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Actin patents



      
           
This page is updated frequently with new Actin-related patent applications. Subscribe to the Actin RSS feed to automatically get the update: related Actin RSS feeds. RSS updates for this page: Actin RSS RSS


Method for preparing a composition comprising coloured silicate mineral particles and a composition comprising coloured…

Universite Paul Sabatier Toulouse Iii

Method for preparing a composition comprising coloured silicate mineral particles and a composition comprising coloured…

System and method for growing a plant in an at least partly conditioned environment

Plantlab Groep B.v.

System and method for growing a plant in an at least partly conditioned environment

System and method for growing a plant in an at least partly conditioned environment

Macdermid Printing Solutions

Method for creating surface texture on flexographic printing elements


Date/App# patent app List of recent Actin-related patents
08/27/15
20150240084 
 Composition and  use in three dimensional printing patent thumbnailComposition and use in three dimensional printing
A composition suitable for forming a support using a three-dimensional (3d) deposition method is presented. The composition includes a wax including at least one functional group capable of reacting with a build material used in the 3d deposition method, when exposed to an actinic radiation, wherein the functional group is itself substantially non-reactive to the actinic radiation.
General Electric Company


08/27/15
20150240083 
 Method for preparing a composition comprising coloured silicate mineral particles and a composition comprising coloured silicate mineral particles patent thumbnailMethod for preparing a composition comprising coloured silicate mineral particles and a composition comprising coloured silicate mineral particles
A method for preparing a composition including silicate mineral particles that have colouring properties in which a talcose composition, including phyllosilicate mineral particles chosen from the group formed: from the particles having the chemical formula: ((sixge1-x)4 m3o10 (oh)2, the particles having at least one interlayer space and having the chemical formula: (sixge1-x)4 m3-ε o10 (oh)2, (m′m+)ε′.nh2o: —m having the formula mgy(1)coy(2)zny(3)cuy(4)mny(5) fey(6)niy(7)cry(8); —m′m+ designating at least one interlayer cation, the silicate mineral particles having a thickness of less than 100 nm and of which the largest dimension is less than 10 μπι, is brought into contact with a dye solution, including dye cations, of at least one element chosen from the transition metals, the lanthanides and the actinides. The composition obtained by this method is also described..
Universite Paul Sabatier Toulouse Iii


08/27/15
20150237810 
 System and  growing a plant in an at least partly conditioned environment patent thumbnailSystem and growing a plant in an at least partly conditioned environment
A system for growing a plant (1) in an at least partly conditioned environment includes a cultivation base (11) for receiving a culture substrate (3) with a root system (4) of the plant therein. Root temperature control elements (12) are provided which are able and adapted to impose a predetermined root temperature on the root system, and lighting elements (20,21,22) which are able and adapted to expose leaves of the plant to actinic artificial light.
Plantlab Groep B.v.


08/20/15
20150234276 
 Method for creating surface texture on flexographic printing elements patent thumbnailMethod for creating surface texture on flexographic printing elements
A method of making a relief image printing element from a photosensitive printing blank is described. The photosensitive printing blank comprises a laser ablatable mask layer disposed on at least one photocurable layer and the laser ablatable mask layer is selectively laser ablated to create an in situ mask and uncover portions of the at least one photocurable layer.
Macdermid Printing Solutions, Llc


08/20/15
20150234269 
 Mask that provides improved focus control using orthogonal edges patent thumbnailMask that provides improved focus control using orthogonal edges
A method includes selecting a mask blank for lithographically forming a desired pattern of main features to be printed onto a wafer by projection lithography. First locations are identified in the desired pattern, the first locations being those which would produce on the wafer images impacted by phase distortions of actinic light through openings in the desired pattern.
International Business Machines Corporation


08/20/15
20150234098 
 Light blocking articles having opacifying layers patent thumbnailLight blocking articles having opacifying layers
A light-blocking article is designed to be lightweight but effective to block most incident actinic radiation and can be designed into fabrics, curtains, and other materials. Such an article has an opacifying layer that is capable of blocking predetermined electromagnetic radiation.

