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Actin patents



      

This page is updated frequently with new Actin-related patent applications.




Date/App# patent app List of recent Actin-related patents
04/28/16
20160116844 
 Method for creating surface texture on flexographic printing elements patent thumbnailMethod for creating surface texture on flexographic printing elements
A method of making a relief image printing element from a photosensitive printing blank is described. The photosensitive printing blank comprises a laser ablatable mask layer disposed on at least one photocurable layer and the laser ablatable mask layer is selectively laser ablated to create an in situ mask and uncover portions of the at least one photocurable layer.
Macdermid Printing Solutions, Llc


04/14/16
20160103395 
 Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method patent thumbnailPattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
A pattern forming method, including: (a) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (b) exposing the resist film; and (d) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.. .

04/07/16
20160097755 
 Method for detecting, capturing and/or releasing chemical elements patent thumbnailMethod for detecting, capturing and/or releasing chemical elements
The invention relates to a method suitable for detecting, capturing and/or selectively releasing chemical elements selected from poor metals, alkalines, alkaline earths, actinides and rare earths. Said method involves a molecular assembly formed by at least one amine, and at least one aldehyde and/or an imine and/or co2, or an adduct formed by the contact between an amine and co2, and at least one of said chemical elements.
Universite Claude Bernard Lyon 1 (ucbl)


03/31/16
20160090432 
 Polymerizable polysiloxanes with hydrophilic substituents patent thumbnailPolymerizable polysiloxanes with hydrophilic substituents
The invention provides an actinically-polymerizable amphiphilic polysiloxane which comprises a polysiloxane polymer chain comprising a polylsiloxane segments comprising at least one siloxane unit having a low molecular weight hydrophilic polymer chain connected with a silicone atom of the siloxane unit, and (meth)acrylamido groups each covalently bonded to one of the ends of the polysiloxane polymer chain and/or to the end of one of low molecular weight hydrophilic polymer chains each connected with one silicone atom. The present invention is also related to a polymer, an actinically-crosslinkable silicone-containing prepolymer, a silicone hydrogel polymeric material, or a silicone hydrogel contact lens, which comprises repeating units derived from an actinically-polymerizable amphiphilic polysiloxane of the invention.
Novartis Ag


03/31/16
20160089672 
 Microfluidic device and a  preparing the microfluidic device from a photosensitive element patent thumbnailMicrofluidic device and a preparing the microfluidic device from a photosensitive element
A microfluidic device is formed from a cover member and a microfluidic precursor that is prepared from a photosensitive element. The photosensitive element is a solid layer of a photopolymerizable composition that includes at least a binder, a monomer, and a photoinitiator.
E I Du Pont De Nemours And Company


03/31/16
20160089362 
 Method for topically treating actinic keratosis on the trunk (except chest) or extremities with ingenol 3-(3,5-diethylisoxazole-4-carboxylate) patent thumbnailMethod for topically treating actinic keratosis on the trunk (except chest) or extremities with ingenol 3-(3,5-diethylisoxazole-4-carboxylate)
The invention relates to the treatment of actinic keratosis on the trunk (except chest) or extremities with ingenol 3-(3,5-diethylisoxazole-4-carboxylate).. .
Leo Laboratories Limited


03/24/16
20160081313 
 Materials and methods for producing animals with short hair patent thumbnailMaterials and methods for producing animals with short hair
The subject invention provides materials and methods for producing animals with short hair length. In a preferred embodiment, this is accomplished by altering in the animal the nucleotide sequence that encodes the prolactin receptor (prlr) protein such that a truncated version of the protein is produced.
Aggenetics, Inc.


03/17/16
20160075148 
 Inkjet recording method, and printed material patent thumbnailInkjet recording method, and printed material
An inkjet recording method comprising, in order, as step a an application step of providing an undercoat layer by applying an undercoat composition onto a recording medium, as step b an image formation step of forming an image by discharging an ink composition onto the undercoat layer, as step c a curing step of irradiating the undercoat layer and the ink composition with actinic radiation so as to carry out curing, the undercoat composition comprising an isocyanate group-containing compound, a radically polymerizable monomer, and a radical polymerization initiator, and the ink composition comprising a radically polymerizable monomer, a radical polymerization initiator, and a colorant.. .
Fujifilm Corporation


03/10/16
20160070167 
 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing  electronic device, electronic device and compound patent thumbnailPattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device, electronic device and compound
There is provided a pattern forming method comprising (i) a step of forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition containing (a) a compound represented by the specific formula, (b) a compound different from the compound (a) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (p) a resin that does not react with the acid generated from the compound (a) and is capable of decreasing the solubility for an organic solvent-containing developer by the action of the acid generated from the compound (b), (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; the actinic ray-sensitive or radiation-sensitive resin composition above; a resist film using the composition.. .
Fujifilm Corporation


