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Block Copolymer patents



      

This page is updated frequently with new Block Copolymer-related patent applications.




Date/App# patent app List of recent Block Copolymer-related patents
06/23/16
20160178999 
 Method of designing lithography features by self-assembly of block copolymer patent thumbnailMethod of designing lithography features by self-assembly of block copolymer
A method of design or verification for a self-assemblable block copolymer feature, the block copolymer feature including a first domain having a first polymer type and a second domain having a second polymer type, the method including, based on the length of the second polymer type or on an uncertainty in position of the first domain within the block copolymer feature calculated based on the length of the second polymer type, adjusting a parameter of the self-assembly process of a block copolymer feature or verifying a placement of a block copolymer feature.. .

06/23/16
20160178822 
 Wire grid polarizer and  fabricating the same patent thumbnailWire grid polarizer and fabricating the same
A method of fabricating a wire grid polarizer includes sequentially forming a conductive layer, a guide layer, and a surface treatment protection layer on a substrate, patterning the surface treatment protection layer and the guide layer, forming a surface treatment film on side surfaces and upper surfaces of the first and second patterns, removing the first and second surface treatment protection patterns from the respective first and second patterns on which the surface treatment film is formed, to expose upper surfaces of the first and second guide patterns and providing a block copolymer of two monomers having mutually different etch rates into a space defined by the conductive layer and the first and second guide patterns, wherein a transfer layer which is hydrophobic to the block copolymer of two monomers is formed on the upper surfaces of the first and second guide patterns.. .

06/23/16
20160177151 
 Surface protection film patent thumbnailSurface protection film
An illustrative aspect of the invention provides a film comprising a release layer defining a first outer film surface and an adhesion layer defining a second outer film surface opposite the first outer film surface. The adhesion layer comprises a hydrogenated styrene block copolymer with a styrene content in a range of about 30% to 40% by weight.

06/23/16
20160177150 
 Hot melt adhesive composition for bonding packs of plastic containers patent thumbnailHot melt adhesive composition for bonding packs of plastic containers
The present invention relates to a hot melt adhesive composition, comprising based on the total weight of the hot melt adhesive composition: (a) more than 25 weight percent of at least one block copolymer, (b) from about 27 to about 45 weight percent of at least one plasticizer, (c) from about 18 to less than about 55 weight percent of a combination of at least two different resins; and (d) optionally up to 10% weight percent of at least one wax. The hot melt adhesive composition of the invention can be used for bonding bundles of plastic containers such as bottles into packs..

06/23/16
20160177141 
 Hot melt pressure-sensitive adhesives for removable applications patent thumbnailHot melt pressure-sensitive adhesives for removable applications
The present invention is related to pressure-sensitive hot melt adhesive compositions and their applications. In particular, the adhesive compositions described herein comprise a block copolymer component, a hydrocarbon tackifier resin component, and a propylene-based polymer component, wherein the propylene-based polymer component has a mfr of greater than about 1,000 g/10 min to less than about 10,000 g/10 min..

06/23/16
20160177083 
 Hydrogenated block copolymer and composition comprising same patent thumbnailHydrogenated block copolymer and composition comprising same
Provided are a block copolymer and a thermoplastic elastomer composition each of which is excellent in both tensile strength and elastic recovery, and has good abrasion resistance. Specifically, provided are a hydrogenated block copolymer, which is obtained by hydrogenating a block copolymer having two or more polymer blocks (a) each containing a structural unit derived from an aromatic vinyl compound and one or more polymer blocks (b) each containing structural units derived from isoprene and 1,3-butadiene, in which the hydrogenated block copolymer has a crystallization peak temperature (tc) defined as described below of −3 to 15° c., and a thermoplastic elastomer composition containing the hydrogenated block copolymer: (crystallization peak temperature (tc)) a peak top temperature of an exothermic peak observed when the temperature of a sample is increased from 30° c.

06/23/16
20160177037 
 Aminosiloxanes of high purity patent thumbnailAminosiloxanes of high purity
Disclosed herein is a composition comprising amino-functional polysiloxanes of high purity and their preparation. Also disclosed herein is an aminoalkyl-functional polysiloxane, a process for purifying this aminoalkyl-functional polysiloxane, a process for preparing the composition, a use of the composition, a polyorganosiloxane-polyorgano block copolymer, a process for the preparation of a polyorganosiloxane-polyorgano block copolymer and a shaped, formed and/or extruded shaped article..

06/23/16
20160177036 
 High aspect ratio nanofibril materials patent thumbnailHigh aspect ratio nanofibril materials
The present invention features linear and three-dimensional supramolecular materials self-assembled from block co-polymers comprising oligo(ethylene sulfide) (oes). The block copolymers assemble into fibrils, micelles, or matrices.

06/23/16
20160177026 
 Absorbable copolymers with improved thermal stability patent thumbnailAbsorbable copolymers with improved thermal stability
The present invention relates to absorbable block copolymers with improved characteristics including thermal stability, molecular weight consistency, inherent viscosity retention following melt extrusion, and fibers made from the polymers exhibit increased strength.. .

06/23/16
20160176165 
 Tear resistant multilayer film patent thumbnailTear resistant multilayer film
A tear resistant multilayer film including a stack of polymeric layers that includes first and second layer types. Layers of the first layer type includes a first polymer and the layers of the second layer type includes a second polymer.

06/23/16
20160175445 

Reversely thermo-reversible hydrogel compositions


A reversely thermo-reversible hydrogel composition comprising a water soluble block copolymer comprising at least two blocks of polyethylene oxide and at least one block of polypropylene oxide, and at least one associative gelling adjuvant having water solubility less than 0.5 g/100 ml, preferably less than 0.3 g/100 ml at 20° c., and being capable of forming water soluble inter-molecular complexes with the water soluble block copolymer in water. The hydrogel composition exhibits improved gelling efficiency, enhanced solubility and/or stability for water sparely soluble and insoluble pharmaceutical agents.

