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This page is updated frequently with new Block Copolymer-related patent applications. Subscribe to the Block Copolymer RSS feed to automatically get the update: related Block RSS feeds. RSS updates for this page: Block Copolymer RSS RSS


Methods for fabricating integrated circuits using directed self-assembly including lithographically-printable assist…

Globalfoundries

Methods for fabricating integrated circuits using directed self-assembly including lithographically-printable assist…

Mark formation method and device manufacturing method

Nikon

Mark formation method and device manufacturing method


Date/App# patent app List of recent Block Copolymer-related patents
08/20/15
20150235911 
 Pattern inspection method, pattern formation control method, and pattern inspection apparatus patent thumbnailPattern inspection method, pattern formation control method, and pattern inspection apparatus
According to one embodiment, in a pattern inspection method, a guide pattern is formed on a substrate. A block copolymer is applied on the guide pattern.
Kabushiki Kaisha Toshiba


08/20/15
20150235839 
 Methods for fabricating integrated circuits using directed self-assembly including lithographically-printable assist features patent thumbnailMethods for fabricating integrated circuits using directed self-assembly including lithographically-printable assist features
Methods for fabricating integrated circuits are provided. In one example, a method for fabricating an integrated circuit includes forming assisting etch resistant fill topographical features that overlie a semiconductor substrate and that define an assisting etch resistant fill confinement well using a photomask.
Globalfoundries, Inc.


08/20/15
20150234279 
 Mark formation  manufacturing method patent thumbnailMark formation manufacturing method
A mark forming method includes: a step of forming, on a device layer of a wafer, an intermediate layer to which a polymer layer containing a block copolymer is adherable, the device layer including a shot area and a scribe line area; a step of removing a portion, of the intermediate layer, formed in the scribe line area; a step of exposing an image of a mark on the scribe line area and forming, based on the image of the mark, a mark including recessed portion; and a step of applying the polymer layer containing the block copolymer on the device layer of the wafer. When a circuit pattern is forced by using the self-assembly of the block copolymer, it is possible to form the mark simultaneously with the formation of the circuit pattern..
Nikon Corporation


08/20/15
20150233800 
 Method of painting microvesicles patent thumbnailMethod of painting microvesicles
The present invention relates to a method to modify and/or to isolate exosomes and other naturally occurring plasma membrane derived microvesicles, by incubation with a reactant, consisting of at least a membrane anchor domain or moiety and a hydrophilic functional domain or moiety. The invention also relates to modification using the same of artificially-prepared lipid bilayer vesicles called liposomes (composed of natural phospholipids) and non-biological or “synthetic” block copolymer membrane mimics which also form vesicles in aqueous solution called polymersomes...
Vin-de-bona Trading Company Pte Ltd


08/20/15
20150232715 
 Adhesive composition and method patent thumbnailAdhesive composition and method
An adhesive composition contains a block copolymer hot melt adhesive and a vapor releasing vapor corrosion inhibitor mixed with the block copolymer hot melt adhesive, the vapor corrosion inhibitor being in the form of particles suspended in the adhesive composition, the particles preferably having a maximum dimension of less than about 30 microns. One improvement results from inclusion in the adhesive mixture of a titanium and/or zirconium containing coupling agent, either separately or as part of the vci particles.
Transhield Technology As


08/20/15
20150232713 
 Adhesive agent having adhesive blend of acrylate and styrene block copolymer patent thumbnailAdhesive agent having adhesive blend of acrylate and styrene block copolymer
The present invention relates to a carrier-based bonding adhesive agent, which is equipped for bonding adhesion on one or both sides or a carrier-free bonding adhesive agent, in the form of an adhesive strip or stamped part having a bonding adhesive consisting substantially of a blend of polyacrylate and a synthetic rubber as well as one or more adhesive resins. By comparison with previously known adhesive systems such an adhesive exhibits a significant improvement in adhesion on hard, non-polar surfaces such as for example new paint surfaces in the automobile industry..
Lohmann Gmbh & Co. Kg


08/20/15
20150232701 
 Method of manufacturing electrophoresis particles, electrophoresis particles, electrophoresis dispersion liquid, electrophoresis sheet, electrophoresis device, and electronic apparatus patent thumbnailMethod of manufacturing electrophoresis particles, electrophoresis particles, electrophoresis dispersion liquid, electrophoresis sheet, electrophoresis device, and electronic apparatus
A method of manufacturing electrophoresis particles having base particles exposing first functional groups on surfaces and block copolymers bonded to the base particles, the method including: obtaining the plurality of block copolymers in which dispersion portions formed by polymerizing monomers including side chains contributing to dispersibility in a dispersion medium and bonding portions formed by polymerizing second monomers including second functional groups having reactivity with the first functional group are bonded, by living polymerization; and bonding the bonding portions to the base particles by reacting the first functional groups and the second functional groups so that the block copolymers are bonded to the base particles.. .
Seiko Epson Corporation


08/20/15
20150232689 
 Using chemical vapor deposited films to control domain orientation in block copolymer thin films patent thumbnailUsing chemical vapor deposited films to control domain orientation in block copolymer thin films
The present invention uses vacuum deposited thin films of material to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer.
Board Of Regents,the University Of Texas System