08/20/15
20150233929 
 Identification of cancer protein biomarkers using proteomic techniques patent thumbnailIdentification of cancer protein biomarkers using proteomic techniques
The claimed invention describes methods to diagnose or aid in the diagnosis of cancer. The claimed methods are based on the identification of biomarkers which are particularly well suited to discriminate between cancer subjects and healthy subjects.
Yale University


08/20/15
20150232435 
 Urea and amide derivatives of aminoalkylpiperazines and use thereof patent thumbnailUrea and amide derivatives of aminoalkylpiperazines and use thereof
Provided are compounds represented by the formula: with y, ri, and r2 being defined in the present disclosure; pharmaceutically acceptable salts thereof, deuterated forms thereof, isomers thereof, solvates thereof, and mixtures thereof. The compounds can be used for treating a patient suffering from a condition capable of treatment with a partial agonist or antagonist of the dopamine d2/d3 receptors and are especially useful for patients suffering from schizophrenia, depressions, neurodegenerative diseases such as parkinson's, dyskinesias, substance abuse and relapse to substance abuse and addiction to substances such as cocaine, methamphetamine, nicotine and alcohol, glaucoma, cognitive disorders, restless leg syndrome, attention deficit hyperactivity disorders, hyperprolactinemia, autism, motor disturbances such as akathisia, rigor, dystonias as well as various disorders of the urinary tract and other neurologic disorders.
Southern Research Institute


08/20/15
20150231126 
 Combinations of 5-ht2a inverse agonists and antagonists with antipsychotics patent thumbnailCombinations of 5-ht2a inverse agonists and antagonists with antipsychotics
Combinations of 5-ht2a inverse agonists or antagonists such as pimavanserin with antipsychotics such as risperidone are shown induce a rapid onset of antipsychotic action and increase the responders when compared to therapy with the antipsychotic alone. These effects can be achieved at a low dose of the antipsychotic, thereby reducing the incidence of side effects.
Acadia Pharmaceuticals Inc.


08/06/15
20150219843 
 Avoiding beam obstruction during inscription of fiber gratings patent thumbnailAvoiding beam obstruction during inscription of fiber gratings
The present disclosure provides systems and methods for avoiding beam obstructions during inscription of fiber gratings. For some embodiments, an optical fiber is re-oriented during fiber inscription to avoid obstruction of the actinic beam..
Ofs Fitel, Llc


08/06/15
20150217276 

Photocatalyst comprising gold-palladium alloy, preparation, photolysis system


The present invention relates to a photocatalyst for the generation of diatomic hydrogen from a hydrogen containing precursor under the influence of actinic radiation comprising a semiconductor support and a gold and palladium alloy on said semiconductor support. The present invention further relates to a method for generating diatomic hydrogen by photolysis and a photolysis system..
Saudi Basic Industries Corporation


07/30/15
20150212406 

Positive photosensitive resin composition and cured film forming method using the same


There are provided a positive photosensitive resin composition excellent in the sensitivity, film residual ratio and storage stability, comprising a resin containing a specific acrylic acid-based constituent unit capable of dissociating an acid-dissociable group to produce a carboxyl group, the resin being alkali-insoluble or sparingly alkali-soluble and becoming alkali-soluble when the acid-dissociable group dissociates, a resin containing a constituent unit having a functional group capable of reacting with the carboxyl group to form a covalent bond, and a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a cured film forming method using the positive photosensitive resin composition; and a cured film excellent in the heat resistance, adhesion, transmittance and the like.. .
Fujifilm Corporation


07/30/15
20150210789 

Polymeric chelation system


A polymeric chelation system comprised of high water content at least one polymer designed with a unique combination of cross-linkers and spacer monomers chosen to enable selective uptake of specific elements from a dissolved solution. Multiple polymers can be used to extract a plurality of elements.
Polymerium, Llc


07/23/15
20150205205 

Positive type resist composition for use in liquid immersion exposure and a forming the pattern using the same


A positive type resist composition for use in liquid immersion exposure comprises: (a) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (b) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (c) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (d) a solvent.. .
Fujifilm Corporation


