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Actin patents



      
           
This page is updated frequently with new Actin-related patent applications. Subscribe to the Actin RSS feed to automatically get the update: related Actin RSS feeds. RSS updates for this page: Actin RSS RSS


Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, and…

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, and…

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, and…

Fujifilm

Pattern forming method, method for manufacturing electronic device, and electronic device

Date/App# patent app List of recent Actin-related patents
06/25/15
20150175674
 Lipidated peptides as anti-obesity agents patent thumbnailLipidated peptides as anti-obesity agents
Lipidated peptides, analogs of both forms of the prolactin-releasing peptide, prrp31 and prrp20, represent anorexigenic compounds that lower food intake and function in the brain after peripheral administration. The analogs prrp31 and prrp20 lipidated at the n-terminus by myristic or palmitic acids bind with high affinity to the endogenous receptor gpr10 in the rat pituitary cell line rc-4b/c and cho cell line with transfected human receptor.
Ustav Organicke Chemie A Biochemie Akademie Ved Cr, V.v.i
06/18/15
20150168838
 Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition patent thumbnailPositive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
A positive resist composition comprises: (a) a resin of which solubility in an alkali developer increases under an action of an acid; (b) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (c) a resin having at least one of a fluorine atom and a silicon atom; and (d) a solvent; and a pattern forming method using the positive resist composition.. .
Fujifilm Corporation
06/18/15
20150168830
 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, and  manufacturing electronic device and electronic device, and compound patent thumbnailActinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, and manufacturing electronic device and electronic device, and compound
X− represents a non-nucleophilic anion.. .
06/11/15
20150160559
 Pattern forming method,  manufacturing electronic device, and electronic device patent thumbnailPattern forming method, manufacturing electronic device, and electronic device
There is provided a pattern forming method containing: forming a film by using a radiation-sensitive or actinic ray-sensitive resin composition containing: (a) a onium salt compound containing a nitrogen atom in a cationic moiety; (b) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (c) a resin capable of increasing the polarity by the action of an acid to decrease solubility in a developer containing an organic solvent, exposing the film; and developing the exposed film by using a developer containing an organic solvent to form a negative pattern.. .
Fujifilm Corporation
06/11/15
20150160555
 Pattern forming method, and,  producing electronic device and electronic device, each using the same patent thumbnailPattern forming method, and, producing electronic device and electronic device, each using the same
The pattern forming method of the invention includes (i) a step of forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition including a resin (a) capable of increasing the polarity by the action of an acid to decrease the solubility in a developer including an organic solvent; (ii) a step of exposing the first film; (iii) a step of developing the exposed first film using a developer including an organic solvent to form a negative tone pattern; and (iv) a step of forming a second film on the second substrate so as to cover the periphery of the negative tone pattern.. .
Fujifilm Corporation
06/11/15
20150157693
 Food containing prolactin patent thumbnailFood containing prolactin
A nutritional composition for a subject, comprising prolactin identical or similar or analogous to prolactin found in a natural food source, and at least one protective layer, wherein release of said prolactin from the composition in said subject is the result of an environmental event.. .
Technion Research & Development Foundation Ltd.
06/11/15
20150156996
 Livestock with genetically modified prolactin receptor patent thumbnailLivestock with genetically modified prolactin receptor
Methods, uses, and animals for introgression of alleles between animals, including snps. One embodiment involves introducing a targeted targeting endonuclease system and a hdr template into a cell with a mismatch in the binding of the targeting endonuclease and the targeted site..
Recombinetics, Inc.
06/04/15
20150150929
 Use of essential oil of oregano or of rosewood, or constituents thereof, in the cosmetic treatment of keratoses patent thumbnailUse of essential oil of oregano or of rosewood, or constituents thereof, in the cosmetic treatment of keratoses
The present invention concerns various cosmetic uses of compositions comprising an essential oil or one of its constituents, preferably a major constituent, in the targeted treatment and prevention of benign keratoses, and more particularly keratoses induced by solar radiation on the skin of a subject. More particularly, the present invention concerns compositions based on the essential oil of oregano or of rosewood, or on linalool, thymol or carvacrol.
Institut Curie
05/28/15
20150148415
 Derivatized dendrimer with low citotoxicity for in vivo, ex vivo, in vitro or in situ chelation of heavy metals or actinides patent thumbnailDerivatized dendrimer with low citotoxicity for in vivo, ex vivo, in vitro or in situ chelation of heavy metals or actinides
The present invention considers derivatized nanomolecules with proven effectiveness to bind to actinides, more specifically uranium, during in vivo, ex vivo, in vitro or in situ assays. When assayed in vivo, the invention showed a reduction in at least kidney damage due to exposition to uranium..
Universidad De Talca
05/28/15
20150147699
 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film,  manufacturing electronic device, and electronic device patent thumbnailPattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device, and electronic device
The pattern forming method of the present invention includes (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition which contains a resin (a) which has a repeating unit including a group capable of generating a polar group by being decomposed due to an action of an acid and a repeating unit including a carboxyl group, a compound (b) which generates an acid according to irradiation with actinic rays or radiation, and a solvent (c); (ii) exposing the film using a krf excimer laser, extreme ultraviolet rays, or an electron beam; and (iii) forming a negative tonetone pattern by developing the exposed film using a developer which includes an organic solvent.. .
Fujifilm Corporation
05/28/15
20150147688

