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Actin patents



      
           
This page is updated frequently with new Actin-related patent applications. Subscribe to the Actin RSS feed to automatically get the update: related Actin RSS feeds. RSS updates for this page: Actin RSS RSS


Photocatalyst, method for preparation, photolysis system

Saudi Basic Industries

Photocatalyst, method for preparation, photolysis system

Date/App# patent app List of recent Actin-related patents
04/16/15
20150103975
 X-ray image sensor and x-ray image sensor system using the same patent thumbnailnew patent X-ray image sensor and x-ray image sensor system using the same
An x-ray image sensor and an x-ray image sensor system using the same is disclosed. The x-ray image sensor has a back-light unit emitting actinic and non-actinic lights.
National Chiao Tung University
04/16/15
20150101923
 Photocatalyst,  preparation, photolysis system patent thumbnailnew patent Photocatalyst, preparation, photolysis system
The present invention relates to a photocatalyst for the generation of diatomic hydrogen from a hydrogen containing precursor under the influence of actinic radiation comprising a semiconductor support with one or more noble and/or transition metal(s) deposited on said semiconductor support, wherein said metal is covered at least in part with a layer of the semiconductor support. Further disclosed is a method for preparing such catalyst and a method for generating diatomic hydrogen by photolysis..
Saudi Basic Industries Corporation
04/09/15
20150099818
 Tri-curable adhesive composition and method patent thumbnailTri-curable adhesive composition and method
A two part composition comprising a part a and a part b, wherein part a comprises an oligomer having both isocyanate and acrylate moieties, and an organic peroxide capable of generating free radicals upon decomposition; and part b comprises a polyol, and a catalyst that can decompose the organic peroxide. In one form, the two part composition of a part a and a part b are in admixture.
Dymax Corporation
04/09/15
20150098893
 Photocatalyst,  preparation, photolysis system patent thumbnailPhotocatalyst, preparation, photolysis system
The present invention relates to a photocatalyst for the generation of diatomic hydrogen from a hydrogen containing precursor under the influence of actinic radiation comprising semiconductor support particles comprised of srtio3 and tio2 with one or more noble and/or transition metals deposited thereon. Further disclosed is a method for preparing such catalyst and a method for generating diatomic hydrogen by photolysis..
Saudi Basic Industries Corporation
04/09/15
20150098869
 Commercialization of carbon dioxide from coal fired furnace emissions patent thumbnailCommercialization of carbon dioxide from coal fired furnace emissions
A procedure for producing unstable aldehydes from coal combustion emission by inserting protons (h+) within the double bond interstice structure of heated co2 carrier gas to form a univalent aldehyde (co2h+). The univalent aldehydes are actinically radiated by a massless negative charge that is ejected from a filament rail magnetic induction circuit at 1 sec.
04/02/15
20150093692
 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film used therefor, and electronic device manufacturing method and electronic device using the samedevice manufacturing method and electronic device using the same patent thumbnailPattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film used therefor, and electronic device manufacturing method and electronic device using the samedevice manufacturing method and electronic device using the same
There is provided a pattern forming method including: (a) forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing (a) to (c), (a) a resin capable of increasing polarity by the action of an acid to decrease solubility in a developer containing an organic solvent, (b) a compound capable of generating acid upon irradiation with an actinic ray or radiation, and (c) a salt having a conjugate base structure of an acid having a pka of −2 or more in a molecule thereof and substantially not capable of decomposing by an actinic ray or radiation, (b) exposing the film, and (c) developing the exposed film using a developer containing an organic solvent to form a negative pattern.. .
Fujifilm Corporation
04/02/15
20150093691
 Actinic-ray- or radiation-sensitive resin composition and  forming pattern using the composition patent thumbnailActinic-ray- or radiation-sensitive resin composition and forming pattern using the composition
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes compound (a) that when exposed to actinic rays or radiation, generates acids and resin (b) that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer. Compound (a) is expressed by general formula (i) below.
Fujifilm Corporation
04/02/15
20150093393
 Anti-prolactin receptor antibody formulations patent thumbnailAnti-prolactin receptor antibody formulations
Provided are a wide concentration range, especially high concentration, substantially salt-free anti-prolactin receptor antibody formulations that are substantially isosmotic and of low viscosity.. .
Bayer Healthcare Llc
03/26/15
20150086912
 Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method using the same, manufacturing  semiconductor device, and semiconductor device patent thumbnailActinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method using the same, manufacturing semiconductor device, and semiconductor device
There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (p) a resin having a repeating unit (a) represented by the specific formula (i) capable of generating an acid on the side chain of the resin upon irradiation with an actinic ray or radiation, and a resist film formed with the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising: exposing the resist film, and developing the exposed resist film, and a method for manufacturing a semiconductor device, containing the pattern forming method, and a semiconductor device manufactured by the manufacturing method of the semiconductor device.. .
Fujifilm Corporation
03/26/15
20150086911
 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask patent thumbnailActinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask
An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (a) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (m) through covalent bonding. In the formula, y1 and y2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group.
Fujifilm Corporation
03/26/15
20150086726