07/23/15
20150205199 

Photosensitive resin composition


A photosensitive printing blank having is described. The photosensitive printing blank comprises at least one photocurable layer that is capable of being selectively crosslinked and cured upon exposure to actinic radiation at a desired wavelength region comprising (a) at least one elastomeric binder, (b) at least one ethylenically unsaturated monomer, (c) a photoinitiator having a favorable absorption profile in the desired wavelength region used for exposing the at least one photocurable layer to actinic radiation, and (d) a dye, wherein the dye exhibits a suitable percent transmission as measured with a uv spectrophotometer at the desired wavelength region used for exposing the at least one photocurable layer to actinic radiation, and optionally an infrared ablatable layer disposed on the at least one photocurable layer.
Macdermid Printing Solutions, Llc


07/23/15
20150204787 

Plant phenometrics systems and methods and devices related thereto


Chlorophyll fluorescence may be studied in response to a variety of environmental cues or conditions by growing phototrophic organisms under actinic illumination. Such illumination may be punctuated or disrupted to gain information about the photosynthetic properties or performance of the phototrophic organism.
Board Of Trustees Of Michigan State University


07/16/15
20150197716 

Method for rapid maturation of distilled spirits using light and heat processes


An improved system and process for rapidly producing distilled spirits having characteristics associated with a much longer maturation process is provided. The method involves contacting wood with an unmatured distilled spirit under heated conditions and contacting the resulting heat-treated spirit with actinic light.
Lost Spirits Distillery


07/16/15
20150197500 

No-releasing guanidine-chromene conjugates


Wherein r1, r2, r3, r4, r10, and l are as defined in the detailed description; pharmaceutical compositions comprising at least one of the compounds of formula (i); and methods useful for healing wounds, preventing and treating cancer, or treating actinic keratosis, cystic fibrosis, acne, or a disease mediated by arginine deficiency using a compound of formula (i).. .

07/16/15
20150197494 

No-releasing nitrooxy-methylene-linked-coxib conjugates


Wherein r1, r2, q, and l are as defined in the detailed description; pharmaceutical compositions comprising at least one compound of formula (i); and methods useful for healing wounds, preventing and treating cancer, and treating actinic keratosis, cystic fibrosis, and acne, using a compound of formula (i).. .

07/16/15
20150196651 

Lipidated peptides for lowering blood glucose


Lipidated analogs of prolactin-releasing peptides (prrp) and their use in controlling and lowering blood glucose in mammals is disclosed. Useful compounds included lipidated analogs of prrp20 and prrp31.
Fyziologicky Ustav Akademie Ved Cr, V.v.i.


07/16/15
20150196490 

Nanoparticle compositions


The present invention describes novel nanoparticle compositions, and systems and methods utilizing them for treating disorders and/or conditions associated with the epidermal and/or dermal level of the skin. Such disorders include acne, hyperhidrosis, bromhidrosis, chromhidrosis, rosacea, hair loss, dermal infection, actinic keratosis, facial wrinkles, muscle contracture, and headache.
Anterios, Inc.


07/02/15
20150185612 

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, manufacturing electronic device using the same, and electronic device


There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (a) a resin having a repeating unit represented by the specific formula and a group capable of decomposing by an action of an acid to produce a polar group; and an ionic compound represented by the specific formula, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition.. .
Fujifilm Corporation


07/02/15
20150185610 

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device using the same, and electronic device


There is provided a pattern forming method comprising, in order, (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (ab) a resin having specific repeating units, (2) a step of exposing the film by using an electron beam or an extreme-ultraviolet ray, and (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.. .
Fujifilm Corporation


07/02/15
20150185609 

Positive resist composition and pattern formation with the same


A positive resist composition comprising: (a) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (b) a compound which generates an acid upon irradiation with actinic rays or a radiation; (c) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (f) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.. .
Fujifilm Corporation


07/02/15
20150184004 

Lithographic offset inks with water and filler content


Lithographic printing inks are described, which are characterized by the inclusion of both water, in a substantially emulsified form, and inorganic filler. Inks of the present invention show improved printing properties in offset lithography, including improved transfer, reduced piling and improved mileage.
Sun Chemical Corporation


07/02/15
20150182997 

Imaging three dimensional substrates using a transfer film


Actinic radiation curable inks are selectively applied to flexible films which allow the transmission of actinic radiation and then are applied such that the side of the flexible films on which the curable inks are applied contact surfaces of three dimensional substrates. Actinic radiation is applied to the flexible films which cause the ink to cure on the three dimensional substrate.
Rohm And Haas Electronic Materials Llc