08/20/15
20150232656 
 Slush molding composition patent thumbnailSlush molding composition
A thermoplastic polypropylene composition comprising polypropylene, a hydrogenated block copolymer, 3 to 6 wt % high density polyethylene, 5 to 10 wt % of a processing oil, and greater than or equal to 3 wt % of a surface modifier comprising an ultra high molecular weight polydialkyl siloxane, an ultra-high molecular weight polydialkyl siloxane in combination with silica, a polyolefin siloxane or a combination thereof, wherein weight percent is based on the total weight of the composition.. .
Inteva Products, Llc


08/20/15
20150232628 
 Method for forming metal nanowire or metal nanomesh patent thumbnailMethod for forming metal nanowire or metal nanomesh
The method for forming a metal nanowire or a metal nanomesh includes the steps of forming a block copolymer thin film on a substrate, in which the block copolymer thin film includes specific hard segments and soft segments containing one or more polymer repeating units selected from the group consisting of a poly(meth)acrylate-based repeating unit, a polyalkylene oxide-based repeating unit, a polyvinylpyridine-based repeating unit, a polystyrene-based repeating unit, a polydiene-based repeating unit and a polylactone-based repeating unit; conducting orientation of the hard segments and soft segments in a lamellar or cylindrical form in the block copolymer thin film; selectively removing the soft segments; adsorbing a metal precursor onto the hard segments; and removing the hard segments.. .

08/20/15
20150232616 

Hybrid block copolymer micelles with mixed stereochemistry for encapsulation of hydrophobic agents


The present invention relates to the field of polymer chemistry and more particularly to multiblock copolymers and micelles comprising the same.. .
Intezyne Technologies, Inc.


08/20/15
20150232590 

Composition of organic peroxide without a colloid agent


An aqueous emulsion composition of organic peroxide without a protective colloid agent wherein the emulsifying agent is a nonionic surfactant chosen exclusively from a block copolymer including at least one alkylene oxide block, a block copolymer including at least two alkylene oxide blocks, an alkoxylated fatty alcohol, an alkoxylated fatty acid, an alkoxylated vegetable or animal oil (hydrogenated or not) or a mixture of a plurality of these elements. Also, a method for producing this composition and specific uses thereof..
Arkema France


08/20/15
20150231925 

Tire provided with a tread including a thermoplastic elastomer and carbon black


The present invention relates to a tire comprising a tread, a crown with a crown reinforcement, two sidewalls, two beads and a carcass reinforcement anchored to the two beads and extending from one sidewall to the other. The tread is based on at least one thermoplastic elastomer and on carbon black at a content by volume within a range extending from 5% to 30%, the thermoplastic elastomer being a block copolymer comprising at least one elastomer block and at least one thermoplastic block, and the total content of thermoplastic elastomer being within a range varying from 65 to 100 phr..
Michelin Recherche Et Technique S.a.


08/20/15
20150231862 

Multilayered polyolefin films, methods of manufacture thereof and articles comprising the same


Disclosed herein is a multilayer film comprising two outer layers; where each outer layer comprises polyethylene; two tie layers; where each tie layer comprises a crystalline block copolymer composite; where each tie layer has a first face and a second face that are opposed to each other, and where the first face of each tie layer contacts at least one outer layer; and a core layer; where the core layer comprises a polypropylene; where the second face of each tie layer contacts the core layer. Disclosed herein is a method comprising coextruding a multilayered film comprising two outer layers; where each outer layer comprises polyethylene; two tie layers; where each tie layer comprises a crystalline block copolymer composite; where each tie layer has a first face and a second face that are opposed to each other, and where the first face of each tie layer contacts at least one outer layer; and a core layer; where the core layer comprises a polypropylene; where the second face of each tie layer contacts the core layer; and coextruding the multilayered blown film..
Dow Global Technologies Llc


08/20/15
20150231861 

Multilayered polyolefin films, methods of manufacture thereof and articles comprising the same


Disclosed herein is a multilayer film comprising two outer layers; where each outer layer comprises polyethylene; two tie layers; where each tie layer comprises a crystalline block copolymer composite; where each tie layer has a first face and a second face that are opposed to each other, and where the first face of each tie layer contacts at least one outer layer; and a core layer; where the core layer comprises a polypropylene; where the second face of each tie layer contacts the core layer; and where the core layer has a thicknesses that is greater than 50% of the total thickness of the multilayer film.. .
Dow Global Technologies Llc


08/20/15
20150231257 

Vitamin functionalized gel-forming block copolymers for biomedical applications


Gel-forming block copolymers were prepared comprising i) a central hydrophilic block consisting essentially of a divalent poly(ethylene oxide) chain and ii) two peripheral monocarbonate or polycarbonate hydrophobic blocks. The hydrophobic blocks comprise one or more vitamin-bearing subunits.
Agency For Science, Technology And Research


08/20/15
20150231246 

Composition for forming pluronic-based hydrogel with improved stability


Wherein n is an integer from 8 to 540, m is an integer from 16 to 70, and r is h or a vinylcarbonyl group (ch2═chco—). When r in formula 1 is a vinylcarbonyl group, the triblock copolymer may be crosslinked through the vinylcarbonyl group to form a nanogel.

08/13/15
20150228994 

Polyelectrolyte film


Provided is a polymer electrolyte membrane that is formed of a fluorine free material, is soft and hardly cracks, and is excellent in hot water resistance. The polymer electrolyte membrane is obtained by crosslinking a block copolymer (z) containing a polymer block (a) containing a structural unit derived from an aromatic vinyl compound and having an ion-conducting group; and an amorphous polymer block (b) containing a structural unit derived from an unsaturated aliphatic hydrocarbon and free of any ion-conducting group, the block copolymer (z) being crosslinked with a crosslinking agent (x) having, in a molecule thereof, two or more aromatic rings of which one or more hydrogen atoms are substituted with hydroxy groups..
Kuraray Co., Ltd.


