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Block Copolymer patents



      
           
This page is updated frequently with new Block Copolymer-related patent applications. Subscribe to the Block Copolymer RSS feed to automatically get the update: related Block RSS feeds. RSS updates for this page: Block Copolymer RSS RSS


Liquid crystal display and manufacturing method thereof

Samsung Display

Liquid crystal display and manufacturing method thereof

Use of topography to direct assembly of block copolymers in grapho-epitaxial applications

Tokyo Electron Limited

Use of topography to direct assembly of block copolymers in grapho-epitaxial applications

Date/App# patent app List of recent Block Copolymer-related patents
04/23/15
20150112031
 Process for preparing a block copolymer patent thumbnailnew patent Process for preparing a block copolymer
The present invention relates to a process for preparing a block copolymer comprising polyarylene ether and polyalkylene oxide blocks, comprising the reaction of an ho-terminated polyarylene ether with a monomeric alkylene oxide. The present invention also relates to a block copolymer obtainable from this process.
Basf Se
04/23/15
20150112029
 Polyester polyols and methods of making and using the same patent thumbnailnew patent Polyester polyols and methods of making and using the same
Polyester polyols are generally disclosed, including methods of making and using them. In some embodiments, the polyester polyols are incorporated into a block copolymer, such as a polyurethane block copolymer.
Elevance Renewable Sciences, Inc.
04/23/15
20150112011
 Compositions of resin-linear organosiloxane block copolymers patent thumbnailnew patent Compositions of resin-linear organosiloxane block copolymers
Curable compositions of “resin-linear” organosiloxane block copolymers comprising a metal ligand complex are disclosed. The addition of a metal ligand complex to compositions of certain resin-linear organosiloxane block copolymers results in curable compositions having faster cure rates, and improved mechanical strength and/or thermal stability over similar compositions without the metal ligand complex..
Dow Corning Corporation
04/23/15
20150111387
 Use of topography to direct assembly of block copolymers in grapho-epitaxial applications patent thumbnailnew patent Use of topography to direct assembly of block copolymers in grapho-epitaxial applications
A method is provided for forming a patterned topography on a substrate. The substrate is provided with features formed atop that constitute an existing topography, and a template for directed self-assembly (dsa) is formed surrounding the exposed topography.
Tokyo Electron Limited
04/23/15
20150111386
 Use of topography to direct assembly of block copolymers in grapho-epitaxial applications patent thumbnailnew patent Use of topography to direct assembly of block copolymers in grapho-epitaxial applications
A method is provided for forming a patterned topography on a substrate. The substrate is provided with features formed atop that constitute an existing topography, and a template for directed self-assembly (dsa) surrounds the exposed topography.
Tokyo Electron Limited
04/23/15
20150111014
 Multilayer polymeric structure patent thumbnailnew patent Multilayer polymeric structure
The invention relates to multilayer polymer structures having at least three layers. These layers include a polar capstock layer other than an acrylic, an olefinic substrate layer, and a tie layer.
Arkema France
04/23/15
20150109563
 Liquid crystal display and manufacturing method thereof patent thumbnailnew patent Liquid crystal display and manufacturing method thereof
A manufacturing method of a liquid crystal display includes: forming an etch target layer including a conductive material on a first substrate; forming a first mask layer on the etch target layer; forming a block copolymer coating layer including a plurality of polymers on the first mask layer; processing the block copolymer coating layer to form a block copolymer pattern layer including first and second polymer blocks; removing one of the first or second polymer blocks to form a second mask pattern layer; etching the first mask layer by using the second mask pattern layer as an etching mask to form a first mask pattern layer; and etching the etch target layer by using the first mask pattern layer as an etching mask to form a first electrode. The first electrode includes a plurality of the first minute patterns extending in a predetermined direction and having a polarization function..
Samsung Display Co., Ltd.
04/23/15
20150108087
 Use of grapho-epitaxial directed self-assembly to precisely cut lines patent thumbnailnew patent Use of grapho-epitaxial directed self-assembly to precisely cut lines
A method for forming a patterned topography on a substrate is provided. The substrate is initially provided with an exposed plurality of lines formed atop.
Tokyo Electron Limited
04/23/15
20150107714
 High-pressure tube comprising several co-extruded layers patent thumbnailnew patent High-pressure tube comprising several co-extruded layers
A high-pressure tube comprises several co-extruded layers which include a reinforcing inner layer. Said reinforcing inner layer exhibits a mixture of a block copolymer and a homopolymer.
Raumedic Ag
04/16/15
20150105180
 Dual core golf ball having negative-hardness-gradient thermoplastic inner core and steep positive-hardness-gradient thermoset outer core layer patent thumbnailDual core golf ball having negative-hardness-gradient thermoplastic inner core and steep positive-hardness-gradient thermoset outer core layer
A golf ball includes a thermoplastic hnp inner core layer having a center hardness less than the surface hardness to define a positive hardness gradient. An outer core layer is disposed about the inner core and is formed from a thermoset rubber composition.
Acushnet Company
04/16/15
20150104946