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device using the same, and electronic device


There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (p) a resin having a repeating unit represented by the specific formula, (2) a step of exposing the film by using an actinic ray or radiation, and (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern, wherein the content of the repeating unit represented by the specific formula is 25 mol % or more based on all repeating units in the resin (p).. .
Fujifilm Corporation
05/28/15
20150146294

Polarizing plate, fabrication polarizing plate, and image display device


The purpose of the present invention is to provide a polarization plate the warping and deformation of which can be controlled when the polarization plate, and a display device that contains the polarization plate, is stored under conditions of high heat and humidity, while keeping the display device low profile. This polarization plate has a polarizing element 0.5-10 μm in thickness that contains a dichroic pigment, a glass film, and an adhesion layer that is disposed between the polarizing element and the glass film and that comprises a cured material of an actinic ray curable composition..
Konica Minolta, Inc.
05/28/15
20150146159

Methods for formation of an ophthalmic lens with an insert utilizing voxel-based lithography


Methods for manufacturing an ophthalmic lens with an insert using voxel-based lithography techniques, wherein at least a portion of one surface may be free-formed from a reactive mixture are set forth herein. An ophthalmic lens precursor may be formed on a substrate with an arcuate optical quality surface via a source of actinic radiation controllable to cure a definable portion of a volume of reactive mixture, wherein the control may be on a voxel by voxel basis..
Johnson & Johnson Vision Care, Inc.
05/21/15
20150141414

Formulation of stable recombinant alpha-fetoprotein conjugated with anti-tumor substance in target-delivery system for treatment of cancer and autoimmune disease


Disclosed is a stable formulation based on rafp conjugated with drug delivery system of various classes of pharmacological agents such as dactinomycin, cardionolide, and bufadinolide, among others. In another embodiment, the invention discloses a method of producing rafp in a strain of methylotrophic pichia pastoris yeast, allowing the yeast to replicate, and extracting the newly created rafp.
Legrand International Llc
05/21/15
20150140484

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, using the same, pattern forming method, manufacturing electronic device, and electronic device


There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (a) a resin containing a repeating unit represented by the first specific formula and a repeating unit represented by the second specific formula, wherein the content of the repeating unit represented by the first specific formula is 35 mol % or more based on all repeating units in the resin (a), a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition.. .
Fujifilm Corporation
05/21/15
20150140482

Pattern forming method, and, electronic device producing method and electronic device, each using the same


A pattern forming method includes: (a) forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition (i) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (b) exposing the first film; (c) developing the exposed first film using a developer containing an organic solvent to form a first negative pattern; (e) forming a second film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition (ii) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (f) exposing the second film; and (g) developing the exposed second film using a developer containing an organic solvent to form a second negative pattern in this order.. .
Fujifilm Corporation
05/14/15
20150133542

Method of topically treating actinic keratosis with ingenol mebutate cycle therapy