06/23/16
20160175247 

Composition containing polycationic triblock copolymer, polyanionic polymer and physiologically active peptide


Peg is a segment that contains poly(ethylene glycol).. .

06/16/16
20160172187 

Method of forming fine pattern and manufacturing integrated circuit device using the method


A method of forming a fine pattern includes forming pillar-shaped guides regularly arranged on a feature layer, forming a block copolymer layer on the feature layer around the pillar-shaped guides, phase separating the block copolymer layer, forming first domains regularly arranged on the feature layer with the pillar-shaped guides, forming a second domain on the feature layer surrounding the pillar-shaped guides and the first domains, removing the first domains, and forming holes corresponding with the first domains in the feature layer by etching the feature layer using the pillar-shaped guides and the second domain as etch masks. The block copolymer layer includes a polymer blend having first and second polymer blocks having first and second repeat units, respectively, a first homopolymer and a second homopolymer.

06/16/16
20160170115 

Wire grid polarizer and manufacturing the same


A method of manufacturing a wire grid polarizer is provided. The method includes: forming an electrical conductive layer on a substrate; forming a guide pattern layer on the electrical conductive layer, wherein the guide pattern layer includes two or more linear structures separated from one another; forming a fluorocarbon surface modification layer on each of the linear structures using a fluorine-based gas plasma treatment; and forming a neutral layer on the electrical conductive layer, wherein the neutral layer has a nonselective affinity with repeating units of a block copolymer..
Samsung Display Co. Ltd.


06/16/16
20160168506 

Oil recovery aid


Compositions for increasing corn oil recovery and embodiments of methods for using the composition for corn oil separation are described. The composition(s) incorporate an admixture that includes a polymer selected from a polyglycol ester, a polyethyleneoxide-polypropyleneoxide block copolymer, a poloxamine, or a mixture thereof.
Phibro Animal Health Corp.


06/16/16
20160168433 

Cohesive fastener formulations with olefin block copolymers


The present disclosure is directed to a composition comprising a) an olefin block copolymer; b) a tackifies; c) an ethylene-based polymer with a density from 0.90 g/cc to 0.94 g/cc; and d) an oil. The composition finds advantageous application as a cohesive layer in a fastening device, for example, a fastening device for a hygiene absorbent product..
Rohm And Haas Company


06/16/16
20160168345 

Elastomeric compositions for blown-film extrusion


Improving processability of homogeneous extrusion blown elastomeric films by compatibilizing impact polystyrene in an effective amount with olefin elastomers and styrenic block copolymers.. .
Clopay Plastic Products Company, Inc.


06/16/16
20160168334 

Phenolic compounds as end-capping agents for polysiloxanes in polycarbonate-polysiloxane block copolymers


Disclosed herein are phenolic compounds as replacements for eugenol as end-capping agents in polysiloxanes, such as eugenol-endcapped polysiloxanes that are used to prepare polycarbonate-polysiloxane copolymers.. .
Sabic Global Technologies B.v.


06/16/16
20160168305 

Method for controlling the synthesis of a block copolymer containing at least one nonpolar block and at least one polar block and use of said block copolymer in applications of nanolithography by direct self-assembly


Recovering the copolymer obtained.. .

06/16/16
20160168304 

Olefin block copolymer and preparation method thereof


The present description relates to an olefin block copolymer having excellences in elasticity and heat resistance and its preparation method. The olefin block copolymer includes a plurality of blocks or segments, each of which includes an ethylene or propylene repeating unit and an α-olefin repeating unit at different weight fractions.
Lg Chem, Ltd.


06/16/16
20160168303 

Mono vinyl aromatic conjugated diene block copolymer and polymer composition comprising said block copolymer and a mono vinylarene acrylate copolymer


The present invention relates to novel block copolymers comprising at least one mono vinyl aromatic monomer (also referred to as mono vinylarene) and at least one conjugated diene monomer, in particular to styrene butadiene block copolymers (sbc), with a defined block structure. The invention further relates to polymer blends which comprise at least one block copolymer and at least one mono vinylarene acrylate copolymer, in particular a styrene-methyl methacrylate copolymer.
Styrolution Group Gmbh


06/16/16
20160168298 

Photocrosslinkable block copolymers for hot-melt adhesives


Disclosed is a method for formation of block copolymers using a single electron transfer living radical polymerization (set-lrp) process. The process can be used to form di and tri-block copolymers from vinyl monomers.
Henkel Corporation


06/16/16
20160167344 

Slip-resistant garment and manufacturing process thereof


A slip-resistant garment may include: at least one textile structure; and/or at least one slip-resistant portion coupled to the at least one textile structure. The at least one slip-resistant portion may include at least one thermoplastic polymer selected from among: (a) block copolymers of styrene; (b) copolymers of ethylene with at least one c3-c12 alpha-olefin; (c) copolymers of at least one butene with at least one diene; or (d) copolymers of ethylene with at least one ester having an ethylene unsaturation selected from among: c1-c8 alkyl acrylate, c1-c8 alkyl methacrylates, or vinyl c2-c8 carboxylates.
Fait Plast S.p.a.


