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Photosensitive Resin patents



      
           
This page is updated frequently with new Photosensitive Resin-related patent applications. Subscribe to the Photosensitive Resin RSS feed to automatically get the update: related Photosensitive RSS feeds. RSS updates for this page: Photosensitive Resin RSS RSS


Process for producing a liquid ejection head

Dye dispersion liquid, photosensitive resin composition for color filters, color filter, liquid crystal display device…

Date/App# patent app List of recent Photosensitive Resin-related patents
07/17/14
20140198157
 Process for producing chip patent thumbnailProcess for producing chip
A process for producing a chip in which plural ejection orifice arrays are arranged including conducting reduction projection exposure plural times to a wafer having a substrate and a photosensitive resin layer formed thereon while relatively moving positions of the wafer and a reticle to form ejection orifice array patterns in the resin layer, developing the patterns to form ejection orifice arrays in the resin layer, and dividing the wafer to form plural chips in which the plural ejection orifice arrays are arranged. The exposure is conducted once to form in the resin layer a first ejection orifice array pattern corresponding to partial ejection orifice arrays in an arranging direction thereof in one chip, a second ejection orifice array pattern corresponding to all ejection orifice arrays in one chip and a third ejection orifice array pattern corresponding to partial ejection orifice arrays in an arranging direction thereof in one chip..
07/10/14
20140193756
 Process for producing a liquid ejection head patent thumbnailProcess for producing a liquid ejection head
A process for producing a liquid ejection head including, on a substrate, a flow path forming member forming ejection orifices and a liquid flow path communicating therewith, including forming, on the substrate, a first layer of photosensitive resin; forming, on the first layer, a mask layer in which at least part of a side surface thereof has a light transmission distribution with a material capable of reducing transmission of light having a photosensitive wavelength of the resin; performing, for the first layer, exposure with the mask layer and development to form a flow path mold pattern having a taper angle θ satisfying 95°<θ, where θ is the angle between top and side surfaces in cross section of the pattern perpendicular to substrate surface; forming a coating resin layer to cover the pattern; patterning the resin layer to form the member; and removing the pattern to form the flow path.. .
07/10/14
20140191213
 Dye dispersion liquid, photosensitive resin composition for color filters, color filter, liquid crystal display device and organic light emitting display device patent thumbnailDye dispersion liquid, photosensitive resin composition for color filters, color filter, liquid crystal display device and organic light emitting display device
An object is to provide a photosensitive resin composition for color filters, configured to be able to form a high-luminance color layer with excellent heat resistance and light resistance. Disclosed is a photosensitive resin composition for color filters including the dye dispersion liquid, the dye dispersion liquid including a dye dispersed by a dispersant in a solvent, wherein the dye is a dye having a sulfonic acid group; the dispersant is a graft copolymer having an amine number of 30 mg koh/g or more and including copolymerizable components that contain a specific monomer having a tertiary amine and a specific polymerizable oligomer; the solvent is a solvent having a solubility of the dye of 0.2 g/100 g solvent or less at 23° c.; and the tertiary amine of the dispersant and the sulfonic acid group of the dye form a micelle..
07/03/14
20140186768
 Photosensitive resin composition for insulating film of display device, insulating film using the same, and display device using the same patent thumbnailPhotosensitive resin composition for insulating film of display device, insulating film using the same, and display device using the same
A photosensitive resin composition for an insulating film of a display device includes (a) an alkali soluble resin including a polybenzoxazole precursor, polyamic acid, polyimide, or a combination thereof; (b) a photosensitive diazoquinone compound; (c) an ultraviolet (uv) absorber having a maximum absorption wavelength of about 300 to about 400 nm; and (d) a solvent. An insulating film and a display device can include the photosensitive resin composition..
07/03/14
20140186765
 Photosensitive resin composition and cured product thereof patent thumbnailPhotosensitive resin composition and cured product thereof
An alkali-developing-type photosensitive resin composition comprising: a polycarboxylic acid resin (a) obtained by reacting a polybasic anhydride (c) with a reactant (ab) between a difunctional bisphenol epoxy resin (a) having an epoxy group at both terminals and an epoxy equivalent of 600-1300 g/eq., and a monocarboxylic acid compound (b) having an alcoholic hydroxyl group; an epoxy resin (b) having two or more epoxy groups in a molecule; and a photoacid generator (c), wherein the addition ratio the monocarboxylic acid compound (b) with respect to 1 equivalent of the epoxy group of the epoxy resin (a) is 80 equivalent % or more, and the addition ratio the polybasic anhydride with respect to one equivalent of the primary hydroxyl group of the reactant (ab) is 80 equivalent % or more.. .
