Block Copolymer

Block Copolymer-related patent applications - as published by the U.S. Patent and Trademark Office (USPTO).

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Ordering block copolymers
Board Of Regents The University Of Texas System
May 18, 2017 - N°20170139326

A method for ordering block copolymers including forming a first layer having a first preference mode; and providing a reactive agent in selected regions of the first layer that modifies the selected regions to a second preference mode, wherein the selected regions define other regions of the first layer retaining the first preference mode thereby forming an alignment layer for ...
Inkjet ink compositions
Cabot Corporation
May 18, 2017 - N°20170137650

Disclosed herein inkjet ink compositions comprising: (a) a carbon black having the following properties: oan≧170 ml/100 g; and stsa ranging from 160 to 220 m2/g; (b) at least one polymeric dispersant selected from polyoxyethylene / polyoxypropylene block copolymers, styrene-acrylic resins, styrene-methacrylic resins, styrene-maleic acid copolymers, and styrene- maleic anhydride copolymers; (c) at least one surfactant selected from ethoxylated siloxanes, succinic acid ...
Ordered nanoscale domains by infiltration of block copolymers
Uchicago Argonne, Llc
May 18, 2017 - N°20170137577

A method of preparing tunable inorganic patterned nanofeatures by infiltration of a block copolymer scaffold having a plurality of self-assembled periodic polymer microdomains. The method may be used sequential infiltration synthesis (sis), related to atomic layer deposition (ald). The method includes selecting a metal precursor that is configured to selectively react with the copolymer unit defining the microdomain but is ...
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Substrate treatment method, computer readable storage medium and substrate treatment system
Tokyo Electron Limited
May 11, 2017 - N°20170133235

A substrate treatment method includes: forming a plurality of circular patterns of a resist film on a substrate; thereafter applying a first block copolymer; then phase-separating the first block copolymer into a hydrophilic polymer and a hydrophobic polymer; thereafter selectively removing the hydrophilic polymer; then selectively removing the resist film from a top of the substrate; thereafter applying a second ...
Hot-melt adhesive and use thereof
Ip & Patent Management Ug (haftungsbeschränkt)
May 11, 2017 - N°20170130104

The present invention relates to the use of a hot-melt adhesive for adhesive bonding of at least a first packaging and a second packaging, the hot-melt adhesive comprising: (a) 7-70 parts per weight, preferably 20-60 parts by weight, more preferred 30-50 parts per weight, even more preferred 35-45 parts by weight, of a polymer component, the polymer component comprising a ...
Polymer material for self-assembly, self-assembled film, and method for producing self-assembled film
Horiba Stec, Co., Ltd.
May 11, 2017 - N°20170129984

A polymer material for self-assembly of the present invention includes a multi-block copolymer containing a first polymer block with a structural unit having a specific structure as a main component and a second polymer block with a structural unit having a specific structure as a main component that are coupled with each other.
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Transposable pressure sensitive adhesives, articles, and related methods
Avery Dennison Corporation
May 11, 2017 - N°20170128615

Transposable adhesives which exhibit a change in adhesive properties upon exposure to particular stimuli or environmental factors are described. The adhesives include one or more olefin block copolymers in combination with tackifiers and process oils. The transposable adhesives may additionally include one or more polyolefin elastomers.
Water-soluble supramolecular complexes
Broda Technologies Co., Ltd.
May 11, 2017 - N°20170128574

Water-soluble supramolecular complexes formed from a water soluble block copolymer and at least one associative gelling adjuvant. The copolymer includes at least two blocks of polyethylene oxide and at least one block of polypropylene oxide. The adjuvant has a water solubility less than 0. 5 g/100 ml at 20° c. When combined with water, the complexes form a transparent reversely thermo-reversible hydrogel ...
Method of forming pattern of semiconductor device
Samsung Electronics Co., Ltd.
May 04, 2017 - N°20170125247

A method of forming a pattern of a semiconductor device includes forming a lower film on a substrate having a first surface and a second surface at different levels, forming an upper film of hydrophobic material on the lower film, forming a block copolymer film on the upper film, phase-separating the block copolymer film to form first patterns spaced apart ...
Block copolymers and pattern treatment compositions and methods
Dow Global Technologies Llc
May 04, 2017 - N°20170123316

Block copolymers comprise a first block comprising an alternating copolymer, and a second block comprising a unit comprising a hydrogen acceptor. The block copolymers find particular use in pattern shrink compositions and methods in semiconductor device manufacture for the provision of high resolution patterns.
Hot melt elastic attachment adhesive for low temperature applications
Kraton Polymers U.s. Llc
May 04, 2017 - N°20170121577