Methods of forming fine patterns for semiconductor devices


Methods of forming fine patterns for semiconductor devices are provided. A method may include sequentially forming a lower layer and a mask layer having first openings on a substrate, forming pillars to fill the first openings and protrude upward from a top surface of the mask layer, forming a block copolymer layer on the substrate with the pillars, performing a thermal treatment to the block copolymer layer to form a first block portion and second block portions, removing the second block portions to form guide openings exposing the mask layer, and etching the mask layer exposed by the guide openings to form second openings..
Samsung Electronics Co., Ltd.
04/16/15
20150104692

Secondary battery, battery pack, electric vehicle, electric power storage system, electric power tool, and electronic apparatus


A secondary battery includes: a cathode; an anode; and an electrolyte layer containing a nonaqueous electrolytic solution and a polymer compound, wherein the polymer compound contains a block copolymer, and the block copolymer contains vinylidene fluoride, hexafluoro propylene, and one or more of monomethyl maleate, trifluoroethylene, and chlorotrifluoroethylene as polymerization units.. .
Sony Corporation
04/16/15
20150104691

Secondary battery, battery pack, electric vehicle, electric power storage system, electric power tool, and electronic apparatus


A secondary battery includes a cathode, an anode, and an electrolyte layer including non-aqueous electrolytic solution and a polymer compound. The polymer compound includes a graft copolymer.
Sony Corporation
04/16/15
20150104663

Olefinically unsaturated radial styrenic block copolymer and an improved vulcanizer-free latex comprising water and said radial styrenic block copolymer


Wherein each a is independently a polymer block composed of at least 90 mol. % of an alkenyl aromatic hydrocarbon, each b is independently a polymer block composed of at least 90 mol.
04/16/15
20150104654

Glass laminate, and using block copolymer hydrogenation product as binder for glass laminate


A laminated glass may be obtained by integrally bonding glass sheets through an adhesive, the adhesive comprising a hydrogenated block copolymer obtained by introducing an alkoxysilyl group into a hydrogenated block copolymer that is obtained by hydrogenating unsaturated bonds of a block copolymer that comprises at least two polymer blocks and at least one polymer block, the polymer block comprising a repeating unit derived from an aromatic vinyl compound as a main component, the polymer block comprising a repeating unit derived from a linear conjugated diene compound as a main component, and a ratio (wa:wb) of a weight fraction wa of the polymer block in the block copolymer to a weight fraction wb of the polymer block in the block copolymer being 30:70 to 60:40. The laminated glass may employ a block copolymer hydrogenation product comprising an alkoxysilyl group and excellent light-fastness, heat resistance, moisture resistance and transparency..
Zeon Corporation
04/16/15
20150104639

Hot melt pressure-sensitive adhesives for no-label look applications


A composition comprising a hot melt pressure-sensitive adhesive comprising a propylene-based polymer component, wherein the propylene-based polymer component has a mfr of greater than about 1,000 g/10 min to less than about 10,000 g/10 min, and free of or having a low block copolymer content. Also, an adhesive article comprising the composition..
Exxonmobil Chemical Patents Inc.
04/16/15
20150104520