07/03/14
20140183425
 Photosensitive resin composition for color filter and color filter using the same patent thumbnailPhotosensitive resin composition for color filter and color filter using the same
Disclosed are a photosensitive resin composition for a color filter including (a) a colorant including a dye represented by the following chemical formula 1 and/or a dye represented by the following chemical formula 2, wherein in the following chemical formulae 1 and 2, each substituent is the same as described in the detailed description; (b) an acrylic-based binder resin; (c) a photopolymerizable monomer; (d) a photopolymerization initiator; and (e) a solvent, and a color filter using the same.. .
06/26/14
20140178816
 Positive photosensitive resin composition, and organic insulator film for display device and display device fabricated using the same patent thumbnailPositive photosensitive resin composition, and organic insulator film for display device and display device fabricated using the same
In chemical formulae 1 and 2, each substituent is the same as defined in the detailed description.. .
06/26/14
20140178815
 Photosensitive resin composition for light blocking layer and light blocking layer using the same patent thumbnailPhotosensitive resin composition for light blocking layer and light blocking layer using the same
In chemical formula 1, each substituent is the same as defined in the detailed description.. .
06/26/14
20140178814
 Dry film photoresist having oxygen permeable barrier layer and manufacturing method thereof patent thumbnailDry film photoresist having oxygen permeable barrier layer and manufacturing method thereof
There is provided a dry film photoresist including: a base film having an oxygen permeable barrier layer formed thereon; a photosensitive resin layer formed on the oxygen permeable barrier layer; and a protective film formed on the photosensitive resin layer. According to the present invention, the dry film photoresist includes the oxygen permeable barrier layer formed on the base film to prevent a curing reaction from being deteriorated by oxygen permeation in the dry film photoresist, such that residue that is not peeled off may be decreased, thereby significantly decreasing process defects..
06/26/14
20140178808
 Photosensitive resin composition patent thumbnailPhotosensitive resin composition
A photosensitive resin composition having excellent storage stability which can form a high precision pattern upon a low amount of exposure; a method of forming a pattern including a polysiloxane coating with the photosensitive resin composition; and an electronic component including a pattern including a polysiloxane coating formed with the photosensitive resin composition. A compound which generates an imidazole compound having a predetermined structure by light is added to a photosensitive resin composition including one or more hydrolyzable silane compounds, hydrolysates of the hydrolyzable silane compounds and condensates thereof and a photo-base generator or a photo-acid generator..
06/26/14
20140178618
Display device and cover member
According to one embodiment, a display device includes a display module configured to display an image on a display area, a cover member including a transmissive portion opposed to the display area, and a color portion opposed to a peripheral area on an outside of the display area of the display module, and a photosensitive resin which attaches the display module and the cover member, wherein the color portion is formed of a color layer which passes light of a wavelength for curing the photosensitive resin.. .
06/26/14
20140175347
Photosensitive resin composition, color filter and liquid crystal display device
The present invention relates to a photosensitive resin composition for black matrix, as well as a color filter and a liquid crystal display (lcd) device formed by the composition. The aforementioned photosensitive resin composition comprises an alkali-soluble resin (a), a compound containing vinyl unsaturated group(s) (b), a photo initiator (c), quinonediazide sulfonic acid ester (d), a solvent (e) and black pigment (f).
06/26/14
20140175346
Photosensitive resin composition for color filter and color filter using the same
In the above chemical formula 1, each substituent is the same as defined in the detailed description.. .
06/26/14
20140175345
Photosensitive resin composition for color filter and color filter using the same
Disclosed are a photosensitive resin composition for a color filter including (a) a colorant including green pigment and a color material having transmittance of about 0 to about 40% in a wavelength region of about 490 to about 500 nm, and transmittance of about 70 to about 100% in a wavelength region of about 520 to about 530 nm, (b) an acrylic-based binder resin, (c) a photopolymerization initiator, (d) a photopolymerizable monomer, and (e) a solvent, and a color filter using the same.. .
06/26/14
20140175344
Photosensitive resin composition for color filter and color filter using the same
In the above chemical formulae 1 to 3, each substituent is the same as described in the detailed description.. .