03/10/16
20160068274 
 Translucent seal cap patent thumbnailTranslucent seal cap
The present disclosure provides methods and articles useful in sealing fasteners, including seal caps and in particular translucent or transparent seals or seal caps. In some embodiments, a seal cap which is optically translucent and optionally visibly transparent contains an uncured sealant, which is optionally optically translucent or visibly transparent, and is applied to a fastener.
3m Innovative Properties Company


03/03/16
20160066430 

Hot melt compositions with improved etch resistance


Hot melt compositions include non-aromatic cyclic (alkyl)acrylates and low acid number waxes. Upon application of actinic radiation, the hot melt compositions cure to form resists.
Rohm And Haas Electronic Materials Llc


02/25/16
20160054658 

Pattern forming method, manufacturing electronic device, and electronic device


Provided is a pattern forming method including a step of applying a solvent (s) onto a substrate, a step of applying an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate, on which the solvent (s) has been applied, to form an actinic ray-sensitive or radiation-sensitive film, a step of exposing the actinic ray-sensitive or radiation-sensitive film, and a step of developing the exposed actinic ray-sensitive or radiation-sensitive film with a developing liquid containing an organic solvent to form a negative-type pattern.. .
Fujifilm Corporation


02/25/16
20160051493 

Methods of treatment of keratinocyte-derived lesions


Methods are provided for diagnosing and treating or preventing keratinocyte-derived lesions, e.g., scc, (including high-risk forms), non-melanoma skin cancers (including high-risk forms), and actinic keratinosis (“ak”) by administering a therapeutically effective amount of camphor oil, camphor oil derivatives or components, and certain terpene trpv3 agonists including 2-apb.. .
The Trustees Of Columbia University In The City Of New York


02/18/16
20160048082 

Pattern-forming method, electronic device and producing same, and developing fluid


A pattern-forming method includes forming a film on a substrate by using an actinic ray-sensitive or radiation-sensitive resin composition containing at least a resin that exhibits, due to an action of an acid, increase in polarity and decrease in solubility with respect to a developer including an organic solvent, and a compound that generates an acid by being irradiated with actinic rays or radiation; exposing the film; and forming a negative tone pattern by developing the exposed film with a developer including an organic solvent, in which the developer includes at least one compound a selected from the group consisting of an onium salt, a polymer having an onium salt, a nitrogen-containing compound including three or more nitrogen atoms, a basic polymer, and a phosphorus-based compound.. .
Fujifilm Corporation


02/18/16
20160048075 

Pattern forming method, composition kit and resist film, manufacturing electronic device using these, and electronic device


There is provided a pattern forming method comprising (i) forming a film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition which contains (a) a resin which decomposes due to an action of an acid to change its solubility with respect to a developer and (c) a specific resin, (ii) forming a top coat layer using a top coat composition which contains a resin (t) on the film, (iii) exposing the film which has the top coat layer to actinic rays or radiation, and (iv) forming a pattern by developing the film which has the top coat layer after the exposing.. .
Fujifilm Corporation


02/11/16
20160038235 

Ingenol mebutate in combination with laser therapy for the treatment of hyperkeratotic skin lesions


The invention relates to the treatment of actinic keratosis (ak) lesions using laser therapy followed by treatment with ingenol mebutate (e.g., pep005 gel).. .
Leo Laboratories Limited


02/04/16
20160033870 

Pattern formation method, electronic-device manufacturing method, and electronic device


A pattern formation method which includes a process of forming an actinic ray sensitive or radiation sensitive film by coating a substrate with an actinic ray sensitive or radiation sensitive resin composition which contains a resin where the degree of solubility with respect to a developer which includes one or more types of organic solvents decreases due to an effect of an acid, a compound which generates an acid by irradiation with actinic rays or radiation, and a solvent, a process of exposing the actinic ray sensitive or radiation sensitive film via an immersion liquid, a process of heating the actinic ray sensitive or radiation sensitive film, and a process of developing the actinic ray sensitive or radiation sensitive film using the developer which includes an organic solvent in this order, in which a process of cleaning the actinic ray sensitive or radiation sensitive film is included after the film forming process and before the exposing process and/or after the exposing process and before the heating process.. .
Fujifilm Corporation


02/04/16
20160032426 

Optimized nickel alloy and turbine blade made thereof


A nickel alloy includes a proportion by weight of cr of 12.3% to 13.7%, a proportion by weight of al of 4.3% to 4.7% and a proportion by weight of co of 4% to 6%. The components are preferably cr, mo, re and/or w, al, ti, ta, hf, si, reactive elements including actinides and lanthanides, c, optionally the components zr and/or b.
Siemens Aktiengesellchaft


02/04/16
20160031126 

Systems and methods for the production of contact lenses


An apparatus for spin casting lenses includes a rotatable tube, the rotatable tube defining a longitudinal cavity, wherein the longitudinal cavity is configured to receive molds. According to one exemplary embodiment, the rotatable tube is made of metal and includes a plurality of apertures configured to permit the transmission of actinic radiation..
Menicon Singapore Pte Ltd.


01/28/16
20160025872 

Compositions and methods for monitoring actinides


Compositions and methods for monitoring the quantity of actinides present in a test sample are disclosed. Compositions and methods for monitoring the motion of special nuclear materials through space are also described.