The present invention relates to cyclic or repeated use of the ingenol mebutate for topical treatment of actinic keratosis lesions. Generally speaking, the present invention comprises a first ingenol mebutate treatment cycle and a second ingenol mebutate treatment cycle, wherein the first treatment cycle topically treats a treatment area with a topical gel formulated with ingenol mebutate at a selected dosage strength for a specified treatment regimen, and the second ingenol mebutate treatment cycle comprises topically re-treating the treatment area with the same topical ingenol mebutate gel for the same specified treatment regimen, if following the first treatment cycle, the treatment area failed to clear or failed to remain clear of ak lesions.
05/14/15
20150133383

Method for diagnosis and treatment of prolactin associated disorders


The present invention concerns methods and tools for determining a specific treatment of a prolactin associated disorder. The treatment is selected based on the expression pattern of growth hormonereceptor (ghr), prolactin receptor (prlr) and the suppressors socs2 and tcs2..
05/14/15
20150132688

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing electronic device, electronic device and resin


There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (p) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.. .
05/14/15
20150132687

Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing electronic device, and electronic device


There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (p) a resin containing a repeating unit represented by the specific formula (1) and a repeating unit represented by the specific formula (a); a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film from the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.. .
05/07/15
20150125796

Method of preparing flexographic printing members


Following imagewise exposure of a sandwiched photopolymer layer, the outer layers between which the photopolymer is interposed are separated in a manner that leaves some photopolymer on each of the separated layers. The photopolymer remaining on one layer contains the raised pattern that will carry ink, and may be subjected to further exposure to actinic radiation in order to complete the curing process without the need for washing; the photopolymer remaining on the other layer can be removed and reused.
04/30/15
20150119789

Compositions and methods for biophotonic bone reconstruction


Biophotonic compositions comprising a photoactivator, a calcium phosphate mineral, hyaluronic acid and optionally glucosamine are disclosed. Said compositions have utility in the augmentation, repair and/or regeneration of bone when used in conjunction with actinic light of a wavelength absorbed by the photoactivator..
Klox Technologies Inc.
04/30/15
20150119434

Method for topically treating actinic keratosis with ingenol 3-(3,5-diethylisoxazole-4-carboxylate)


The invention relates to the topical treatment of actinic keratosis with ingenol 3-(3,5-diethylisoxazole-4-carboxylate).. .
Leo Laboratories Limited
04/30/15
20150119433

Method of treating actinic keratosis on the full balding scalp with ingenol 3-(3,5-diethylisoxazole-4-carboxylate)


The invention relates to the topical treatment of actinic keratosis on the full balding scalp with ingenol 3-(3,5-diethylisoxazole-4-carboxylate).. .
Leo Laboratories Limited
04/30/15
20150118628

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, forming pattern, process for manufacturing semiconductor device, and semiconductor device


Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (p) comprising any of repeating units (a) of general formula (i) below, each of which contains an ionic structural moiety that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid in a side chain of the resin.. .
Fujifilm Corporation
04/30/15
20150118627

Pattern forming method, composition used tehrein, manufacturing electronic device, and electronic device


A pattern forming method includes: (i) a step of forming a first film by using an actinic ray-sensitive or radiation-sensitive resin composition (i), (ii) a step of exposing the first film, (iii) a step of developing the exposed first film by using an organic solvent-containing developer to form a negative pattern, (iv) a step of forming a second film on the negative pattern by using a specific composition (ii), (v) a step of increasing polarity of the specific compound present in the second film, and (vi) a step of removing a specific area of the second film by using the organic solvent-containing remover.. .
Fujifilm Corporation
04/30/15
20150118621

Method of forming pattern and actinic-ray- or radiation-sensitive resin composition for use in the method


Provided is a method of forming a pattern, including (a) forming a film comprising an actinic-ray- or radiation-sensitive resin composition comprising a resin (p) containing a repeating unit (p1) with a cyclic carbonic acid ester structure and any of repeating units (p2) of general formula (p2-1) below, and a compound (b) that when exposed to actinic rays or radiation, generates an acid, (b) exposing the film to actinic rays or radiation, and (c) developing the exposed film with a developer comprising an organic solvent to thereby obtain a negative pattern.. .
Fujifilm Corporation
04/23/15
20150111157