06/26/14
20140175343
Photosensitive resin composition and light blocking layer using the same
In the above chemical formula 1, each substituent is the same as defined in the detailed description.. .
06/26/14
20140175342
Photosensitive resin composition, and light blocking layer and liquid crystal display using the same
In chemical formula 1, each substituent is the same as defined in the detailed description.. .
06/19/14
20140170562
Positive photosensitive resin composition
Disclosed is a positive photosensitive resin composition that includes (a) an alkali soluble resin selected from a polybenzoxazole precursor, a polyimide precursor, and a combination thereof, (b) a photosensitive diazoquinone compound, (c) a phenol compound, (d) an organic dye and (e) a solvent, wherein the organic dye (d) includes at least one red dye having an absorption wavelength of 590 to 700 nm, at least one yellow dye having an absorption wavelength of 550 to 590 nm, and at least one blue dye having an absorption wavelength of 450 to 500 nm.. .
06/19/14
20140166947
Photosensitive resin composition for color filter and color filter using the same
In chemical formulae 1 and 14, each substituent is the same as defined in the detailed description.. .
06/12/14
20140163131
Photosensitive resin composition and black spacer using the same
Disclosed are a photosensitive resin composition including (a) a thermally curing initiator having a half-life of about one hour at a temperature ranging from about 100 to about 150° c.; (b) a photopolymerization initiator; (c) a binder resin; (d) a photopolymerizable compound; (e) a colorant; and (f) a solvent, and a black spacer using the same.. .
06/12/14
20140158953
Photosensitive resin composition for color filter, and color filter using the same
In the above chemical formulae 1 to 3, each substituent is the same as defined in the detailed description.. .
06/12/14
20140158952
Photosensitive resin composition for color filter and color filter using the same
In the above chemical formula 1, each substituent is the same as described in the detailed description.. .
06/12/14
20140158412
Novel conductive layer integrated fpc
A conductive-layer-integrated flexible printed circuit includes: (a) an electromagnetic-shielding conductive layer; (b) a photosensitive resin composition layer; and (c) a wiring-pattern-equipped film, (a) the electromagnetic-shielding conductive layer, (b) the photosensitive resin composition layer, and (c) the a wiring-pattern-equipped film being laminated in this order, and (b) the photosensitive resin composition layer being formed from a photosensitive resin composition containing at least (a) carboxyl-group-containing resin, (b) a photo-polymerization initiator, and (c) thermosetting resin.. .
06/05/14
20140154628
Photosensitive resin composition, photosensitive film, permanent resist and method for producing permanent resist
The present invention provides a photosensitive resin composition comprising an (a) component: an acid-modified epoxy resin, a (b) component: a photopolymerizable monomer having an ethylenically unsaturated group, a (c) component: a photopolymerization initiator, a (d) component: an epoxy resin, and an (e) component: an inorganic filler, wherein the (a) component comprises an acid-modified bisphenol novolak type epoxy resin and further the photosensitive resin composition satisfies a predetermined condition, and provides a photosensitive film, a permanent resist and a method for producing a permanent resist using the same.. .
06/05/14
20140154627
Negative type photosensitive resin composition, resin film, and electronic device
A negative type photosensitive resin composition containing a resin compound (a) which has a weight average molecular weight of 1000 or more, a (meth)acryloyl compound (b), a silane-modified resin (c), a radical-generating type photopolymerization initiator (d), and a silicon atom-free epoxy group-containing cross-linking agent (e), wherein the resin compound (a) contains a resin compound (a1) which has two or more (meth)acryloyl groups in a molecule and which has a carboxyl group which reacts with the epoxy group and the (meth)acryloyl compound (b) has a weight average molecular weight of less than 1000 and has two or more (meth)acryloyl groups in a molecule, is provided.. .
05/29/14
20140147776
Photocurable/thermosetting resin composition
Provided is an alkali-developable photocurable/thermosetting resin composition from which a cured coating film that has excellent thermal shock resistance and exhibits excellent pct resistance, hast resistance and electroless gold plating resistance, which are important as a solder resist for semiconductor packages, can be formed. The alkali-developable photocurable/thermosetting resin composition is characterized by comprising (a) a carboxyl group-containing photosensitive resin, (b) a photopolymerization initiator, (c) a block copolymer and (d) a thermosetting component..