06/25/15
20150175674 

Lipidated peptides as anti-obesity agents


Lipidated peptides, analogs of both forms of the prolactin-releasing peptide, prrp31 and prrp20, represent anorexigenic compounds that lower food intake and function in the brain after peripheral administration. The analogs prrp31 and prrp20 lipidated at the n-terminus by myristic or palmitic acids bind with high affinity to the endogenous receptor gpr10 in the rat pituitary cell line rc-4b/c and cho cell line with transfected human receptor.
Ustav Organicke Chemie A Biochemie Akademie Ved Cr, V.v.i


06/18/15
20150168838 

Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition


A positive resist composition comprises: (a) a resin of which solubility in an alkali developer increases under an action of an acid; (b) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (c) a resin having at least one of a fluorine atom and a silicon atom; and (d) a solvent; and a pattern forming method using the positive resist composition.. .
Fujifilm Corporation


06/18/15
20150168830 

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, and manufacturing electronic device and electronic device, and compound


X− represents a non-nucleophilic anion.. .

06/11/15
20150160559 

Pattern forming method, manufacturing electronic device, and electronic device


There is provided a pattern forming method containing: forming a film by using a radiation-sensitive or actinic ray-sensitive resin composition containing: (a) a onium salt compound containing a nitrogen atom in a cationic moiety; (b) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (c) a resin capable of increasing the polarity by the action of an acid to decrease solubility in a developer containing an organic solvent, exposing the film; and developing the exposed film by using a developer containing an organic solvent to form a negative pattern.. .
Fujifilm Corporation


06/11/15
20150160555 

Pattern forming method, and, producing electronic device and electronic device, each using the same


The pattern forming method of the invention includes (i) a step of forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition including a resin (a) capable of increasing the polarity by the action of an acid to decrease the solubility in a developer including an organic solvent; (ii) a step of exposing the first film; (iii) a step of developing the exposed first film using a developer including an organic solvent to form a negative tone pattern; and (iv) a step of forming a second film on the second substrate so as to cover the periphery of the negative tone pattern.. .
Fujifilm Corporation


06/11/15
20150157693 

Food containing prolactin


A nutritional composition for a subject, comprising prolactin identical or similar or analogous to prolactin found in a natural food source, and at least one protective layer, wherein release of said prolactin from the composition in said subject is the result of an environmental event.. .
Technion Research & Development Foundation Ltd.


06/11/15
20150156996 

Livestock with genetically modified prolactin receptor


Methods, uses, and animals for introgression of alleles between animals, including snps. One embodiment involves introducing a targeted targeting endonuclease system and a hdr template into a cell with a mismatch in the binding of the targeting endonuclease and the targeted site..
Recombinetics, Inc.


06/04/15
20150150929 

Use of essential oil of oregano or of rosewood, or constituents thereof, in the cosmetic treatment of keratoses


The present invention concerns various cosmetic uses of compositions comprising an essential oil or one of its constituents, preferably a major constituent, in the targeted treatment and prevention of benign keratoses, and more particularly keratoses induced by solar radiation on the skin of a subject. More particularly, the present invention concerns compositions based on the essential oil of oregano or of rosewood, or on linalool, thymol or carvacrol.
Institut Curie


05/28/15
20150148415 

Derivatized dendrimer with low citotoxicity for in vivo, ex vivo, in vitro or in situ chelation of heavy metals or actinides


The present invention considers derivatized nanomolecules with proven effectiveness to bind to actinides, more specifically uranium, during in vivo, ex vivo, in vitro or in situ assays. When assayed in vivo, the invention showed a reduction in at least kidney damage due to exposition to uranium..
Universidad De Talca


05/28/15
20150147699 

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device, and electronic device


The pattern forming method of the present invention includes (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition which contains a resin (a) which has a repeating unit including a group capable of generating a polar group by being decomposed due to an action of an acid and a repeating unit including a carboxyl group, a compound (b) which generates an acid according to irradiation with actinic rays or radiation, and a solvent (c); (ii) exposing the film using a krf excimer laser, extreme ultraviolet rays, or an electron beam; and (iii) forming a negative tonetone pattern by developing the exposed film using a developer which includes an organic solvent.. .
Fujifilm Corporation