Method of forming pattern and actinic-ray- or radiation-sensitive resin composition for use in the method


Provided is a method of forming a pattern, including forming a film comprising an actinic-ray- or radiation-sensitive resin composition comprising, resin (a) comprising any of repeating units of general formula (i) below, which resin when acted on by an acid, decreases its solubility in a developer comprising an organic solvent, and a compound (b) expressed by any of general formulae (b-1) to (b-3) below, which compound when exposed to actinic rays or radiation, generates an acid, exposing the film to actinic rays or radiation, and developing the exposed film with a developer comprising an organic solvent to thereby obtain a negative pattern.. .
Fujifilm Corporation
04/23/15
20150111154

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device, and electronic device


There is provided a pattern forming method including: (a) a process of forming a film by resin (p) having a repeating unit (a) having a cyclic structure and a partial structure represented by the following formula (i), (ii-1) or (ii-2), and a repeating unit (b) having a group which decomposes by the action of an acid to generates a polar group, and an actinic ray-sensitive or radiation-sensitive resin composition containing compound (b) which generates acid upon irradiation with an actinic ray or radiation; (b) a process of exposing the film; and (c) a process of forming a negative-type pattern by performing development using a developer including an organic solvent, an actinic ray-sensitive or radiation-sensitive resin composition used therefor, a resist film, a method of manufacturing an electronic device, and an electronic device.. .
Fujifilm Corporation
04/23/15
20150111135

Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition for use in the method


Rn-a−x+  (i). .
04/16/15
20150103975

X-ray image sensor and x-ray image sensor system using the same


An x-ray image sensor and an x-ray image sensor system using the same is disclosed. The x-ray image sensor has a back-light unit emitting actinic and non-actinic lights.
National Chiao Tung University
04/16/15
20150101923

Photocatalyst, preparation, photolysis system


The present invention relates to a photocatalyst for the generation of diatomic hydrogen from a hydrogen containing precursor under the influence of actinic radiation comprising a semiconductor support with one or more noble and/or transition metal(s) deposited on said semiconductor support, wherein said metal is covered at least in part with a layer of the semiconductor support. Further disclosed is a method for preparing such catalyst and a method for generating diatomic hydrogen by photolysis..
Saudi Basic Industries Corporation
04/09/15
20150099818

Tri-curable adhesive composition and method


A two part composition comprising a part a and a part b, wherein part a comprises an oligomer having both isocyanate and acrylate moieties, and an organic peroxide capable of generating free radicals upon decomposition; and part b comprises a polyol, and a catalyst that can decompose the organic peroxide. In one form, the two part composition of a part a and a part b are in admixture.
Dymax Corporation
04/09/15
20150098893

Photocatalyst, preparation, photolysis system


The present invention relates to a photocatalyst for the generation of diatomic hydrogen from a hydrogen containing precursor under the influence of actinic radiation comprising semiconductor support particles comprised of srtio3 and tio2 with one or more noble and/or transition metals deposited thereon. Further disclosed is a method for preparing such catalyst and a method for generating diatomic hydrogen by photolysis..
Saudi Basic Industries Corporation
04/09/15
20150098869

Commercialization of carbon dioxide from coal fired furnace emissions


A procedure for producing unstable aldehydes from coal combustion emission by inserting protons (h+) within the double bond interstice structure of heated co2 carrier gas to form a univalent aldehyde (co2h+). The univalent aldehydes are actinically radiated by a massless negative charge that is ejected from a filament rail magnetic induction circuit at 1 sec.
04/02/15
20150093692

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film used therefor, and electronic device manufacturing method and electronic device using the samedevice manufacturing method and electronic device using the same


There is provided a pattern forming method including: (a) forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing (a) to (c), (a) a resin capable of increasing polarity by the action of an acid to decrease solubility in a developer containing an organic solvent, (b) a compound capable of generating acid upon irradiation with an actinic ray or radiation, and (c) a salt having a conjugate base structure of an acid having a pka of −2 or more in a molecule thereof and substantially not capable of decomposing by an actinic ray or radiation, (b) exposing the film, and (c) developing the exposed film using a developer containing an organic solvent to form a negative pattern.. .
Fujifilm Corporation
04/02/15
20150093691