05/29/14
20140145973
Touch screen module and method of manufacturing the same
There is provided a touch screen module including a glass substrate, a first photosensitive resin layer formed on the glass substrate and a bezel including a second photosensitive resin layer formed on the first photosensitive resin layer, and transparent electrodes simultaneously formed on both the glass substrate and the bezel. A residue phenomenon in which pigment particles included in the bezel remain on a surface of the glass substrate after exposure and development may be prevented..
05/22/14
20140141378
Photosensitive resin laminate and thermal processing of the same
A method of thermally developing a photocurable printing blank to produce a relief pattern comprising a plurality of relief dots. The photocurable printing blank comprises a backing layer having at least one photocurable layer disposed thereon and a laser ablatable mask layer disposed on top of the at least one photocurable layer.
05/15/14
20140131743
Light-emitting display backplane, display device and manufacturing method of pixel define layer
The present invention discloses a light-emitting display backplane, a display device and a manufacturing method of a pixel define layer. A light-emitting display backplane according to the present invention comprises: a substrate and a pixel define layer provided thereon, wherein said pixel define layer comprises: a first photosensitive resin layer, a first transparent define layer and a second transparent define layer sequentially provided on said substrate from bottom to top, each of the first photosensitive resin layer, the first define layer and the second define layer is provided with openings corresponding to respective pixels, and the openings in said second define layer are smaller than those in both said first define layer and said first photosensitive resin layer, so as to form luminescent material filling regions which are wider at bottom and narrower at top..
05/15/14
20140131310
Display panel with pixel define layer, manufacturing method of pixel define layer of display panel, and display device
Embodiments of the invention provide a display panel with a pixel define layer, a manufacturing method of a pixel define layer of a display panel, and a display device. The display panel with the pixel define layer comprises: a substrate and the pixel define layer disposed on the substrate.
05/08/14
20140125931
Half-transmitting and half-reflecting color film substrate, manufacture method thereof and liquid crystal display device
A half-transmitting and half-reflecting color film substrate, manufacture method thereof and liquid crystal display device are provided. The half-transmitting and half-reflecting color film substrate comprises a transparent substrate (1) and a black matrix (2) arranged on the transparent substrate (1).
05/08/14
20140125930
Dye dispersion liquid, photosensitive resin composition for color filters, color filter, liquid crystal display device and organic light emitting display device
A photosensitive resin composition comprising a dye (a), a dispersant (b), a solvent (c), and a photosensitive binder component (d), the dye (a) being dispersed in the solvent (c) by the dispersant (b), wherein the dye (a) is a dye having a sulfonic acid group; the dispersant (b) is a block polymer that contains a block portion comprising a repeating unit having a tertiary amine; the solvent (c) is a solvent having a solubility of the dye (a) of 0.2 (g/100 g solvent) or less at 23° c.; and a micelle is formed by an acid-base interaction between the tertiary amine of the dispersant (b) and the sulfonic acid group of the dye (a).. .
05/08/14
20140124716
Photosensitive resin composition and application of the same
A photosensitive resin composition and application of the same are provided. The photosensitive resin composition comprises an alkali-soluble resin (a), a compound (b) containing vinyl unsaturated group(s), a photo initiator (c), an organic solvent (d), a pigment (e) and a metal chelating agent (f).
05/08/14
20140124253
Photosensitive conductive film, method for forming conductive film, method for forming conductive pattern, and conductive film substrate
A photosensitive conductive film 10 according to the invention includes a support film 1, a conductive layer 2 containing conductive fiber formed on the support film 1, and a photosensitive resin layer 3 formed on the conductive layer 2.. .
05/01/14
20140120462
Photosensitive resin composition, method for forming pattern-cured film using photosensitive resin composition, and electronic component
A photosensitive resin composition including: (a) a polybenzoxazole precursor; (b) a photosensitizer; (c) a solvent; (d) a cross-linking agent; and (e) a heterocyclic compound including a hydroxyl group, an alkoxy group or a carboxyl group within a molecule.. .
05/01/14
20140117842
Organic el device, method of manufacturing organic el device, and electronic apparatus
The organic el device includes a base material as a substrate, a plurality of organic el elements disposed on the based materials, a seal layer covering the plurality of organic el elements to seal, color layers of at least red, green, and blue corresponding to a plurality of organic el elements and formed on the seal layer, and a convex portion which is formed by dividing each of colored layers with different colors on the seal layer, and whose height is lower than the height of a colored layer of at least red, green, blue on the seal layer. The convex portion has a property of optical transparency, and is formed using a photosensitive resin material which is a main material of the colored layers, for example..