01/28/16
20160024617 

Methods for gas-phase thermochromatographic separations of fission and activation products


Methods are provided for characterizing samples containing chemical elements such as rare earth elements, actinides, and heavy transition metals by treating the samples to form volatile complexes of the elements (e.g., β-diketonate complexes or other organic ligand complexes of the elements) and then analyzing the complexes, for example, via gas-phase thermochromatography. Also provided are methods for separating and/or recovering such chemical elements.
University Of Tennessee Research Foundation


01/28/16
20160024005 

Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and manufacturing electronic device using same, and electronic device


And a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising a step of exposing the resist film, and a step of developing the exposed film, and a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.. .

01/21/16
20160018732 

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and producing electronic device using them, and electronic device


There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing: a resin (a) containing a repeating unit represented by a specific formula (1), and an ionic compound (b) represented by a specific formula (2), a resist film formed by using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method including: (a) a step of forming the resist film, (b) a step of exposing the film, and (c) a step of developing the exposed film using a developer to form a pattern.. .
Fujifilm Corporation


01/21/16
20160017177 

Actinic-radiation-curable resin composition, primer contianing the same, and shaped article


Provided are an actinic-radiation-curable resin composition that has high storage stability and that combines high levels of ease of application and adhesion to various substrates and high levels of coating appearance and heat resistance after curing, an actinic-radiation-curable primer for metallization that contains such an actinic-radiation-curable resin composition, and a shaped article including an undercoat layer for metallization that has good adhesion to various substrates. Specifically, an actinic-radiation-curable resin composition is used that contains an oil-modified alkyd resin (a) and a (meth)acryloyl-containing compound (b).
Dic Corporation


01/14/16
20160011517 

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device using the same, and electronic device


There is provided a pattern forming method, including: (1) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition, (2) exposing the film with actinic ray or radiation, (3) developing the film exposed by using a developer containing an organic solvent, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains (a) a resin having a repeating unit (r) with a structural moiety capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid, and (b) a solvent, and the developer contains an additive that causes at least one interaction selected from the group consisting of an ionic bond, a hydrogen bond, a chemical bond and a dipole interaction with respect to a polar group contained in the resin (a) after the exposing.. .
Fujifilm Corporation


01/14/16
20160009936 

Method of forming patterns


A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film, wherein the resist composition contains a resin capable of increasing the polarity by the action of the acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) forming a protective film on the resist film with a protective film composition after forming the resist film and before exposing the resist film, (c) exposing the resist film via an immersion medium, and (d) performing development with a negative developer.. .
Fujifilm Corporation


01/07/16
20160004157 

Method of forming pattern, actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, process for manufacturing electronic device and electronic device


A method of forming a pattern includes (a) forming a film of an actinic-ray- or radiation-sensitive resin composition, (b) exposing the film to light, and (c) developing the exposed film with a developer comprising an organic solvent to thereby form a negative pattern. The actinic-ray- or radiation-sensitive resin composition includes (a) a resin whose solubility in the developer comprising an organic solvent is lowered when acted on by an acid, which resin contains a repeating unit with any of lactone structures of general formula (1) below, and (b) a compound that when exposed to actinic rays or radiation, generates an acid..
Fujifilm Corporation


01/07/16
20160004156 

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition for organic solvent development used therefor and manufacturing the same, manufacturing electronic device, and electronic device


There is provided a pattern forming method including: (1) filtering, by using a filter, a resin solution containing (a) a resin capable of increasing its polarity by an action of an acid to decrease solubility in a developer including an organic solvent, and (c1) a solvent; (2) preparing an actinic ray-sensitive or radiation-sensitive resin composition containing the resin (a) obtained from the filtrating (1) and a solvent (c2) different from the solvent (c1); (3) filtering the actinic ray-sensitive or radiation-sensitive resin composition by using a filter; (4) forming a film by using a filtrate obtained by the filtering (3); (5) exposing the film; and (6) performing development using a developer containing an organic solvent to form a negative pattern, wherein an absolute value of the difference between solubility parameter (spc1) of the solvent (c1) and solubility parameter (spdev) of the developer (c1), . .
spc1−spdev


01/07/16
20160002497 

Methods for making elastomers, elastomer compositions and related elastomers


Methods of producing an elastomer are disclosed that include (i) applying an actinic radiation curable composition preferably selected from a urethane (meth)acrylate, an allophanate urethane (meth)acrylate or a lactone-containing (meth)acrylate to a substrate at a thickness of at least 0.25 mm (10 mils); (ii) exposing the composition ultraviolet radiation to produce a cured film; and (iii) removing the film from the substrate. Related compositions are also disclosed..
Allnex Ip Sarl


01/07/16
20160002342 

Anti-prolactin receptor antibody formulations


Provided are a wide concentration range, especially high concentration anti-prolactin receptor antibody formulations that are substantially isosmotic and of low viscosity.. .