Actinic-ray- or radiation-sensitive resin composition and forming pattern using the composition


According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes compound (a) that when exposed to actinic rays or radiation, generates acids and resin (b) that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer. Compound (a) is expressed by general formula (i) below.
Fujifilm Corporation
04/02/15
20150093393

Anti-prolactin receptor antibody formulations


Provided are a wide concentration range, especially high concentration, substantially salt-free anti-prolactin receptor antibody formulations that are substantially isosmotic and of low viscosity.. .
Bayer Healthcare Llc
03/26/15
20150086912

Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method using the same, manufacturing semiconductor device, and semiconductor device


There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (p) a resin having a repeating unit (a) represented by the specific formula (i) capable of generating an acid on the side chain of the resin upon irradiation with an actinic ray or radiation, and a resist film formed with the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising: exposing the resist film, and developing the exposed resist film, and a method for manufacturing a semiconductor device, containing the pattern forming method, and a semiconductor device manufactured by the manufacturing method of the semiconductor device.. .
Fujifilm Corporation
03/26/15
20150086911

Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask


An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (a) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (m) through covalent bonding. In the formula, y1 and y2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group.
Fujifilm Corporation
03/26/15
20150086726

Methods for making cured sealants by actinic radiation and related compositions


Disclosed are methods for making a cured sealant. The methods include depositing an uncured sealant composition on a substrate and exposing the uncured sealant composition to actinic radiation to provide a cured sealant.
Prc-desoto International, Inc.
03/19/15
20150080430

Use of jasmonate ester derivatives for treating benign hyperproliferative skin disorders


The present invention relates to methods of treating benign hyperproliferative diseases of the epidermis by administering a composition comprising at least one jasmonate ester derivative. In particular, the present invention provides jasmonate ester derivatives as potent compounds useful for the treatment of disorders such as actinic keratoses with reduced side effects..
Sepal Pharma Ltd.
03/19/15
20150080312

Hexadepsipeptide analogues as anticancer compounds


Or derivatives or pharmaceutically acceptable salts thereof. The invention also includes all isomeric and tautomeric forms of the compound of formula (1) or the derivatives thereof.
03/19/15
20150079624

Porifera-based therapeutic compositions for treating and preventing skin diseases


Methods and protocols of harvesting and processing of porifera species, specifically sponges, and more specifically fresh water species of genus spongilla; testing and storing of the processed spongilla powder; and manufacturing and packaging of spongilla-based therapeutic compositions for treating and preventing skin diseases are disclosed. Treatable skin conditions and diseases include without limitation acne vulgaris, rosacea, seborrheic dermatitis, psoriasis, photo-aging and actinic keratosis, acne vulgaris, psoriasis, photo-aging, wounds, scars, and eczema (atopic dermatitis)..
03/19/15
20150079522

Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method


A pattern forming method, including: (a) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (b) exposing the resist film; and (d) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.. .
Fujifilm Corporation
03/19/15
20150079508

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device, and electronic device


There is provided a pattern forming method comprising (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition; (ii) a step of exposing the film; and (iii) a step of performing development by using a developer containing an organic solvent to form a negative pattern, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains (a) a resin capable of increasing the polarity by an action of an acid to decrease the solubility in a developer containing an organic solvent, (b) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (c) a solvent, and (d) a resin having a repeating unit having a fluorine atom and not having a cf3 partial structure.. .
Fujifilm Corporation
03/19/15
20150078504

Hybrid molten salt reactor with energetic neutron source


In an embodiment, a hybrid molten salt reactor includes a source of energetic neutrons, the energetic neutrons having a typical energy per neutron of 14 mev or greater, a critical molten salt reactor, and a molten salt comprising a dissolved mixture of fissile actinides and fertile actinides. The molten salt circulates in a loop through the reactor vessel and around the source of energetic neutrons.
03/12/15
20150073008

Topical application of vinca alkaloids for the treatment of actinic keratosis


Or a pharmaceutically acceptable salt (or hydrate) thereof, wherein each of r1, r2, r3, and r4 is as defined and described herein, wherein said formulations are useful for the topical treatment of actinic keratosis.. .
03/12/15
20150072083