04/24/14
20140113448
Positive photosensitive resin composition for spray coating and method for producing through electrode using the same
A method for producing a through electrode includes providing a semiconductor wafer having an integrated circuit provided on a surface of the semiconductor wafer and a hole provided in the semiconductor wafer along a thickness direction of the semiconductor wafer. At least a portion of a back surface of an electrode of the integrated circuit is exposed through the hole.
04/24/14
20140113230
Positive-type photosensitive resin composition and cured film prepared therefrom
Disclosed herein is a photosensitive resin composition which comprises (a1) at least one compound selected from the group consisting of a silane compound represented by formula (i), a hydrolyzate thereof and a condensate of the hydrolyzate, (a2) a 1,2-quinonediazide compound, and (a3) an amino-based silane coupling agent represented by formula (ii). A cured film prepared from the photosensitive resin composition has an excellent pattern development property, heat resistance and light transmittance, as well as an excellent adhesion property to a silicon nitride(sinx) substrate, and it can be used as a protective film of an electronic component..
04/17/14
20140104798
Hybrid lamination substrate, manufacturing method thereof and package substrate
Disclosed herein are a hybrid lamination substrate and a manufacturing method thereof. The hybrid lamination substrate includes: a core layer; at least one first insulating layer that is made of a photosensitive resin material and is formed on an upper portion, a lower portion, or upper and lower portions of the core layer; and at least one second insulating layer that is made of a non-photosensitive resin material and is formed on the upper portion, the lower portion, or the upper and lower portions of the core layer.
04/17/14
20140103269
Photosensitive resin composition for color filter and color filter using the same
In chemical formula 1, each substituent is the same as described in the detailed description.. .
04/10/14
20140100301
Black photosensitive resin composition and light-blocking layer using the same
The present invention provides a novel black photosensitive resin composition, which includes: a polysiloxane, a black pigment, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator and a solvent. Accordingly, the black photosensitive resin composition of the present invention can meet the requirements for optical density and resistance under high temperature and is advantageous to the application in a touch panel.
04/10/14
20140099581
Negative photosensitive resin composition and cured product of same
A negative photosensitive resin composition which contains (a) an epoxy resin that has two or more epoxy groups in each molecule, (b) an alkali-soluble resin and (c) a cationic photopolymerization initiator. The epoxy resin (a) is an epoxy resin that is obtained by a reaction between a phenol derivative represented by formula (1) and an epihalohydrin..
04/10/14
20140099243
Photosensitive resin composition for forming biochip, and biochip
It is intended to obtain a photosensitive resin composition that is capable of forming a highly fine pattern with a high aspect ratio while attaining the high adhesion of the pattern to a substrate, having low autofluorescence, and being exceedingly suitable for producing a biochip that causes exceedingly low damage on cultured cells. The photosensitive resin composition for forming a biochip of the present invention contains: an epoxy compound (a1) of a particular structure having an oxycyclohexane skeleton having an epoxy group; an epoxy compound (a2) of a particular structure which is a polyvalent carboxylic acid derivative having an epoxidized cyclohexenyl group; a cationic photoinitiator (b); and a solvent (c)..
04/10/14
20140096385
Method for producing liquid-ejection head
A method for producing a liquid-ejection head includes the steps of: forming molds on or above a substrate, the molds being used as molding members for forming liquid chambers; forming a flow-passage-forming member by depositing an inorganic material on or above the substrate and the molds by chemical vapor deposition, the flow-passage-forming member having depressed portions each formed in an area between an adjacent pair of liquid-chamber side walls in which the molds are not formed; forming a photosensitive resin layer by depositing a photosensitive resin on the flow-passage-forming member and in the depressed portions; forming filling members in the depressed portions by grinding the photosensitive resin layer until the upper surface of an orifice plate is exposed; after grinding the photosensitive resin layer, forming ejection ports in the flow-passage-forming member; and, after forming the ejection ports, removing the molds.. .
04/03/14
20140092354
Display device substrate, display device substrate manufacturing method, display device, liquid crystal display device, liquid crystal display device manufacturing method and organic electroluminescent display device
The present invention provides a display device substrate, a display device substrate manufacturing method, a display device, a liquid crystal display device, a liquid crystal display device manufacturing method and an organic electroluminescent display device that allow suppressing faults derived from occurrence of gas and/or bubbles in a pixel region. The present invention is a display device substrate that comprises: a photosensitive resin film; and a pixel electrode, in this order, from a side of an insulating substrate.