Methods for making cured sealants by actinic radiation and related compositions


Disclosed are methods for making a cured sealant. The methods include depositing an uncured sealant composition on a substrate and exposing the uncured sealant composition to actinic radiation to provide a cured sealant.
Prc-desoto International, Inc.
03/19/15
20150080430

Use of jasmonate ester derivatives for treating benign hyperproliferative skin disorders


The present invention relates to methods of treating benign hyperproliferative diseases of the epidermis by administering a composition comprising at least one jasmonate ester derivative. In particular, the present invention provides jasmonate ester derivatives as potent compounds useful for the treatment of disorders such as actinic keratoses with reduced side effects..
Sepal Pharma Ltd.
03/19/15
20150080312

Hexadepsipeptide analogues as anticancer compounds


Or derivatives or pharmaceutically acceptable salts thereof. The invention also includes all isomeric and tautomeric forms of the compound of formula (1) or the derivatives thereof.
03/19/15
20150079624

Porifera-based therapeutic compositions for treating and preventing skin diseases


Methods and protocols of harvesting and processing of porifera species, specifically sponges, and more specifically fresh water species of genus spongilla; testing and storing of the processed spongilla powder; and manufacturing and packaging of spongilla-based therapeutic compositions for treating and preventing skin diseases are disclosed. Treatable skin conditions and diseases include without limitation acne vulgaris, rosacea, seborrheic dermatitis, psoriasis, photo-aging and actinic keratosis, acne vulgaris, psoriasis, photo-aging, wounds, scars, and eczema (atopic dermatitis)..
03/19/15
20150079522

Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method


A pattern forming method, including: (a) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (b) exposing the resist film; and (d) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.. .
Fujifilm Corporation
03/19/15
20150079508

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device, and electronic device


There is provided a pattern forming method comprising (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition; (ii) a step of exposing the film; and (iii) a step of performing development by using a developer containing an organic solvent to form a negative pattern, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains (a) a resin capable of increasing the polarity by an action of an acid to decrease the solubility in a developer containing an organic solvent, (b) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (c) a solvent, and (d) a resin having a repeating unit having a fluorine atom and not having a cf3 partial structure.. .
Fujifilm Corporation
03/19/15
20150078504

Hybrid molten salt reactor with energetic neutron source


In an embodiment, a hybrid molten salt reactor includes a source of energetic neutrons, the energetic neutrons having a typical energy per neutron of 14 mev or greater, a critical molten salt reactor, and a molten salt comprising a dissolved mixture of fissile actinides and fertile actinides. The molten salt circulates in a loop through the reactor vessel and around the source of energetic neutrons.
03/12/15
20150073008

Topical application of vinca alkaloids for the treatment of actinic keratosis


Or a pharmaceutically acceptable salt (or hydrate) thereof, wherein each of r1, r2, r3, and r4 is as defined and described herein, wherein said formulations are useful for the topical treatment of actinic keratosis.. .
03/12/15
20150072083

High temperature resistance, radiation curable maskant for metal substrates


A method for shielding a metal substrate surface during the application of heat to the surroundings of the substrate which comprises. A liquid maskant composition is formed which comprises: a) at least one of a polycarbonate urethane diacrylate oligomer, a polycarbonate urethane dimethacrylate oligomer, a polycarbonate caprolactone urethane diacrylate oligomer, or a polycarbonate caprolactone urethane dimethacrylate oligomer; b) a reactive diluent capable of free radical polymerization; and c) a photoinitiator capable of generating free radicals when exposed to actinic radiation.
Dymax Corporation
03/05/15
20150065599