05/28/15
20150147688 

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device using the same, and electronic device


There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (p) a resin having a repeating unit represented by the specific formula, (2) a step of exposing the film by using an actinic ray or radiation, and (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern, wherein the content of the repeating unit represented by the specific formula is 25 mol % or more based on all repeating units in the resin (p).. .
Fujifilm Corporation


05/28/15
20150146294 

Polarizing plate, fabrication polarizing plate, and image display device


The purpose of the present invention is to provide a polarization plate the warping and deformation of which can be controlled when the polarization plate, and a display device that contains the polarization plate, is stored under conditions of high heat and humidity, while keeping the display device low profile. This polarization plate has a polarizing element 0.5-10 μm in thickness that contains a dichroic pigment, a glass film, and an adhesion layer that is disposed between the polarizing element and the glass film and that comprises a cured material of an actinic ray curable composition..
Konica Minolta, Inc.


05/28/15
20150146159 

Methods for formation of an ophthalmic lens with an insert utilizing voxel-based lithography


Methods for manufacturing an ophthalmic lens with an insert using voxel-based lithography techniques, wherein at least a portion of one surface may be free-formed from a reactive mixture are set forth herein. An ophthalmic lens precursor may be formed on a substrate with an arcuate optical quality surface via a source of actinic radiation controllable to cure a definable portion of a volume of reactive mixture, wherein the control may be on a voxel by voxel basis..
Johnson & Johnson Vision Care, Inc.


05/21/15
20150141414 

Formulation of stable recombinant alpha-fetoprotein conjugated with anti-tumor substance in target-delivery system for treatment of cancer and autoimmune disease


Disclosed is a stable formulation based on rafp conjugated with drug delivery system of various classes of pharmacological agents such as dactinomycin, cardionolide, and bufadinolide, among others. In another embodiment, the invention discloses a method of producing rafp in a strain of methylotrophic pichia pastoris yeast, allowing the yeast to replicate, and extracting the newly created rafp.
Legrand International Llc


05/21/15
20150140484 

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing electronic device, and electronic device


There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (a) a resin containing a repeating unit represented by the first specific formula and a repeating unit represented by the second specific formula, wherein the content of the repeating unit represented by the first specific formula is 35 mol % or more based on all repeating units in the resin (a), a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition.. .
Fujifilm Corporation


05/21/15
20150140482 

Pattern forming method, and, electronic device producing method and electronic device, each using the same


A pattern forming method includes: (a) forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition (i) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (b) exposing the first film; (c) developing the exposed first film using a developer containing an organic solvent to form a first negative pattern; (e) forming a second film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition (ii) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (f) exposing the second film; and (g) developing the exposed second film using a developer containing an organic solvent to form a second negative pattern in this order.. .
Fujifilm Corporation


05/14/15
20150133542 

Method of topically treating actinic keratosis with ingenol mebutate cycle therapy


The present invention relates to cyclic or repeated use of the ingenol mebutate for topical treatment of actinic keratosis lesions. Generally speaking, the present invention comprises a first ingenol mebutate treatment cycle and a second ingenol mebutate treatment cycle, wherein the first treatment cycle topically treats a treatment area with a topical gel formulated with ingenol mebutate at a selected dosage strength for a specified treatment regimen, and the second ingenol mebutate treatment cycle comprises topically re-treating the treatment area with the same topical ingenol mebutate gel for the same specified treatment regimen, if following the first treatment cycle, the treatment area failed to clear or failed to remain clear of ak lesions.

05/14/15
20150133383 

Method for diagnosis and treatment of prolactin associated disorders


The present invention concerns methods and tools for determining a specific treatment of a prolactin associated disorder. The treatment is selected based on the expression pattern of growth hormonereceptor (ghr), prolactin receptor (prlr) and the suppressors socs2 and tcs2..

05/14/15
20150132688 

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing electronic device, electronic device and resin


There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (p) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.. .