04/03/14
20140091267
Photosensitive resin composition for color filters and uses thereof
The invention relates to a photosensitive resin composition, and a color filter produced thereby has the advantages of no bubble display and little color difference before and after development. The invention also provides a method for manufacturing a color filter, color filter and liquid crystal display device..
03/27/14
20140087619
Photosensitive resin composition, photosensitive element using same, method for forming partition wall of image display device, and method for manufacturing image display device
The present invention provides a photosensitive resin composition which can form an excellently light-resistant partition wall of an image display device and has excellent patterning properties. One embodiment of the present invention is a photosensitive resin composition for forming a partition wall of an image display device, comprising: (a) a binder polymer; (b) a photopolymerizable compound; (c) a photopolymerization initiator; (d) an inorganic black pigment; (e) a surfactant; and (f) a mercapto group-containing compound, wherein the (b) photopolymerizable compound contains a photopolymerizable compound having at least one unsaturated group and an isocyanuric ring structure in a molecule..
03/27/14
20140087308
Photosensitive resin composition and applications thereof
A photosensitive resin composition includes: an alkali-soluble resin; an o-naphthoquinonediazidesulfonic acid ester; a silsesquioxane having at least two thiol groups in a molecule; and a solvent. The silsesquioxane is obtained by subjecting to condensation a silane material which includes a thiol-group-containing silane represented by rasi(orb)3.
03/27/14
20140087307
Photosensitive resin composition and applications thereof
A photosensitive resin composition includes: an alkali-soluble resin; an o-naphthoquinonediazidesulfonic acid ester; a urethane(meth)acrylate compound having at least six (meth)acryloyl groups in a molecule; and a solvent. A protective film which is formed from the photosensitive resin composition and an element which includes the protective film are also provided..
03/27/14
20140083974
Process for producing liquid ejection head
A process for producing a liquid ejection head, comprising providing a substrate with an energy-generating element for ejecting liquid and a wiring; forming a flow path wall forming layer containing a negative photosensitive resin on the substrate; exposing a portion to be a flow path wall of the flow path wall forming layer; forming an ejection orifice forming layer containing a negative photosensitive resin on the flow path wall forming layer; applying a material for a water-repellent layer onto the ejection orifice forming layer; drying a solvent contained in the applied material to form the water-repellent layer; exposing another region than a portion to be an ejection orifice of the ejection orifice forming layer and the water-repellent layer; and dissolving and removing the non-exposed portions, wherein the boiling point of the solvent is not more than the drying temperature in the step to form the water-repellent layer.. .
03/20/14
20140080937
Photosensitive resin composition
There is provided provide a photosensitive resin composition which can markedly improve transparency, heat resistance, heat discoloration resistance, solvent resistance, and patterning properties. A photosensitive resin composition including: a polymer (a) in which a content of a unit structure containing a boronic acid group, a unit structure containing a boronic acid ester group, or a combination of these unit structures is 20 mol % to 100 mol % of a total molar number of unit structures constituting the polymer; and a photosensitizer (b).
03/20/14
20140078701
Display device and cover member
According to one embodiment, a display device includes a display module including a display panel having a display area which displays an image, and a signal supply source mounted on the display panel, a cover member including a transmissive portion opposed to the display area, a first color portion opposed to the signal supply source, and a second color portion opposed to a peripheral area on an outside of the display area of the display module, and a photosensitive resin which adheres the display module and the cover member to each other. The first color portion has a higher transmittance of light of a wavelength for curing the photosensitive resin than the second color portion..
03/20/14
20140078415
Display device and cover member
According to one embodiment, a display device includes a display module including a display area which displays an image, a cover member including a transmissive portion opposed to the display area, a first color portion opposed to a peripheral area on an outside of the display area of the display module, and a second color portion located on an outside of the first color portion, and a photosensitive resin which adheres the display module and the cover member to each other, wherein the first color portion has a higher transmittance of light of a wavelength for curing the photosensitive resin than the second color portion.. .
03/13/14
20140071413
Pattern formation method, pattern formation apparatus, and recording medium recorded with alignment program
According to one embodiment, a pattern formation method includes placing a master on a substrate including a concave-convex pattern, performing alignment between the master and the substrate, curing a photosensitive resin applied onto the substrate, with the pattern brought into contact with the resin, and removing the master from the resin. The performing alignment includes measuring amount of misalignment of first marks provided at least three of four corners of the shot region and performing alignment of the corners, after the alignment of the corners, measuring misalignment of a second mark, calculating a target value of amount of movement of the corners so as to minimize the amount of misalignment of the first marks and amount of misalignment of the second mark, and performing alignment between the master and the substrate so that the amount of movement of the corners is made close to the value..