An adhesive composition comprising: one or more block copolymers and one or more tackifying resins, wherein said one or more block copolymers comprise (i) one or more blocks of polymerized alkenyl arene monomer (a block), (ii) one or more blocks of polymerized conjugated diene monomer (b block), and optionally at least one low molecular weight (compared to b block) block ...
Release materials
3m Innovative Properties Company
May 04, 2017 - N°20170121566

The present application is directed to an adhesive article comprising a pressure sensitive adhesive layer and a release layer in contact with the pressure sensitive adhesive layer. The release layer comprises a polyolefin block copolymer. Generally, the polyolefin block copolymer has a density of no greater than 0. 9 g/cc.
Block copolymers with high flory-huggins interaction parameters for block copolymer lithography
Wisconsin Alumni Research Foundation
May 04, 2017 - N°20170121555

Block copolymers for use in block copolymer lithography, self-assembled films of the block copolymers and methods for polymerizing the block copolymers are provided. The block copolymers are characterized by high flory-huggins interaction parameters (χ). The block copolymers can be polymerized from protected hydroxystyrene monomers or from tert-butyl styrene and 2-vinylpyridine monomers.
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Substantially symmetrical 3-arm star block copolymers
E I Du Pont De Nemours And Company
May 04, 2017 - N°20170121468

In a first aspect, a composition of matter includes a substantially symmetrical 3-arm star block copolymer having a central core and diblock copolymer arms having inner blocks and outer blocks. In a second aspect, an article includes a substrate, a block copolymer composition on the substrate, and a neutral layer between the substrate and the block copolymer composition.
Alternating crystalline-amorphous multiblock copolymer compositions and methods of production thereof
Exxonmobil Chemical Patents Inc.
May 04, 2017 - N°20170121467

Alternating crystalline-amorphous polyolefin based multiblock copolymer compositions and methods for producing these multiblock copolymer compositions are disclosed. Also disclosed is the use of these multiblock copolymer compositions as additives to high density polyethylene (hdpe) resins in order to form polymer blends having improved ductility and toughness over that of the hdpe resins while retaining high mechanical strength, and the use ...
Process for sealing flexible fitment to flexible film
Dow Global Technologies Llc
May 04, 2017 - N°20170120552

The present disclosure provides a process. In an embodiment, the process includes (a) providing a fitment with a base having a wall thickness (tw). The base comprises an ethylene/a olefin multi-block copolymer. The process includes (b) placing the base between two opposing multilayer films. Each multilayer film has a respective seal layer comprising an olefin-based polymer. The process includes (...
Methods for the production, modification and use of metallic nanoparticles
Loma Linda University
May 04, 2017 - N°20170119686

Provided herein is a method for producing triblock copolymer-coated metallic nanoparticle seeds which increases the size and shape homogeneity of the triblock copolymer-coated metallic nanoparticle seeds. Also provided is a quantity of triblock copolymer-coated metallic nanoparticle seeds. Also provided herein is a method for producing triblock copolymer-coated metallic nanoparticles which increases the size and shape homogeneity of the triblock copolymer-coated ...
Polymer, thermosensitive carrier and use thereof
Institute Of Nuclear Energy Research, Atomic Energy Council, Executive Yuan, R.o.c.
May 04, 2017 - N°20170119676

Disclosed herein are a novel polymer, a thermosensitive carrier prepared using the same and use thereof. The novel polymer is essentially composed of a peo-ppo-peo block copolymer and silane.
Dielectric with air gaps for use in semiconductor devices
International Business Machines Corporation
April 27, 2017 - N°20170117357

Aspects of the invention are directed to a method for forming a semiconductor device. A dielectric layer is formed on a semiconductor substrate. Subsequently, a metallic contact is formed in the dielectric layer such that it lands on the semiconductor substrate. A masking layer comprising a block copolymer is then formed on the dielectric layer. This block copolymer is caused ...
Method of electroplating copper into a via on a substrate from an acid copper electroplating ...
Rohm And Haas Electronic Materials Llc
April 27, 2017 - N°20170114469

Copper electroplating baths containing primary alcohol alkoxylate block copolymers and ethylene oxide/propylene oxide random copolymers having specific hlb ranges are suitable for filling vias with copper, where such copper deposits are substantially void-free and substantially free of surface defects.
Use of peo-pbo block copolymers in ophthalmic compositions
Alcon Research, Ltd.
April 27, 2017 - N°20170114300

The use of poly(oxyethylene)-poly(oxybutylene) block copolymers in pharmaceutical compositions useful for modifying the surfaces of contact lenses and other medical devices is disclosed. The present invention is based in-part on a discovery that this class of compounds is particularly efficient in wetting hydrophobic surfaces, such as the surfaces of silicone hydrogel contact lenses and other types of ...