06/16/16
20160166411 

Fabric-covered polymeric prosthetic liner


A prosthetic cushion liner may include a fabric covering having an open end for introduction of a residual limb and a closed end opposite the open end. The prosthetic cushion liner may include a continuous layer of a gel composition residing on an interior surface of the fabric covering.
The Ohio Willow Wood Company


06/09/16
20160163563 

Etching method


There is provided an etching method for etching an object to be processed by using a substrate processing apparatus including a process chamber including a first electrode and a second electrode disposed opposite to the first electrode to receive the object to be processed thereon. The etching method includes a process of removing at least one of a first polymer and a second polymer by etching the object to be processed on which a pattern of the first polymer and the second polymer is formed by phase separation of a block copolymer containing the first polymer and the second polymer at a temperature lower than or equal to 10 degrees c.
Tokyo Electron Limited


06/09/16
20160163560 

Substrate processing method, storage medium and substrate processing system


There is provided a method of processing a substrate using a block copolymer composed of a first polymer containing an oxygen atom and a second polymer containing no oxygen atom, the method including: coating the block copolymer onto the substrate on which a predetermined pattern is formed; phase-separating the block copolymer into the first polymer and the second polymer; and heating the substrate in a low oxygen atmosphere to selectively remove the first polymer from the phase-separated block copolymer.. .
Tokyo Electron Limited


06/09/16
20160163536 

Methods of forming semiconductor device structures including metal oxide structures


Methods of forming metal oxide structures and methods of forming metal oxide patterns on a substrate using a block copolymer system formulated for self-assembly. A block copolymer at least within a trench in the substrate and including at least one soluble block and at least one insoluble block may be annealed to form a self-assembled pattern including a plurality of repeating units of the at least one soluble block laterally aligned with the trench and positioned within a matrix of the at least one insoluble block.
Micron Technology, Inc.


06/09/16
20160161647 

Method for producing mold for minute pattern transfer, producing diffraction grating using the same, and producing organic el element including the diffraction grating


A method for producing a mold includes: applying a block copolymer solution made of first and second polymers on a base member; performing a first annealing process at a temperature higher than tg of the block copolymer after drying the coating film; forming a concavity and convexity structure on the base member by removing the second polymer by an etching process; performing a second annealing process of the concavity and convexity structure at a temperature higher than tg of the first polymer; forming a seed layer on the structure; laminating or stacking a metal layer on the seed layer by an electroforming; and peeling off the metal layer from the base member. The second annealing process enables satisfactory transfer of a concavity and convexity structure on the base member onto the metal layer..
Tokyo Institute Of Technology


06/09/16
20160160086 

Hot-melt adhesive and use thereof


Use of a hot-melt adhesive for adhesive bonding of at least a first packaging and a second packaging, the hot-melt adhesive comprising: (a) 50-85 parts per weight of a basis polymer, wherein the basis polymer is consisting of a metallocene catalysed polyolefin polymer, preferably ethene-1-octene-copolymer; (b) 10-25 parts per weight of a modifying polymer, the modifying polymer comprising a styrene block copolymer; (c) 5-25 parts per weight of a reinforcing wax, preferably a polyethylene wax or a wax produced by the fischer-tropsch synthesis route, the wax component preferably comprising paraffinic oil, naphthenic oil, polybutene, dibasic ester, polyol or mixtures thereof; and (d) 0.05-1.5 parts per weight of a stabilizer component comprising a sterically hindered phenolic antioxidant and/or a hindered amine light stabilizer and a pack comprising the hot-melt adhesive.. .
Ip & Patent Management Ug (haftungsbeschränkt)


06/09/16
20160160038 

Thermoplastic elastomer compounds exhibiting shape memory via thermo-mechanical action


A thermoplastic elastomer compound is disclosed having a high strain recovery rate and a high strain fixity rate to provide shape memory, preferably manageable shape memory. One type of thermoplastic elastomer compound is comprises a maleated styrenic block copolymer and polycaprolactone to achieve the shape memory.
Polyone Corporation


06/09/16
20160159987 

Polydiorganosiloxane polymide copolymers having organic soft segments


Polydiorganosiloxane polyamide, block copolymers having organic soft segments and methods of making the copolymers are provided.. .
3m Innovative Properties Company


06/09/16
20160159961 

Process for production of fluorine-containing block copolymer


Provided is a process for the production of a fluorine-containing block copolymer, which suppresses the formation of a homopolymer as a by-product and which, regardless of whether the chain transfer constant of the iodine end is large or small, achieves nearly 100% conversion into a block copolymer. The process is characterized by reacting (a) a fluorine-containing polymer which has an iodine atom or a bromine atom at either or both terminals of the backbone chain and/or at a side-chain terminal with (m) a radical-polymerizable monomer in the presence of (c) a sulfur compound represented by general formula (2): (y1)nh2-ns2o4 (wherein y1 is a mono- or divalent metal ion or an ammonium ion; and n is an integer of 0 to 2)..
Daikin Industries, Ltd.


06/02/16
20160155787 

Method for fabricating display device and display device thereof


A display device having an uneven electrode enhances display quality by improving the emission efficiency of the vertically polarized light. The method for fabricating a display device includes forming a thin film transistor on a base substrate, forming a first electrode connected to the thin film transistor, forming a block copolymer layer on the first electrode, patterning the block copolymer layer and forming a uneven first electrode having a plurality of electrode grooves by etching the first electrode exposed by the block copolymer pattern, and forming a light emitting layer on the uneven first electrode..
Samsung Display Co., Ltd.


06/02/16
20160155784 

Method for fabricating display device and display device


A method for fabricating a display device includes forming a thin film transistor on a base substrate, forming a first electrode connected to the thin film transistor, forming a pixel defining layer overlapping a portion of the first electrode, such that the pixel defining layer exposes a portion of the first electrode and partitions pixel areas, forming a block copolymer layer on the first electrode and the pixel defining layer, patterning the block copolymer layer, etching the pixel defining layer by using the patterned block copolymer layer as a mask, such that an uneven pixel defining layer with a plurality of defining layer grooves is formed, and forming a light emitting layer on the first electrode and the uneven pixel defining layer.. .
Samsung Display Co., Ltd.