08/13/15
20150228512 

Substrate treatment method, computer-readable storage medium, and substrate treatment system


The present invention is a method of treating a substrate using a block copolymer containing a first polymer and a second polymer, the method including: a block copolymer coating step of applying the block copolymer onto a substrate or a base film applied on the substrate; and a polymer separation step of phase-separating the block copolymer into the first polymer and the second polymer by thermally treating the block copolymer on the substrate in a non-oxidizing gas atmosphere.. .
Tokyo Electron Limited


08/13/15
20150228475 

Methods of fabricating a pattern using the block co-polymer materials


A method of fabricating a pattern comprising sequentially forming a pattern formation layer and a neutral layer on over a substrate having in a first regions and a second regions, forming guide patterns on first portions of over the neutral layer in the second regions, forming a first block copolymer layers on over second portions of the neutral layer in the first regions, phase-separating the tint block copolymer layers such that each of the first block copolymer layers includes to form first polymer blocks having a first phase and first polymer blocks having a second phase, removing the guide patterns to form openings that expose the first portions of the neutral layer in the second region, forming a second block copolymer layer on over the phase-separated first block copolymer layers and in the openings, phase-separating the second block copolymer layer into to form second polymer blocks having the first phase and second polymer blocks having the second phase removing the second polymer blocks having the second phase and the first polymer blocks having the second phase, and etching, the neutral layer and the pattern formation layer using the first polymer blocks having the first phase and the second polymer blocks having the first phase as an etch masks,. .
Sk Hynix Inc.


08/13/15
20150228298 

Method for forming silicon oxide and metal nanopattern's, and magnetic recording medium for information storage using the same


The method for forming a silicon oxide nanopattern includes the steps of forming a block copolymer thin film including specific hard segments and soft segments containing a (meth)acrylate-based repeating unit on silicon oxide of a substrate; conducting orientation of the thin film; selectively removing the soft segments from the block copolymer thin film; and conducting reactive ion etching of silicon oxide using the block copolymer thin film from which the soft segments are removed, as a mask to form a silicon oxide nanodot or nanohole pattern.. .

08/13/15
20150227090 

Electroconductive resin belt, preparing the same, and image forming apparatus having the same


An electroconductive resin belt having a flame resistance of vtm-0 in ul94 standard when having a thickness of from 50 to 150 μm includes a first resin selected from the group consisting of polyetherimide-siloxane block copolymer, polyphenylene sulfide and polyimide; a second resin selected from the group consisting of polyetherimide, polyether sulfone, polyester, aliphatic polyamide, polyetherimide-siloxane block copolymer and polyamideimide; carbon as a first conductant; and at least one second conductant selected from the group consisting of particulate al-doped zno, particulate ga-doped zno, particulate sb-doped sno2, particulate in-doped sno2, particulate p-doped sno2 and the group consisting of metal oxides coated with any one of the second conductant group. The first resin forms a continuous phase, the second resin forms a dispersion phase, the carbon is unevenly distributed in the dispersion phase or an arc therearound, the second conductant is present in both of the dispersion phase and the continuous phase..
Ricoh Company, Ltd.


08/13/15
20150227046 

Methods of manufacturing a semiconductor device


The inventive concepts provide methods of forming a semiconductor device. The method includes forming a neutral layer having a photosensitive property and a reflow property on an anti-reflective coating layer, performing an exposure process and a development process on the neutral layer to form a preliminary neutral pattern at least partially exposing the anti-reflective coating layer, heating the preliminary neutral pattern to form a neutral pattern, forming a block copolymer layer on the neutral pattern, and heating the block copolymer layer to form a block copolymer pattern.
Samsung Electronics Co., Ltd.


08/13/15
20150225850 

Method for line density multiplication using block copolymers and sequential infiltration synthesis


Block copolymers (bcps) and synthetic infiltration synthesis (sis) are used to double the line density on a substrate. The bcp comprises first and second interconnected bcp components with a functional group at the junction or interface of the components.
Hgst Netherlands B.v.


08/13/15
20150225666 

High performance, water-dilutable lubricity additive for multi-metal metalworking applications


The invention provides lubricating composition comprising: (1) a reaction product selected from the group consisting of: (a) a polyalkanoic or polyalkenoic acid derived from hydroxyfatty acids and a block copolymer selected from the group consisting of polyoxyethylene-polyoxypropylene and a reverse block copolymer of polyoxypropylene-polyoxyethylene-polyoxypropylene; (b) the reaction product of (a) with a maleic acid or anhydride; and (c) the reaction product of (a) with maleated soybean oil; and (2) at least one base oil selected from the group consisting of alkyl benzene, normal paraffin, isoparaffin, mineral oil and α-olefin.. .