Matrices and sealants which are based on sulfur-containing polymers and which comprise a photoinitiator, curing and coating methods, and use of said matrices and sealants


A method for curing a mixture of a matrix and a curing agent based on sulfur-containing polymers on command and so rapidly that a tack-free surface results. A method for coating a substrate with the composition and of curing a sealant is also provided.
Chemetall Gmbh
03/05/15
20150064398

Image formation method, decorative sheet, decorative sheet molding, process for producing in-mold molded product, in-mold molded product, and ink set


The object of the present invention is to provide an image formation method that can give an image that is excellent in terms of adhesion to a substrate, blocking resistance of a resulting printed material, and molding suitability, in particular vacuum forming properties, and that can suppress post-molding cracking of a molding. Disclosed is an image formation method comprising, in order, step a: a step of applying liquid a to a substrate, step b: a step of irradiating the applied liquid a with actinic radiation so as to carry out complete curing or semi-curing up to a degree of cure of at least 90%, step c: a step of applying liquid b to a cured layer of the completely cured or semi-cured liquid a, and step d: a step of completely curing liquid a and liquid b..
Fujifilm Corporation
03/05/15
20150063524

Ald coating of nuclear fuel actinides materials


A method of forming a nuclear fuel pellet, with the steps of obtaining a fuel form in a powdered state; coating the fuel form in a powdered state with at least one layer of a material; and sintering the powdered fuel form into a fuel pellet. A sintered nuclear fuel pellet, wherein the pellet is made from a powdered fuel form, wherein the powdered fuel form is coated with at least one layer of a material, and wherein the at least one layer of the material substantially surrounds each interfacial grain barrier after the powdered fuel form has been sintered..
Uchicago Argonne, Llc
02/26/15
20150056455

Form in-place gasket with tack free surface


A method of preparing a flexible, substantially tack free gasket by forming a liquid composition which is a radiation polymerizable admixture of a free radical polymerizable urethane(meth)acrylate monomer, free radical polymerizable urethane(meth)acrylate oligomer, or combinations thereof; a free radical polymerizable diluent; a free radical polymerization photoinitiator; a wax; a thixotropic agent; and optionally an adhesion promoter and a colorant. The composition is distributed onto a substrate and then exposed to actinic radiation to cure the liquid composition into a flexible, substantially tack free gasket having a shore a hardness of from about a20 to about a80..
Dymax Corporation
02/26/15
20150056421

Cationic polymerizable compositions and methods of use thereof


An inkjet printing method and inkjet compositions are disclosed. The method includes selectively depositing by inkjet printing, layer by layer, a first composition and a second composition onto a receiving media from different dispensers to form polymerizable deposited layers.
Stratasys Ltd.
02/26/15
20150056222

Anti-prlr antibodies and uses thereof


The present invention provides antibodies that bind to prolactin receptor (prlr) and methods of using the same. According to certain embodiments, the antibodies of the invention bind human prlr with high affinity.
Regeneron Pharmaceuticals, Inc.
02/26/15
20150056221

Anti-prlr antibodies and uses thereof


The present invention provides antibodies that bind to prolactin receptor (prlr) and methods of using the same. According to certain embodiments, the antibodies of the invention bind human prlr with high affinity.
Regeneron Pharmaceuticals, Inc.
02/26/15
20150053643

Hot melt compositions with improved etch resistance


Hot melt compositions include non-aromatic cyclic (alkyl)acrylates and low acid number waxes. Upon application of actinic radiation, the hot melt compositions cure to form resists.
Rohm And Haas Electronic Materials Llc
02/19/15
20150050599

Methods of providing patterned epitaxy templates for self-assemblable block copolymers for use in device lithography


A method is disclosed to form a patterned epitaxy template, on a substrate, to direct self-assembly of block copolymer for device lithography. A resist layer on a substrate is selectively exposed with actinic (e.g.
Asml Netherlands B.v.
02/19/15
20150048557

Apparatus for thermal processing of flexographic printing elements


An apparatus for thermally processing a relief image printing element and a method of using the same are described. The printing element comprises at least one photopolymer layer and is selectively exposed to actinic radiation to crosslink portions of the at least one photopolymer layer.
Macdermid Printing Solutions, Llc
02/12/15
20150045403