12/31/15
20150378257 

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, manufacturing electronic device, and electronic device


According to one example of the present application, there is provided a pattern forming method including: (i) forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (a) a specific resin and (b) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) exposing the film; and (iii) developing the film exposed, by using an organic solvent-containing developer to form a negative pattern.. .
Fujifilm Corporation


12/31/15
20150376476 

Actinic radiation and moisture dual curable composition


A dual curable, liquid adhesive composition capable of polymerization by exposure to actinic radiation and moisture. The composition is particularly useful for liquid adhesives for electronic applications.
Dymax Corporation


12/31/15
20150376440 

Inkjet recording method, printed material, and ink set


An inkjet recording method comprising, in order, a step of applying an undercoat solution having a ph of no greater than six to a substrate, a discharge step of discharging an ink composition onto the substrate to which the undercoat solution has been applied, a drying step of drying the ink composition above the substrate by means of heat, and a curing step of curing the ink composition above the substrate by irradiation with actinic radiation, the ink composition comprising (component a) a polymer compound comprising a monomer unit (a-1) having a partial structure represented by formula (1) below, (component b) water, and (component c) a pigment.. .
Fujifilm Corporation


12/24/15
20150369962 

Actinically-crosslinkable amphiphilic prepolymers


The invention provide a class of actinically-crosslinkable amphiphilic prepolymers which comprise at least one polysiloxane segment, at least one polyoxazoline segment, and two terminal ene groups. The present invention is also related to a medical device comprising a silicone hydrogel material obtained from step-growth polymerization of a polymerizable material comprising a prepolymer of the invention and to a method for producing contact lenses from a prepolymer of the invention..
Novartis Ag


12/17/15
20150362836 

Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, manufacturing electronic device and electronic device


And chemical amplification resist composition containing the photosensitive composition, wherein the photosensitive composition further contains a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and a chemical amplification resist composition containing the photosensitive composition, wherein the photosensitive composition further contains a compound capable of generating an acid upon irradiation with an actinic ray or radiation.. .

12/17/15
20150361298 

Actinic-radiation-curable resin composition, primer containing the same, and shaped article


Provided are an actinic-radiation-curable resin composition that has high storage stability and that combines high levels of ease of application and adhesion to various substrates and high levels of coating appearance and heat resistance after curing, an actinic-radiation-curable primer for metallization that contains such an actinic-radiation-curable resin composition, and a shaped article including an undercoat layer for metallization that has good adhesion to various substrates. Specifically, an actinic-radiation-curable resin composition is provided that contains an oil-modified alkyd resin and a (meth)acryloyl-containing compound.
Dic Corporation


12/10/15
20150355541 

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and pattern forming method


An actinic-ray- or radiation-sensitive resin composition includes (a) a resin containing an acid-decomposable repeating unit and having a polarity that is changed when the resin is acted on by an acid, and (b) a compound that is configured to produce an acid when exposed to actinic rays or radiation. The acid produced by the compound (b) exhibits a log p value of 3.0 or below and has a molecular weight of 430 or greater..
Fujifilm Corporation


12/10/15
20150352788 

Resin container for stereolithography


According to some aspects, a storage unit for storing a photopolymer resin is provided. The storage unit may comprise a photopolymer resin, a bottom face comprising at least one region of actinically transparent material, the actinically transparent material being actinically transparent with respect to the photopolymer resin, at least one wall extending upwards from said bottom face comprising at least one region of actinically opaque material, the actinically opaque material being actinically opaque with respect to the photopolymer resin, and a lid comprising the actinically opaque material and removably connectable to the at least one wall..
Formlabs, Inc.


12/03/15
20150342900 

Device for delivery of skin care composition


A novel device and method for delivering a liquid containing an active ingredient to a treatment site on the skin is disclosed. The device is useful for treating lesions or abnormal skin features such as corns, warts, calluses, bunions, actinic keratoses and hard hyperkeratotic skin as is often found on the face, arms, legs or feet..
Johnson & Johnson Consumer Inc.


11/26/15
20150338743 

Pattern forming method, manufacturing electronic device using same, and electronic device


There is provided a pattern forming method comprising a step of forming a resist film from an actinic ray-sensitive or radiation-sensitive resin composition containing a resin capable of increasing the polarity by an action of an acid to decrease the solubility in an organic solvent-containing developer and a compound capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid, a step of forming, on the resist film, a protective film from a protective film composition, a step of exposing the resist film having a protective film to an electron beam or an extreme-ultraviolet ray, and a step of developing the resist film by using the organic solvent-containing developer.. .
Fujifilm Corporation


11/26/15
20150338736 

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and forming pattern


Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (a) and any of compounds (b) of general formula (i) below. (in general formula (i), rf represents a fluorine atom or a monovalent organic group containing at least one fluorine atom; r1 represents a hydrogen atom or a monovalent substituent containing no fluorine atom; x1 represents a monovalent organic group having at least two carbon atoms, or a methyl group in which a substituent other than a fluorine atom is optionally introduced, provided that x1 may be bonded to r1 to thereby form a ring; and z represents a moiety that when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group.).
Fujifilm Corporation