08/13/15
20150225601 

Composition for pattern formation, and pattern-forming method


A composition for pattern formation includes a block copolymer and a solvent. The block copolymer is capable of forming a phase separation structure through directed self-assembly.
Jsr Corporation


08/06/15
20150219796 

Heat fusible oil gels


The present invention is directed to a composition for a gel useful in fiber optic cable which has the normal consistency of a grease but which, if desired, will become a rubbery coherent gel upon heating; a method of making the heat-fusible gel, and a method of making a spliceable fiber optic cable, and a fiber optic cable. In the broadest sense, a heat-fusible oil gel composition for fiber optic cable is disclosed, comprising: from 50 to 80 wt.
Kraton Polymers U.s. Llc


08/06/15
20150218363 

Styrene/butadiene diblock copolymer-containing blends that are not an agglomeration and a process for preparation


A process for producing a styrene-butadiene diblock copolymer-containing blend that is not an agglomeration, that involves mixing a styrene-butadiene multiblock thermoplastic elastomer solution with a styrene-butadiene diblock copolymer solution. Blends comprising a styrene-butadiene diblock copolymer and a styrene-butadiene multiblock thermoplastic elastomer, which blends are not an agglomeration..
Firestone Polymers, Llc


08/06/15
20150218325 

Styrene butadiene block copolymers for film applications


We disclose a monovinylarene-conjugated diene block copolymer containing a plurality of monovinylarene-conjugated diene mixed blocks, wherein each mixed block contains conjugated diene units and monovinylarene units in a weight ratio of about 0.05 to about 0.33. We also disclose a composition containing (a) from about 50 parts by weight to about 95 parts by weight of the monovinylarene-conjugated diene block copolymer and (b) from about 5 parts by weight to about 50 parts by weight of polystyrene; wherein the monovinylarene-conjugated diene block copolymer and the polystyrene total 100 parts by weight.
Chevron Phillips Chemical Company Lp


08/06/15
20150218300 

Block copolymer and pattern forming method using the same


A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group..
Sogang University Research Foundation


08/06/15
20150217548 

Elastic laminate


An elastic laminate is made by first coextruding a film having an elastic outer film layer formed of a styrene-block copolymer and an inner film layer of lesser elasticity than the outer layer. An outer fleece web with an outer adhesive layer is then adhered to the outer film layer, and an inner fleece web with an inner adhesive layer is adhered to the inner film layer so as to form between the inner fleece web and the inner film layer a bond that is weaker than a bond formed by the outer adhesive layer between the outer fleece web and the outer film layer.

08/06/15
20150217544 

Multilayered polyolefin-based films


Disclosed are multilayer structures comprising a polyolefin layer, a tie layer and a barrier layer wherein the tie layer is a formulation comprising a crystalline block copolymer composite (cbc) comprising i) an ethylene polymer (ep) comprising at least 90 mol % polymerized ethylene; ii) an alpha-olefin-based crystalline polymer (caop) and iii) a block copolymer comprising (a) an ethylene polymer block comprising at least 90 mol % polymerized ethylene and (b) a crystalline alpha-olefin block (caob).. .
Dow Global Technologies Llc


08/06/15
20150216200 

Chewing gums and gum bases comprising block copolymers having crystallizable hard blocks


Chewing gums and chewing gum bases which are cud-forming and chewable at mouth temperature contains a block copolymer having at least two hard crystallizable polymeric blocks and at least one soft polymeric block. At least one hard polymeric block is a hard crystallizable polymeric block has a melting point greater than 20° c.
Wm. Wrigley Jr. Company


07/30/15
20150214038 

Method for directed self-assembly (dsa) of block copolymers


In directed self-assembly (dsa) of a block copolymer (bcp), a patterned sublayer on a substrate serves as a guiding chemical prepattern on which bcps form more uniform and/or denser patterns. A layer of a blend of a bcp and functional homopolymers, referred to as inks, is deposited on the patterned sublayer and annealed to change the initial chemical prepattern to a 1:1-like chemical pattern that is more favorable to dsa.
Hgst Netherlands B.v.


07/30/15
20150212075 

Latex agglutination inhibition immunoassay


A problem of the present invention is to provide a method capable of avoiding nonspecific reactions which result in the absence of agglutination that should occur in agglutination inhibition ltia. The present invention provides a method of avoiding nonspecific reactions in a latex agglutination inhibition test by performing a latex agglutination inhibition assay in the presence of one or more compounds selected from the group consisting of polyoxyethylene-polyoxypropylene block copolymers, polyoxyethylene alkyl ethers, polyoxyethylene fatty acid esters, and polyvalent quaternary amine polymer compounds..
Sekisui Medical Co., Ltd.


07/30/15
20150210868 

Method for synthesizing nanoparticles on surfaces


A method of forming a nanostructure on a substrate surface can include heating a substrate comprising a composition comprising a block copolymer and a nanostructure precursor to a temperature above the glass transition temperature of the block copolymer and below the decomposition temperature of the block copolymer to aggregate the nanostructure precursor to form a nanostructure precursor aggregated composition. The method can further include heating the nanostructure precursor aggregated composition to a temperature above the decomposition temperature of the nanostructure precursor to decompose the polymer and form the nanostructure..
Northwestern University


07/30/15
20150210841 

Injection-moldable sound-deadening filled thermoplastic polyolefin composition


The present invention relates to filled thermoplastic polyolefin compositions useful for use in sound-deadening articles for automotive applications comprising an olefin block copolymer, one or more linear ethylene polymer and/or substantially linear ethylene polymer, a propylene polymer, and a filler. Said compositions demonstrate a good balance of heat properties and stiffness such that it is particularly suitable for injection molding sound-deadening articles therefrom..
Dow Global Technologies Llc