Pharmaceutical cream compositions and methods of use


Embodiments relating to cream formulations as well as oxymetazoline creams and methods for treating rosacea and symptoms associated with rosacea, including, for example, papules, pustules, phymas (skin thickening), telangiectasias or erythema associated with rosacea, other skin erythemas, telangiectasias, purpura or the like, and other manifestations associated therewith; other inflammatory conditions of the skin including, but not limited to, keratosis pilaris, lupus miliaris dissemniatus faciei, eczema, dermatitis, such as contact dermatitis, atopic dermatitis, seborrheic dermatitis, nummular dermatitis, generalized exfoliative dermatitis, statis dermatitis, neurodermatitis, lichen simplex chronicus, xerosis and xerotic dermatitis, dyshidrosis and dyshidrotic dermatitis, asteototic dermatitis or other conditions characterized by sensitive skin or a disturbance of the epidermal barrier; disorders characterized by rough, dry, cracked or fissured skin, disorders characterized by hyperkeratotic skin such as keratodermas and ichthyosisis and ichthyosiform dermatoses; disorders of hair follicles and sebaceous glands, such as acne, perioral dermatitis, and pseudofolliculitis barbae; disorders of sweat glands, such as miliaria, including, but not limited to, miliaria crystallina, miliaria rubra, miliaria profunda, miliaria pustulosa; sunburn, chronic actinic damage, poikiloderma, radiation dermatitis, actinic purpura (“solar purpura”); other inflammatory dermatoses, reactions and conditions of the skin, including, but not limited to, psoriasis, drug eruptions, erythema multiforme, erythema nodosum, and granuloma annulare; diseases and conditions characterized by bleeding or bruising such as petechiae, ecchymosis, purpura and the like including any accumulation of blood in the skin due to vascular extravasation, irrespective of size or cause, bleeding or bruising due to any skin injury which may include any trauma including surgical or procedural trauma; infection, inflammatory dermatoses or inflammation due to any cause using such creams are described herein.. .
Allergan, Inc.
02/12/15
20150044616

Method of forming patterns


A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film, wherein the resist composition contains a resin capable of increasing the polarity by the action of the acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) forming a protective film on the resist film with a protective film composition after forming the resist film and before exposing the resist film, (c) exposing the resist film via an immersion medium, and (d) performing development with a negative developer.. .
Fujifilm Corporation
02/05/15
20150034594

Methods of providing patterned templates for self-assemblable block copolymers for use in device lithography


A method is disclosed to form a patterned template on a substrate, to direct orientation of a self-assemblable block copolymer. The method involves providing a resist layer of a positive tone resist on the substrate and overexposing the resist with actinic (e.g.
Asml Netherlands B.v.
01/22/15
20150025142

Use of oligomers of lactic acid in the treatment of gynaecological disorders


The invention relates to the use of one or more oligomers of lactic acid or a lactic acid oligomeric product for the prophylaxis and/or treatment of a disease or condition that benefits from an acidic environment, especially a gynaecological infection including a bacterial infection such as bacterial vaginosis, unspecific colpitis, senile colpitis, cervicitis, and urethritis, a fungal infection, such as candidosis (candida albicans), cryptococcosis, actinomycosis, or a viral infection, such as human immunodefiency virus (hiv), herpes simplex virus (hsv), human papilloma virus (hpv).. .
Laccure Ab
01/22/15
20150025139

Ingenol mebutate in combination with cryotherapy for the treatment of actinic keratosis


The invention relates to the treatment of actinic keratosis (ak) lesions using sequential cryotherapy and field treatment with ingenol mebutate (e.g., pep005 gel).. .
Leo Laboratories Limited
01/22/15
20150023914

Use of tellurium compounds for the treatment actinic keratosis


Methods for treating skin conditions such as basal cell carcinoma and/or actinic keratosis are provided, which are effected by administering a pharmaceutically effective amount of a tellurium-containing compound. A pharmaceutical composition for treatment of skin conditions such as basal cell carcinoma and/or actinic keratosis is also provided..
Biomas Ltd.
01/15/15
20150017347

Method for producing film with coating


Even in the case where a coating liquid is applied onto an inorganic vapor-deposited film deposited on a support in advance, it is possible to effectively prevent cissing with a simple configuration and no increase in thickness of a product. A coating liquid preparation apparatus for preparing a coating liquid containing an actinic ray curable component, a coating apparatus for applying the coating liquid onto an inorganic vapor-deposited film deposited on a belt-like support in advance to form a coating, a first irradiation apparatus for irradiating the coating with an actinic ray, and a drying apparatus for drying the coating irradiated are provided in this order, and in the first irradiation apparatus, irradiation with an actinic ray is made in a state where the coating is wet, to place the curing rate of the curable component in the coating in a range of 10 to 80%..
Fujifilm Corporation
01/15/15
20150016778