11/26/15
20150338732 

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, pattern forming method, process for manufacturing electronic device and electronic device


An actinic-ray- or radiation-sensitive resin composition includes a compound (a) that is configured to produce an acid when exposed to actinic rays or radiation, and a resin (b). The compound (a) is expressed by general formula (1) or (2) below.
Fujifilm Corporation


11/26/15
20150337310 

Splice modulating oligonucleotides that inhibit cancer


A method of treating cancer in a subject is provided. The method includes administering a splice modulating oligonucleotide to the subject in an amount effective to provide a therapeutic benefit to the subject.
The Regents Of The University Of California


11/26/15
20150337248 

Method for rapid maturation of distilled spirits using light and heat processes


An improved system and process for rapidly producing distilled spirits having characteristics associated with a much longer maturation process is provided. The method involves contacting wood with an unmatured distilled spirit under heated conditions and contacting the resulting heat-treated spirit with actinic light.
Lost Spirits Distillery


11/26/15
20150336370 

System and exposing a digital polymer plate


An improved process for producing flexographic printing plates using a digital workflow is described. After creating an in-situ digital mask over the photopolymerizable layer, the photopolymerizable layer is exposed to actinic radiation through the mask layer in a reduced oxygen environment.
Precision Rubber Plate Co., Inc.


11/19/15
20150331314 

Pattern forming method, compound used therein, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device, and electronic device


There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (a) a resin having a group capable of decomposing by an action of an acid to produce a polar group, (c1) a compound containing a group capable of generating a first acidic functional group upon irradiation with an actinic ray or radiation and a group capable of generating a second acidic functional group different from the first acidic functional group upon irradiation with an actinic ray or radiation, and (c2) at least one compound containing two or more groups selected from the group consisting of the groups capable of generating the structures represented by the specific formulae upon irradiation with an actinic ray or radiation.. .
Fujifilm Corporation


11/19/15
20150328878 

Printing form precursor having elastomeric cap layer and a preparing a printing form from the precursor


The invention pertains to a printing form precursor, a method of preparing a printing form from the precursor, and a process of preparing the precursor. The printing form precursor includes a photopolymerizable layer, an elastomeric layer having at least an elastomeric binder and particulate, and an actinic radiation opaque material on, adjacent, or disposed above the elastomeric layer opposite the photopolymerizable layer.
E I Du Pont De Nemours And Company


11/12/15
20150321980 

Stabilization of pyrolysis bio-oil using in-situ hydrogenation


Methods are provided for producing an alcohol-containing pyrolysis product. Initially, a hydrocarbon feedstock is pyrolyzed in the presence of a catalyst system, the catalyst system comprising a basic metal oxide catalyst and a hydrogenation metal catalyst.
Exxonmobil Research And Engineering Company


11/05/15
20150315213 

Tris(trimethyl siloxy)silane vinylic monomers and uses thereof


The invention provides a tris-containing vinylic monomer which comprises one sole (meth)acryloyloxy group and a tris(trimethylsiloxy)silyl group covalently linked to the ethylenically-unsaturated group through a polyoxyethylene linker. The present invention is also related to a polymer, an actinically-crosslinkable silicone-containing prepolymer, a silicone hydrogel polymeric material, or a silicone hydrogel contact lens, which comprises monomeric units derived from a tris-containing vinylic monomer of the invention.
Shin-etsu Chemical Company, Ltd.


11/05/15
20150314115 

Pump storing and dispensing a plurality of precisely measured unit-doses of imiquimod cream


The present invention is directed to airless storage and dispensing systems that include a pump or dispensing package pre-filled with a topical semi-solid imiquimod pharmaceutical formulation (“pump systems”) and methods for storing and dispensing from the pump systems a plurality of precisely measured and uniform unit doses of a topical semi-solid imiquimod pharmaceutical formulation, and more particularly to pump systems, pre-filled with a topical imiquimod pharmaceutical cream and methods for delivering multiple precisely measured unit doses of a topical imiquimod pharmaceutical cream, and methods for using a controlled delivery pump system to store and dispense a plurality of consistent and precisely measured unit doses of a topical imiquimod pharmaceutical cream for use in topically treating a dermal and mucosal-associated condition, such as, external genital warts and/or perianal warts (egws), actinic keratosis or actinic keratoses (ak or aks) and superficial basal cell carcinoma (sbcc).. .
Medicis Pharmaceutical Corporation


11/05/15
20150313936 

Compositions of aluminum fluoride and methods of use thereof for the treatment and prevention of actinic keratosis and sun-induced damages


The present invention is directed to methods and compositions for the treatment or prevention of actinic keratosis and/or for countering the effects of skin aging and/or damage to blood vessels and fine wrinkling the present invention provides for a composition comprising aluminum fluoride or chemical compounds which releases aluminum fluoride to be used to treat or reduce the negative effects of actinic keratosis or sun-induced skin aging and associated conditions, for example, damaged blood vessels and fine wrinkling. .