07/30/15
20150210821 

Nanoporous linear polyolefin membranes and block copolymer precursors for same


A composition comprising a block copolymer that includes at least one polyester block and at least one linear polyolefin block, wherein the composition is in the form of a nano-structured, bicontinuous composite that includes a continuous matrix phase and a second continuous phase. The continuous matrix phase comprises the linear polyolefin block of the block copolymer, and the second continuous phase comprises the polyester block of the block copolymer.
Regents Of The University Of Minnesota


07/30/15
20150210812 

Defect-less directed self-assembly


Techniques herein enable executing directed self-assembly of block copolymer patterning processes that result in patterns having no defects or a negligibly low occurrence of defects to have a high yield of functional patterns and devices. Methods include executing a same dsa patterning sequence two or more times such that any defects in from a phase-separated first block copolymer film are corrected with a phase-separated second block copolymer film as any defect in the second block copolymer film would only temporarily cover a feature already created and/or transferred from first block copolymer film..
Tokyo Electron Limited


07/30/15
20150209275 

Fast dissolving ocular insert


This invention relates to a pharmaceutical dosage form, particularly to a topical ocular pharmaceutical dosage form comprising a polymeric matrix of polyethylene oxide block copolymer, preferably polyoxyethylene-polyoxypropylene block copolymer and hydroxpropyl cellulose, and a pharmaceutically active ingredient incorporated within the matrix. The invention extends to a method of manufacturing the pharmaceutical dosage form..
University Of The Witwatersrand, Johannesburg


07/23/15
20150206549 

Chemical pinning to direct addressable array using self-assembling materials


A substrate having an arrangement of self-assembling magnetic domains and a method of fabrication therefor. In some embodiments, a substrate is patterned with a plurality of chemically contrasted alignment features, and a block copolymer having a magnetic component and a non-magnetic component is deposited onto the substrate.
Seagate Technology Llc


07/23/15
20150206548 

Imprint pattern guided self-assembly of lamellar block copolymer for bpm


The embodiments disclose a method of using a trimmed imprinted resist and chemical contrast pattern to guide a directed self-assembly (dsa) of a predetermined lamellar block copolymer (bcp), creating chromium (cr) lamellar guiding lines using the bcp and dsa in a dry cr lift-off process and etching the cr lamellar guiding line patterns into a substrate to fabricate the imprint template.. .
Seagate Technology Llc


07/23/15
20150205207 

Method of producing structure containing phase-separated structure, forming pattern and forming fine pattern


A method of producing a structure containing a phase-separated structure, including a step in which a layer including an si-containing block copolymer having a plurality of blocks bonded is formed between guide patterns on a substrate; a step in which a solution of a top coat material is applied to the layer and the guide patterns so as to form a top coat film; and a step in which the layer including the si-containing block copolymer and having the top coat film formed thereon is subjected to annealing treatment so as to conduct a phase separation of the layer; in which a solvent of the solution of the top coat material contains no basic substance.. .
Tokyo Ohka Kogyo Co., Ltd.


07/23/15
20150205197 

Methods for providing lithography features on a substrate by self-assembly of block copolymers


A method of designing an epitaxy template to direct self-assembly of a block copolymer on a substrate into an ordered target pattern involves providing a primary epitaxy template design and then varying the design to optimize a pattern fidelity statistic, such as placement error, relative to the target pattern by modelling predicted self-assembled block copolymer patterns and optimizing pattern placement as a function of a varied design parameter. In addition to varying a design parameter to optimize the pattern fidelity statistic, a random error in the template design is included prior to modelling predicted patterns in order to compensate for expected template inaccuracy in practice.
Asml Netherlands B.v.


07/23/15
20150203725 

Hot melt positioning adhesive


A hot melt adhesive composed of a styrene-butadiene-styrene polymer having a relatively high diblock content and styrene content, a second styrenic block copolymer having a lower diblock content than the styrene-butadiene-styrene polymer, which is preferably a styrene-isoprene-styrene polymer, together with tackifying resin, and liquid plasticizer. The preferred styrene-butadiene-styrene polymer contains a styrene content of greater than 30 percent and a diblock content greater than 30 percent by weight.
Bostik, Inc.


07/23/15
20150203638 

Nucleophilic high molecular weight polymer functionalization through alkylation


A new and efficient method of functionalizing high molecular weight polymers through alkylation using a metal hetero alkylbase is described. This novel procedure can also be used to synthesize polymer-based macro-initiators containing radical initiating groups at the chain-ends for synthesis of block copolymers..
Seeo, Inc


07/23/15
20150202923 

Pneumatic tire including inner liner


A pneumatic tire including an inner liner made of a polymer sheet is provided, and the polymer sheet is made of a polymer composition. The polymer composition includes a polymer component of a styrene-isobutylene-styrene triblock copolymer by greater than or equal to 5 mass % and less than or equal to 80 mass %, and a rubber component of at least one kind selected from the group consisting of natural rubber, isoprene rubber, and isobutylene-isoprene rubber by greater than or equal to 20 mass % and less than or equal to 95 mass %.
Sumitomo Rubber Industries, Ltd.