06/02/16
20160155743 

Method for forming patterns of semiconductor device


A method for forming patterns of a semiconductor device includes forming a block copolymer layer on an underlying layer, the underlying layer including a first block copolymer having first and second polymer blocks; phase-separating the block copolymer layer to form first block portions including the first polymer block and a second block portion surrounding the first block portions and including the second polymer block; removing the first block portions to form first openings; forming block copolymer pillars to fill the first openings, the block copolymer pillars including a second block copolymer having third and fourth polymer blocks; phase-separating the block copolymer pillars to form third block portions including the third polymer block and fourth block portions including the fourth polymer block within the first openings; and removing the third block portions to form second openings.. .
Samsung Electronics Co., Ltd.


06/02/16
20160154302 

Method for the perpendicular orientation of nanodomains of block copolymers, using statistical or gradient copolymers, the monomers of which differ at least in part from those present in each of the blocks of the block copolymer


The present invention relates to a process for the perpendicular orientation of nanodomains of block copolymers on a substrate by using a sublayer of random or gradient copolymers whose monomers differ at least in part from those present, respectively, in each of the blocks of the block copolymer.. .
Institut Polytechnique De Bordeaux


06/02/16
20160154158 

Wire grid polarizer and fabricating the same


A method for fabricating a wire grid polarizer according to an embodiment comprises: forming a conductive layer on a substrate; forming a guide layer on the conductive layer; forming a hard mask pattern to partially expose the guide layer; forming a guide pattern to partially expose the conductive layer; providing a block copolymer of two monomers having different etching rates; forming two sets of monomer blocks by aligning the block copolymer; selectively removing one set of monomer blocks; and forming a conductive wire pattern using the remaining set of monomer blocks and the guide pattern as etching masks. A width of an upper end of the guide pattern adjacent to the hard mask pattern is smaller than a width of a lower end adjacent to the conductive layer.
Samsung Display Co. Ltd.


06/02/16
20160152824 

Polymer composition


A composition may contain a first polymer, a second polymer, and a block copolymer. The first polymer may be polyactic acid, starch, polybutylene succinate, poly(butylene adipate-co-terephthalate), or a mixture thereof.
Total Research & Technology Feluy


06/02/16
20160152823 

High thermal conductivity thermoplastic resin composition with excellent injection moldability


A highly thermally conductive thermoplastic resin composition of the present invention contains: (a) a thermoplastic polyester resin having a weight average molecular weight of 50,000 to 200,000; (b) a polyalkylene terephthalate block copolymer composed of a polyether segment and a polyethylene terephthalate segment which includes an ethylene terephthalate unit as a main component; and (c) a highly thermally conductive inorganic compound, the highly thermally conductive thermoplastic resin composition containing, with respect to 100 parts by weight of (a) the thermoplastic polyester resin, 20 parts by weight to 200 parts by weight of (b) the polyalkylene terephthalate block copolymer and 20 parts by weight to 250 parts by weight of (c) the highly thermally conductive inorganic compound.. .
Kaneka Corporation


06/02/16
20160152758 

Compatibilized tire tread compositions


A polyolefin-polybutadiene block-copolymer and a tire tread composition comprising the polyolefin-polybutadiene block-copolymer, the composition comprising, by weight of the composition, within the range from 15 to 60 wt % of a styrenic copolymer, processing oil, filler, a curative agent, and from 4 to 20 wt % of a polyolefin-polybutadiene block-copolymer, wherein the polyolefin-polybutadiene block-copolymer is a block copolymer having the general formula po-xl-fpb; where “po” is a polyolefin block having a weight average molecular weight within the range from 1000 to 150,000 g/mole, the “fpb” is a functionalized polar polybutadiene block having a weight average molecular weight within the range from 500 to 30,000 g/mole, and “xl” is a cross-linking moiety that covalently links the po and fpb blocks; and wherein the maximum energy loss (tangent delta) of the immiscible polyolefin domain is a temperature within the range from −30° c. To 10° c..
Exxonmobile Chemical Patents Inc.


05/26/16
20160146977 

Optical film and production same


An optical film includes a hydrogenated block copolymer-[2] obtained by hydrogenating 90% or more of unsaturated bonds of block copolymer-[1] that includes at least two polymer blocks-[a] and at least one polymer block-[b], the polymer block-[a] including a repeating unit derived from an aromatic vinyl compound as main component, the polymer block-[b] including repeating unit derived from a linear conjugated diene compound as main component, ratio (wa:wb) of weight fraction wa of the polymer block-[a] in block copolymer-[1] to weight fraction wb of polymer block-[b] in block copolymer-[1] being 40:60 to 80:20, height from peak of ridge of a die line is formed in longitudinal direction of the optical film to a valley bottom point that is contiguous to the ridge being 100 nm or less over the optical film entire surface, and slope of the die line being 300 nm/mm or less over the optical film entire surface.. .
Zeon Corporation


05/26/16
20160145400 

Block copolymers in laminate manufacturing


A block copolymer is synthesized by polymerizing a silane-functionalized norbornene monomer in the presence of a catalyst system that includes a ziegler-natta catalyst and cocatalyst, followed by sequential addition and polymerization of a matrix-reactive functionalized norbornene monomer. In some embodiments, an enhanced substrate for a pcb is produced by applying the block copolymer to a substrate that includes glass fiber, followed by applying the base polymer to the substrate having the block copolymer applied thereto..
International Business Machines Corporation


05/26/16
20160145371 

Block copolymers in laminate manufacturing


Wherein r1 is a silane pendant group that includes a silicon-containing moiety capable of bonding to a glass surface, and wherein r2 is a matrix-reactive pendant group that includes at least one moiety (e.g., a vinyl-, allyl-, amine-, amide- or epoxy-containing moiety) capable of reacting with a base polymer.. .