11/05/15
20150313901 

Compositions and methods for treating and preventing dermatoses


The invention encompasses protectant agents including uracil or a metabolite thereof that effectively treat the cutaneous toxicities and dermatological side-effects associated with chemotherapeutic agents. Specifically, and surprisingly, the compositions of the invention including uracil or a metabolite thereof are effective for treating various dermatoses including atopic dermatitis, irritant contact dermatitis, radiation-induced dermatitis, dry skin dermatitis, papulopustular rashes, xerosis, pruritus, actinic keratosis, and genital warts..
Asymmetric Therapeutics, Llc


10/29/15
20150309408 

Negative resist composition, resist film using same, pattern forming method, and mask blank provided with resist film


A negative resist composition includes an onium salt compound (a) containing a nitrogen atom in its cation moiety, a compound (b) that is configured to produce an acid when exposed to actinic rays or radiation, and a compound (c) containing an acid-crosslinkable group.. .
Fujifilm Corporation


10/29/15
20150309213 

Amphiphilic siloxane-containing vinylic monomers and uses thereof


The invention provides an amphiphilic siloxane-containing vinylic monomer which comprises one sole ethylenically unsaturated group and a siloxane-containing group covalently linked to the ethylenically-unsaturated group through a hydrophilic linker. The present invention is also related to a polymer, an actinically-crosslinkable silicone-containing prepolymer, a silicone hydrogel polymeric material, or a silicone hydrogel contact lens, which comprises monomeric units derived from an amphiphilic siloxane-containing vinylic monomer of the invention.
Novartis Ag


10/29/15
20150309211 

Carbosiloxane vinylic monomers


The invention provides a carbosiloxane vinylic monomer which comprises one sole ethylenically unsaturated group, one sole terminal butyl group; and one oligo(carbosiloxane)-containing linkage between the ethylenically unsaturated terminal group and the terminal butyl group. The present invention is also related to a polymer, an actinically-crosslinkable silicone-containing prepolymer, a silicone hydrogel polymeric material, or a silicone hydrogel contact lens, which comprises monomeric units derived from a carbosiloxane vinylic monomer of the invention..
Novartis Ag


10/29/15
20150309210 

Hydrophilized carbosiloxane vinylic monomers


The invention provides a hydrophilized carbosiloxane vinylic monomer which comprises (1) a poly(carbosiloxane) segment, (2) one sole ethylenically unsaturated group, and (3) at least one terminal or pendant group which is a hydrophilic group or hydrophilic polymer chain. The present invention is also related to a polymer, an actinically-crosslinkable silicone-containing prepolymer, a silicone hydrogel polymeric material, or a silicone hydrogel contact lens, which comprises monomeric units derived from a hydrophilized carbosiloxane vinylic monomer of the invention..
Novartis Ag


10/29/15
20150308907 

Witness material and monitoring the environmental history of an object


A witness material for monitoring an environmental history of an object may include a material containing a dye of a type that fluoresces in response to actinic radiation in one or both of a shift in color and a change in intensity when subjected to a predetermined stress above a predetermined level; and the material forming a coating on one or more of an outer container for the object, an inner container for the object, a tape that is applied to an outer container for the object, a tape that is applied to an inner container for the object, a shrink wrap enclosing the object, an outer surface of the object, and an inner surface of the object.. .
The Boeing Company


10/29/15
20150307486 

Ergoline derivatives as dopamine receptor modulators


The invention provides compounds of formula (i) wherein r1-r4 have any of the values defined in the specification, and salts thereof. The compounds are useful as dopamine receptor modulators for the treatment of diseases where modulation of dopamine receptors is implicated (e.g.
Regents Of The University Of Minnesota


10/22/15
20150301451 

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device, and electronic device


(c) forming a negative tone pattern by developing the exposed film using a developer which includes an organic solvent.. .

10/22/15
20150301228 

Amphiphilic siloxane-containing (meth)acrylamides and uses thereof


The invention provides an amphiphilic siloxane-containing (meth)acrylamide which comprises one sole (meth)acrylamido group, one sole tris(trimethylsiloxy)silyl group, and one polyethylene glycol segment which is either dangling polymer chain or a hydrophilic linker between the (meth)acrylamido group and the tris(trimethylsiloxy)silyl group. The present invention is also related to a polymer, an actinically-crosslinkable silicone-containing prepolymer, a silicone hydrogel polymeric material, or a silicone hydrogel contact lens, which comprises monomeric units derived from an amphiphilic siloxane-containing (meth)acrylamido group, one tris(trimethylsiloxy)silyl group of the invention.
Novartis Ag


10/15/15
20150293446 

Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, manufacturing electronic device, and electronic device


There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (p) having a repeating unit represented by the following formula (a) and having at least two of a repeating unit represented by the following formula (b), a repeating unit represented by the following formula (c), a repeating unit represented by the following formula (d) and a repeating unit represented by the following formula (e).. .