Facile optical assemblies and components


A micro identification system supports facile optical assemblies and components. A segment of optical fiber can comprise an identifier formed via actinic radiation.
Cirrex Sytems, Llc
01/15/15
20150015648

Actinic radiation-curable inkjet ink and image forming method using same


Provided is an actinic radiation-curable inkjet ink that undergoes sol-gel phase transfer and contains a dye, a gelling agent, a photopolymerization compound and a photopolymerization initiator. The actinic radiation-curable inkjet ink comprises a photopolymerizable compound a, which is a (meth)acrylate having hydroxyl groups; a photopolymerizable compound b, which is a (meth)acrylate compound having a molecular weight within a range of 300 to 1,500 and an intramolecular structure (—ch2—ch2—o—)m (where m is an integer between 3 and 14); and a (meth)acrylate compound c, which has a molecular weight within a range of 280 to 1,500 and a clogp value within a range of 4 to 7.
Konica Minolta, Inc.
01/08/15
20150010869

Methods of providing patterned chemical epitaxy templates for self-assemblable block copolymers for use in device lithography


A method of forming a patterned chemical epitaxy template, for orientation of a self-assemblable block copolymer including first and second polymer blocks, on a surface of a substrate, the method including applying a primer layer of a primer composition to the surface, the primer composition including a first polymer moiety having a chemical affinity with the first polymer blocks and a second polymer moiety having a chemical affinity with the second polymer blocks, selectively exposing the surface, the primer layer and any overlying layer to actinic radiation to provide exposed and unexposed regions, to render labile the first polymer moiety in the exposed region, and removing the labile first polymer moiety from the exposed region to deplete the primer layer surface in the exposed region of first polymer moiety to form the patterned chemical epitaxy template.. .
Asml Netherlands B.v.
01/08/15
20150010858

Pattern forming method, actinic ray-sensitive or radiation-sensitive composition used therein, resist film, manufacturing electronic device using the same, and electronic device


There is provided a pattern forming method comprising (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive composition containing (a) a non-polymeric acid-decomposable compound having an aromatic ring and a molecular weight of 500 to 5,000 and (b) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of performing development by using an organic solvent-containing developer to form a negative pattern.. .
Fujifilm Corporation
01/08/15
20150010857

Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, manufacturing electronic device, and electronic device


There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (p) having a repeating unit represented by the following formula (a) and having at least two of a repeating unit represented by the following formula (b), a repeating unit represented by the following formula (c), a repeating unit represented by the following formula (d) and a repeating unit represented by the following formula (e).. .
Fujifilm Corporation
01/08/15
20150010855

Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition


And a resist film formed using the actinic ray-sensitive or radiation-sensitive composition, a resist-coated mask blanks coated with the resist film, a resist pattern forming method comprising exposing the resist film and developing the exposed film, a photomask obtained by exposing and developing the resist-coated mask blanks, a method for manufacturing an electronic device, comprising the resist pattern forming method and an electronic device manufactured by the manufacturing method of an electronic device.. .
01/01/15
20150004533

Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same


N represents an integer of 0 to 4.. .
12/18/14
20140371384

Method for producing homogeneously matted coatings by radiation curing


The present invention relates to a method for producing matt and scratch-resistant coatings that takes place under exposure to actinic radiation on coating systems containing activated double bonds under radical polymerisation.. .
Basf Coatings Gmbh
12/18/14
20140370425

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, photomask blank and forming pattern


Provided is an actinic-ray- or radiation-sensitive resin composition including (a) a resin that when acted on by an acid, is decomposed to thereby increase its alkali solubility, which resin comprises at least either any of repeating units (i) of general formula (i) below or any of repeating units (ii) of general formula (ii) below, (b) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume ranges from 250 Å3 to less than 350 Å3, and (c) an onium salt acid generator that when exposed to actinic rays or radiation, generates a sulfonic acid whose volume is 400 Å3 or greater.. .
Fujifilm Corporation
12/11/14
20140363758