03/13/14
20140069702
Novel photosensitive resin composition and use thereof
The photosensitive resin composition contains a (a) binder polymer, (b) cross-linked polymer particles, (c) thermosetting resin, (d) photo-polymerization initiator, and a (e) phosphoric flame retardant, in which a content of the (b) cross-linked polymer particles is 30 parts by weight to 100 parts by weight with respect to the 100 parts by weight of the (a) binder polymer, and an average particle diameter of the (b) cross-linked polymer particles is 1 μm to 10 μm. Therefore, the photosensitive resin composition (i) obtains an excellent tack-free property after being applied and dried, (ii) can be subjected to fine processing, (iii) is formed into a cured film having excellent flexibility, flame retardancy, and electrical insulation reliability, and (iv) causes a substrate to have a small warpage after being cured..
03/06/14
20140065526
Positive photosensitive resin composition and method for forming patterns by using the same
The present invention relates to a positive photosensitive resin composition and a method for forming patterns by using the same. The positive photosensitive resin composition includes a novolac resin (a), an ortho-naphthoquinone diazide sulfonic acid ester (b), a dye (c) and a solvent (d).
02/20/14
20140051017
Photosensitive resin composition and application thereof
The present invention relates to a photosensitive resin composition, which comprises an alkali-soluble resin (a), a compound (b) containing vinyl unsaturated group(s), a photoinitiator (c), ortho-naphthoquinone diazide sulfonic acid ester (d), a thermal initiator (e) and a solvent (f). The photosensitive resin composition added with the ortho-naphthoquinone diazide sulfonic acid ester (d) and the thermal initiator (e) can have excellent resolution and development adherence.
01/30/14
20140030659
Liquid ejection head and method of manufacturing the same
A liquid ejection head is manufactured by forming a dent representing a substantially spherical profile so as to include a position for forming an ejection port on a surface of a photosensitive resin layer, then forming a latent image of the ejection port in the dent by an exposure treatment using a projection lens system, and developing the latent image. The center of the top surface of the latent image is shifted to the incoming side of the beam of exposure light from the lowest point of the dent..
01/16/14
20140013600
Manufacturing method of substrate for liquid ejection head
Provided is a method for manufacturing a substrate for liquid ejection head including an ejection energy generating element and a nozzle layer including an ejection port and a liquid channel. The method includes the steps of: forming, on the substrate including the element, a metal mold member made of metal and having a flat surface, the metal mold member making up at least a part of a mold for the liquid channel, and a planarization layer made of the metal and having a flat surface to planarize a surface of the nozzle layer; coating the mold for the liquid channel and the planarization layer with negative-type photosensitive resin, thus forming a negative-type photosensitive resin layer to be the nozzle layer; exposing the resin layer to ultraviolet rays, thus forming the ejection port; and selectively removing the mold for the liquid channel, thus forming the liquid channel..
01/09/14
20140011905
Novel polyamic acid, photosensitive resin composition, dry film and circuit board
The present invention relates to novel polyamic acid; a photosensitive resin composition satisfying excellent flexibility and low stiffness and exhibiting excellent heat resistance and plating resistance; a dry film obtained from the photosensitive resin composition; and a circuit board including the dry film.. .
01/02/14
20140005409
Positive photosensitive resin composition, method for forming cured film, cured film, organic el display device and liquid crystal display device
Wherein in formula (i), r1 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkoxy group, an alkoxycarbonyl group, an acyl group, a carbamoyl group, a sulfamoyl group, a sulfo group, a cyano group, an aryl group or a heteroaryl group; r2 represents an alkyl group or an aryl group; each of r3 and r4 independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkoxy group, an alkoxycarbonyl group, a carbonyl group or an aryl group; x represents —o—, —s—, —nh—, —nr5—, —ch2—, —cr6h— or —cr6r7—; each of r5 to r7 independently represents an alkyl group or an aryl group; and r1 and any one of r5 to r7, or r3 and r4, may be bonded to each other to form a ring.. .
01/02/14
20140004466
Photosensitive resin laminate and thermal processing of the same
A method of developing a photocurable printing blank to produce a relief pattern comprising a plurality of relief dots. The photocurable printing blank comprises a backing layer having at least one photocurable layer disposed thereon, a barrier layer disposed on the at least one photocurable layer, and a laser ablatable mask layer disposed on top of the barrier layer.