05/26/16
20160144038 

Water-soluble supramolecular complexes


Water-soluble supramolecular complexes formed from a water soluble block copolymer and at least one associative gelling adjuvant. The copolymer includes at least two blocks of polyethylene oxide and at least one block of polypropylene oxide.
Broda International, Llc


05/19/16
20160141184 

Dry development and image transfer of si-containing self-assembled block copolymers


Provided herein are methods of selectively etching silicon-containing block copolymer (bcp) materials. The methods involve exposing a bcp material that includes at least one silicon-containing block and at least one non-silicon-containing block to a plasma that has a reducing chemistry.
Lam Research Corporation


05/19/16
20160139302 

Formation of antireflective surfaces


Technologies are described for methods and systems effective for etching nanostructures in a substrate. The methods may comprise depositing a patterned block copolymer on the substrate.
Brookhaven Science Associates, Llc


05/19/16
20160138169 

Method of forming a fine pattern


A method of forming a fine pattern includes providing a first metal layer on a base substrate, providing a first passivation layer on the first metal layer, providing a mask pattern on the first passivation layer, providing a partitioning wall pattern having a reverse taper shape by etching the first passivation layer, coating a composition having a block copolymer between the partitioning wall patterns adjacent each other, providing a self-aligned pattern by heating the composition, and providing a metal pattern by etching the first metal layer using the self-aligned pattern as a mask.. .
Samsung Display Co., Ltd.


05/19/16
20160137831 

Propylene-based block copolymer


An object of the present invention is to prevent an occurrence of flow-mark molding defects to improve an appearance of molded articles, and as a means for achieving the object, a propylene-based block copolymer is used as an appearance improver, the copolymer comprising 80 to 60% by weight of crystalline propylene polymer portion which has an intrinsic viscosity [η]p of 0.90 dl/g or less and 20 to 40% by weight of propylene/ethylene random copolymer portion which has an ethylene content of 35 to 50% by weight and an intrinsic viscosity [η]c of 7.0 dl/g or higher ([η]c/[η]p being 7.5 to 30), in which the propylene-based block copolymer has a mfr of 10 to 50 g/10 min.. .
Japan Polypropylene Corporation


05/19/16
20160137825 

A part consisting of a material and a manufacturing such part and a radiation sterilization of such part


The material of a part includes a composition obtained by blending an isobutylene-based, pre-crosslinked polymer as component (a), at least one poly olefin or a non-crosslinked rubber or a tpv as component (b), at least one polymer having a tg of 90° c. Or higher as component (c) and—preferably—at least one component (d) selected from the group of: substituted vinyl polymers, stryrenic block copolymers, inorganic functionalized and non-functionalized fillers, carbon black, halogen scavengers, preferably the inorganic halogen scavengers, acid acceptors, stabilizers, preferably the polymeric stabilizers, and processing aids.
Datwyler Pharma Packaging International Nv


05/19/16
20160137799 

Formation of superhydrophobic surfaces


Technologies are described for methods and systems effective for etching nanostructures in a substrate. The methods may comprise depositing a patterned block copolymer on the substrate.
Brookhaven Science Associates, Llc


05/19/16
20160137793 

Hot-melt adhesive and use thereof


The present invention relates to the use of a hot-melt adhesive for adhesive bonding of at least a first packaging and a second packaging, the hot-melt adhesive comprising: (a) 7-48 parts per weight of a polymer component, the polymer component comprising a styrene block copolymer; (b) 15-52 parts per weight of a tackifying component, wherein the tackifying component comprises thermoplastic adhesive resin, aliphatic hydrocarbon, cycloaliphatic hydrocarbon, aromatic hydrocarbon, the respective hydrocarbon optionally being modified and/or hydrogenated, terpenes, the terpenes optionally being modified or hydrogenated, rosins, the rosins optionally being modified or hydrogenated, or mixtures thereof; (c) 5-25 parts per weight of a plasticizer component, wherein the plasticizer component comprises paraffinic oils, naphthenic oils, polybuten, polybutadien, dibasic esters, polyols or mixtures thereof; and d) 0.02-1.2 parts per weight of a stabilizer component, wherein the stabilizer component is a light stabilizer, preferably as a sterically hindered phenolic antioxidant and/or a sterically hindered amine, most preferably is pentaerythritol tetrakis(3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate).. .
Khs Gmbh


05/19/16
20160137776 

Fluorescent polymers and applications thereof


In one aspect, block copolymers are described herein. A block copolymer described herein, in some embodiments, comprises a first block comprising a polymer or oligomer formed from the reaction product of (i) a polycarboxylic acid or a polycarboxylic acid equivalent, (ii) a polyol, and (iii) an amino acid; and a second block comprising a polymer or oligomer that differs from the polymer or oligomer of the first block.
The Penn State Research Foundation


05/19/16
20160137775 

Methoxypolyethylene glycol-polylactic acid block copolymer and preparation method thereof


A methoxypolyethylene glycol-polylactic acid block copolymer is disclosed, the methoxypolyethylene glycol-polylactic acid block copolymer being a block copolymer formed by ring opening polymerization of d,l-lactide and methoxypolyethylene glycol. A mass ratio of the methoxypolyethylene glycol to the d,l-lactide is 1:0.55-0.65 or 1:0.73-0.89 or 1:0.91-0.99.
Suzhou High-tech Bioscience Co., Ltd.


