|| List of recent Defect-related patents
| Determining relevant events in source code analysis|
In embodiments of determining relevant events in source code analysis, a computing device includes a key event manager that is implemented to traverse executable paths in source code of executable software instructions, log events along the executable paths in the source code, and determine a defect in the source code along an executable path in the source code. A state machine is implemented to traverse back through the logged events and determine relevant events that are associated with the defect in the source code.
| Identifying a defect density|
A technique to determine defect density in a portion or subset of code. Changes to code may be tracked.
| Method of treating spinal internal disk derangement|
A method of treating a spinal disk according to the present invention can include inserting an alloplastic bulking agent into the spinal disk to treat the defect. The alloplastic bulking agent has a plurality of microparticles.
| Apparatus and methods for repairing tissue defects|
Methods and devices to process harvested skin tissue and to immediately reintroduce the ground tissue into the patient to repair a tissue defect are disclosed. A hand-held portable tissue grinder comprising a housing and a grinding element are disclosed.
| Device and procedure to treat presbyopia|
A treatment apparatus for surgical correction of presbyopia or defective eyesight in an eye of a patient. The treatment apparatus includes a laser device configured to treat lens tissue of the eye by irradiation of pulsed laser radiation with the laser radiation being focused on target points arranged in a pattern within the lens.
| Prosthetic implant shell|
A fluid-filled prosthetic implant having a shell comprising a matrix material and an additive distributed in the matrix material. The implant can be imaged in vivo using magnetic resonance imaging to more clearly reveal defects in the shell, relative to a implant having a shell without the additive material..
| Endoscope with distal tip having encased optical components and display orientation capabilities|
An apparatus according to one embodiment includes an endoscope tip including a housing that is monolithically formed of a transparent material. At least one optical component is at least partially encased within the housing.
| Realtime color vision deficiency correction|
Real-time modification of pixel colors for displays, such as video game displays, may be performed to account for color vision deficiency. The modifications can be performed using operations utilizing constant matrices, with operations performed in the lms color space.
| Edge grinding apparatus and method for grinding glass substrate|
An edge grinding apparatus and method for grinding a glass substrate, with which a glass substrate can be ground by a fixed amount and the occurrence of defects can be minimized. The edge grinding apparatus includes an edge grinding unit which grinds a cut edge of a glass substrate while following the cut edge; a measuring unit which obtains positional information of the cut edge; and a control unit which receives the positional information of the cut edge from the measuring unit and controls a position of the edge grinding unit based on the positional information of the cut edge..
| Method and system for determining overlap process windows in semiconductors by inspection techniques|
The formation of overlap areas in sophisticated semiconductor devices is a critical aspect which may not be efficiently evaluated on the basis of conventional measurement and design strategies. For this reason, the present disclosure provides measurement techniques and systems in which overlying device patterns are transformed into the same material layer, thereby forming a combined pattern which is accessible by well-established defect inspection techniques.
| Method of prognosing and diagnosing hereditary spastic paraplegia, mutant nucleic acid molecules and polypeptides|
A method for diagnosing the presence of hereditary spastic paraplegia (hsp) or predicting the risk of developing hsp in a human subject, comprising detecting the presence or absence of a defect in a gene encoding a polypeptide comprising the sequence of fig. 9 (seq id no: 19), in a nucleic acid sample of the subject, whereby the detection of the defect is indicative that the subject has or is at risk of developing hsp..
| Resist composition and patterning process|
A polymer capable of increasing alkali solubility under the action of acid, as a base resin is blended with a polymer comprising recurring units derived from a styrene having 1,1,1,3,3,3-hexafluoro-2-propanol as a polymeric additive to formulate a resist composition. The photoresist film formed using the resist composition is effective for minimizing outgassing therefrom during the euv lithography, reducing lwr after development, and suppressing formation of blob defects after development because of its hydrophilic surface..
| Resist composition and patterning process|
A polymer capable of increasing alkali solubility under the action of acid, as a base resin is blended with a copolymer comprising recurring units derived from (meth)acrylate, vinyl ether, vinylfluorene, vinylanthracene, vinylpyrene, vinylbiphenyl, stilbene, styrylnaphthalene or dinaphthylethylene, and fluorine-containing recurring units, as a polymeric additive to formulate a resist composition. The photoresist film formed using the resist composition is effective for minimizing outgassing therefrom during the euv lithography.