Nanoparticle formulations in biomarker detection


The present invention relates to compositions and methods of treatment of cancer patients with cytotoxic drugs in particular the use of cytotoxic drugs encapsulated in a diblock copolymer formulation where the composition is stable in protein free media and less stable in protein containing media such as serum, in particular the treatment of ovarian.. .
04/16/15
20150104406

Metap-2 inhibitor polymersomes for therapeutic administration


Described herein are metap-2 inhibitors and compositions and formulations thereof, and more particularly compositions and formulations of metap-2 inhibitors wherein the metap-2 inhibitor is associated with a block copolymer comprising a hydrophilic polymer moiety and a hydrophobic polymer moiety. The present invention also relates to compositions and formulations comprising metap-2 inhibitors for oral administration or administration via routes such as topical or ocular administration.
Children's Medical Center Corporation
04/09/15
20150100287

Method for simulating the self-assembly of block copolymers in order to design a printed circuit, corresponding design method, design system and computer program


A method for simulating a placement of patterns by self-assembly of block copolymers in a contour printed on a plate by lithography includes: extraction of geometric parameters of the contour recorded in a memory; selection, by a processor having access to the memory, of at least one local extremum of an interference figure produced inside the contour on the basis of the geometric parameters of the contour by applying a model for propagation of waves interfering with one another; and provision, by the processor and on the basis of the local extremum, of parameters for placement of at least one pattern intended to be obtained by self-assembly of block copolymers within the contour.. .
Commissariat A L'energie Atomique Et Aux Ene Alt
04/09/15
20150099835

Manufacturing enhancing ordered structure of block copolymers


The invention is related to a manufacturing method for enhancing an ordered structure of block copolymers, and more particularly to a thermal annealing process for block copolymers having conducting polymers and rod segments. The manufacturing method includes the following steps: (a) providing a block copolymer and a small molecule additive, wherein the block copolymer is formed of first monomers containing at least one aromatic ring and second monomers optionally containing at least one aromatic ring; and the small molecule additive is a aliphatic molecule, an aromatic molecule or a combination thereof; (b) blending the block copolymer and the small molecule additive to form a mixture; and (c) treating the mixture with a thermal annealing process to manufacture and facilitate the ordered structure of the block copolymers..
National Taiwan University
04/09/15
20150099815

Process for coagulating sulfonated block copolymers


Sulfonated block copolymers (sbcs) are coagulated from sbc solutions in one or more organic solvents, including reaction mixtures obtained in the sulfonation process, by a process in which the sbc solution is ejected into or onto water provided that no steam is added to the sbc solution prior to ejection and provided that the ejection velocity as well as the water temperature and convection are controlled and balanced. The coagulation process is easy to implement and avoids or at least diminishes problems due to foaming and the formation of micro dispersions of the sbc which cannot be separated successfully or easily by conventional filtration or centrifuging..
Kraton Polymers U.s. Llc
04/09/15
20150099109

Block copolymers with high flory-huggins interaction parameters for block copolymer lithography


Block copolymers for use in block copolymer lithography, self-assembled films of the block copolymers and methods for polymerizing the block copolymers are provided. The block copolymers are characterized by high flory-huggins interaction parameters (χ).
Wisconsin Alumni Research Foundation
04/09/15
20150099064

Pattern formation method and magnetic recording medium manufacturing method


According to one embodiment, a pattern formation method includes forming a surface treatment polymer film on a substrate, applying a solution containing a monomer or oligomer of a surface treatment polymer material to a surface of the surface treatment polymer film, forming a self-assembled layer by coating the surface treatment polymer film with a coating solution containing a block copolymer having at least two types of polymer chains, and forming a microphase-separated structure in the self-assembled layer by annealing, and optionally removing one type of a polymer layer from the microphase-separated structure, thereby forming convex patterns by a remaining polymer layer.. .
Kabushiki Kaisha Toshiba
04/02/15
20150094428

Synthesis of chlorotrifluoroethylene-based block copolymers by iodine transfer polymerization


