applying current in a plasma sintering means (10, 50) to provide a hermetically sealed tube (52). The invention also provides a sealed tube made by this method..
Kabushiki Kaisha Toshiba

new patent

Analysis of amino acids in body fluid by liquid chromotography-mass spectrometry

This disclosure provides methods for quantifying individual amino acids in various bodily fluids obtained from a human patient. Also provided are reference ranges for normal amino acid levels in the various bodily fluids (e.g., blood plasma, urine, cerebrospinal fluid, and saliva) and for various age groups (e.g., neonates, infants, children, and adults)..
Quest Diagnostics Investment Inc.

new patent

Low power cooling and flow inducement

A plasma actuator of the present disclosure comprises a plate electrode; a needle electrode positioned at a height above the plate electrode and a distance away from the plate electrode; and a voltage source connected to the needle electrode. Application of a signal from the voltage source to the needle electrode forms surface corona discharge around a tip of the needle electrode, and air flow driven by the corona discharge from the tip of the needle electrode is induced at a surface of the plate electrode.
University Of Florida Research Foundation, Inc.

new patent

Method and assisting with the combustion of fuel

An apparatus and method for assisting with the combustion of fuel are described. The apparatus includes a swirler assembly and a fuel nozzle.
Fgc Plasma Solutions Llc

new patent

Linear led luminaire for use in harsh and hazardous locations

A linear light fixture is provided which includes a housing body onto which a bezel is attached. Semiconductor leds or other light emitting source that produce light when electrically powered are located behind a lens that is secured to the housing body by the bezel.
Cooper Technologies Company

new patent

Coated fibers, methods of making, and composite materials reinforced with coated fibers

In general, coated fibers, methods of bonding a coating to fibers, and composite materials prepared from coated fibers are provided. The coated fiber is created with a surface that is compatible with and bonds to the polymer resin used in composite materials.
Kettering University

new patent

Atmospheric pressure plasma processing of polymeric materials utilizing close proximity indirect exposure

A plasma treatment method that includes providing treatment chamber including an intermediate heating volume and an interior treatment volume. The interior treatment volume contains an electrode assembly for generating a plasma and the intermediate heating volume heats the interior treatment volume.
Remaxco Technologies

new patent

Method for synthesizing organic matter and submerged plasma device

An organic substance synthesis method according to an embodiment of the present invention is carried out using a submerged plasma device (1000), for example, and the method includes: forming a plasma through discharge in a gas including a carbon dioxide gas in contact with water; and generating an organic substance including performic acid or diformyl peroxide in the water by contact between the plasma and the water.. .
Pm Dimensions Kabushiki Kaisha

new patent

Conditioning gas turbine engine components for increasing fuel efficiency

The present invention relates to a conditioning method of gas turbine engine components (e.g. Compressor blades and vanes) for increasing fuel efficiency.
Envaerospace Inc.

new patent

Workpiece edge detection using plasma arc cutting system

Systems and methods can be provided to use an automated cutting system to identify an edge or multiple edges of a workpiece. An automated cutting system receives trace data for a test path to be traced over a workpiece.
Hypertherm, Inc.

new patent

Reactor with cold turning plasma and stream forcing

A reactor for forming a plasma in a flowing fluid that includes a central rod belonging to a first electrode, an insulator, a tubular body belonging to a second electrode and defining a cylindrical space for the flow of the fluid between the tubular body and the insulator. The reactor further includes control disk having a front face linked to a downstream end of the central rod, and a permanent magnet juxtaposed against a back face of the control disk.
Commissariat A L'energie Atomique Et Aux Energies Alternatives

new patent

Systems and methods of plasma partial dissociation of carbon dioxide, water, and carbonaceous matter

A system for plasma partial dissociation of some materials may include one or more plasma reactors. Such materials may include one or more of carbon dioxide, hydrocarbons, and water.
Powerdyne, Inc.

new patent

Cold plasma treatment devices and associated methods

A cold plasma helmet application device for delivery of cold plasma benefits to the head of a patient. An appropriate gas is introduced into a helmet receptacle within a containment dome of the helmet.
Plasmology4, Inc.

new patent

Multivariable artificial pancreas method and system

Methods and modules for using physiological (biometric) variables to advance the state of the artificial pancreas. The method and system includes one or more modules for recursive model identification, hypoglycemia early alert and alarm, adaptive control, hyperglycemia early alert and alarm, plasma insulin concentration estimation, assessment of physical activity (e.g., presence, type, duration, expected effects on insulin sensitivity and gc), detection of acute stress and assessment of its impact on insulin sensitivity, detection of sleep and its stages and assessment of sleep stages on gc, sensor fault detection and diagnosis, software and controller performance evaluation and adjustment and/or pump fault detection and diagnosis..

new patent

Apparatus for the extracorporeal treatment of blood

An apparatus for the extracorporeal treatment of blood comprising an extracorporeal blood circuit (2), a pump (6) configured to provide fluid displacement within the extracorporeal blood circuit, and a reaction chamber (8) connected to the extracorporeal blood circuit and configured to receive blood or plasma from the circuit and treat the blood or plasma. The reaction chamber comprises a protease enzyme immobilized to a support, in which the protease enzyme is specific for, and capable of irreversibly cleaving, a human c5a present in the blood or plasma, wherein the abundance of the human c5a in the treated blood or plasma is less than that in the untreated blood or plasma.
University Of Limerick

new patent

Gamma-secretase inhibition reduce apoc3 levels and plasma triglycerides

A method of reducing a subject's plasma triglyceride level, comprising administering to a subject in need thereof a gamma-secretase inhibitor in an amount effective to reduce the subject's plasma triglyceride level.. .
The Trustees Of Columbia University In The City Of New York

new patent

Apparatus for patterned plasma-mediated laser ophthalmic surgery

A system for ophthalmic surgery on an eye includes: a pulsed laser which produces a treatment beam; an oct imaging assembly capable of creating a continuous depth profile of the eye; an optical scanning system configured to position a focal zone of the treatment beam to a targeted location in three dimensions in one or more floaters in the posterior pole. The system also includes one or more controllers programmed to automatically scan tissues of the patient's eye with the imaging assembly; identify one or more boundaries of the one or more floaters based at least in part on the image data; iii.
Optimedica Corporation

new patent

Apparatus for patterned plasma-mediated laser ophthalmic surgery

A system for ophthalmic surgery on an eye includes: a pulsed laser which produces a treatment beam; an oct imaging assembly capable of creating a continuous depth profile of the eye; an optical scanning system configured to position a focal zone of the treatment beam to a targeted location in three dimensions in one or more floaters in the posterior pole. The system also includes one or more controllers programmed to automatically scan tissues of the patient's eye with the imaging assembly; identify one or more boundaries of the one or more floaters based at least in part on the image data; iii.
Optimedica Corporation





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This listing is a sample listing of patent applications related to Plasma for is only meant as a recent sample of applications filed, not a comprehensive history. There may be associated servicemarks and trademarks related to these patents. Please check with patent attorney if you need further assistance or plan to use for business purposes. This patent data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Plasma with additional patents listed. Browse our RSS directory or Search for other possible listings.


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