| Resist composition and patterning process|
A polymer capable of increasing alkali solubility under the action of acid, as a base resin is blended with a copolymer comprising recurring units derived from acenaphthylene, indene, benzofuran or benzothiophene and fluorine-containing recurring units, as a polymeric additive to formulate a resist composition. The photoresist film formed using the resist composition is effective for minimizing outgassing therefrom during the euv lithography.
| Method for mask fabrication and repair|
A method for repairing phase defects for an extreme ultraviolet (euv) mask is disclosed. The method includes receiving a patterned euv mask with at least one phase-defect region, determining location and size of the phase-defect region, depositing an absorber material to cover the phase-defect region and removing a portion of the patterned absorption layer near the phase-defect region in the patterned euv mask to form an absorber-absent region..
| Multiple electrode substrate thicknesses in battery cells for portable electronic devices|
The disclosed embodiments provide a battery cell. The battery cell includes an electrode containing an active material and a continuous substrate.
| Polymer in multicoat color and/or effect paint systems|
Where r is a c3 to c6 alkylene radical and n is selected accordingly such that said polyether has a number-average molecular weight of 450 to 2200 g/mol, components (a) and (b) are used in a molar ratio of 0.7/2.3 to 1.3/1.7, and the resulting polymer has a number-average molecular weight of 1500 to 5000 g/mol and an acid number <10 mg koh/g. Also disclosed is a pigmented aqueous basecoat material which comprises this polymer, and the use of said polymer in pigmented aqueous basecoat materials.
| Large area, low-defect gallium-containing nitride crystals, method of making, and method of use|
An ultralow defect gallium-containing nitride crystal and methods of making ultralow defect gallium-containing nitride crystals are disclosed. The crystals are useful as substrates for light emitting diodes, laser diodes, transistors, photodetectors, solar cells, and photoelectrochemical water splitting for hydrogen generators..
| Thin film electronic devices with conductive and transparent gas and moisture permeation barriers|
Thin film electronic devices (or stacks integrated with a substrate) that include a permeation barrier formed of a thin layer of metal that provides a light transmitting and electrically conductive layer, wherein the electrical conductive layer is formed on a surface of the substrate or device layer such as a transparent conducting material layer with pin holes or defects caused by manufacturing and the thin layer of metal is deposited on the conductive layer and formed from a self-healing metal that forms self-terminating oxides. A permeation plug or block is formed in or adjacent to the thin film of metal at or proximate to the pin holes to block further permeation of contaminants through the pin holes..
| Composite material for tissue repair|
The present disclosure provides a biocompatible composite and method for its use in repairing tissue defects, including defects in cartilage. The biocompatible composite includes a fibrous polymeric component and a polymerizable agent, which is capable of forming the biocompatible composite in situ at the site of a tissue defect.
| Piggybac transposon variants and methods of use|
The present invention provides hyperactive piggybac transposons, in particular hyperactive piggybac transposons from trichoplusia ni (cabbage looper moth) that transpose at a higher frequency than wildtype. The invention also features integration defective piggybac transposons.
| Method of automatic optical inspection for detection of macro defects of sub-pixel defect size in pattern wafers and non-pattern wafers|
A method of automatic optical self-contained inspection for detection of macro defects of sub-pixel defect size in pattern wafers and non-pattern wafers is based on surface light scattering color-intensity computerized analysis. The method includes setting-up initial calibration and deriving correction data.
| Descriptor guided fast marching method for analyzing images and systems using the same|
Methods and systems for descriptor guided fast marching method based image analysis and associated systems are disclosed. A representative image processing method includes processing an image of a microelectronic device using a fast marching algorithm to obtain arrival time information for the image.
| Service processing method and system, and policy control and charging rules function|
A service processing method, a service processing system, and a pcrf entity are disclosed to overcome this defect in the prior art: the prior art is unable to handle services discriminatively according to the policy context information when different services require the same qos level. The method includes: receiving bearer priority information from a pcrf entity, where the bearer priority information includes: bearer priority information of a service data stream, bearer priority information of an ip-can session, and/or bearer priority information of an ip-can bearer; and handling services according to the bearer priority information.