05/14/15
20150132687 

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing electronic device, and electronic device


There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (p) a resin containing a repeating unit represented by the specific formula (1) and a repeating unit represented by the specific formula (a); a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film from the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.. .

05/07/15
20150125796 

Method of preparing flexographic printing members


Following imagewise exposure of a sandwiched photopolymer layer, the outer layers between which the photopolymer is interposed are separated in a manner that leaves some photopolymer on each of the separated layers. The photopolymer remaining on one layer contains the raised pattern that will carry ink, and may be subjected to further exposure to actinic radiation in order to complete the curing process without the need for washing; the photopolymer remaining on the other layer can be removed and reused.

04/30/15
20150119789 

Compositions and methods for biophotonic bone reconstruction


Biophotonic compositions comprising a photoactivator, a calcium phosphate mineral, hyaluronic acid and optionally glucosamine are disclosed. Said compositions have utility in the augmentation, repair and/or regeneration of bone when used in conjunction with actinic light of a wavelength absorbed by the photoactivator..
Klox Technologies Inc.


04/30/15
20150119434 

Method for topically treating actinic keratosis with ingenol 3-(3,5-diethylisoxazole-4-carboxylate)


The invention relates to the topical treatment of actinic keratosis with ingenol 3-(3,5-diethylisoxazole-4-carboxylate).. .
Leo Laboratories Limited


04/30/15
20150119433 

Method of treating actinic keratosis on the full balding scalp with ingenol 3-(3,5-diethylisoxazole-4-carboxylate)


The invention relates to the topical treatment of actinic keratosis on the full balding scalp with ingenol 3-(3,5-diethylisoxazole-4-carboxylate).. .
Leo Laboratories Limited


04/30/15
20150118628 

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, forming pattern, process for manufacturing semiconductor device, and semiconductor device


Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (p) comprising any of repeating units (a) of general formula (i) below, each of which contains an ionic structural moiety that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid in a side chain of the resin.. .
Fujifilm Corporation


04/30/15
20150118627 

Pattern forming method, composition used tehrein, manufacturing electronic device, and electronic device


A pattern forming method includes: (i) a step of forming a first film by using an actinic ray-sensitive or radiation-sensitive resin composition (i), (ii) a step of exposing the first film, (iii) a step of developing the exposed first film by using an organic solvent-containing developer to form a negative pattern, (iv) a step of forming a second film on the negative pattern by using a specific composition (ii), (v) a step of increasing polarity of the specific compound present in the second film, and (vi) a step of removing a specific area of the second film by using the organic solvent-containing remover.. .
Fujifilm Corporation


04/30/15
20150118621 

Method of forming pattern and actinic-ray- or radiation-sensitive resin composition for use in the method


Provided is a method of forming a pattern, including (a) forming a film comprising an actinic-ray- or radiation-sensitive resin composition comprising a resin (p) containing a repeating unit (p1) with a cyclic carbonic acid ester structure and any of repeating units (p2) of general formula (p2-1) below, and a compound (b) that when exposed to actinic rays or radiation, generates an acid, (b) exposing the film to actinic rays or radiation, and (c) developing the exposed film with a developer comprising an organic solvent to thereby obtain a negative pattern.. .
Fujifilm Corporation


04/23/15
20150111157 

Method of forming pattern and actinic-ray- or radiation-sensitive resin composition for use in the method


Provided is a method of forming a pattern, including forming a film comprising an actinic-ray- or radiation-sensitive resin composition comprising, resin (a) comprising any of repeating units of general formula (i) below, which resin when acted on by an acid, decreases its solubility in a developer comprising an organic solvent, and a compound (b) expressed by any of general formulae (b-1) to (b-3) below, which compound when exposed to actinic rays or radiation, generates an acid, exposing the film to actinic rays or radiation, and developing the exposed film with a developer comprising an organic solvent to thereby obtain a negative pattern.. .
Fujifilm Corporation


04/23/15
20150111154 

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device, and electronic device


There is provided a pattern forming method including: (a) a process of forming a film by resin (p) having a repeating unit (a) having a cyclic structure and a partial structure represented by the following formula (i), (ii-1) or (ii-2), and a repeating unit (b) having a group which decomposes by the action of an acid to generates a polar group, and an actinic ray-sensitive or radiation-sensitive resin composition containing compound (b) which generates acid upon irradiation with an actinic ray or radiation; (b) a process of exposing the film; and (c) a process of forming a negative-type pattern by performing development using a developer including an organic solvent, an actinic ray-sensitive or radiation-sensitive resin composition used therefor, a resist film, a method of manufacturing an electronic device, and an electronic device.. .
Fujifilm Corporation


04/23/15
20150111135 

Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition for use in the method


Rn-a−x+  (i). .