07/23/15
20150202163 

Polymer-polymer composite nanoassemblies and applications thereof


The invention provides novel nanoscale delivery vehicles and composite nanoassemblies built from distinct nanoassembly units (e.g., block copolymer micelles and nanogels) with stoichiometric control. These intelligent composite nanoassemblies independently retain the key features of the nanoassembly units and greatly expand the potential functional features attainable based on the surface functionalization.
University Of Massachusetts


07/16/15
20150200165 

Mark, forming same, and exposure apparatus


A mark forming method includes: a step of forming a resist mark including recessed portion based on an image of a mark exposed on a wafer; a step of coating the recessed portion, in an area of the wafer in which the resist mark has been formed, with a polymer layer containing a block copolymer; a step of performing annealing for the polymer layer so as to allow the polymer layer to form a self-assembled area; a step of performing etching so as to selectively remove a portion of the self-assembled area; and a step of forming a wafer mark in the wafer by using the self-assembled area from which the portion thereof has been removed. When forming a circuit pattern by using the directed self-assemble of the block copolymer, a mark can be also formed, in parallel with the formation of the circuit pattern..
Nikon Corporation


07/16/15
20150197675 

Polydiorganosiloxane polymide copolymers having organic soft segments


Polydiorganosiloxane polyamide, block copolymers having organic soft segments and methods of making the copolymers are provided.. .
3m Innovative Properties Company


07/16/15
20150197663 

Self-organizing composition for forming pattern, forming pattern by self-organization of block copolymer using same, and pattern


There is provided a pattern forming method through self-organization of a block copolymer, containing an annealing step after application of a self-organizing composition for forming pattern that contains a block copolymer containing a block having a repeating unit represented by the specific general formula, and contains an organic solvent, to a substrate, and wherein after a microphase-separated structure is formed in the annealing step, one domain thereof is selectively removed to form a pattern.. .
Fujifilm Corporation


07/16/15
20150197607 

Junction - functionalized block copolymers


Where a is a first polymer block, b is a second polymer block, where the a block and the b block are chemically dissimilar, and j is a junction linking the a block to the b block, and including one or more electrostatically charged moieties.. .

07/16/15
20150197594 

High-chi block copolymers for directed self-assembly


Compositions for directed self-assembly (dsa) patterning techniques are provided. Methods for directed self-assembly are also provided in which a dsa composition comprising a block copolymer (bcp) is applied to a substrate and then self-assembled to form the desired pattern.
Brewer Science Inc.


07/16/15
20150197588 

Hydrogenated block copolymer and producing same


The present invention relates to a hydrogenated block copolymer including a polymer block (a) containing a constitutional unit derived from an aromatic vinyl compound and a polymer block (b) containing from 1 to 100% by mass of a constitutional unit (b1) derived from farnesene and from 99 to 0% by mass of a constitutional unit (b2) derived from a conjugated diene other than the farnesene, in which 50 mol % or more of carbon-carbon double bonds in the polymer block (b) are hydrogenated.. .
Amyris, Inc.


07/16/15
20150197585 

Tapered block copolymer electrolytes


Wherein a is a vinyl aromatic block, t is a tapered copolymer region copolymerized from a vinyl aromatic monomer and an oligo(oxyalkylene) acrylate monomer and b is an oligo(oxyalkylene) acrylate block.. .

07/09/15
20150194078 

Label facestock


The invention relates to a multilayer facestock of a label, and to a label having a multilayer facestock, wherein the facestock is machine direction oriented and comprises a core layer, a first skin layer and a second skin layer. The second skin layer comprises propylene homopolymer, hydrocarbon resin, styrene block copolymer, and low density polyethylene.
Upm Raflatac Oy


07/09/15
20150191637 

Hot melt pressure sensitive adhesive and thermoset comprising styrene-butadiene polymers having high vinyl and high di-block


The present invention provides methods and systems for a hot melt pressure sensitive adhesive and thermoset that comprises from about 5 to about 50 wt. % of a block copolymer, from about 0 to about 75 wt.
Kraton Polymers U.s. Llc


07/09/15
20150191594 

Non-dusting poly(phenylene ether) particles


Disclosed herein are non-dusting poly(phenylene ether) particles comprising 80 to 96 weight percent of poly(phenylene ether) particles having a mean particle size of 1 to 40 micrometers; and 4 to 20 weight percent of a liquid reactive diluent. Poly(alkenyl aromatic) resins, rubber-modified poly(alkenyl aromatic) resins, and hydrogenated, partially hydrogenated, and non-hydrogenated block copolymers of an alkenyl aromatic monomer and a conjugated diene are all excluded from the particles.
Sabic Innovative Plastics, Ip B.v.


07/09/15
20150191590 

Airbag housing cover


Component (b): an olefin-based block copolymer containing a polymer block composed of ethylene and an ethylene α-olefin copolymer block.. .

07/09/15
20150191034 

Stamps, methods of forming stamps, methods of forming a pattern on a substract, and methods of forming a self-assembled block copolymer


Methods for fabricating stamps and systems for patterning a substrate, and devices resulting from those methods are provided.. .
Micron Technology, Inc.