Methods for the synthesis of ctfe-based block copolymers through iodine transfer polymerization are disclosed. In an exemplary embodiment, a method includes reacting a fluoromonomer “m” with a chain transfer agent of the formula x—y or y—x—y, wherein x represents a c1-c3 hydrocarbon, a c1-c6 hydrofluorocarbon, c1-c6 hydrochlorofluorocarbon, or c1-c6 fluorocarbon and y represents iodine or bromine, in the presence of a radical initiator, to form a macro-initiator of the formula: x-poly(m)-y or y-poly(m)-x-poly(m)-y, wherein poly(m) represents a polymer of the fluoromonomer.
Honeywell International Inc.
04/02/15
20150094424

Cold flow resistant compositions containing rubber and a block copolymer


Disclosed are cold flow resistant and dimensionally stable compositions containing a diene rubber and a conjugated diene monovinylarene block copolymer, and generally, these compositions have solutions viscosities and cold flows that are less than that of the diene rubber. Methods for reducing cold flow and for storage-stabilizing bales of diene rubbers also are disclosed..
Chevron Phillips Chemical Company Lp
04/02/15
20150094423

Catalyst composition, hydrogenating styrenic block copolymers, and hydrogenated polymer


A catalyst composition, a method for hydrogenating styrenic block copolymer employing the same, and a hydrogenated polymer from the method are provided. The method for hydrogenating styrenic block copolymer includes subjecting a hydrogenation process to a styrenic block copolymer in the presence of a catalyst composition.
Tsrc Corporation
04/02/15
20150093704

Radiation-sensitive resin composition, resist-patterning method, and block copolymer


A radiation-sensitive resin composition includes (a) a block copolymer, and (b) an acid-generating agent. The block copolymer (a) includes a polymer block (i), a polymer block (ii), and a moiety contained in the polymer block (i), the polymer block (2), or both thereof.
Jsr Corporation
04/02/15
20150093573

Self-bonding conductive wire


A self-bonding conductive wire and methods in which it is made and used. The wire comprises a conductor, an insulator, and a self-bonding outer coating.
Rubadue Wire Co., Inc.
04/02/15
20150093570

Antistatic block copolymer pressure sensitive adhesives and articles


An antistatic pressure sensitive adhesive composition, useful in electronic and optical display applications, comprising an antistatic agent and a first block copolymer comprising at least two hard a block polymeric units each independently having a tg of at least 50° c., and at least one soft b block (meth)acrylic polymeric unit having a tg no greater than 20° c. The composition can comprise a second block copolymer.
3m Innovative Properties Company
04/02/15
20150093569

Pressure-sensitive adhesive composition


Provided are a pressure-sensitive adhesive composition, an optical laminate, a pressure-sensitive adhesive polarizing plate and a display device. When a particular block copolymer forming a micro phase separation region in a crosslinking structure is used, and a cohesive strength of the block copolymer is controlled, a pressure-sensitive adhesive composition having excellent physical properties required for an optical member, and particularly having excellent bending preventability, cuttability and pressure-sensitive adhesive durability may be provided.
Lg Chem, Ltd.
04/02/15
20150093508

Composition for pattern formation and pattern-forming method


A composition for pattern formation includes a block copolymer that includes a block represented by formula (i) and a block represented by formula (ii). R1 and r3 each independently represent a hydrogen atom, a methyl group, a fluorine atom or a trifluoromethyl group.
Jsr Corporation
04/02/15
20150093507

Method of producing structure containing phase-separated structure, and block copolymer composition


A method of producing a structure containing a phase-separated structure, the method including: a step of forming a layer of a neutralization film; a step of form a layer containing a mixture of a plurality of block copolymers having different periods; and a step of phase-separating the layer containing the plurality of block copolymers.. .
Tokyo Ohka Kogyo Co., Ltd.
04/02/15
20150093452

Compositions and methods for disinfecting and cleaning contact lenses


This invention relates generally to disinfection and cleaning systems for medical devices. In a preferred embodiment, the invention relates to compositions, methods and articles for simultaneously cleaning and disinfecting contact lenses.
Novartis Ag
04/02/15
20150093444