04/16/15
20150103975 

X-ray image sensor and x-ray image sensor system using the same


An x-ray image sensor and an x-ray image sensor system using the same is disclosed. The x-ray image sensor has a back-light unit emitting actinic and non-actinic lights.
National Chiao Tung University


04/16/15
20150101923 

Photocatalyst, preparation, photolysis system


The present invention relates to a photocatalyst for the generation of diatomic hydrogen from a hydrogen containing precursor under the influence of actinic radiation comprising a semiconductor support with one or more noble and/or transition metal(s) deposited on said semiconductor support, wherein said metal is covered at least in part with a layer of the semiconductor support. Further disclosed is a method for preparing such catalyst and a method for generating diatomic hydrogen by photolysis..
Saudi Basic Industries Corporation


04/09/15
20150099818 

Tri-curable adhesive composition and method


A two part composition comprising a part a and a part b, wherein part a comprises an oligomer having both isocyanate and acrylate moieties, and an organic peroxide capable of generating free radicals upon decomposition; and part b comprises a polyol, and a catalyst that can decompose the organic peroxide. In one form, the two part composition of a part a and a part b are in admixture.
Dymax Corporation


04/09/15
20150098893 

Photocatalyst, preparation, photolysis system


The present invention relates to a photocatalyst for the generation of diatomic hydrogen from a hydrogen containing precursor under the influence of actinic radiation comprising semiconductor support particles comprised of srtio3 and tio2 with one or more noble and/or transition metals deposited thereon. Further disclosed is a method for preparing such catalyst and a method for generating diatomic hydrogen by photolysis..
Saudi Basic Industries Corporation


04/09/15
20150098869 

Commercialization of carbon dioxide from coal fired furnace emissions


A procedure for producing unstable aldehydes from coal combustion emission by inserting protons (h+) within the double bond interstice structure of heated co2 carrier gas to form a univalent aldehyde (co2h+). The univalent aldehydes are actinically radiated by a massless negative charge that is ejected from a filament rail magnetic induction circuit at 1 sec.

04/02/15
20150093692 

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film used therefor, and electronic device manufacturing method and electronic device using the samedevice manufacturing method and electronic device using the same


There is provided a pattern forming method including: (a) forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing (a) to (c), (a) a resin capable of increasing polarity by the action of an acid to decrease solubility in a developer containing an organic solvent, (b) a compound capable of generating acid upon irradiation with an actinic ray or radiation, and (c) a salt having a conjugate base structure of an acid having a pka of −2 or more in a molecule thereof and substantially not capable of decomposing by an actinic ray or radiation, (b) exposing the film, and (c) developing the exposed film using a developer containing an organic solvent to form a negative pattern.. .
Fujifilm Corporation


04/02/15
20150093691 

Actinic-ray- or radiation-sensitive resin composition and forming pattern using the composition


According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes compound (a) that when exposed to actinic rays or radiation, generates acids and resin (b) that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer. Compound (a) is expressed by general formula (i) below.
Fujifilm Corporation


04/02/15
20150093393 

Anti-prolactin receptor antibody formulations


Provided are a wide concentration range, especially high concentration, substantially salt-free anti-prolactin receptor antibody formulations that are substantially isosmotic and of low viscosity.. .
Bayer Healthcare Llc


03/26/15
20150086912 

Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method using the same, manufacturing semiconductor device, and semiconductor device


There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (p) a resin having a repeating unit (a) represented by the specific formula (i) capable of generating an acid on the side chain of the resin upon irradiation with an actinic ray or radiation, and a resist film formed with the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising: exposing the resist film, and developing the exposed resist film, and a method for manufacturing a semiconductor device, containing the pattern forming method, and a semiconductor device manufactured by the manufacturing method of the semiconductor device.. .
Fujifilm Corporation


03/26/15
20150086911 

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask


An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (a) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (m) through covalent bonding. In the formula, y1 and y2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group.
Fujifilm Corporation


03/26/15
20150086726 

Methods for making cured sealants by actinic radiation and related compositions


Disclosed are methods for making a cured sealant. The methods include depositing an uncured sealant composition on a substrate and exposing the uncured sealant composition to actinic radiation to provide a cured sealant.
Prc-desoto International, Inc.