10/08/15
20150284492 

Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, manufacturing electronic device, and electronic device


There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (p) having a repeating unit represented by the following formula (a) and having at least two of a repeating unit represented by the following formula (b), a repeating unit represented by the following formula (c), a repeating unit represented by the following formula (d) and a repeating unit represented by the following formula (e).. .

10/08/15
20150283145 

Treatment of hyperproliferative and pre-cancerous skin diseases using an inhibitor of cbp/catenin


The present disclosure relates generally to alpha-helix mimetic structures and specifically to alpha-helix mimetic structures that are inhibitors of β-catenin. The disclosure also relates to applications in the treatment of hyperproliferative and pre-cancerous skin conditions including actinic keratosis and psoriasis, and pharmaceutical compositions comprising such alpha helix mimetic β-catenin inhibitors..

10/01/15
20150277225 

Actinic-ray-sensitive or radiation-sensitive resin composition, resist film formed using said composition, forming pattern using said composition, process for producing electronic device, and electronic device


An actinic-ray-sensitive or radiation-sensitive resin composition contains a compound (a) which generates acid by being irradiated with actinic rays or radiation where, when relative light absorbance is εr using triphenyl sulfonium nonaphlate as a reference and relative quantum efficiency is φr using triphenyl sulfonium nonaphlate as a reference, the relative light absorbance εr is 0.4 to 0.8 and εr×φr is 0.5 to 1.0.. .
Fujifilm Corporation


09/24/15
20150265567 

Method for treating skin lesions with ingenol mebutate


The invention provides novel methods for topical treatment of skin lesions such as actinic keratosis over treatment areas up to 250 cm2.. .
Leo Laboratories Limited


09/17/15
20150258071 

Method for topically treating actinic keratosis on the trunk (except chest) or extremities with ingenol 3-(3,5-diethylisoxazole-4-carboxylate)


The invention relates to the treatment of actinic keratosis on the trunk (except chest) or extremities with ingenol 3-(3,5-diethylisoxazole-4-carboxylate).. .
Leo Laboratories Limited


09/10/15
20150253673 

Pattern forming method, resist pattern formed by the method, manufacturing electronic device using the same, and electronic device


There is provided a pattern forming method including (1) forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (a) capable of increasing the polarity by the action of an acid so that a solubility thereof in a developer containing an organic solvent is decreased, (2) exposing the film, (3) developing the film by a developer including an organic solvent to form a negative pattern having a space part obtained by removing a part of the film and a residual film part which is not removed by the developing, (4) forming a resist film for reversing a pattern, on the negative pattern, so as to be embedded in the space part in the negative pattern, and (5) reversing the negative pattern into a positive pattern by removing the residual film part in the negative pattern by using an alkaline wet etching liquid.. .
Fujifilm Corporation


09/10/15
20150253662 

Actinic ray-sensitive or radiation-sensitive resin composition, forming pattern, resist film, manufacturing electronic device, and electronic device


According to an exemplary embodiment of the present invention, there is provided an actinic ray-sensitive or radiation-sensitive resin composition includes an aromatic group and a resin (a) that may include (i) a repeating unit having a group capable of decomposing by the action of an acid to generate a polar group and (ii) a repeating unit having a polar group other than a phenolic hydroxyl group, wherein the total content of the repeating units (i) and (ii) is 51 mol % or more based on the entire repeating units in the resin (a).. .
Fujifilm Corporation


09/10/15
20150252116 

Anti-prolactin receptor antibody formulations


Provided are a wide concentration range, especially high concentration, substantially salt-free anti-prolactin receptor antibody formulations that are substantially isosmotic and of low viscosity.. .
Bayer Healthcare Llc


09/03/15
20150248054 

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing electronic device, and electronic device


(c) developing the film exposed by using a developer including an organic solvent to form a negative pattern.. .

08/27/15
20150240084 

Composition and use in three dimensional printing


A composition suitable for forming a support using a three-dimensional (3d) deposition method is presented. The composition includes a wax including at least one functional group capable of reacting with a build material used in the 3d deposition method, when exposed to an actinic radiation, wherein the functional group is itself substantially non-reactive to the actinic radiation.
General Electric Company


08/27/15
20150240083 

Method for preparing a composition comprising coloured silicate mineral particles and a composition comprising coloured silicate mineral particles


A method for preparing a composition including silicate mineral particles that have colouring properties in which a talcose composition, including phyllosilicate mineral particles chosen from the group formed: from the particles having the chemical formula: ((sixge1-x)4 m3o10 (oh)2, the particles having at least one interlayer space and having the chemical formula: (sixge1-x)4 m3-ε o10 (oh)2, (m′m+)ε′.nh2o: —m having the formula mgy(1)coy(2)zny(3)cuy(4)mny(5) fey(6)niy(7)cry(8); —m′m+ designating at least one interlayer cation, the silicate mineral particles having a thickness of less than 100 nm and of which the largest dimension is less than 10 μπι, is brought into contact with a dye solution, including dye cations, of at least one element chosen from the transition metals, the lanthanides and the actinides. The composition obtained by this method is also described..
Universite Paul Sabatier Toulouse Iii


08/27/15
20150237810 

System and growing a plant in an at least partly conditioned environment


A system for growing a plant (1) in an at least partly conditioned environment includes a cultivation base (11) for receiving a culture substrate (3) with a root system (4) of the plant therein. Root temperature control elements (12) are provided which are able and adapted to impose a predetermined root temperature on the root system, and lighting elements (20,21,22) which are able and adapted to expose leaves of the plant to actinic artificial light.
Plantlab Groep B.v.