07/09/15
20150190422 

Bi-functional co-polymer use for ophthalmic and other topical and local applications


The invention contemplates a copolymer which is a graft or block copolymer useful to change wettability and surface characteristics of biological surfaces. Methods for use of these formulations and coatings to change wettability and sterically stabilize, and lubricate biological surfaces in a subject, for example, in the treatment of dry eye syndrome, and to prevent adherence of unwanted proteins, for example in the treatment of contact lens intolerance, are provided..
Eyeon Particle Sciences Llc


07/09/15
20150190334 

Shampoo composition


Disclosed is a shampoo composition comprising a silicone component which comprises a dimethiconol, a blend of dimethicone with surface active block copolymer, and further comprises an aminosilicone. The shampoo can provide improved conditioning benefit..
Conopco, Inc., D/b/a Unilever


07/09/15
20150190271 

Film for urostomy pouch baffle and pouch using same


A urostomy pouch includes a baffle member, which is formed using multilayer film sheets. The multilayer film includes an inner layer comprising polypropylene and styrenic block copolymer, and an outer layer comprising ethyl methyl acrylate copolymer (ema).
Hollister Incorporated


07/02/15
20150187602 

Nanoscale patterning method and integrated device for electronic apparatus manufactured therefrom


Provided is a nanoscale patterning method using self-assembly, wherein nanoscale patterns having desirable shapes such as a lamella shape, a cylinder shape, and the like, may be formed by using a self-assembly property of a block copolymer, and low segment interaction caused in a structure of 10 nm or less which is a disadvantage of the block copolymer may be prevented. In addition, even though single photolithography is used, pattern density may double as that of the existing nano patterns, and pitch and cycle of the patterns may be controlled to thereby be largely utilized for electronic apparatuses requiring high integration of circuits such as a semiconductor device, and the like..
Institute For Basic Science


07/02/15
20150184108 

Viscosity index improver concentrates for lubricating oil compositions


Concentrates of linear, block copolymers having a polymer block derived from a monoalkenyl arene, covalently linked to one or more blocks of a hydrogenated derivative of a conjugated diene copolymer, dissolved in highly saturated diluent oil, wherein the size of the monoalkenyl arene block is controlled to provide an optimized level of incompatibility of the block copolymer in the selected diluent.. .

07/02/15
20150184105 

Viscosity index improver concentrates for lubricating oil compositions


Concentrates of linear, block copolymers having a polymer block derived from a monoalkenyl arene, covalently linked to one or more blocks of a hydrogenated derivative of a conjugated diene copolymer, dissolved in highly saturated diluent oil, wherein the size of the monoalkenyl arene block is controlled to provide an optimized level of incompatibility of the block copolymer in the selected diluent.. .
Infineum International Limited


07/02/15
20150184024 

Method of controlling block copolymer characteristics and articles manufactured therefrom


Disclosed herein is a composition comprising a brush polymer; where the brush polymer comprises a reactive moiety that is reacted to a substrate upon which it is disposed; and a block copolymer; where the block copolymer comprises a first block and a second block that are covalently bonded to each other; where the first block comprises a first polymer and a second block comprises a second polymer; where the first polymer comprises less than or equal to 10 atomic percent polysiloxane; where the second polymer comprises at least 15 atomic percent polysiloxane; where the brush polymer is chemically different from the first polymer and the second polymer; and where the first polymer is chemically different from the second polymer; and wherein the block copolymer is disposed upon the brush polymer.. .
Rohm And Haas Electronic Materials Llc


07/02/15
20150184017 

Copolymer formulations, methods of manufacture thereof and articles comprising the same


Disclosed herein is a method comprising disposing a mat composition on a surface of a semiconductor substrate; where the mat composition comprises a random copolymer comprising a first acrylate unit and a second unit; where the copolymer does not comprise a polystyrene or a polyepoxide; crosslinking the random copolymer; disposing a brush backfill composition on the substrate; such that the brush backfill composition and the mat composition alternate with each other; disposing on the brush backfill composition and on the mat composition a block copolymer that undergoes self assembly; and etching the block copolymer to create uniformly spaced channels in the semiconductor substrate.. .
Rohm And Haas Electronic Materials Llc


07/02/15
20150183969 

Additive for rubber, and rubber composition obtained by blending same


The present invention pertains to: an additive for rubber, comprising (a) a hydrocarbon-based oil and (b) a styrene/diene block copolymer; and a rubber composition obtained by blending the additive for rubber into rubber. The present invention makes it possible to provide an additive for rubber which has little impact on the environment or the human body and enables the provision of rubber having excellent heat resistance and spring properties, as well as a rubber composition obtained by blending the same..
Dow Corning Toray Co.,ltd.


07/02/15
20150183935 

Methods for annealing block copolymers and articles manufactured therefrom


Disclosed herein is a block copolymer comprising a first block derived from a vinyl aromatic monomer; where the vinyl aromatic monomer has at least one alkyl substitution on an aromatic ring; a second block derived from a siloxane monomer; where a chi parameter that measures interactions between the first block and the second block is 0.03 to 0.18 at a temperature of 200° c. Disclosed herein is a method comprising polymerizing a vinyl aromatic monomer to form a first block; and polymerizing a second block onto the first block to form a block copolymer; where the second block is derived by polymerizing a siloxane monomer; and where the block copolymer has a chi parameter of 0.03 to 0.18 at a temperature of 200° c.; where the chi parameter is a measure of interactions between the first block and the second block of the copolymer..
Rohm And Haas Electronic Materials Llc


07/02/15
20150183917 

Method for producing asymmetrically formed, star-branched vinyl aromatic-diene block copolymers


Process for the production of asymmetric, star-branched block copolymers which comprise, incorporated into the polymer, from 60 to 95% by weight of vinylaromatic and from 40 to 5% by weight of a conjugated diene having from 4 to 5 c atoms, based on the branched block copolymer, via sequential anionic polymerization and subsequent coupling of the resultant living block-copolymer anions by a coupling agent, and also vinylaromatic-diene block copolymers obtainable via the process and use of these for moldings and for thermoforming foils.. .
Styrolution Europe Gmbh