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device using the same and electronic device


There is provided a pattern forming method comprising (a) forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin containing a repeating unit having a phenol skeleton and a repeating unit having a group capable of decomposing by the action of an acid to produce an alcoholic hydroxy group; (b) exposing the film; and (c) developing the exposed film by using an organic solvent-containing developer.. .
12/04/14
20140357726

Use of pegylated alcohols for the treatment of actinic keratosis


Use of pegylated alcohols for the treatment of actinic keratosis.. .
12/04/14
20140356771

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing electronic device and electronic device


There is provided an actinic ray-sensitive or radiation-sensitive resin composition, having: (a) a resin having a repeating unit represented by formula (i); (b) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (c) a resin having at least one repeating unit (x) out of a repeating unit represented by formula (ii) and a repeating unit represented by formula (iii) and containing substantially neither fluorine atom nor silicon atom, wherein the content of the repeating unit (x) is 90% or more by mole based on all repeating units in the resin (c).. .
11/27/14
20140349957

Compositions for photodynamic therapy chemically modified to increase epithelia penetration and cellular bioavailability


The present invention describes a photodynamic prodrug, i.e., a substituted 4-thiothymidine (4-tt), which is able to cross the body's epithelia tissues such as the skin, oral cavity, nasal cavity, pulmonary tract, digestive tract, and blood-brain barrier, including the use of such a prodrug in a topical application for the treatment of skin hyperplasias, including skin cancer, psoriasis, keloids, actinic keratosis, and the like.. .
11/27/14
20140349225

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device, and electronic device


There is provided a pattern forming method, including: (a) forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing: (a) a resin capable of increasing polarity by an action of an acid to decrease solubility in an organic solvent-containing developer, (b) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (c) a solvent, and (d) a resin, which contains substantially no fluorine atom and silicon atom and is other than the resin (a), (b) exposing the film; and (c) performing development using the organic solvent-containing developer to form a negative type pattern, wherein a receding contact angle of water on the film formed by (a) is 70° or more.. .
11/27/14
20140349224

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device using the same and electronic device


There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (a) a resin containing an acid-decomposable repeating unit and being capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (b) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (c) a compound capable of decomposing by the action of an acid to generate an acid, and (d) a solvent; (2) a step of exposing the film by using an actinic ray or radiation, and (4) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.. .
11/27/14
20140349223

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-or radiation-sensitive film therefrom, forming pattern, process for manufacturing semiconductor device, semiconductor device and compound


Provided is an actinic-ray- or radiation-sensitive resin composition including a compound that when exposed to actinic rays or radiation, generates any of acids of general formula (i) below.. .
11/27/14
20140349221

Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method and resist film using the composition, and electronic device manufacturing method and electronic device using these


And a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method comprising a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, a step of exposing the film, and a step of developing the exposed film, a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the method for manufacturing an electronic device.. .
11/20/14
20140342973

Cleaning fluid


A cleaning fluid comprising glycerin and a culture of micro-organisms, said culture comprising lactic acid bacteria, actinomycetes, photosynthetic bacteria, yeast and fungi.. .
11/20/14
20140342275

Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the composition


An actinic ray-sensitive or radiation-sensitive resin composition contains a compound (p) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group has been substituted with a group represented by the following general formula (1) (in the formula, m11 represents a single bond or a divalent linking group; q11 represents an alkyl group, a cycloalkyl group, or an aryl group).. .
11/20/14
20140342223

Actinic and electron beam radiation curable water based electrode binders and electrodes incorporating same


A process for manufacturing an electrode utilizing electron beam (eb) or actinic radiation to cure the electrode binder is provided. A process is also disclosed for mixing specific actinic or eb radiation curable polymer precursors with electrode solid particles to form an aqueous mixture, application of the mixture to an electrode current collector, followed by the application of actinic or eb radiation to the current collector for curing the polymer, thereby binding the electrode binder to the current collector.
11/20/14
20140342086

Photoaligning materials


The present invention relates to polymer, homo- or copolymer or oligomer, which, when irradiated with polarised light orients perpendicular to the polarization direction of polarized actinic light, for the photoalignment of liquid crystals, especially for the planar orientation of liquid crystals, and which derives from at least one monomer (i), compositions thereof, and its use for optical and electro optical devices, such as, liquid crystal devices (lcds), especially for planar orientation of liquid crystals.. .


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