Block copolymer, liquid composite thereof, nucleic acid preparation, preparation methods therefor, and use thereof


Provided are a polycaprolactone-polyphosphate block copolymer, a liquid composite formed by the block copolymer, a nucleic acid preparation, preparation methods for the copolymer and the liquid composite, and the use of the copolymer and the liquid composite in a nucleic acid medicine delivery system. The block copolymer prepared using the present invention has good biocompatibility, low cytotoxicity, and good biodegradability.
Suzhou Ribo Life Science Co., Ltd.
04/02/15
20150091137

Methods of forming nanostructures including metal oxides and semiconductor structures including same


A method of forming nanostructures may include forming a block copolymer composition within a trench in a material on a substrate, wherein the block copolymer composition may comprise a block copolymer material and an activatable catalyst having a higher affinity for a first block of the block copolymer material compared to a second block of the block copolymer material; self-assembling the block copolymer composition into first domains comprising the first block and the activatable catalyst, and second domains comprising the second block; generating catalyst from the activatable catalyst in at least one portion of the first domains to produce a structure comprising catalyst-containing domains and the second domains, the catalyst-containing domains comprising the first block and the catalyst; and reacting a metal oxide precursor with the catalyst in the catalyst-containing domains to produce a metal oxide-containing structure comprising the first block and metal oxide.. .
Micron Technology, Inc.
03/26/15
20150087772

Compositions of resin-linear organosiloxane block copolymers


A process is disclosed for preparing a resin-linear organosiloxane block copolymer. The resin-linear organosiloxanes block copolymers prepared by the disclosed process may provide optically solid compositions which may be considered as “reprocessable”..
Dow Corning Corporation
03/26/15
20150087771

Process for preparing resin-linear organosiloxane block copolymers


A process is disclosed for preparing a resin-linear organosiloxane block copolymer by reacting a linear organosiloxane and an organosiloxane resin to form a resin-linear organosiloxane block copolymer. The resulting resin-linear organosiloxane block copolymer is then crosslinked to increase the average molecular weight of the resin-linear organosiloxane block copolymer.
Dow Corning Corporation
03/26/15
20150087761

Latex, dip-forming composition, and dip-formed article


A latex of synthetic polyisoprene and/or a styrene-isoprene-styrene block copolymer with a weight average molecular weight of 10,000 to 5,000,000, a volume average particle size of 0.5 to 10 μm, and a content of a total of an alicyclic hydrocarbon solvent and aromatic hydrocarbon solvent of 500 weight ppm or less are provided.. .
Zeon Corporation
03/26/15
20150087734

Preparation of industrial asphalt


The present invention relates to a method for preparing an industrial asphalt comprising sparging an oxygen containing gas through an asphalt flux in the presence of 0.25 weight percent to about 12 weight percent of a highly saturated rubbery polymer at a temperature within the range of about 400° f. To about 550° f.
Building Material Investment Corporation
03/26/15
20150087729

Synergistic formulations of functionalized copolymers and ionic liquids for dehydrated and desalted of medium, heavy and extra heavy crude oils


The present invention is related to formulations including one or more block copolymers with low polydispersity and bifunctionalized with amines, and an ionic liquid. A method of demulsifying, dehydrating, and desalting crude oils having api gravity ranging between 8 to 30 admixes the formulation with the crude oil in an amount effective to demulsify, dehydrate and/or desalt the crude oils..
Instituto Mexicano Del Petroleo
03/26/15
20150086781

Pressure-sensitive adhesive composition


Provided are a pressure-sensitive adhesive composition, an optical member, a polarizing plate and a display device. The pressure-sensitive adhesive composition having physical properties required for an optical member using a particular block copolymer and an antioxidant or a photostabilizer, which forms a fine phase change region in a crosslinking structure, and particularly having excellent bending preventability and storage stability may be provided.
Lg Chem, Ltd.
03/26/15
20150086504