07/02/15
20150182440 

Cosmetic composition comprising a hydrocarbonated-based resin, a hydrocarbon-based block copolymer, a non volatile dimethicone oil and a non volatile hydrocarbonated oil


The present invention relates to compositions for making up and/or caring for the skin and/or the lips, comprising at least one fatty phase comprising:—at least one hydrocarbon-based resin with a number-average molecular weight of less than or equal to 10 000 g/mol,—at least one hydrocarbon-based block polymer,—from 11% to 80% by weight of non volatile non phenylated silicone oil(s) having at least a dimethicone part, relative to the total weight of the composition, and—from 1% to 80% by total weight of non volatile hydrocarbonated apolar oil(s), relative to the total weight of the composition.. .
L'oreal


06/25/15
20150177629 

Imaging members having electrically and mechanically tuned imaging layers


An electrophotographic imaging member which has improved imaging layer(s) formulated to comprise a charge transport compound and a polymer blended binder to render photoelectrical stability, tune-ability, and surface contact friction reduction for providing service life extension. The polymer blended binder used in the imaging layer(s) is a binary polymer blend binder consisting of: (1) an a-b diblock copolymer and a bisphenol polycarbonate and a low surface energy polysiloxane/polycarbonate random copolymer and (2) an a-b diblock copolymer and a low surface energy graft polysiloxane/polycarbonate copolymer..
Xerox Corporation


06/25/15
20150175855 

Block copolymer composition for viscous adhesive, and adhesive composition


A number average molecular weight ratio of the component (b) to the component (a) being 2.0 to 4.0.. .

06/25/15
20150175793 

Strong polyolefin-based thermoplastic elastomeric films and methods of making


Stronger thermoplastic elastomeric films having improved tensile strength and elastic properties are disclosed herein. The thermoplastic elastomeric films include a combination of polyolefin-based thermoplastic elastomers, styrenic block copolymers, and strength-enhancing agents.
Kimberly-clark Worldwide, Inc.


06/25/15
20150175761 

Patterning by area selective oxidation


Technologies are described for methods for producing a pattern of a material on a substrate. The methods may comprise receiving a patterned block copolymer on a substrate.
Brookhaven Science Associates, Llc


06/25/15
20150175760 

Epoxy-resin composition and film, prepreg, and fiber-reinforced plastic using same


An epoxy-resin composition of the components (a), (b), (d) and (e), where component (a) is an epoxy resin having an oxazolidone-ring structure, (b) is a bisphenol bifunctional epoxy resin with a number-average molecular weight of at least 600 but no more than 1300, which does not have an oxazolidone-ring structure, (d) is a triblock copolymer, and (e) is a curing agent. A film made of the epoxy-resin composition, a prepreg and a fiber-reinforced plastic is also disclosed.
Mitsubishi Rayon Co., Ltd.


06/25/15
20150175758 

Block copolymer and process for production of heat shrinkable film


The present invention provides a production process of a heat shrinkable film which is transparent, excellent in the balance of physical properties such as rigidity, elongation and shrink properties in both md and td, especially has a uniform film thickness and good stability in extrusion molding film while utilizing an inflation method; a block copolymer or hydrogenated product thereof, or a composition composed thereof excellent in tensile properties, optical properties, hardness, stretch properties, molding processability, shrink properties and solvent resistance and therefore suited for extrusion, injection molding and foams. The production process of a heat shrinkable film has a first inflation step of forming a tube having a thickness of from 0.05 to 0.5 mm by using a block copolymer having a vinyl aromatic hydrocarbon content of from 65 to 95 wt.
Asahi Kasei Chemicals Corporation


06/25/15
20150174300 

Block copolymer comprising at least one polyester block and at least one poly(ethylene glycol) block


The present invention provides a block copolymer for a coating on an implantable device for controlling release of drug and methods of making and using the same.. .
Abbott Cardiovascular Systems Inc.


06/25/15
20150173960 

Absorbent article with tear resistant film


A disposable absorbent article that includes an elastic film material. The elastic film resists the growth of a tear and include an seeps block copolymer having a tm of between about 10° c.
The Procter & Gamble Company


06/25/15
20150173334 

Reinforced hydrogel lures and bait


A fishing lure comprises a hydrogel material and at least one water soluble attractant. The fishing lure can be a single hydrogel component or can have a core-shell structure having one or more shells on a core, where the shells and core differ by repeating unit composition and/or by the cross-linking density of the shell and core material, wherein the core is more highly cross-linked than the shells.
University Of Florida Research Foundation, Inc.


06/18/15
20150168842 

Block co-polymer photoresist


An integrated circuit is made by depositing a pinning layer on a substrate. A block copolymer photoresist is formed on the pinning layer.
Pixelligent Technologies, Llc


06/18/15
20150168841 

Pattern forming method


According to one embodiment, first a guide pattern is formed above an object to processing, and then surface modification is performed on the guide pattern. Then a solution including a block copolymer is coated over the object to processing having the guide pattern formed thereon, and the block copolymer is made to phase separate over the object to processing.
Kabushiki Kaisha Toshiba




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Block Copolymer topics: Block Copolymer, Calcium Carbonate, Monovalent, Line Array, Semiconductor, Pyrrolidone, Hydrogen Peroxide, Propylene Oxide, Ethylene Oxide, Organosiloxane

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