| Repair system for repairing defect using e fuses and method of controlling the same|
A system for repairing a plurality of semiconductor chips each comprising a data storage region including electric fuses connected to the data storage regions of the plurality of semiconductor chips, a defect determination unit configured to read the data of a chip that is actually accessed and the data of an idle chip in the data storage regions, compare the actually accessed and read data with the data of the idle chip, and detect a defect based on a result of the comparison, a storage unit configured to store the defective position of the defect according to a result of the defect determination unit, and a repair unit configured to repair the defect through an e fuse connected to the position of the defect using a reset signal.. .
| Multi-resolution segmented image sensor|
A method of detecting and correcting imaging defects in a media printed on a high-speed multi-color printer includes providing a multisensory imaging device (10); illuminating the media; sensing images on the media at high resolution with at least one high resolution sensor (20) as it passes the multisensory imaging device; transmitting an output of the high resolution sensor to a controller (19); sensing images on the media at low resolution with at least one low resolution sensor (24); calculating a correction for stitch; adjusting a timing of image data provided to image writers to align the inkjets to produce an optimal cross-track line; and providing a full page view from the low resolution sensor.. .
| Imaging device and defective pixel correction method|
Provided is an imaging device and a defective pixel correction method which can improve the accuracy of a defective pixel correction. In a case where a correction target pixel is a g pixel, a defective pixel correction unit determines whether there is an edge portion around the g pixel; when there is an edge portion, the defective pixel correction unit performs a defect correction by using g pixels adjacent to the g pixel in a x shaped direction; when there is no edge portion, it performs the defect correction using g pixels adjacent to the g pixel in the cross direction..
| Apparatus and method for determining defect pixel|
Provided is an apparatus of determining a defect pixel which includes at least one of a first edge periphery defect determiner and a second edge periphery defect determiner, wherein the first edge periphery defect determiner is configured to determine if a central pixel of a pixel group is the defect pixel by using pixel values of pixels adjacent to the central pixel disposed close to an image edge, wherein the edge includes at least one of right, left, upper, lower, lower-left, lower-right, upper-left and upper-right pixels of the central pixel, and wherein the second edge periphery defect determiner is configured to determine if the central pixel is the defect pixel by using a pixel disposed at at least one of the lower-left, lower-right, upper-left and upper-right of the central pixel.. .
| Control device and image forming system|
There is provided a control device configured to control a drive system including a motor and a driven object. The control device includes a controller configured to compute an operation amount, to measure a control amount of the controlled object, to input a measurement signal of the control amount to an inverse model of a model indicating input-output characteristics of the controlled object, and to generate a differential signal between an output of the inverse model and the operation amount; and a filter configured to filter the generated differential signal, and which has frequency characteristics of attenuating a vibrational component which is developed due to mechanical characteristics of the controlled object, from the differential signal.
| Image forming apparatus and image forming method|
An image forming apparatus includes a discharge disabling unit configured to disable a discharge operation of a defective nozzle, which is in a defective discharge state, among a plurality of nozzles configured to discharge liquid droplets to a recording medium, when a value obtained by quantifying a degree of defective state of the defective nozzle is greater than a discharge disable threshold value; a complement unit configured to complement an image defect using two nozzles on either side of the defective nozzle of which discharge operation is disabled; and a threshold value change unit configured to change the discharge disable threshold value depending on a discharge order between the nozzles which complement the image defect and nozzles adjacent to the nozzles which complement the image defect.. .
| Double through silicon via structure|
This invention discloses a double through silicon via (tsv) structure, including a first die unit, a first signal path, a second signal path, a receiving unit and a second die unit. The first and the second signal paths respectively include a driving unit and a tsv unit.
| Fault tolerant integrated circuit architecture|
The exemplary embodiments provide a resilient integrated circuit. An exemplary ic comprises a plurality of composite circuit elements, a state machine element (sme), and a plurality of communication elements.