Polymeric microemulsions


The invention provides novel self-emulsifying diblock copolymers and novel self-emulsifying compositions comprising an active ingredient and a diblock copolymer characterized in that the diblock copolymer is liquid at a temperature below 50° c. And the composition is non-aqueous and liquid at a temperature below 50° c..
Janssen Pharmaceutica Nv
03/26/15
20150085042

Blanket materials for indirect printing method with varying surface energies via amphiphilic block copolymers


An intermediate transfer member containing a multi-block copolymer containing at least an a block and a b block, wherein the a block has a higher surface energy than the b block, and a method of forming an intermediate transfer member. A method of printing an image to a substrate including applying an ink onto the intermediate receiving member using an inkjet printhead; spreading the ink onto the intermediate receiving member; inducing a property change of the ink; and transferring the ink to a substrate..
Xerox Corporation
03/19/15
20150080454

Unit structure-type pharmaceutical composition for nucleic acid delivery


A unit structure-type pharmaceutical composition includes at least one nucleic acid, such as sirna, electrostatically bound to at least one block copolymer having a cationic polyamino acid segment and a hydrophilic polymer chain segment. The negative charge(s) of the nucleic acid are counterbalanced, at least substantially, by the positive charge(s) of the cationic polyamino acid segment such that the pharmaceutical composition is electrically neutral or nearly electrically neutral.
The University Of Tokyo
03/19/15
20150079794

Pattern forming method


A pattern forming method includes forming a coating film containing a hydrophilic first homopolymer having a first bonding group and a hydrophobic second homopolymer having a second bonding group capable of bonding with the first bonding group, forming a bond between the first and second bonding group to produce a block copolymer of the first and second homopolymners, and heating the coating film to microphase-separating the copolymer into a hydrophilic domain and a hydrophobic domain. The hydrophilic and hydrophobic domains are arranged alternately.
Kabushiki Kaisha Toshiba
03/19/15
20150079389

Cross-linkable adhesive compound with hard and soft blocks as a permeant barrier


Adhesive compound as a permeant barrier, comprising (i) block copolymers having a construction a-b-a, (a-b)n, (a-b)nx, or (a-b-a)nx, where x is the radical of the coupling reagent, n is a whole number between 2 and 10, a is a polymer made of a vinyl aromatic compound and b is a polymer block made of an alkene or diene, wherein this polymer block can also be hydrated, with the condition that at least part of the a blocks is sulfonated, optionally with two-block copolymers in the form of a-b as an admixture component, and (ii) at least one tackifier resin.. .
Tesa Se
03/19/15
20150079385

Pressure-sensitive adhesive sheet


This invention provides a psa sheet comprising a psa layer (a) constituting an adhesive face and a viscoelastic layer (b) supporting the psa layer (a). The psa layer (a) comprises, as a base polymer (a), a block copolymer of a monovinyl-substituted aromatic compound and a conjugated diene compound.
Nitto Denko Corporation
03/19/15
20150079007

Tunable multimodal nanoparticles and methods of use thereof


Tunable nanoparticles and methods of use thereof are provided. In accordance with the instant invention, tunable nanoparticles comprising a metal nanoparticle core (e.g., a paramagnetic particle (e.g., uspio) or a quantum dot) and a polymer linked to a metal binding moiety are provided.
Board Of Regents Of The University Of Nebraska
03/19/15
20150076436

Methods of forming semiconductor device structures, and related semiconductor device structures


A method of forming a semiconductor device structure. The method comprises forming a block copolymer assembly comprising at least two different domains over an electrode.
Micron Technology, Inc.
03/12/15
20150073096

Process for controlling the period of a nanostructured assemblage comprising a blend of block copolymers


The present invention relates to a process for controlling the period of a nanostructured assemblage comprising a blend of block copolymers which is deposited on a surface or in a mold. Block copolymers are characterized by the possession of at least one of the constituent monomers respectively of each of the blocks of the block copolymers identical but exhibit different molecular weights.
Institut Polytechnique De Bordeaux
03/12/15
20150073094

Process for producing thick nanostructured films obtained from a block copolymer composition