High temperature resistance, radiation curable maskant for metal substrates


A method for shielding a metal substrate surface during the application of heat to the surroundings of the substrate which comprises. A liquid maskant composition is formed which comprises: a) at least one of a polycarbonate urethane diacrylate oligomer, a polycarbonate urethane dimethacrylate oligomer, a polycarbonate caprolactone urethane diacrylate oligomer, or a polycarbonate caprolactone urethane dimethacrylate oligomer; b) a reactive diluent capable of free radical polymerization; and c) a photoinitiator capable of generating free radicals when exposed to actinic radiation.
Dymax Corporation
03/05/15
20150065599

Matrices and sealants which are based on sulfur-containing polymers and which comprise a photoinitiator, curing and coating methods, and use of said matrices and sealants


A method for curing a mixture of a matrix and a curing agent based on sulfur-containing polymers on command and so rapidly that a tack-free surface results. A method for coating a substrate with the composition and of curing a sealant is also provided.
Chemetall Gmbh
03/05/15
20150064398

Image formation method, decorative sheet, decorative sheet molding, process for producing in-mold molded product, in-mold molded product, and ink set


The object of the present invention is to provide an image formation method that can give an image that is excellent in terms of adhesion to a substrate, blocking resistance of a resulting printed material, and molding suitability, in particular vacuum forming properties, and that can suppress post-molding cracking of a molding. Disclosed is an image formation method comprising, in order, step a: a step of applying liquid a to a substrate, step b: a step of irradiating the applied liquid a with actinic radiation so as to carry out complete curing or semi-curing up to a degree of cure of at least 90%, step c: a step of applying liquid b to a cured layer of the completely cured or semi-cured liquid a, and step d: a step of completely curing liquid a and liquid b..
Fujifilm Corporation
03/05/15
20150063524

Ald coating of nuclear fuel actinides materials


A method of forming a nuclear fuel pellet, with the steps of obtaining a fuel form in a powdered state; coating the fuel form in a powdered state with at least one layer of a material; and sintering the powdered fuel form into a fuel pellet. A sintered nuclear fuel pellet, wherein the pellet is made from a powdered fuel form, wherein the powdered fuel form is coated with at least one layer of a material, and wherein the at least one layer of the material substantially surrounds each interfacial grain barrier after the powdered fuel form has been sintered..
Uchicago Argonne, Llc
02/26/15
20150056455

Form in-place gasket with tack free surface


A method of preparing a flexible, substantially tack free gasket by forming a liquid composition which is a radiation polymerizable admixture of a free radical polymerizable urethane(meth)acrylate monomer, free radical polymerizable urethane(meth)acrylate oligomer, or combinations thereof; a free radical polymerizable diluent; a free radical polymerization photoinitiator; a wax; a thixotropic agent; and optionally an adhesion promoter and a colorant. The composition is distributed onto a substrate and then exposed to actinic radiation to cure the liquid composition into a flexible, substantially tack free gasket having a shore a hardness of from about a20 to about a80..
Dymax Corporation
02/26/15
20150056421

Cationic polymerizable compositions and methods of use thereof


An inkjet printing method and inkjet compositions are disclosed. The method includes selectively depositing by inkjet printing, layer by layer, a first composition and a second composition onto a receiving media from different dispensers to form polymerizable deposited layers.
Stratasys Ltd.
02/26/15
20150056222

Anti-prlr antibodies and uses thereof


The present invention provides antibodies that bind to prolactin receptor (prlr) and methods of using the same. According to certain embodiments, the antibodies of the invention bind human prlr with high affinity.
Regeneron Pharmaceuticals, Inc.
02/26/15
20150056221

Anti-prlr antibodies and uses thereof


The present invention provides antibodies that bind to prolactin receptor (prlr) and methods of using the same. According to certain embodiments, the antibodies of the invention bind human prlr with high affinity.
Regeneron Pharmaceuticals, Inc.


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This listing is a sample listing of patent applications related to Actin for is only meant as a recent sample of applications filed, not a comprehensive history. There may be associated servicemarks and trademarks related to these patents. Please check with patent attorney if you need further assistance or plan to use for business purposes. This patent data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Actin with additional patents listed. Browse our RSS directory or Search for other possible listings.
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