05/19/16
20160136292 

Metap-2 inhibitor polymersomes for therapeutic administration


Described herein are metap-2 inhibitors and compositions and formulations thereof, and more particularly compositions and formulations of metap-2 inhibitors wherein the metap-2 inhibitor is associated with a block copolymer comprising a hydrophilic polymer moiety and a hydrophobic polymer moiety. The present invention also relates to compositions and formulations comprising metap-2 inhibitors for oral administration or administration via routes such as topical or ocular administration.
Children's Medical Center Corporation


05/12/16
20160133292 

Density multiplication and improved lithography by directed block copolymer assembly


Methods to pattern substrates with dense periodic nanostructures that combine top-down lithographic tools and self-assembling block copolymer materials are provided. According to various embodiments, the methods involve chemically patterning a substrate, depositing a block copolymer film on the chemically patterned imaging layer, and allowing the block copolymer to self-assemble in the presence of the chemically patterned substrate, thereby producing a pattern in the block copolymer film that is improved over the substrate pattern in terms feature size, shape, and uniformity, as well as regular spacing between arrays of features and between the features within each array compared to the substrate pattern.
Hgst Netherlands B.v.


05/12/16
20160131925 

Method of manufacturing electrophoretic particle, electrophoretic particle, electrophoretic dispersion, electrophoretic sheet, electrophoretic device, and electronic apparatus


There is provided a method of manufacturing an electrophoretic particle, in which the electrophoretic particle includes a mother particle and a block copolymer, including: a step of polymerizing a monomer m having a site contributing to dispersibility into a dispersion medium, a monomer m including a second functional group having reactivity with the first functional group, a charged monomer m by living polymerization without random copolymerizing the monomer m1 and the monomer m2 so as to obtain the block copolymer; and a step of reacting the first functional group and the second functional group to a bonding section to a mother particle so as to connect the block copolymer to the mother particle.. .
Seiko Epson Corporation


05/12/16
20160131811 

Wire grid polarizer and fabricating the same


Provided is a method of fabricating a wire grid polarizer, the method comprising an organic light-emitting display panel. According to an aspect of the present disclosure, there is provided a method comprising sequentially stacking a conductive wire pattern layer, a first neutral layer, a guide pattern layer and a second neutral layer on a substrate, forming etch-stop patterns on the second neutral layer, forming second neutral layer patterns and guide patterns by patterning the second neutral layer and the guide pattern layer using the etch-stop patterns, coating a block copolymer of two types of monomer blocks having different etch rates on the first neutral layer and the second neutral layer patterns, aligning the block copolymer, removing one type of monomer blocks from the aligned block copolymer, and patterning the conductive wire pattern layer using the remaining monomer blocks, the second neutral layer patterns, and the guide patterns..
Samsung Display Co. Ltd.


05/12/16
20160130435 

Thermoplastic resin composition and molded article made therefrom


A thermoplastic resin composition including a first thermoplastic polymer and a second thermoplastic polymer, wherein the first thermoplastic polymer is a block copolymer including a plurality of polymer blocks, at least one of the plurality of polymer blocks includes a random copolymer, and at least one structural unit of the first thermoplastic polymer and a structural unit of the second thermoplastic polymer are stereoisomers, a molded article made therefrom, and methods of making the same.. .
Samsung Electronics Co., Ltd.


05/12/16
20160130430 

Polystyrene and polylactic acid blends


Polymeric blends of polystyrene (ps) and polylactic acid (pla) are described, in the preparation of which a compatibilizing agent was added, preferably a ps-pla block copolymer. Such compatibilizing agents act controlling phase separation of the blending compounds, and preventing excessive growth of polystyrene domains scattered in the pla matrix; and this results in blends with good mechanical and thermal resistance..
Universidade Federal Do Rio Grande Do Sul - Ufrgs


05/12/16
20160130407 

Polyethercarbonate-polyoxymethylene block copolymers


The present invention relates to a method for producing polyethercarbonate-polyoxymethylene block copolymers, comprising the step of polymerizing formaldehyde, wherein formaldehyde is polymerized in the presence of a polyethercarbonate having at least one zerewitinoff-active h atom, obtaining an intermediate product. The obtained intermediate product can be further reacted with a cyclic carboxylic acid ester or carbonic acid ester, a cyclic anhydride, an epoxide, and/or an isocyanate, wherein a hydroxyl- or carboxy-functional or nco-modified polyethercarbonate-polyoxymethylene block copolymer is obtained.
Covestro Deutschland Ag


05/12/16
20160129117 

Novel boronic acid compound preparation


The purpose of the present invention is to avoid side effects from contained medicines. Provided are: a preparation obtained by mixing a boronic acid compound and a block copolymer represented by general formula (i); and a production method therefor..
Nippon Kayaku Kabushiki Kaisha


05/12/16
20160128940 

Docetaxel nano-polymer micelle lyophilized preparation and preparation method thereof


A docetaxel nano-polymer micelle lyophilized preparation is disclosed including methoxypolyethylene glycol-polylactic acid block copolymer carrier material and docetaxel, the docetaxel being is encapsulated in the carrier material. A mass ratio of the docetaxel to the carrier material is 0.01-0.15.
Suzhou High-tech Biosciense Co., Ltd


05/05/16
20160124307 

Substrate treatment method, computer storage medium and substrate treatment system


A substrate treatment method includes: a polymer separation step of phase-separating a block copolymer into a hydrophilic polymer and a hydrophobic polymer; and a polymer removal step of selectively removing the hydrophilic polymer from the phase-separated block copolymer, wherein in the polymer removal step, the hydrophilic polymer is removed by: irradiating the phase-separated block copolymer with an energy ray; then supplying a first polar organic solvent having a first degree of dissolving the hydrophilic polymer, being lower in boiling point than water and capable of dissolving water, and not dissolving the hydrophobic polymer, to the block copolymer; and then supplying a second polar organic solvent having a second dissolving degree lower than the first dissolving degree, being higher in boiling point than water, and not dissolving the hydrophobic polymer, to the block copolymer.. .
Tokyo Electron Limited


05/05/16
20160122859 

Method for directed self-assembly (dsa) of block copolymers using guiding line sidewalls


A guiding pattern for directed self-assembly (dsa) of a block copolymer (bcp) is an array of spaced guiding stripes on a substrate that have a width equal to nl0 and a pitch equal to (n+k)l0, where n and k are integers equal to or greater than 1 and l0 is the natural pitch of the bcp. The guiding stripes have oxidized sidewalls.
Hgst Netherlands B.v.