The present invention relates to a process for producing nanostructured films obtained from block copolymers exhibiting a dispersity index of between 1.1 and 2, limits included, without nanostructuring defects, on a surface, in order for this treated surface to be able to be used as masks for applications in microelectronics.. .
Institut Polytechnique De Bordeaux
03/12/15
20150073077

Compositions comprising resin-linear organosiloxane block copolymers and organopolysiloxanes


Resin-linear organosiloxane block copolymers combined with linear or resin organopolysiloxane components are disclosed. In some embodiments, the combination of resin-linear organosiloxane block copolymers with linear or resin organopolysiloxane components provides compositions having improved physical properties, such as improved toughness and flow behavior..
Dow Corning Corporation
03/12/15
20150072536

Pattern forming method, pattern forming apparatus, and non-transitory computer-readable storage medium


A photoresist pattern used for forming a pattern of a block copolymer is formed on a substrate, and then an acid solution is supplied and an alkaline solution is further supplied to the photoresist pattern so as to slim and smooth the photoresist pattern. A block copolymer solution is applied to the substrate on which the smoothed photoresist pattern has been formed, to form a film of the block copolymer, and the film is heated..
Tokyo Electron Limited
03/12/15
20150072292

Self-assembled structures, manufacture thereof and articles comprising the same


Disclosed herein is a photoresist composition comprising a graft block copolymer; a solvent and a photoacid generator; where the graft block copolymer comprises a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety or a silicon containing moiety; and a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo deprotection and alter the solubility of the graft block copolymer; where the graft block copolymer has a bottle brush topology.. .
The Texas A&m University System
03/12/15
20150072291

Self-assembled structures, manufacture thereof and articles comprising the same


Disclosed herein is a graft block copolymer comprising a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety, a silicon containing moiety, or a combination of a halocarbon moiety and a silicon containing moiety; a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo acid-catalyzed deprotection causing a change of solubility of the graft block copolymer in a developer solvent.. .
The Texas A&m University System
03/12/15
20150072287

Toner for image formation, and developer and image forming apparatus using the toner


A toner is provided. The toner includes a crosslinked polyester resin, and a block copolymer.
03/12/15
20150072109

Fixed-array anisotropic conductive film using conductive particles with block copolymer coating


Structures and manufacturing processes of an acf array and more particularly a non-random particles are transferred to the array of microcavities of predetermined configuration, shape and dimension. The manufacturing process includes fluidic filling of conductive particles surface-treated with a block copolymer composition onto a substrate or carrier web comprising a predetermined array of microcavities.
Trillion Science, Inc.
03/12/15
20150071864

Reversely thermo-reversible hydrogel compositions


A reversely thermo-reversible hydrogel composition comprising a water soluble block copolymer comprising at least two blocks of polyethylene oxide and at least one block of polypropylene oxide, and at least one associative gelling adjuvant having water solubility less than 0.5 g/100 ml, preferably less than 0.3 g/100 ml at 20° c., and being capable of forming water soluble inter-molecular complexes with the water soluble block copolymer in water. The hydrogel composition exhibits improved gelling efficiency, enhanced solubility and/or stability for water sparely soluble and insoluble pharmaceutical agents.
Broda Technologies Co., Ltd.
03/12/15
20150069010

Pattern forming method, manufacturing magnetic recording medium and magnetic recording medium


A patterning method includes steps of forming a first copolymer layer comprising a first diblock copolymer which has portions which are phase incompatible. The first copolymer layer is annealed to form a first phase pattern including a first phase dispersed in a second surrounding phase.
Kabushiki Kaisha Toshiba
03/05/15
20150065638

Polyolefin adhesive composition


The invention provides an adhesive formulation comprising an olefin block copolymer comprising hard blocks and soft blocks wherein the hard blocks comprise 4-8 mol % comonomer; and are present in an amount of 20 wt %-45 wt %. This formulation is particularly advantageous for use in hot melt adhesives but may be used in other applications as well..
Dow Global Technologies Llc
03/05/15
20150065593