01/02/14
20140004313
Nanometric imprint lithography method
A nanoimprint lithography method, including: pressing a mold in a photosensitive resin to form at least one imprint pattern defined by a stamped area and an adjacent area, the adjacent area being less stamped or not stamped at all, and being thicker than the stamped area; and exposure to a certain amount of sunlight. Respective thicknesses of the two areas are defined such that the two areas absorb a different amount of the sunlight and the amount of sunlight provided by the exposure is predetermined so as to be great enough to activate the resin in whichever of the two areas has the greater absorption, and so as not to be great enough to activate the other of the two areas..
12/26/13
20130344437
Photosensitive resin composition
Disclosed is a photosensitive resin composition for an organic insulating layer. More specifically, the photosensitive resin composition is suitable for forming a substrate of a transflective thin film transistor liquid crystal display (tft-lcd) or a pattern of an interlayer insulating layer by improving remarkably a pattern property with a high taper angle besides improvement of flatness, sensitivity, heat resistance, and transparency.
12/19/13
20130335645
Photosensitive resin composition and application of the same
Where r1 and r2 independently represent a c1-c20 alkyl group or a c1-c20 aryl group, r3 represents hydrogen or methyl, and a is an integer ranging from 2 to 20.. .
12/12/13
20130330673
Process for producing ejection orifice forming member and liquid ejection head
A process for producing an ejection orifice forming member including the steps of forming a laminate including a first negative photosensitive resin layer that contains a first photoacid generator, and a second negative photosensitive resin layer that is formed on the first negative photosensitive resin layer and contains a second photoacid generator; forming a first latent image and a second latent image on the first negative photosensitive resin layer and the second negative photosensitive resin layer, respectively, by collectively subjecting the first negative photosensitive resin layer and the second negative photosensitive resin layer to exposure; performing a heat treatment after the exposure; and forming the ejection orifice by a development treatment. The first photoacid generator in the first latent image has an acid diffusion length greater than the acid diffusion length of the second photoacid generator in the second latent image..
12/05/13
20130323650
Method for manufacturing liquid ejection head
There is provided a method for manufacturing a liquid ejection head having a substrate and a channel-forming member having an ejection port from which a liquid is ejected, the method including forming a negative photosensitive resin layer on or above the substrate; forming a lens layer on the negative photosensitive resin layer, the lens layer having a lens; exposing the negative photosensitive resin layer through the lens to form an ejection port in the negative photosensitive resin layer; and removing the lens layer.. .
11/21/13
20130310480
Photosensitive resin composition for forming microlens
(where x is a c1-20 hydrocarbon group that optionally has an ether bond or a cyclic structure; y is an organic group that optionally has a substituent; and z is an aromatic hydrocarbon group or an alkoxy group that optionally has a substituent).. .
11/21/13
20130309607
Photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, and pattern forming method and article using the photosensitive resin composition
A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance..
11/21/13
20130306970
Positive photosensitive resin composition and uses thereof
The invention relates to a positive photosensitive resin composition without color off after etching. The invention also provides a method for manufacturing a thin-film transistor array substrate, a thin-film transistor array substrate and a liquid crystal display device..
11/21/13
20130306919
Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor
The invention provides a photosensitive resin composition that includes titanium black, a photopolymerizable compound, a resin a having an acid value of from 70 mgkoh/g to 250 mgkoh/g, a resin b having an acid value of from 26 mgkoh/g to 65 mgkoh/g, a photopolymerization initiator, and a solvent, the photopolymerization initiator including an oxime photopolymerization compound.. .
11/21/13
20130306918
Photosensitive resin composition for color filter and color filter using same
Provided are a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (a) a colorant including a diaminopyridine azo-based dye including a structure represented by chemical formula 1, and having an absorption wavelength at about 450 to about 550 nm, (b) an acrylic-based binder resin, (c) an acrylic-based photopolymerizable monomer, (d) a photopolymerization initiator, and (e) a solvent..


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Photosensitive Resin topics: Photosensitive Resin, Semiconductor, Semiconductor Device, Liquid Crystal Display, Liquid Crystal, Hydrocarbon, Polyester Film, Photoinitiator, Aromatic Compound, Hydrolysis, Semiconductor Substrate, Photosensitivity, Circuit Board, Cross Section, Scratch Resistance

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