| Wiring defect inspecting method, wiring defect inspecting apparatus, and method for manufacturing semiconductor substrate|
A wiring defect inspecting method in accordance with the present invention comprises: obtaining a resistance of a short-circuited path of a semiconductor substrate; applying a voltage, which is specified on the basis of the resistance obtained, to the semiconductor substrate having a defect portion so as to cause the defect portion to generate heat; and capturing, with use of an infrared camera, an image of the semiconductor substrate whose temperature has increased due to the heat generated from the defect portion.. .
| Detection, monitoring, and management of gas presence, gas flow and gas leaks in composites manufacturing|
Porosity causing gas-based defects are detected, located, identified, and/or characterized by the use of defect information generated from gas flow data corresponding to gas flow characteristics measured by one or more sensors on a composite part processing piece such as a mould or membrane used during a composite manufacturing process. The defect information is generated using techniques including one or more of profiling the gas flow data, fingerprinting, line leak detection, analytical triangulation..
| Semiconductor device|
A semiconductor device is disclosed allowing detection of a connection state of a through silicon via (tsv) at a wafer level. The semiconductor device includes a first line formed over a through silicon via (tsv), a second line formed over the first line, and a first power line and a second power line formed over the same layer as the second line.
| Plastic ball grid array package having reinforcement resin|
A plastic ball grid array package having a reinforcement resin that may address the problem of delamination and cracks in a boundary region between a sealing resin and a substrate. The reinforcement resin is formed at an outer region of a sealing resin and has a height that is lower than that of the sealing resin.
| Method for producing a semiconductor layer|
A method for producing a semiconductor layer is disclosed. One embodiment provides for a semiconductor layer on a semiconductor substrate containing oxygen.
| Method to form a cmos image sensor|
The present disclosure relates to a method and composition to limit crystalline defects introduced in a semiconductor device during ion implantation. A high-temperature low dosage implant is performed utilizing a tri-layer photoresist which maintains the crystalline structure of the semiconductor device while limiting defect formation within the semiconductor device.
| Diamond sensors, detectors, and quantum devices|
A single crystal synthetic cvd diamond material comprising: a growth sector; and a plurality of point defects of one or more type within the growth sector, wherein at least one type of point defect is preferentially aligned within the growth sector, wherein at least 60% of said at least one type of point defect shows said preferential alignment, and wherein the at least one type of point defect is a negatively charged nitrogen-vacancy defect (nv−).. .
| Airflow-organization testing method for a clean room and system using the same method|
The present invention discloses an airflow-organization testing method for a clean room and a system using the same method, which are designed to solve the defects such as poor precision in the existing visual testing method. The airflow-organization testing method for a clean room according to the present invention uses a thermal imaging device to detect a sample gas-flow formed by a sample gas in the clean room, and the sample gas is a kind of gas, such as liquid nitrogen, dry ice or water vapor, with temperature difference from ambient air.
| Defect inspection apparatus, defect inspection method and non-transitory computer readable recording medium|
In accordance with an embodiment, a defect inspection apparatus includes an electron beam applying unit, a detection unit, a signal processing unit, and a control unit. The electron beam applying unit applies an electron beam to a semiconductor substrate on which first to n-th (n is a natural number equal to or more than 2) patterns are periodically provided.
| Coordinate correcting method, defect image acquiring method and electron microscope|
In accordance with an embodiment, a coordinate correcting method includes generating a pattern image for matching from an sem image acquired by an electron microscope in accordance with a defect coordinate, performing matching between a defect image and the pattern image, superimposing the defect image and the pattern image between which the matching has been performed on a difference image, specifying a position to which a defect position on the difference image corresponds on the pattern image, and converting the corresponding position on the sem image to a coordinate on a wafer. The defect coordinate, the defect image and the difference image are obtained by a defect inspection apparatus..
| Optical sorting machine|
The present invention intends to provide an optical sorting machine which can improve the collection rate of non-defective products without increasing the size of the machine. The optical sorting machine of the present invention includes a granular object feed unit including storage means that stores an object to be sorted, and transfer means that transfers the object to be sorted from the storage means; an optical sorting unit including optical detection means that detects an object to be sorted falling along a predetermined trajectory from an end portion of the transfer means, determination means that determines a type of the object to be sorted based on a detection signal from the optical detection means, an ejector that removes an object to be sorted determined as a specific type from the predetermined falling trajectory based on a determination result by the determination means, and a discharge hopper having a first discharge passage provided at a falling position of the object to be sorted falling along the predetermined trajectory, a second discharge passage provided at a falling position of the object to be sorted removed from the predetermined falling trajectory, and a third discharge passage formed between the first discharge passage and the second discharge passage; and conveyance means that conveys an object to be sorted discharged from the third discharge passage of the discharge hopper in the optical sorting unit to the storage means of the granular object feed unit..