Polyurethane foam for seat pad


Polyurethane foam for seat pad prepared by foam-molding a foaming liquid containing (a) a polyol component and (b) a polyisocyanate component. Polyol component (a) includes, based on polyol component, 30% to 55% by mass of (a-1) a polyether polyol which is a block copolymer obtained through ring-opening polymerization of ethylene oxide (eo) and propylene oxide (po), and has a molar ratio of repeating units derived from eu to repeating units derived from po of 5/95 to 25/75 and a number average molecular weight of 6,000 to 8,000.
Bridgestone Corporation
03/05/15
20150064915

Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers


A method is disclosed for forming a row of mutually spaced lithography features on a substrate, such as contact electrodes for a nand device. The method involves forming and/or using a narrow slot over the substrate defined between the edge of a hard mask layer and a side wall of a trench in a resist layer overlying the edge and the substrate.
Asml Netherlands B.v.
03/05/15
20150064630

Methods and compositions for providing spaced lithography features on a substrate by self-assembly of block copolymers


A method is disclosed to form a row of mutually spaced elongate lithography features along an axis on a substrate, for instance for use as contact electrodes for a nand device. The method involves directing alignment of self-assemblable block copolymer (bcp) composition in a trench in a resist layer on the substrate, having the substrate as base, with an epitaxy feature in the trench to cause the ordered bcp layer to have elongate domains stretching across the trench width, substantially parallel to each other and to the substrate.
Asml Netherlands B.v.
03/05/15
20150062545

Pattern forming method, pattern forming apparatus, and computer readable storage medium


The present invention is a pattern forming method of forming a pattern on a substrate using a block copolymer, the pattern forming method including the steps of: forming a film of a block copolymer containing at least two kinds of polymers on the substrate; heating the film of the block copolymer; irradiating the heated film of the block copolymer with ultraviolet light in an atmosphere of an inert gas; and supplying an organic solvent to the film of the block copolymer irradiated with the ultraviolet light.. .
Tokyo Electron Limited
03/05/15
20150062503

Pressure-sensitive adhesive composition


Provided is a pressure-sensitive adhesive composition. The pressure-sensitive adhesive composition may form a pressure-sensitive adhesive having a fine phase separation structure by a block copolymer including a hard segment and a soft segment, and also has a high elastic modulus and an excellent pressure-sensitive adhesive property.
Lg Chem, Ltd.
03/05/15
20150060737

Block copolymers that disperse nanofillers in water


The invention relates to novel block copolymers that enable a good dispersion of nanofillers in water and also to a dispersion of nanofillers obtained owing to these block copolymers. This dispersion may be used as a transparent electrode in organic solar cells or other photoemitter or photoreceptor devices..
Institut Polytechnique De Bordeaux
03/05/15
20150059976

Adhesive composition, adhesive film, and bonding method


An adhesive composition including a block copolymer. An adhesive layer formed by using the adhesive composition has a young's modulus of 0.1 gpa or greater at 23° c., a storage modulus (g′) of 1.5×105 pa or less at 220° c., and a loss factor (tan σ) of 1.3 or less at 220° c..
Tokyo Ohka Kogyo Co., Ltd.
02/26/15
20150056290

Microsphere compositions, preparation method and applications thereof


A cell carrying microsphere composition, wherein the microsphere composition comprises a microspheric core comprising a triblock copolymer matrix a-b-a wherein a is selected from poly(lactide-co-glycolide) (plga) or polylactide (pla) and b is poloxamer or poloxamine, wherein the microspheric core is coated with a cell adhesion coating and further comprises whole cells or cell fragments bonded to the cell adhesion coating, a process for the preparation of a cell carrying microsphere composition, and applications thereof.. .
Inserm (institut National De La Sante Et De La Recherche Medicale)
02/26/15
20150052691

Ape-free laundry emulsifier


A detergent emulsifier for laundry and other hard surface cleaning using an ape-free surfactant blend is disclosed. The emulsifier system is efficacious for removal of oily soils and greasy food removal.
Ecolab Usa Inc.


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Block Copolymer topics: Block Copolymer, Calcium Carbonate, Monovalent, Line Array, Semiconductor, Pyrrolidone, Hydrogen Peroxide, Propylene Oxide, Ethylene Oxide, Organosiloxane

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