03/19/15
20150080430 

Use of jasmonate ester derivatives for treating benign hyperproliferative skin disorders


The present invention relates to methods of treating benign hyperproliferative diseases of the epidermis by administering a composition comprising at least one jasmonate ester derivative. In particular, the present invention provides jasmonate ester derivatives as potent compounds useful for the treatment of disorders such as actinic keratoses with reduced side effects..
Sepal Pharma Ltd.


03/19/15
20150080312 

Hexadepsipeptide analogues as anticancer compounds


Or derivatives or pharmaceutically acceptable salts thereof. The invention also includes all isomeric and tautomeric forms of the compound of formula (1) or the derivatives thereof.

03/19/15
20150079624 

Porifera-based therapeutic compositions for treating and preventing skin diseases


Methods and protocols of harvesting and processing of porifera species, specifically sponges, and more specifically fresh water species of genus spongilla; testing and storing of the processed spongilla powder; and manufacturing and packaging of spongilla-based therapeutic compositions for treating and preventing skin diseases are disclosed. Treatable skin conditions and diseases include without limitation acne vulgaris, rosacea, seborrheic dermatitis, psoriasis, photo-aging and actinic keratosis, acne vulgaris, psoriasis, photo-aging, wounds, scars, and eczema (atopic dermatitis)..

03/19/15
20150079522 

Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method


A pattern forming method, including: (a) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (b) exposing the resist film; and (d) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.. .
Fujifilm Corporation


03/19/15
20150079508 

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device, and electronic device


There is provided a pattern forming method comprising (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition; (ii) a step of exposing the film; and (iii) a step of performing development by using a developer containing an organic solvent to form a negative pattern, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains (a) a resin capable of increasing the polarity by an action of an acid to decrease the solubility in a developer containing an organic solvent, (b) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (c) a solvent, and (d) a resin having a repeating unit having a fluorine atom and not having a cf3 partial structure.. .
Fujifilm Corporation


03/19/15
20150078504 

Hybrid molten salt reactor with energetic neutron source


In an embodiment, a hybrid molten salt reactor includes a source of energetic neutrons, the energetic neutrons having a typical energy per neutron of 14 mev or greater, a critical molten salt reactor, and a molten salt comprising a dissolved mixture of fissile actinides and fertile actinides. The molten salt circulates in a loop through the reactor vessel and around the source of energetic neutrons.

03/12/15
20150073008 

Topical application of vinca alkaloids for the treatment of actinic keratosis


Or a pharmaceutically acceptable salt (or hydrate) thereof, wherein each of r1, r2, r3, and r4 is as defined and described herein, wherein said formulations are useful for the topical treatment of actinic keratosis.. .

03/12/15
20150072083 

High temperature resistance, radiation curable maskant for metal substrates


A method for shielding a metal substrate surface during the application of heat to the surroundings of the substrate which comprises. A liquid maskant composition is formed which comprises: a) at least one of a polycarbonate urethane diacrylate oligomer, a polycarbonate urethane dimethacrylate oligomer, a polycarbonate caprolactone urethane diacrylate oligomer, or a polycarbonate caprolactone urethane dimethacrylate oligomer; b) a reactive diluent capable of free radical polymerization; and c) a photoinitiator capable of generating free radicals when exposed to actinic radiation.
Dymax Corporation


03/05/15
20150065599 

Matrices and sealants which are based on sulfur-containing polymers and which comprise a photoinitiator, curing and coating methods, and use of said matrices and sealants


A method for curing a mixture of a matrix and a curing agent based on sulfur-containing polymers on command and so rapidly that a tack-free surface results. A method for coating a substrate with the composition and of curing a sealant is also provided.
Chemetall Gmbh




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