| Methods and systems for ink-based digital printing with multi-component, multi-functional fountain solution|
An ink-based digital printing system comprises an external fluid applicator for applying multi-component, multi-functional fountain solution to a surface of an imaging plate. The plate is image wise exposed using a high power laser to remove primary components of the fountain solution from select regions of the plate according to digital image data, leaving a layer of the secondary components at said select regions.
|Defect injection for transistor-level fault simulation|
Aspects of the invention relate to techniques of defect injection for transistor-level fault simulation. A circuit element in a circuit netlist of a circuit is first selected for defect injection.
|Cartilage repair mixture containing allograft chondrocytes|
The invention is directed toward a sterile cartilage defect implant material comprising milled lyophilized allograft cartilage pieces ranging from 0.01 mm to 1.0 mm in size in a bioabsorbable carrier taken from a group consisting of sodium hyaluronate, hyaluronic acid and its derivatives, gelatin, collagen, chitosan, alginate, buffered pbs, dextran or mixed polymers with allograft chondrocytes added in an amount ranging from 2.5×105 to 2.5×107.. .
|Blood flow disruption devices and methods for the treatment of vascular defects|
A blood flow disruption device for embolizing blood flowing into a vascular defect between a proximal vascular segment and a distal vascular segment, wherein the device includes a porous inner flow disruption element configured to extend through the defect between the proximal vascular segment and the distal vascular segment, whereby a first portion of the blood flowing into the inner flow disruption element from the proximal vascular segment is directed to flow into the defect and a second portion of the blood flowing into the inner flow disruption element is directed to flow into the distal vascular segment. A porous outer flow disruption element coaxially surrounds the inner flow disruption element and is radially expansible from a collapsed state to an expanded state.
|Trochlear resurfacing system and method|
A system for repairing a defect on an articular surface of a patient's trochlear region, the system comprising a guide block comprising a body having an exterior surface configured to engage with the saddle portion and ridge portions of the patient's trochlear region, a protrusion extending generally from the body and configured to be received in a first bore formed in the articular surface along a reference axis, and a first cavity extending through the body configured to establish a first working axis displaced from the reference axis, wherein the exterior surface of the body and the protrusion are configured to secure the location of the guide block about the patient's trochlear region. A method for preparing an implant site in bone, comprising: establishing a reference axis extending from the bone; creating a bore in the bone by reaming about the reference axis; securing a guide block about the articular surface; establishing a first working axis extending from the bone using the guide block, the first working axis is displaced from the reference axis; and creating a first socket in the bone by reaming about the first working axis, wherein the first socket partially overlaps with the bore..
|Intramedullary fixation system|
An intramedullary fixation system is configured to be fixed to first and second bone segments that are separated by a defect. The system includes an intramedullary fixation member that includes first and second wire segments that are twisted about each other so as to define a plurality of intersections.
|Method for manufacturing fluoroelastomers|
The invention pertains to a process for manufacturing a fluoroelastomer [fluoroelastomer (a)] having a heat of fusion of less than 5 j/g as measured by astm d-3418-08, said method comprising emulsion polymerizing vinylidene fluoride (vdf) in the presence of at least one additional fluorinated monomer, in an aqueous polymerization medium, said method comprising polymerizing vdf and said additional fluorinated monomer(s) in the presence of a redox radical initiator system comprising: —at least one organic oxidizing agent [agent (o)]; —at least one organic reducing agent [agent (r)]; wherein agent (o) is fed to said polymerization medium separately from agent (r), so that agent (o) comes in contact with agent (r) exclusively in said polymerization medium comprising vdf and optional additional monomer(s), to fluoroelastomers having low amount of chain defects and low amount of polar end groups, notably obtainable from said process, and to curable compositions therefrom.. .