05/05/16
20160122603 

Adhesive containing block copolymer


Provided are an acrylic hot-melt adhesive that has both good hot-melt processability and good holding power, that is suitable for applications to a hot-melt coating method in which coating is performed at a low temperature at a high speed, that has good transparency and good weather resistance, and that further has good adhesiveness at low temperatures, and a block copolymer suitable for use in the adhesive. Prepared is an adhesive containing a block copolymer having at least one structure represented by a general formula: -[a1]-[b/a2]- (where, in the formula, [a1] represents a polymer block composed of a structural unit derived from a methacrylic acid ester (a1), [b/a2] represents a copolymer block composed of a structural unit derived from an acrylic acid ester (b) and a structural unit derived from a methacrylic acid ester (a2), and the copolymer block [b/a2] has a gradient copolymer block section in which a copolymerization ratio of the methacrylic acid ester (a2) continuously increases from a section connected to the polymer block [a1]), and having a total content of the structural units derived from the methacrylic acid ester (a1) and the methacrylic acid ester (a2) of 5% to 60% by mass, a weight-average molecular weight (mw) of 30,000 to 300,000, and a molecular weight distribution (mw/mn) of 1.0 to 1.5..
Kuraray Co., Ltd.


05/05/16
20160122580 

Defect reduction methods and composition for via formation in directed self-assembly patterning


The present invention relates to a two novel processes, “dual coating process and single coating process,” for forming an array of via's by employing a graphoepitaxy approach, where an array of pillars the surface of the pillars has been modified by the formation of a hydrophobic poly(vinyl aryl) brush at the surface of the pillars. The present invention also relates to a composition comprising a poly(vinyl aryl) hydrophopic polymer brush precursor terminated at one chain end with a reactive functional group, a diblock copolymer comprising an etch resistant hydrophobic block and a highly etchable hydrophilic block, a thermal acid generator and a solvent..
Az Electronic Materials (luxembourg) S.a.r.l.


05/05/16
20160122579 

Silicon containing block copolymers for direct self-assembly application


The invention also relates to a novel composition comprising the novel polymer and a solvent. The invention further relates to a process utilizing the novel composition for affecting directed self-assembly of the block copolymer..

05/05/16
20160122571 

Orientation control materials for block copolymers used in directed self-assembly applications


An orientation control layer (ocl) for self-assembly of block copolymers comprises a random copolymer comprising a first repeat unit having an ethylenic backbone functional group and a side chain aromatic ring, a second repeat unit comprising an ethylenic backbone functional group and a side chain polycarbonate, and a third repeat unit comprising an ethylenic backbone functional group and a side chain ester or amide bearing an active group capable of forming a covalent bond with a substrate surface (e.g., a silicon wafer). The ocls are neutral wetting to block copolymers having a high flory-huggins interaction parameter chi (χ) (“high-chi” block copolymers) such as a block copolymer comprising a polystyrene block and a polycarbonate block.
International Business Machines Corporation


05/05/16
20160121279 

Device for producing polymer dispersion solution of core-shell structured silicon nanoparticles


Disclosed herein is a device for producing a polymer dispersion solution of core-shell structured silicon nanoparticles. The device includes: a canister for storing silicon nanoparticles; a quantitative feeder for receiving the silicon nanoparticles released from the canister and for quantitatively feeding the same; a mixing tank for mixing block copolymer constituting a shell, and a dispersion solvent, and the silicon nanoparticles fed through the quantitative feeder to form core-shell structured silicon nanoparticles; an ultrasonic disperser for receiving the core-shell structured silicon nanoparticles released from the mixing tank and a dispersion solvent and for dispersing the particles with ultrasonic waves; and a dispersion solvent tank for feeding a dispersion solvent into the mixing tank and the ultrasonic disperser..
Oci Company Ltd.


05/05/16
20160121172 

Polyester-based thermoplastic elastomers containing plasticizers for making golf balls


Multi-layered golf balls having at least one layer made of a polyester composition containing a polyester thermoplastic elastomer and plasticizer are provided. The plasticizers help reduce the glass transition temperature (tg) of the composition and various plasticizers may be used.
Acushnet Company


05/05/16
20160121014 

An elastic attachment adhesive and a disposable absorbent article made with the same


The invention relates to a disposable absorbent article and an adhesive composition including a first polymer that is propylene-based and has a mw of no greater than about 75,000, and a second polymer selected from a group including propylene based polymers with a mw of at least about 100,000 and styrene block copolymers with a styrene content of no greater than about 20% where the adhesive composition is useful for elastic attachment applications.. .
H.b. Fuller Company


04/28/16
20160118555 

Compositions of resin-linear organosiloxane block copolymers


Curable compositions of “resin-linear” organosiloxane block copolymers comprising a nanoparticulate filler are disclosed. In some instances, even at high loading levels, curable and solid compositions comprising “resin linear” organosiloxane block copolymers and a nanoparticulate filler exhibit melt flow and cure behavior.
Dow Corning Toray Co., Ltd.