08/20/15
20150234276 

Method for creating surface texture on flexographic printing elements


A method of making a relief image printing element from a photosensitive printing blank is described. The photosensitive printing blank comprises a laser ablatable mask layer disposed on at least one photocurable layer and the laser ablatable mask layer is selectively laser ablated to create an in situ mask and uncover portions of the at least one photocurable layer.
Macdermid Printing Solutions, Llc


08/20/15
20150234269 

Mask that provides improved focus control using orthogonal edges


A method includes selecting a mask blank for lithographically forming a desired pattern of main features to be printed onto a wafer by projection lithography. First locations are identified in the desired pattern, the first locations being those which would produce on the wafer images impacted by phase distortions of actinic light through openings in the desired pattern.
International Business Machines Corporation


08/20/15
20150234098 

Light blocking articles having opacifying layers


A light-blocking article is designed to be lightweight but effective to block most incident actinic radiation and can be designed into fabrics, curtains, and other materials. Such an article has an opacifying layer that is capable of blocking predetermined electromagnetic radiation.

08/20/15
20150233929 

Identification of cancer protein biomarkers using proteomic techniques


The claimed invention describes methods to diagnose or aid in the diagnosis of cancer. The claimed methods are based on the identification of biomarkers which are particularly well suited to discriminate between cancer subjects and healthy subjects.
Yale University


08/20/15
20150232435 

Urea and amide derivatives of aminoalkylpiperazines and use thereof


Provided are compounds represented by the formula: with y, ri, and r2 being defined in the present disclosure; pharmaceutically acceptable salts thereof, deuterated forms thereof, isomers thereof, solvates thereof, and mixtures thereof. The compounds can be used for treating a patient suffering from a condition capable of treatment with a partial agonist or antagonist of the dopamine d2/d3 receptors and are especially useful for patients suffering from schizophrenia, depressions, neurodegenerative diseases such as parkinson's, dyskinesias, substance abuse and relapse to substance abuse and addiction to substances such as cocaine, methamphetamine, nicotine and alcohol, glaucoma, cognitive disorders, restless leg syndrome, attention deficit hyperactivity disorders, hyperprolactinemia, autism, motor disturbances such as akathisia, rigor, dystonias as well as various disorders of the urinary tract and other neurologic disorders.
Southern Research Institute


08/20/15
20150231126 

Combinations of 5-ht2a inverse agonists and antagonists with antipsychotics


Combinations of 5-ht2a inverse agonists or antagonists such as pimavanserin with antipsychotics such as risperidone are shown induce a rapid onset of antipsychotic action and increase the responders when compared to therapy with the antipsychotic alone. These effects can be achieved at a low dose of the antipsychotic, thereby reducing the incidence of side effects.
Acadia Pharmaceuticals Inc.


08/06/15
20150219843 

Avoiding beam obstruction during inscription of fiber gratings


The present disclosure provides systems and methods for avoiding beam obstructions during inscription of fiber gratings. For some embodiments, an optical fiber is re-oriented during fiber inscription to avoid obstruction of the actinic beam..
Ofs Fitel, Llc


08/06/15
20150217276 

Photocatalyst comprising gold-palladium alloy, preparation, photolysis system


The present invention relates to a photocatalyst for the generation of diatomic hydrogen from a hydrogen containing precursor under the influence of actinic radiation comprising a semiconductor support and a gold and palladium alloy on said semiconductor support. The present invention further relates to a method for generating diatomic hydrogen by photolysis and a photolysis system..
Saudi Basic Industries Corporation


07/30/15
20150212406 

Positive photosensitive resin composition and cured film forming method using the same


There are provided a positive photosensitive resin composition excellent in the sensitivity, film residual ratio and storage stability, comprising a resin containing a specific acrylic acid-based constituent unit capable of dissociating an acid-dissociable group to produce a carboxyl group, the resin being alkali-insoluble or sparingly alkali-soluble and becoming alkali-soluble when the acid-dissociable group dissociates, a resin containing a constituent unit having a functional group capable of reacting with the carboxyl group to form a covalent bond, and a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a cured film forming method using the positive photosensitive resin composition; and a cured film excellent in the heat resistance, adhesion, transmittance and the like.. .
Fujifilm Corporation


07/30/15
20150210789 

Polymeric chelation system


A polymeric chelation system comprised of high water content at least one polymer designed with a unique combination of cross-linkers and spacer monomers chosen to enable selective uptake of specific elements from a dissolved solution. Multiple polymers can be used to extract a plurality of elements.
Polymerium, Llc






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