04/28/16
20160115312 

Sealing element compositions having biorenewable content


Thermoplastic elastomer compositions, in particular derived from one or more styrenic block copolymers, a relatively high molecular weight isobutylene-containing (co)polymer, and a biorenewable processing aid. The isobutylene-containing (co)polymer imparts desirable oxygen barrier performance to the composition and the biorenewable processing aid acts as a barrier synergist as well as a processing aid useful during compounding.
Teknor Apex Company


04/28/16
20160115269 

Process for producing hydrogenated block copolymer, hydrogenated block copolymer obtained by the process, and composition thereof


The present invention relates to a method for producing a hydrogenated block copolymer, including the steps of: (a) forming a block copolymer by allowing a living polymer having a specific structure to react with a tetra- or more functional silane coupling agent; (b) hydrogenating the block copolymer to form a hydrogenated block copolymer; (c) isolating the resultant hydrogenated block copolymer; and (d) deactivating a functional group in the silane coupling agent and/or an unreacted functional group present in a coupling agent residue in the block copolymer or the hydrogenated block copolymer prior to the step (c), in which the number of functional groups derived from the coupling agent in the hydrogenated block copolymer recovered in the step (c) is 1.5 or less per block copolymer molecule; a hydrogenated block copolymer obtained by the method; and a composition containing the hydrogenated block copolymer.. .
Kuraray Co., Ltd


04/28/16
20160114296 

Improved membranes


Membrane comprising a block copolymer comprising polyarylene ether blocks and polyalkylene oxide blocks, wherein said polyalkylene oxide blocks comprise at least one polyethylene oxide segment and at least one segment of at least one polyalkylene oxide that is different from polyethylene oxide. .
Basf Se


04/28/16
20160114058 

Polymer micelle pharmaceutical composition


A polymer micelle pharmaceutical composition is provided and includes: a block copolymer unit α having a hydrophilic polymer chain segment and a hydrophobic polymer chain segment; and a block copolymer unit β having a hydrophilic polymer chain segment and a hydrophobic polymer chain segment, wherein: the block copolymer unit α and the block copolymer unit β are radially arranged in the state in which the hydrophilic polymer chain segments are directed outward and the hydrophobic polymer chain segments are directed inward; and the hydrophobic polymer chain segment of the block copolymer unit α is constituted of repeating units having side chains, at least one of the side chains having a hydrophilic group.. .
Nanocarrier Co., Ltd.


04/28/16
20160113884 

Preparation radiation sensitive copolymer carrier for coating radiated nanoparticles and chemotherapy drugs


The preparation method of radiation-sensitive copolymer carrier for coating radiated nanoparticles and/or chemotherapy drugs includes forming a nanosphere by diselenide block copolymers and dspe-peg-biomarkers to coat chemotherapy drugs and/or radiated nanoparticles that can be released from the opened nanosphere by protons penetrating tissue during proton therapy. The treatment effect of proton therapy is enhanced by two ways of using the radiated nanoparticles released from an opened nanosphere to produce nuclear fission with the protons for releasing electrons to destroy cancer cells of tumor and the chemotherapy drugs released from the opened nanosphere for distributing among tissue to kill the cancer cells of the tumor..

04/21/16
20160111275 

Compositions of low-k dielectric sols containing nonmetallic catalysts


A sol composition for producing a porous low-k dielectric material is provided. The composition can include at least one silicate ester, a polar solvent, water, an acid catalyst for silicate ester hydrolysis, an amphiphilic block copolymer surfactant, and a nonmetallic catalyst that reduces dielectric constant in the produced material.

04/21/16
20160108305 

Curable, resealable, swellable, reactive sealant composition for zonal isolation and well integrity


The invention relates to a curable sealant composition broadly comprising a resealable, swellable, reactive sealant and free radical initiator; said resealable, swellable reactive sealant comprises monofunctional monomer(s), multifunctional monomer(s), reactive polymer such as unsaturated styrenic block copolymer, swellable additive, and optional components. The monofunctional monomer is a vinyl ester derivative of versatic acid with c9-c12 carbon atoms, or monoacrylate, monomethacrylate, monoacrylamide, or monomethacrylamide.

04/21/16
20160108296 

Bonding adhesive and adhered roofing systems prepared using the same


A bond adhesive composition comprising an acrylic block copolymer and protic solvent.. .

04/21/16
20160108228 

Thermoplastic elastomer composition and molded body


The thermoplastic elastomer composition of the present invention is a thermoplastic elastomer composition including a hydrogenated block copolymer (a) and a softening agent (b), the hydrogenated block copolymer (a) being a hydrogenated product of a block copolymer including a polymer block (a) composed of a constitutional unit derived from an aromatic vinyl compound and a polymer block (b) containing 1 to 100% by mass of a constitutional unit (b1) derived from farnesene and 99 to 0% by mass of a constitutional unit (b2) derived from a conjugated diene other than farnesene; a mass ratio of the polymer block (a) and the polymer block (b) [(a)/(b)] being 1/99 to 70/30; 50 mol % or more of carbon-carbon double bonds in the polymer block (b) being hydrogenated; and a content of the softening agent (b) being 20 to 2,000 parts by mass on the basis of 100 parts by mass of the hydrogenated block copolymer (a).. .

04/21/16
20160108181 

Method and catalyst system for preparing polymers and block copolymers


The present invention provides methods for producing block copolymers, either by the sequential addition of monomers, or using a “one-pot” method. The invention also relates to novel methods for producing polyesters by ring opening lactides and/or lactones and by copolymerising anhydrides and epoxides..

04/21/16
20160108178 

Block copolymers


block copolymer comprising polyarylene ether blocks and polyalkylene oxide blocks, wherein said block copolymer comprises at least two polyalkylene oxide blocks that are endcapped with different endcapping groups.. .



Block Copolymer topics: Block Copolymer, Calcium Carbonate, Monovalent, Line Array, Semiconductor, Pyrrolidone, Hydrogen Peroxide, Propylene Oxide, Ethylene Oxide, Organosiloxane

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